ClassID:

120287

C23C16/52 - page 9 - CPC Classification

Classification description:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating Controlling or regulating the coating process

Recent Application in this class:
#2401
20160260620
2016-09-08

Technique to deposit sidewall passivation for high aspect ratio cylinder etch

#2402
20160260603
2016-09-08

Method and apparatus to minimize seam effect during TEOS oxide film deposition

#2403
20160258065
2016-09-08

Substrate processing method including supplying a fluorine-containing gas on a surface of a substrate

#2404
20160258063
2016-09-08

ATOMIC LAYER DEPOSITION APPARATUS AND ATOMIC LAYER DEPOSITION METHOD

#2405
20160258059
2016-09-08

FLUIDIZED BED ATOMIC LAYER DEPOSITION DEVICE FOR MANUFACTURING NANOCOATING PARTICLES

#2406
20160258057
2016-09-08

Clean resistant windows for ultraviolet thermal processing

#2407
20160244881
2016-08-25

Heat treatment system, heat treatment method, and program

#2408
20160244878
2016-08-25

Substrate processing apparatus and heating unit

#2409
20160244875
2016-08-25

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2410
20160240402
2016-08-18

Systems and methods for internal surface conditioning in plasma processing equipment

#2411
20160237568
2016-08-18

SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY COMPUTER READABLE RECORDING MEDIUM

#2412
20160237561
2016-08-18

Anneal techniques for chalcogenide semiconductors

#2413
20160237560
2016-08-18

Substrate processing apparatus, non-transitory computer-readable recording medium thereof and semiconductor manufacturing method by employing thereof

#2414
20160236239
2016-08-18

Substrate processing apparatus

#2415
20160233085
2016-08-11

Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium

#2416
20160233081
2016-08-11

Apparatuses and methods for depositing SiC/SiCN films via cross-metathesis reactions with organometallic co-reactants

#2417
20160230283
2016-08-11

Fused Material Deposition Microwave System And Method

#2418
20160230280
2016-08-11

Substrate processing apparatus

#2419
20160225632
2016-08-04

Metal doping of amorphous carbon and silicon films used as hardmasks in substrate processing systems

#2420
20160225617
2016-08-04

Method of manufacturing semiconductor device, substrate processing apparatus and recording medium

#2421
20160225588
2016-08-04

Methods for decreasing carbon-hydrogen content of amorphous carbon hardmask films

#2422
20160222514
2016-08-04

Semiconductor manufacturing apparatus and manufacturing method of semiconductor device

#2423
20160220953
2016-08-04

Method of detoxifying exhaust pipe and film forming apparatus

#2424
20160216185
2016-07-28

Estimation of lifetime remaining for a consumable-part in a semiconductor manufacturing chamber

#2425
20160216100
2016-07-28

APPARATUS FOR MEASURING CONTAMINATION OF PLASMA GENERATING DEVICE

#2426
20160215397
2016-07-28

Monitoring thin film deposition

#2427
20160215396
2016-07-28

Intelligent hardstop for gap detection and control mechanism

#2428
20160211135
2016-07-21

Method of manufacturing semiconductor device, substrate processing apparatus, substrate processing system and recording medium

#2429
20160211132
2016-07-21

Method of manufacturing semiconductor device for forming film including at least two different elements

#2430
20160211123
2016-07-21

Plasma processing apparatus and method for monitoring plasma processing apparatus

#2431
20160204044
2016-07-14

Processing methods and apparatus with temperature distribution control

#2432
20160204008
2016-07-14

Substrate treatment device

#2433
20160201196
2016-07-14

Substrate processing apparatus and method of manufacturing semiconductor device

#2434
20160201194
2016-07-14

Method and apparatus for depositing atomic layers on a substrate

#2435
20160196984
2016-07-07

Isotropic atomic layer etch for silicon and germanium oxides

#2436
20160196978
2016-07-07

Method of manufacturing semiconductor device, substrate processing device, and recording medium

#2437
20160190564
2016-06-30

Li-ion battery with alumina coated porous silicon anode

#2438
20160189993
2016-06-30

Substrate processing apparatus, gas-purging method, method for manufacturing semiconductor device, and recording medium containing abnormality-processing program

#2439
20160189931
2016-06-30

PLASMA PROCESSING APPARATUS AND METHOD FOR DETERMINING REPLACEMENT OF MEMBER OF PLASMA PROCESSING APPARATUS

#2440
20160185605
2016-06-30

COPPER SUBSTRATE FOR DEPOSITION OF GRAPHENE

#2441
20160181128
2016-06-23

High-throughput semiconductor-processing apparatus equipped with multiple dual-chamber modules

#2442
20160181073
2016-06-23

Low contamination chamber for surface activation

#2443
20160172165
2016-06-16

Carrier ring structure and chamber systems including the same

#2444
20160168710
2016-06-16

Gas Injection System For Chemical Vapor Deposition Using Sequenced Valves

#2445
20160168709
2016-06-16

Slot-die coating method and apparatus

#2446
20160168708
2016-06-16

COMBINED HEAT TREAT AND THIN FILM COATING PROCESS

#2447
20160168707
2016-06-16

VAPOR DEPOSITION APPARATUS AND METHOD

#2448
20160168705
2016-06-16

Inlet for effective mixing and purging

#2449
20160168701
2016-06-16

Multi-station plasma reactor with RF balancing

#2450
20160168695
2016-06-16

Coating for a medical, dental or surgical instrument

#2451
20160163591
2016-06-09

Copper wiring forming method, film forming system, and storage medium

#2452
20160163561
2016-06-09

Technique to deposit sidewall passivation for high aspect ratio cylinder etch

#2453
20160163556
2016-06-09

Technique to deposit sidewall passivation for high aspect ratio cylinder etch

#2454
20160163507
2016-06-09

Deposition method and focused ion beam system

#2455
20160155627
2016-06-02

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2456
20160155611
2016-06-02

Plasma processing apparatus

#2457
20160153090
2016-06-02

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2458
20160153088
2016-06-02

Film forming apparatus

#2459
20160148824
2016-05-26

Method and apparatus of manufacturing a semiconductor device by forming a film on a substrate

#2460
20160148800
2016-05-26

Selective inhibition in atomic layer deposition of silicon-containing films

#2461
20160148369
2016-05-26

Method of analyzing growth of two-dimensional material

#2462
20160145744
2016-05-26

Image processing-based lithography system and method of coating target object

#2463
20160138191
2016-05-19

High pressure chemical vapor deposition apparatuses, methods, and compositions produced therewith

#2464
20160138160
2016-05-19

REACTIVE ULTRAVIOLET THERMAL PROCESSING OF LOW DIELECTRIC CONSTANT MATERIALS

#2465
20160130725
2016-05-12

Highly twinned, oriented polycrystalline diamond film and method of manufacture thereof

#2466
20160130698
2016-05-12

Nanowire growth system having nanoparticles aerosol generator

#2467
20160126337
2016-05-05

SUBSTRATE PROCESSING APPARATUS, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND SUBSTRATE PROCESSING METHOD

#2468
20160126106
2016-05-05

Selective growth method and substrate processing apparatus

#2469
20160122904
2016-05-05

Method of producing epitaxial wafer

#2470
20160122873
2016-05-05

Film forming apparatus and shower head

#2471
20160122872
2016-05-05

Film forming apparatus, film forming method, and recording medium

#2472
20160122871
2016-05-05

Atomic Layer Deposition (ALD) Apparatus

#2473
20160122870
2016-05-05

Vapor delivery device, methods of manufacture and methods of use thereof

#2474
20160122868
2016-05-05

Method for synthesis of transition metal chalcogenide

#2475
20160118345
2016-04-28

Low temperature tungsten film deposition for small critical dimension contacts and interconnects

#2476
20160118227
2016-04-28

System, method and apparatus for RF power compensation in a plasma processing system

#2477
20160115594
2016-04-28

SOURCE GAS SUPPLY APPARATUS AND FILM FORMING APPARATUS

#2478
20160111466
2016-04-21

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS

#2479
20160111342
2016-04-21

METHOD AND APPARATUS FOR CHARACTERIZING METAL OXIDE REDUCTION

#2480
20160111307
2016-04-21

Integrated substrate defect detection using precision coating

#2481
20160111304
2016-04-21

Substrate processing apparatus, substrate processing method and storage medium

#2482
20160111278
2016-04-21

Substrate processing method and substrate processing apparatus

#2483
20160111258
2016-04-21

Gas supply delivery arrangement including a gas splitter for tunable gas flow control

#2484
20160104606
2016-04-14

Systems and methods for internal surface conditioning assessment in plasma processing equipment

#2485
20160102400
2016-04-14

Controlled coating apparatus, systems, and methods

#2486
20160097127
2016-04-07

Systems and methods for measuring entrained vapor

#2487
20160097126
2016-04-07

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2488
20160097121
2016-04-07

Methods of vapor deposition with multiple vapor sources

#2489
20160093762
2016-03-31

Anneal techniques for chalcogenide semiconductors

#2490
20160093542
2016-03-31

Method of manufacturing semiconductor device and semiconductor manufacturing apparatus

#2491
20160093520
2016-03-31

Processing apparatus and processing method

#2492
20160093512
2016-03-31

Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium

#2493
20160093508
2016-03-31

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

#2494
20160091711
2016-03-31

ELECTROWETTING ELEMENT WITH A LAYER INCLUDING SILICON AND FLUORINE

#2495
20160090651
2016-03-31

SUBSTRATE PROCESSING APPARATUS

#2496
20160090650
2016-03-31

Method for RF compensation in plasma assisted atomic layer deposition

#2497
20160090649
2016-03-31

Method to obtain SiC class of films of desired composition and film properties

#2498
20160090645
2016-03-31

Method for structuring an object with the aid of a particle beam apparatus

#2499
20160086818
2016-03-24

Substrate processing apparatus and a method of manufacturing a semiconductor device

#2500
20160086801
2016-03-24

Method of processing substrate, substrate processing apparatus, and recording medium

#2501
20160086791
2016-03-24

Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium

#2502
20160083846
2016-03-24

Method for adjusting vapor-phase growth apparatus

#2503
20160083843
2016-03-24

SUBSTRATE PROCESSING APPARATUS

#2504
20160079100
2016-03-17

VACUUM CARRIER INTERFACE HAVING A SWITCHABLE REDUCED CAPACITY AIRLOCK CHAMBER

#2505
20160079070
2016-03-17

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS

#2506
20160079057
2016-03-17

Systems and methods for reducing backside deposition and mitigating thickness changes at substrate edges

#2507
20160079056
2016-03-17

Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium

#2508
20160076149
2016-03-17

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND FURNACE LID

#2509
20160071728
2016-03-10

Film forming method and film forming apparatus

#2510
20160071720
2016-03-10

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2511
20160068962
2016-03-10

Devices including metal-silicon contacts using indium arsenide films and apparatus and methods

#2512
20160068961
2016-03-10

Method and Apparatus For Growing Binary, Ternary and Quaternary Materials on a Substrate

#2513
20160068960
2016-03-10

Method for generating plasma uniformly on dielectric material

#2514
20160068953
2016-03-10

Gas separation control in spatial atomic layer deposition

#2515
20160064262
2016-03-03

SEMICONDUCTOR MANUFACTURING APPARATUS, SEMICONDUCTOR MANUFACTURING SYSTEM, AND SEMICONDUCTOR MANUFACTURING METHOD

#2516
20160064246
2016-03-03

Substrate processing apparatus and method of processing a substrate

#2517
20160064219
2016-03-03

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2518
20160060763
2016-03-03

Chemical vapor deposition process and coated article

#2519
20160060762
2016-03-03

Semiconductor manufacturing system and semiconductor manufacturing method

#2520
20160060755
2016-03-03

Substrate processing apparatus

#2521
20160056074
2016-02-25

Method for void-free cobalt gap fill

#2522
20160056071
2016-02-25

Method for selectively sealing ultra low-k porous dielectric layer using flowable dielectric film formed from vapor phase dielectric precursor

#2523
20160056053
2016-02-25

Method and apparatus to deposit pure titanium thin film at low temperature using titanium tetraiodide precursor

#2524
20160056037
2016-02-25

Method to tune TiOstoichiometry using atomic layer deposited Ti film to minimize contact resistance for TiO/Ti based MIS contact scheme for CMOS

#2525
20160056032
2016-02-25

METHODS AND APPARATUSES FOR STABLE DEPOSITION RATE CONTROL IN LOW TEMPERATURE ALD SYSTEMS BY SHOWERHEAD ACTIVE HEATING AND/OR PEDESTAL COOLING

#2526
20160053377
2016-02-25

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SUBSTRATE PROCESSING METHOD

#2527
20160053376
2016-02-25

Plasma uniformity control by arrays of unit cell plasmas

#2528
20160053371
2016-02-25

Decorative article having black hard coating film

#2529
20160052655
2016-02-25

Fill on demand ampoule refill

#2530
20160051964
2016-02-25

Method and system for in situ formation of gas-phase compounds

#2531
20160049298
2016-02-18

Method of forming germanium film and apparatus therefor

#2532
20160049281
2016-02-18

Differentially pumped reactive gas injector

#2533
20160047047
2016-02-18

Raw material gas supply apparatus

#2534
20160047046
2016-02-18

Semiconductor manufacturing apparatus and manufacturing method of semiconductor device

#2535
20160047045
2016-02-18

Process control method and process control system

#2536
20160047039
2016-02-18

Processing apparatus

#2537
20160043385
2016-02-11

Silicon or Germanium Network Structure for Use as an Anode in a Battery

#2538
20160042958
2016-02-11

Graphene forming method

#2539
20160042940
2016-02-11

Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium

#2540
20160042917
2016-02-11

Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wall

#2541
20160035544
2016-02-04

Wafer carrier with independent isolated heater zones

#2542
20160035542
2016-02-04

Method of conditioning vacuum chamber of semiconductor substrate processing apparatus

#2543
20160032457
2016-02-04

Atomic layer deposition processing apparatus to reduce heat energy conduction

#2544
20160030975
2016-02-04

Enhanced low friction coating for medical leads and methods of making

#2545
20160027675
2016-01-28

Position and temperature monitoring of ALD platen susceptor

#2546
20160027674
2016-01-28

Carousel Gas Distribution Assembly With Optical Measurements

#2547
20160027667
2016-01-28

Systems and methods for electrical and magnetic uniformity and skew tuning in plasma processing reactors

#2548
20160024659
2016-01-28

Method of manufacturing semiconductor device including forming a film containing a first element, a second element and carbon, substrate processing apparatus, and recording medium

#2549
20160024650
2016-01-28

SUBSTRATE PROCESSING APPARATUS

#2550
20160024649
2016-01-28

Semiconductor device manufacturing method and substrate processing apparatus

#2551
20160023904
2016-01-28

STRAIN ENGINEERED MICROSTRUCTURES

#2552
20160017497
2016-01-21

PECVD process

#2553
20160017496
2016-01-21

Method For Optimizing A Deposition Process, Method For Setting A Deposition System and Deposition System

#2554
20160017494
2016-01-21

APPARATUS AND METHOD FOR TUNING A PLASMA PROFILE USING A TUNING RING IN A PROCESSING CHAMBER

#2555
20160017493
2016-01-21

Systems and methods for improving deposition rate uniformity and reducing defects in substrate processing systems

#2556
20160017489
2016-01-21

Method for supplying a process with an enriched carrier gas

#2557
20160016848
2016-01-21

Layered transparent conductive oxide thin films

#2558
20160013023
2016-01-14

Film forming device, film forming method, and film forming program

#2559
20160013020
2016-01-14

SYSTEMS AND METHODS FOR PRODUCING ENERGETIC NEUTRALS

#2560
20160010212
2016-01-14

PROCESS FOR OBTAINING A SUBSTRATE EQUIPPED WITH A COATING

#2561
20160010210
2016-01-14

Substrate processing apparatus

#2562
20160010206
2016-01-14

H/Oside inject to improve process uniformity for low temperature oxidation process

#2563
20160005607
2016-01-07

Method for selectively depositing a layer on a three dimensional structure

#2564
20160005594
2016-01-07

High efficiency apparatus and method for depositing a layer on a three dimensional structure

#2565
20160002789
2016-01-07

SUBSTRATE PROCESSING APPARATUS, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM

#2566
20160002787
2016-01-07

Substrate processing apparatus

#2567
20160002773
2016-01-07

Reverse circulation fluidized bed reactor for granular polysilicon production

#2568
20150380296
2015-12-31

CLEANING OF CARBON-BASED CONTAMINANTS IN METAL INTERCONNECTS FOR INTERCONNECT CAPPING APPLICATIONS

#2569
20150380288
2015-12-31

Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium

#2570
20150380287
2015-12-31

Method and system for naturally oxidizing a substrate

#2571
20150380272
2015-12-31

Liner and barrier applications for subtractive metal integration

#2572
20150377714
2015-12-31

Processing apparatus and method of measuring temperature of workpiece in processing apparatus

#2573
20150376792
2015-12-31

ATMOSPHERIC PLASMA APPARATUS FOR SEMICONDUCTOR PROCESSING

#2574
20150376791
2015-12-31

GAS CLUSTER REACTOR FOR ANISOTROPIC FILM GROWTH

#2575
20150376782
2015-12-31

Wafer placement and gap control optimization through in situ feedback

#2576
20150376781
2015-12-31

Cleaning method, manufacturing method of semiconductor device, substrate processing apparatus, and recording medium

#2577
20150371882
2015-12-24

Semiconductor manufacturing apparatus

#2578
20150371843
2015-12-24

Method of manufacturing semiconductor device and substrate processing apparatus

#2579
20150369710
2015-12-24

Method and System of Creating a Symmetrical FIB Deposition

#2580
20150368802
2015-12-24

Film forming method and film forming apparatus

#2581
20150368794
2015-12-24

Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, recording medium, and cleaning completion determining method

#2582
20150368111
2015-12-24

METHOD AND SYSTEM FOR GRAPHENE FORMATION

#2583
20150364318
2015-12-17

Method for manufacturing semiconductor device, method for processing substrate, substrate processing apparatus and recording medium

#2584
20150364300
2015-12-17

DETERMINING PRESENCE OF CONDUCTIVE FILM ON DIELECTRIC SURFACE OF REACTION CHAMBER

#2585
20150361559
2015-12-17

Hydrophobization treatment apparatus, hydrophobization treatment method, and hydrophobization treatment recording medium

#2586
20150361553
2015-12-17

Rotating semi-batch ALD device

#2587
20150357181
2015-12-10

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2588
20150354062
2015-12-10

Thin film forming method and thin film forming appartus

#2589
20150354060
2015-12-10

Film formation apparatus, film formation method, and storage medium

#2590
20150348854
2015-12-03

Multi-station plasma reactor with RF balancing

#2591
20150348840
2015-12-03

METHODS OF FILLING HIGH ASPECT RATIO FEATURES WITH FLUORINE FREE TUNGSTEN

#2592
20150345311
2015-12-03

APPARATUS AND METHODS FOR FORMING MODIFIED METAL COATINGS

#2593
20150345023
2015-12-03

Window cooling using compliant material

#2594
20150345022
2015-12-03

Apparatus and methods for injector to substrate gap control

#2595
20150345018
2015-12-03

Methods for obtaining hydrophilic fluoropolymers

#2596
20150340225
2015-11-26

Back side deposition apparatus and applications

#2597
20150338560
2015-11-26

Optical device and method of in situ treating an EUV optical component to enhance a reduced reflectivity

#2598
20150338279
2015-11-26

Control of stray radiation in a CVD chamber

#2599
20150337442
2015-11-26

Multi-wafer reactor

#2600
20150335823
2015-11-26

Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like

#2601
20150332916
2015-11-19

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2602
20150332912
2015-11-19

Single ALD cycle thickness control in multi-station substrate deposition systems

#2603
20150329965
2015-11-19

METHODS OF LOW TEMPERATURE DEPOSITION OF CERAMIC THIN FILMS

#2604
20150329961
2015-11-19

Carbon nanotube foams with controllable mechanical properties

#2605
20150325488
2015-11-12

Vapor phase growth method of growing a film on a substrate while heating the substrate with a heating unit

#2606
20150325475
2015-11-12

Methods of preparing tungsten and tungsten nitride thin films using tungsten chloride precursor

#2607
20150325447
2015-11-12

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS

#2608
20150325432
2015-11-12

Film forming method, film forming apparatus and recording medium

#2609
20150325427
2015-11-12

Method of manufacturing semiconductor device, substrate processing method and substrate processing apparatus

#2610
20150323483
2015-11-12

Detection system for detecting service life of baffle mechanism in a chamber for vacuum coating

#2611
20150322571
2015-11-12

SUBSTRATE PROCESSING APPARATUS

#2612
20150322569
2015-11-12

Atomic layer deposition with plasma source

#2613
20150322567
2015-11-12

Raw material vaporization and supply apparatus

#2614
20150321917
2015-11-12

Method of manufacturing carbon nanotubes

#2615
20150318223
2015-11-05

Method for controlling a plasma chamber

#2616
20150318120
2015-11-05

CARBON NANOTUBE-GRAPHENE COMPOSITE

#2617
20150315706
2015-11-05

Low volume showerhead with porous baffle

#2618
20150315704
2015-11-05

Low-oxidation plasma-assisted process

#2619
20150315702
2015-11-05

Substrate Processing Apparatus

#2620
20150311060
2015-10-29

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2621
20150303056
2015-10-22

Conformal deposition of silicon carbide films

#2622
20150303054
2015-10-22

Method for manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2623
20150303051
2015-10-22

Method of manufacturing semiconductor device, using hydrocarbon and halogen-based precursors, substrate processing apparatus for processing same, and recording medium comprising hydrocarbon and halogen-based precursors

#2624
20150299861
2015-10-22

Device for synthesising core-shell nanoparticles by laser pyrolysis and associated method

#2625
20150299857
2015-10-22

DEPOSITION DEVICE WITH AUXILIARY INJECTORS FOR INJECTING NUCLEOPHILE GAS AND SEPARATION GAS

#2626
20150299855
2015-10-22

Apparatus for susceptor temperature verification and methods of use

#2627
20150299853
2015-10-22

EVAPORATOR, DEPOSITION ARRANGEMENT, DEPOSITION APPARATUS AND METHODS OF OPERATION THEREOF

#2628
20150294884
2015-10-15

Substrate processing apparatus and control device for substrate processing apparatus

#2629
20150294860
2015-10-15

Substrate processing apparatus

#2630
20150293031
2015-10-15

Coating inspection method

#2631
20150292087
2015-10-15

Substrate Processing Apparatus and Substrate Processing Method

#2632
20150292083
2015-10-15

Device and method for exhaust gas treatment on CVD reactor

#2633
20150292082
2015-10-15

Substrate processing apparatus, non-transitory computer-readable recording medium thereof and semiconductor manufacturing method by employing thereof

#2634
20150287618
2015-10-08

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

#2635
20150287616
2015-10-08

Methods for Discretized Processing and Process Sequence Integration of Regions of a Substrate

#2636
20150287594
2015-10-08

Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium

#2637
20150287588
2015-10-08

Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium

#2638
20150284851
2015-10-08

Systems and Methods to Control Sources of Atomic Species in a Deposition Process

#2639
20150279708
2015-10-01

Substrate treatment method and substrate treatment apparatus

#2640
20150279683
2015-10-01

METHOD AND APPARATUS FOR FORMING TiSiN FILM

#2641
20150279682
2015-10-01

Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium

#2642
20150279681
2015-10-01

Plasma atomic layer deposition

#2643
20150279663
2015-10-01

Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium

#2644
20150275372
2015-10-01

System and method for forming a thin-film phosphor layer for phosphor-converted light emitting devices

#2645
20150275371
2015-10-01

Vapor deposition apparatus and method associated

#2646
20150275367
2015-10-01

Gas supply mechanism, gas supplying method, film forming apparatus and film forming method using the same

#2647
20150275366
2015-10-01

Film forming apparatus, film forming method, and non-transitory computer-readable storage medium

#2648
20150275359
2015-10-01

Substrate Processing Apparatus

#2649
20150275358
2015-10-01

Systems and methods for pressure-based liquid flow control

#2650
20150275356
2015-10-01

CLEANING METHOD OF APPARATUS FOR FORMING AMORPHOUS SILICON FILM, AND METHOD AND APPARATUS FOR FORMING AMORPHOUS SILICON FILM

#2651
20150270134
2015-09-24

METHODS OF FORMING A METAL-INSULATOR-SEMICONDUCTOR (MIS) STRUCTURE AND A DUAL CONTACT DEVICE

#2652
20150270119
2015-09-24

Substrate processing apparatus, method for manufacturing semiconductor device and computer-readable recording medium

#2653
20150267301
2015-09-24

Gas-phase reactor and system having exhaust plenum and components thereof

#2654
20150267300
2015-09-24

Thermal processing chamber

#2655
20150267299
2015-09-24

Gas distribution system, reactor including the system, and methods of using the same

#2656
20150267298
2015-09-24

Film forming apparatus

#2657
20150267296
2015-09-24

Substrate processing apparatus

#2658
20150267294
2015-09-24

Substrate processing apparatus, method for manufacturing semiconductor device and computer-readable recording medium

#2659
20150267292
2015-09-24

CLEANING METHOD OF SILICON OXIDE FILM FORMING APPARATUS, SILICON OXIDE FILM FORMING METHOD, AND SILICON OXIDE FILM FORMING APPARATUS

#2660
20150262817
2015-09-17

Substrate processing method, substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium

#2661
20150262816
2015-09-17

Method of manufacturing semiconductor device and substrate processing apparatus

#2662
20150262809
2015-09-17

Method of manufacturing a SiOCN film, substrate processing apparatus, and recording medium

#2663
20150259796
2015-09-17

Film forming method, film forming apparatus and storage medium

#2664
20150259795
2015-09-17

Substrate processing apparatus

#2665
20150259792
2015-09-17

Method of Forming Titanium Carbonitride Film and Film Formation Apparatus Therefor

#2666
20150259791
2015-09-17

Method for depositing a chlorine-free conformal SiN film

#2667
20150259790
2015-09-17

Methods for producing diamond mass and apparatus therefor

#2668
20150255274
2015-09-10

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2669
20150255269
2015-09-10

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2670
20150255255
2015-09-10

Plasma processing apparatus, plasma processing method and storage medium for storing program for executing the method

#2671
20150255254
2015-09-10

Method for the plasma coating of a substrate, in particular a press platen

#2672
20150252474
2015-09-10

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

#2673
20150249013
2015-09-03

Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors

#2674
20150247238
2015-09-03

RF CYCLE PURGING TO REDUCE SURFACE ROUGHNESS IN METAL OXIDE AND METAL NITRIDE FILMS

#2675
20150247236
2015-09-03

METHODS FOR DEPOSITING MATERIAL ONTO MICROFEATURE WORKPIECES IN REACTION CHAMBERS AND SYSTEMS FOR DEPOSITING MATERIALS ONTO MICROFEATURE WORKPIECES

#2676
20150243883
2015-08-27

Plasma assisted atomic layer deposition titanium oxide for conformal encapsulation and gapfill applications

#2677
20150243545
2015-08-27

Inhibitor plasma mediated atomic layer deposition for seamless feature fill

#2678
20150243499
2015-08-27

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2679
20150243496
2015-08-27

Method and apparatus of forming carbon-containing silicon film

#2680
20150240361
2015-08-27

Apparatus and method for improving wafer uniformity

#2681
20150240355
2015-08-27

Vaporizer unit with open cell core and method of operating

#2682
20150240352
2015-08-27

Method for making aircraft brake disc

#2683
20150240121
2015-08-27

Method for improving chemical resistance of polymerized film, polymerized film forming method, film forming apparatus, and electronic product manufacturing method

#2684
20150240120
2015-08-27

Polymerized film forming method

#2685
20150238999
2015-08-27

Coating method, coating device and coating generating system

#2686
20150235850
2015-08-20

Semiconductor device manufacturing method and semiconductor device manufacturing apparatus

#2687
20150235846
2015-08-20

Method and apparatus for forming silicon oxide film

#2688
20150235835
2015-08-20

High growth rate process for conformal aluminum nitride

#2689
20150235813
2015-08-20

Plasma processing device and operation method

#2690
20150232988
2015-08-20

VAPOR PHASE GROWTH APPARATUS

#2691
20150232986
2015-08-20

Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2692
20150232702
2015-08-20

Polymerized film forming method

#2693
20150228474
2015-08-13

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#2694
20150228473
2015-08-13

Method and apparatus for forming metal oxide film

#2695
20150228457
2015-08-13

GAS SUPPLY METHOD AND PLASMA PROCESSING APPARATUS

#2696
20150227139
2015-08-13

Correction value computation device, correction value computation method, and computer program

#2697
20150226540
2015-08-13

PECVD apparatus and process

#2698
20150225875
2015-08-13

Density-matching alkyl push flow for vertical flow rotating disk reactors

#2699
20150225852
2015-08-13

Method of forming metal-containing film

#2700
20150225849
2015-08-13

Method for processing a substrate and substrate processing apparatus