120287 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating Controlling or regulating the coating process
Technique to deposit sidewall passivation for high aspect ratio cylinder etch
#2402Method and apparatus to minimize seam effect during TEOS oxide film deposition
#2403Substrate processing method including supplying a fluorine-containing gas on a surface of a substrate
#2404ATOMIC LAYER DEPOSITION APPARATUS AND ATOMIC LAYER DEPOSITION METHOD
#2405FLUIDIZED BED ATOMIC LAYER DEPOSITION DEVICE FOR MANUFACTURING NANOCOATING PARTICLES
#2406Clean resistant windows for ultraviolet thermal processing
#2407Heat treatment system, heat treatment method, and program
#2408Substrate processing apparatus and heating unit
#2409Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#2410Systems and methods for internal surface conditioning in plasma processing equipment
#2411SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY COMPUTER READABLE RECORDING MEDIUM
#2412Anneal techniques for chalcogenide semiconductors
#2413Substrate processing apparatus, non-transitory computer-readable recording medium thereof and semiconductor manufacturing method by employing thereof
#2414Substrate processing apparatus
#2415Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium
#2416Apparatuses and methods for depositing SiC/SiCN films via cross-metathesis reactions with organometallic co-reactants
#2417Fused Material Deposition Microwave System And Method
#2418Substrate processing apparatus
#2419Metal doping of amorphous carbon and silicon films used as hardmasks in substrate processing systems
#2420Method of manufacturing semiconductor device, substrate processing apparatus and recording medium
#2421Methods for decreasing carbon-hydrogen content of amorphous carbon hardmask films
#2422Semiconductor manufacturing apparatus and manufacturing method of semiconductor device
#2423Method of detoxifying exhaust pipe and film forming apparatus
#2424Estimation of lifetime remaining for a consumable-part in a semiconductor manufacturing chamber
#2425APPARATUS FOR MEASURING CONTAMINATION OF PLASMA GENERATING DEVICE
#2426Monitoring thin film deposition
#2427Intelligent hardstop for gap detection and control mechanism
#2428Method of manufacturing semiconductor device, substrate processing apparatus, substrate processing system and recording medium
#2429Method of manufacturing semiconductor device for forming film including at least two different elements
#2430Plasma processing apparatus and method for monitoring plasma processing apparatus
#2431Processing methods and apparatus with temperature distribution control
#2432Substrate treatment device
#2433Substrate processing apparatus and method of manufacturing semiconductor device
#2434Method and apparatus for depositing atomic layers on a substrate
#2435Isotropic atomic layer etch for silicon and germanium oxides
#2436Method of manufacturing semiconductor device, substrate processing device, and recording medium
#2437Li-ion battery with alumina coated porous silicon anode
#2438Substrate processing apparatus, gas-purging method, method for manufacturing semiconductor device, and recording medium containing abnormality-processing program
#2439PLASMA PROCESSING APPARATUS AND METHOD FOR DETERMINING REPLACEMENT OF MEMBER OF PLASMA PROCESSING APPARATUS
#2440COPPER SUBSTRATE FOR DEPOSITION OF GRAPHENE
#2441High-throughput semiconductor-processing apparatus equipped with multiple dual-chamber modules
#2442Low contamination chamber for surface activation
#2443Carrier ring structure and chamber systems including the same
#2444Gas Injection System For Chemical Vapor Deposition Using Sequenced Valves
#2445Slot-die coating method and apparatus
#2446COMBINED HEAT TREAT AND THIN FILM COATING PROCESS
#2447VAPOR DEPOSITION APPARATUS AND METHOD
#2448Inlet for effective mixing and purging
#2449Multi-station plasma reactor with RF balancing
#2450Coating for a medical, dental or surgical instrument
#2451Copper wiring forming method, film forming system, and storage medium
#2452Technique to deposit sidewall passivation for high aspect ratio cylinder etch
#2453Technique to deposit sidewall passivation for high aspect ratio cylinder etch
#2454Deposition method and focused ion beam system
#2455Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#2456Plasma processing apparatus
#2457Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#2458Film forming apparatus
#2459Method and apparatus of manufacturing a semiconductor device by forming a film on a substrate
#2460Selective inhibition in atomic layer deposition of silicon-containing films
#2461Method of analyzing growth of two-dimensional material
#2462Image processing-based lithography system and method of coating target object
#2463High pressure chemical vapor deposition apparatuses, methods, and compositions produced therewith
#2464REACTIVE ULTRAVIOLET THERMAL PROCESSING OF LOW DIELECTRIC CONSTANT MATERIALS
#2465Highly twinned, oriented polycrystalline diamond film and method of manufacture thereof
#2466Nanowire growth system having nanoparticles aerosol generator
#2467SUBSTRATE PROCESSING APPARATUS, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND SUBSTRATE PROCESSING METHOD
#2468Selective growth method and substrate processing apparatus
#2469Method of producing epitaxial wafer
#2470Film forming apparatus and shower head
#2471Film forming apparatus, film forming method, and recording medium
#2472Atomic Layer Deposition (ALD) Apparatus
#2473Vapor delivery device, methods of manufacture and methods of use thereof
#2474Method for synthesis of transition metal chalcogenide
#2475Low temperature tungsten film deposition for small critical dimension contacts and interconnects
#2476System, method and apparatus for RF power compensation in a plasma processing system
#2477SOURCE GAS SUPPLY APPARATUS AND FILM FORMING APPARATUS
#2478METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS
#2479METHOD AND APPARATUS FOR CHARACTERIZING METAL OXIDE REDUCTION
#2480Integrated substrate defect detection using precision coating
#2481Substrate processing apparatus, substrate processing method and storage medium
#2482Substrate processing method and substrate processing apparatus
#2483Gas supply delivery arrangement including a gas splitter for tunable gas flow control
#2484Systems and methods for internal surface conditioning assessment in plasma processing equipment
#2485Controlled coating apparatus, systems, and methods
#2486Systems and methods for measuring entrained vapor
#2487Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#2488Methods of vapor deposition with multiple vapor sources
#2489Anneal techniques for chalcogenide semiconductors
#2490Method of manufacturing semiconductor device and semiconductor manufacturing apparatus
#2491Processing apparatus and processing method
#2492Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
#2493METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
#2494ELECTROWETTING ELEMENT WITH A LAYER INCLUDING SILICON AND FLUORINE
#2495SUBSTRATE PROCESSING APPARATUS
#2496Method for RF compensation in plasma assisted atomic layer deposition
#2497Method to obtain SiC class of films of desired composition and film properties
#2498Method for structuring an object with the aid of a particle beam apparatus
#2499Substrate processing apparatus and a method of manufacturing a semiconductor device
#2500Method of processing substrate, substrate processing apparatus, and recording medium
#2501Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium
#2502Method for adjusting vapor-phase growth apparatus
#2503SUBSTRATE PROCESSING APPARATUS
#2504VACUUM CARRIER INTERFACE HAVING A SWITCHABLE REDUCED CAPACITY AIRLOCK CHAMBER
#2505METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS
#2506Systems and methods for reducing backside deposition and mitigating thickness changes at substrate edges
#2507Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium
#2508SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND FURNACE LID
#2509Film forming method and film forming apparatus
#2510Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#2511Devices including metal-silicon contacts using indium arsenide films and apparatus and methods
#2512Method and Apparatus For Growing Binary, Ternary and Quaternary Materials on a Substrate
#2513Method for generating plasma uniformly on dielectric material
#2514Gas separation control in spatial atomic layer deposition
#2515SEMICONDUCTOR MANUFACTURING APPARATUS, SEMICONDUCTOR MANUFACTURING SYSTEM, AND SEMICONDUCTOR MANUFACTURING METHOD
#2516Substrate processing apparatus and method of processing a substrate
#2517Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#2518Chemical vapor deposition process and coated article
#2519Semiconductor manufacturing system and semiconductor manufacturing method
#2520Substrate processing apparatus
#2521Method for void-free cobalt gap fill
#2522Method for selectively sealing ultra low-k porous dielectric layer using flowable dielectric film formed from vapor phase dielectric precursor
#2523Method and apparatus to deposit pure titanium thin film at low temperature using titanium tetraiodide precursor
#2524Method to tune TiOstoichiometry using atomic layer deposited Ti film to minimize contact resistance for TiO/Ti based MIS contact scheme for CMOS
#2525METHODS AND APPARATUSES FOR STABLE DEPOSITION RATE CONTROL IN LOW TEMPERATURE ALD SYSTEMS BY SHOWERHEAD ACTIVE HEATING AND/OR PEDESTAL COOLING
#2526SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SUBSTRATE PROCESSING METHOD
#2527Plasma uniformity control by arrays of unit cell plasmas
#2528Decorative article having black hard coating film
#2529Fill on demand ampoule refill
#2530Method and system for in situ formation of gas-phase compounds
#2531Method of forming germanium film and apparatus therefor
#2532Differentially pumped reactive gas injector
#2533Raw material gas supply apparatus
#2534Semiconductor manufacturing apparatus and manufacturing method of semiconductor device
#2535Process control method and process control system
#2536Processing apparatus
#2537Silicon or Germanium Network Structure for Use as an Anode in a Battery
#2538Graphene forming method
#2539Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium
#2540Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wall
#2541Wafer carrier with independent isolated heater zones
#2542Method of conditioning vacuum chamber of semiconductor substrate processing apparatus
#2543Atomic layer deposition processing apparatus to reduce heat energy conduction
#2544Enhanced low friction coating for medical leads and methods of making
#2545Position and temperature monitoring of ALD platen susceptor
#2546Carousel Gas Distribution Assembly With Optical Measurements
#2547Systems and methods for electrical and magnetic uniformity and skew tuning in plasma processing reactors
#2548Method of manufacturing semiconductor device including forming a film containing a first element, a second element and carbon, substrate processing apparatus, and recording medium
#2549SUBSTRATE PROCESSING APPARATUS
#2550Semiconductor device manufacturing method and substrate processing apparatus
#2551STRAIN ENGINEERED MICROSTRUCTURES
#2552PECVD process
#2553Method For Optimizing A Deposition Process, Method For Setting A Deposition System and Deposition System
#2554APPARATUS AND METHOD FOR TUNING A PLASMA PROFILE USING A TUNING RING IN A PROCESSING CHAMBER
#2555Systems and methods for improving deposition rate uniformity and reducing defects in substrate processing systems
#2556Method for supplying a process with an enriched carrier gas
#2557Layered transparent conductive oxide thin films
#2558Film forming device, film forming method, and film forming program
#2559SYSTEMS AND METHODS FOR PRODUCING ENERGETIC NEUTRALS
#2560PROCESS FOR OBTAINING A SUBSTRATE EQUIPPED WITH A COATING
#2561Substrate processing apparatus
#2562H/Oside inject to improve process uniformity for low temperature oxidation process
#2563Method for selectively depositing a layer on a three dimensional structure
#2564High efficiency apparatus and method for depositing a layer on a three dimensional structure
#2565SUBSTRATE PROCESSING APPARATUS, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM
#2566Substrate processing apparatus
#2567Reverse circulation fluidized bed reactor for granular polysilicon production
#2568CLEANING OF CARBON-BASED CONTAMINANTS IN METAL INTERCONNECTS FOR INTERCONNECT CAPPING APPLICATIONS
#2569Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
#2570Method and system for naturally oxidizing a substrate
#2571Liner and barrier applications for subtractive metal integration
#2572Processing apparatus and method of measuring temperature of workpiece in processing apparatus
#2573ATMOSPHERIC PLASMA APPARATUS FOR SEMICONDUCTOR PROCESSING
#2574GAS CLUSTER REACTOR FOR ANISOTROPIC FILM GROWTH
#2575Wafer placement and gap control optimization through in situ feedback
#2576Cleaning method, manufacturing method of semiconductor device, substrate processing apparatus, and recording medium
#2577Semiconductor manufacturing apparatus
#2578Method of manufacturing semiconductor device and substrate processing apparatus
#2579Method and System of Creating a Symmetrical FIB Deposition
#2580Film forming method and film forming apparatus
#2581Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, recording medium, and cleaning completion determining method
#2582METHOD AND SYSTEM FOR GRAPHENE FORMATION
#2583Method for manufacturing semiconductor device, method for processing substrate, substrate processing apparatus and recording medium
#2584DETERMINING PRESENCE OF CONDUCTIVE FILM ON DIELECTRIC SURFACE OF REACTION CHAMBER
#2585Hydrophobization treatment apparatus, hydrophobization treatment method, and hydrophobization treatment recording medium
#2586Rotating semi-batch ALD device
#2587Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#2588Thin film forming method and thin film forming appartus
#2589Film formation apparatus, film formation method, and storage medium
#2590Multi-station plasma reactor with RF balancing
#2591METHODS OF FILLING HIGH ASPECT RATIO FEATURES WITH FLUORINE FREE TUNGSTEN
#2592APPARATUS AND METHODS FOR FORMING MODIFIED METAL COATINGS
#2593Window cooling using compliant material
#2594Apparatus and methods for injector to substrate gap control
#2595Methods for obtaining hydrophilic fluoropolymers
#2596Back side deposition apparatus and applications
#2597Optical device and method of in situ treating an EUV optical component to enhance a reduced reflectivity
#2598Control of stray radiation in a CVD chamber
#2599Multi-wafer reactor
#2600Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like
#2601Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#2602Single ALD cycle thickness control in multi-station substrate deposition systems
#2603METHODS OF LOW TEMPERATURE DEPOSITION OF CERAMIC THIN FILMS
#2604Carbon nanotube foams with controllable mechanical properties
#2605Vapor phase growth method of growing a film on a substrate while heating the substrate with a heating unit
#2606Methods of preparing tungsten and tungsten nitride thin films using tungsten chloride precursor
#2607METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS
#2608Film forming method, film forming apparatus and recording medium
#2609Method of manufacturing semiconductor device, substrate processing method and substrate processing apparatus
#2610Detection system for detecting service life of baffle mechanism in a chamber for vacuum coating
#2611SUBSTRATE PROCESSING APPARATUS
#2612Atomic layer deposition with plasma source
#2613Raw material vaporization and supply apparatus
#2614Method of manufacturing carbon nanotubes
#2615Method for controlling a plasma chamber
#2616CARBON NANOTUBE-GRAPHENE COMPOSITE
#2617Low volume showerhead with porous baffle
#2618Low-oxidation plasma-assisted process
#2619Substrate Processing Apparatus
#2620Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#2621Conformal deposition of silicon carbide films
#2622Method for manufacturing semiconductor device, substrate processing apparatus, and recording medium
#2623Method of manufacturing semiconductor device, using hydrocarbon and halogen-based precursors, substrate processing apparatus for processing same, and recording medium comprising hydrocarbon and halogen-based precursors
#2624Device for synthesising core-shell nanoparticles by laser pyrolysis and associated method
#2625DEPOSITION DEVICE WITH AUXILIARY INJECTORS FOR INJECTING NUCLEOPHILE GAS AND SEPARATION GAS
#2626Apparatus for susceptor temperature verification and methods of use
#2627EVAPORATOR, DEPOSITION ARRANGEMENT, DEPOSITION APPARATUS AND METHODS OF OPERATION THEREOF
#2628Substrate processing apparatus and control device for substrate processing apparatus
#2629Substrate processing apparatus
#2630Coating inspection method
#2631Substrate Processing Apparatus and Substrate Processing Method
#2632Device and method for exhaust gas treatment on CVD reactor
#2633Substrate processing apparatus, non-transitory computer-readable recording medium thereof and semiconductor manufacturing method by employing thereof
#2634PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
#2635Methods for Discretized Processing and Process Sequence Integration of Regions of a Substrate
#2636Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium
#2637Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium
#2638Systems and Methods to Control Sources of Atomic Species in a Deposition Process
#2639Substrate treatment method and substrate treatment apparatus
#2640METHOD AND APPARATUS FOR FORMING TiSiN FILM
#2641Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium
#2642Plasma atomic layer deposition
#2643Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium
#2644System and method for forming a thin-film phosphor layer for phosphor-converted light emitting devices
#2645Vapor deposition apparatus and method associated
#2646Gas supply mechanism, gas supplying method, film forming apparatus and film forming method using the same
#2647Film forming apparatus, film forming method, and non-transitory computer-readable storage medium
#2648Substrate Processing Apparatus
#2649Systems and methods for pressure-based liquid flow control
#2650CLEANING METHOD OF APPARATUS FOR FORMING AMORPHOUS SILICON FILM, AND METHOD AND APPARATUS FOR FORMING AMORPHOUS SILICON FILM
#2651METHODS OF FORMING A METAL-INSULATOR-SEMICONDUCTOR (MIS) STRUCTURE AND A DUAL CONTACT DEVICE
#2652Substrate processing apparatus, method for manufacturing semiconductor device and computer-readable recording medium
#2653Gas-phase reactor and system having exhaust plenum and components thereof
#2654Thermal processing chamber
#2655Gas distribution system, reactor including the system, and methods of using the same
#2656Film forming apparatus
#2657Substrate processing apparatus
#2658Substrate processing apparatus, method for manufacturing semiconductor device and computer-readable recording medium
#2659CLEANING METHOD OF SILICON OXIDE FILM FORMING APPARATUS, SILICON OXIDE FILM FORMING METHOD, AND SILICON OXIDE FILM FORMING APPARATUS
#2660Substrate processing method, substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
#2661Method of manufacturing semiconductor device and substrate processing apparatus
#2662Method of manufacturing a SiOCN film, substrate processing apparatus, and recording medium
#2663Film forming method, film forming apparatus and storage medium
#2664Substrate processing apparatus
#2665Method of Forming Titanium Carbonitride Film and Film Formation Apparatus Therefor
#2666Method for depositing a chlorine-free conformal SiN film
#2667Methods for producing diamond mass and apparatus therefor
#2668Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#2669Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#2670Plasma processing apparatus, plasma processing method and storage medium for storing program for executing the method
#2671Method for the plasma coating of a substrate, in particular a press platen
#2672SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
#2673Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors
#2674RF CYCLE PURGING TO REDUCE SURFACE ROUGHNESS IN METAL OXIDE AND METAL NITRIDE FILMS
#2675METHODS FOR DEPOSITING MATERIAL ONTO MICROFEATURE WORKPIECES IN REACTION CHAMBERS AND SYSTEMS FOR DEPOSITING MATERIALS ONTO MICROFEATURE WORKPIECES
#2676Plasma assisted atomic layer deposition titanium oxide for conformal encapsulation and gapfill applications
#2677Inhibitor plasma mediated atomic layer deposition for seamless feature fill
#2678Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#2679Method and apparatus of forming carbon-containing silicon film
#2680Apparatus and method for improving wafer uniformity
#2681Vaporizer unit with open cell core and method of operating
#2682Method for making aircraft brake disc
#2683Method for improving chemical resistance of polymerized film, polymerized film forming method, film forming apparatus, and electronic product manufacturing method
#2684Polymerized film forming method
#2685Coating method, coating device and coating generating system
#2686Semiconductor device manufacturing method and semiconductor device manufacturing apparatus
#2687Method and apparatus for forming silicon oxide film
#2688High growth rate process for conformal aluminum nitride
#2689Plasma processing device and operation method
#2690VAPOR PHASE GROWTH APPARATUS
#2691Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#2692Polymerized film forming method
#2693Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#2694Method and apparatus for forming metal oxide film
#2695GAS SUPPLY METHOD AND PLASMA PROCESSING APPARATUS
#2696Correction value computation device, correction value computation method, and computer program
#2697PECVD apparatus and process
#2698Density-matching alkyl push flow for vertical flow rotating disk reactors
#2699Method of forming metal-containing film
#2700Method for processing a substrate and substrate processing apparatus