120717 ⎘
Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions; Other heavy metals refractory metals
COMPOSITION, METHOD OF TREATING METAL-CONTAINING LAYER BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME
#2PREPARATION FOR PRE-TREATING SURFACES BY CHEMICALLY CONVERTING OXIDE LAYERS OF TITANIUM OR TITANIUM ALLOYS
#3METHOD FOR SURFACE TREATMENT BY SELECTIVE REMOVAL OF A BONDING PRIMER ON A TITANIUM OR TITANIUM ALLOY SUBSTRATE
#4MOLYBDENUM CONTAINING TARGETS
#5Solution and method for etching titanium based materials
#6Molybdenum containing targets
#7Selective etching of reactor surfaces
#8Molybdenum containing targets for touch screen device
#9Cleaning liquid for semiconductor elements and cleaning method using same
#10Oxidizing aqueous cleaner for the removal of post-etch residues
#11Method of making molybdenum containing targets comprising molybdenum, titanium, and tantalum or chromium
#12Selective etch chemistry for gate electrode materials
#13Oxidizing aqueous cleaner for the removal of post-etch residues
#14ETCHING SOLUTION FOR TITANIUM-BASED METAL, TUNGSTEN-BASED METAL, TITANIUM/TUNGSTEN-BASED METAL OR THEIR NITRIDES
#15Molybdenum containing targets
#16Process for the stripping of workpieces and stripping solution
#17Selective etching of reactor surfaces
#18Oxidizing aqueous cleaner for the removal of post-etch residues
#19Removal of niobium second phase particle deposits from pickled zirconium-niobium alloys
#20Removal of niobium second phase particle deposits from pickled zirconium-niobium alloys
#21Semiconductor process residue removal composition and process
#22Manufacture of casting cores
#23Cleaning compositions and methods of use thereof
#24Preparation of getter surfaces using caustic chemicals
#25Cleaning solution and method for cleaning semiconductor device by using the same
#26Cleaning tantalum-containing deposits from process chamber components