ClassID:

121284

C30B25/025 - CPC Classification

Classification description:

Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth; Epitaxial-layer growth Continuous growth

Recent Application in this class:
#1
20220316093
2022-10-06

METHODS AND SYSTEMS FOR PREPARING COMPOSITE CRYSTALS

#2
20210214856
2021-07-15

Methods for forming large area single crystal diamond substrates with high crystallographic alignment

#3
20210130979
2021-05-06

Concentric flow reactor

#4
20200385885
2020-12-10

CYCLICAL EPITAXIAL DEPOSITION SYSTEM

#5
20200032416
2020-01-30

Concentric flow reactor

#6
20190272994
2019-09-05

HIGH GROWTH RATE DEPOSITION FOR GROUP III/V MATERIALS

#7
20180187331
2018-07-05

Continuous single crystal growth of graphene

#8
20180033872
2018-02-01

Method of epitaxial growth shape control for CMOS applications

#9
20180011209
2018-01-11

Scintillator, scintillator panel, radiation detector and method of manufacturing scintillator

#10
20170198409
2017-07-13

Concentric flower reactor

#11
20160293789
2016-10-06

VAPOR DEPOSITION EQUIPMENT INCLUDING A SELENIZATION PROCESS FOR FABRICATING CIGS FILM

#12
20160160387
2016-06-09

Linear Cluster Deposition System

#13
20160076148
2016-03-17

Protecting a target pump interior with an ALD coating

#14
20150376793
2015-12-31

Indexed gas jet injector for substrate processing system

#15
20150152570
2015-06-04

Concentric flower reactor

#16
20150107510
2015-04-23

COATING A SUBSTRATE WEB BY ATOMIC LAYER DEPOSITION

#17
20150059647
2015-03-05

Apparatus for growing diamonds by microwave plasma chemical vapour deposition process and substrate stage used therein

#18
20130272928
2013-10-17

APPARATUS FOR THE DEPOSITION OF DIAMONDS BY MICROWAVE PLASMA CHEMICAL VAPOUR DEPOSITION PROCESS AND SUBSTRATE STAGE USED THEREIN

#19
20130239879
2013-09-19

Load lock having secondary isolation chamber

#20
20130098289
2013-04-25

METHODS AND APPARATUS FOR A CHEMICAL VAPOR DEPOSITION REACTOR

#21
20120058630
2012-03-08

Linear Cluster Deposition System

#22
20110290175
2011-12-01

Multi-Chamber CVD Processing System

#23
20100310769
2010-12-09

Continuous Feed Chemical Vapor Deposition System

#24
20100212591
2010-08-26

REACTOR LID ASSEMBLY FOR VAPOR DEPOSITION

#25
20100209626
2010-08-19

Methods for heating with lamps

#26
20100209620
2010-08-19

Method for vapor deposition

#27
20100209082
2010-08-19

HEATING LAMP SYSTEM

#28
20100206235
2010-08-19

Wafer carrier track

#29
20100206229
2010-08-19

VAPOR DEPOSITION REACTOR SYSTEM

#30
20100190343
2010-07-29

Load lock having secondary isolation chamber

#31
20100120233
2010-05-13

Continuous feed chemical vapor deposition

#32
20090325367
2009-12-31

METHODS AND APPARATUS FOR A CHEMICAL VAPOR DEPOSITION REACTOR

#33
20090324379
2009-12-31

Methods and apparatus for a chemical vapor deposition reactor

#34
20060073978
2006-04-06

Method and apparatus for making continuous films of a single crystal material

#35
20050269021
2005-12-08

Method and apparatus for manufacturing coated conductor