Upper dome with injection assembly

Method of growing gallium nitride-based crystal and heat treatment apparatus

Silicon carbide semiconductor device manufacturing method

Pre-cleaning method and preparation method of low-temperature polysilicon thin film, liquid crystal display device, and manufacturing system thereof

Epitaxial growth apparatus

APPARATUS FOR SELF-CENTERING PRE-HEAT RING

Film formation apparatus and film formation method

Method and apparatus for producing large, single-crystals of aluminum nitride

EPI pre-heat ring

Growth reactor for gallium-nitride crystals using ammonia and hydrogen chloride

Method for producing bulk silicon carbide by sublimation of a silicon carbide precursor prepared from silicon and carbon particles or particulate silicon carbide

Cluster apparatus for treating substrate

Method for producing III-N templates and the reprocessing thereof and III-N template

Heater moving type substrate processing apparatus

CRYSTAL FILM, METHOD FOR MANUFACTURING CRYSTAL FILM, VAPOR DEPOSITION APPARATUS AND MULTI-CHAMBER APPARATUS

Synthetic diamond coated compound semiconductor substrates

Single crystal CVD synthetic diamond material

Vapor-trapping growth of single-crystalline graphene flowers

Film formation apparatus and film formation method

Wafer carrier with temperature distribution control

Film Forming Method Using Epitaxial Growth and Epitaxial Growth Apparatus

Methods and systems for thin film deposition processes

Growth methods for controlled large-area fabrication of high-quality graphene analogs

Crystal layered structure and method for manufacturing same, and semiconductor element

Methods of growing a silicon carbide epitaxial layer on a substrate to increase and control carrier lifetime

Epitaxial wafer manufacturing device and manufacturing method

Film forming method, vacuum processing apparatus, semiconductor light emitting element manufacturing method, semiconductor light emitting element, and illuminating device

Method of growing diamond thin film

EQUIPMENT FOR MANUFACTURING SEMICONDUCTOR

Silicon carbide single crystal manufacturing apparatus

Gas hydrate conversion system for harvesting hydrocarbon hydrate deposits

Production method of an aluminum based group III nitride single crystal

Gallium-nitride-on-diamond wafers and manufacturing equipment and methods of manufacture

Susceptor assemblies for supporting wafers in a reactor apparatus

Film-forming apparatus and film-forming method

Method for making epitaxial structure

Gas injectors including a funnel- or wedge-shaped channel for chemical vapor deposition (CVD) systems and CVD systems with the same

Method of manufacturing substrate

TARGETED TEMPERATURE COMPENSATION IN CHEMICAL VAPOR DEPOSITION SYSTEMS

MICRO COIL, MANUFACTURING METHOD AND MANUFACTURING APPARATUS THEREOF

Gallium trichloride injection scheme

METHODS AND APPARATUS FOR A CHEMICAL VAPOR DEPOSITION REACTOR

Graphene pattern and process of preparing the same

APPARATUS AND METHOD FOR HVPE PROCESSING USING A PLASMA

Manufacturing apparatus and method for semiconductor device

Method and apparatus for depositing a layer on a semiconductor wafer by vapor deposition in a process chamber

HEATING UNIT AND FILM-FORMING APPARATUS

Method for producing a III/V Si template

VAPOR GROWTH APPARATUS AND VAPOR GROWTH METHOD

Process for producing epitaxial silicon carbide single crystal substrate and epitaxial silicon carbide single crystal substrate obtained by the same

Nucleation of Aluminum Nitride on a Silicon Substrate Using an Ammonia Preflow

METHOD OF VAPOR PHASE EPITAXY AND VAPOR PHASE EPITAXY DEVICE

Film-forming apparatus and film-forming method

Manufacturing apparatus and method for semiconductor device

Metal-Organic Vapor Phase Epitaxy System and Process

Method and apparatus for the selective deposition of epitaxial germanium stressor alloys

FILM-FORMING APPARATUS AND METHOD

Rapid bake of semiconductor substrate with upper linear heating elements perpendicular to horizontal gas flow

Method for manufacturing silicon epitaxial wafer

Induction Heating for Substrate Processing

EPITAXIAL GROWTH TEMPERATURE CONTROL IN LED MANUFACTURE

FILM-FORMING APPARATUS AND FILM-FORMING METHOD

Method of forming crystalline oxide semiconductor film

Linear Cluster Deposition System

Vapor phase deposition apparatus and support table

Manufacturing method and apparatus for semiconductor device

THERMAL PROCESSING APPARATUS

Gallium trichloride injection scheme

FILM-FORMING MANUFACTURING APPARATUS AND METHOD

CUBIC SILICON CARBIDE FILM MANUFACTURING METHOD, AND CUBIC SILICON CARBIDE FILM-ATTACHED SUBSTRATE MANUFACTURING METHOD

Controlling an epitaxial growth process in an epitaxial reactor

Reaction chamber of an epitaxial reactor and reactor that uses said chamber

FILM DEPOSITION APPARATUS

MOCVD REACTOR HAVING A CEILING PANEL COUPLED LOCALLY DIFFERENTLY TO A HEAT DISSIPATION MEMBER

GAS DEPOSITION REACTOR

Multi-Zone Induction Heating for Improved Temperature Uniformity in MOCVD and HVPE Chambers

METHOD FOR PROCESSING A CHEMICAL VAPOR DEPOSITION (CVD) AND A CVD DEVICE USING THE SAME

DUAL HEATING FOR PRECISE WAFER TEMPERATURE CONTROL

CRYSTAL GROWTH PROCESS FOR NITRIDE SEMICONDUCTOR, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

REACTOR, CHEMICAL VAPOR DEPOSITION REACTOR, AND METALORGANIC CHEMICAL VAPOR DEPOSITION REACTOR

MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF SILICON CARBIDE SINGLE CRYSTAL

Modern hydride vapor-phase epitaxy system and methods

Epitaxial growth systems

Manufacturing apparatus and method for semiconductor device

Thermal processing apparatus and cooling method

APPARATUS AND METHOD FOR FILM DEPOSITION

Gas hydrate conversion system for harvesting hydrocarbon hydrate deposits

Methods of growing a silicon carbide epitaxial layer on a substrate to increase and control carrier lifetime

Manufacturing apparatus and method for semiconductor device

Manufacturing apparatus and method for semiconductor device

Substrate processing apparatus with an insulator disposed in the reaction chamber

Growth reactor for gallium-nitride crystals using ammonia and hydrogen chloride

Heat treatment apparatus

DEVICE AND METHOD FOR SELECTIVELY DEPOSITING CRYSTALLINE LAYERS USING MOCVD OR HVPE

Epitaxial layers on oxidation-sensitive substrates and method of producing same

CVD apparatus having a rotating heater

Methods for heating with lamps

HEATING LAMP SYSTEM

VAPOR DEPOSITION REACTOR SYSTEM

Method and apparatus for manufacturing epitaxial silicon wafer

Apparatus for crystal growth

Growth of germanium epitaxial thin film with negative photoconductance characteristics and photodiode using the same

Susceptor device, manufacturing apparatus of epitaxial wafer, and manufacturing method of epitaxial wafer

Method of producing a group III nitride crystal

Film deposition apparatus and film deposition method

Heater, manufacturing apparatus for semiconductor device, and manufacturing method for semiconductor device

CVD Device with Substrate Holder with Differential Temperature Control

DIFFERENTIATED-TEMPERATURE REACTION CHAMBER

Reactor For Growing Crystals

METHODS AND APPARATUS FOR A CHEMICAL VAPOR DEPOSITION REACTOR

Graphene pattern and process of preparing the same

Methods and apparatus for a chemical vapor deposition reactor

Synthesis of Carbon Nanotubes by Selectively Heating Catalyst

Method for producing an epitaxially coated semiconductor wafer

CONTROLLED EDGE RESISTIVITY IN A SILICON WAFER

Method for manufacturing epitaxial wafer

APPARATUS AND METHOD FOR MANUFACTURING EPITAXIAL WAFER

Method for growing thin films

Gallium trichloride injection scheme

MBE DEVICE AND METHOD FOR THE OPERATION THEREOF

Methods for controllably induction heating an article

Apparatus and Method for Controlling the Surface Temperature of a Substrate in a Process Chamber

VAPOR-PHASE GROWTH APPARATUS AND VAPOR-PHASE GROWTH METHOD

Method and apparatus for growing a group (III) metal nitride film and a group (III) metal nitride film

Method of controlling an epitaxial growth process in an epitaxial reactor

Epitaxial layer structures and precursors for topotactic anion exchange oxide films

Vapor phase growth apparatus and vapor phase growth method

Synthesis of carbon nanotubes by selectively heating catalyst

Method for growing thin films

Housing assembly for an induction heating device including liner or susceptor coating

Method for maintaining semiconductor manufacturing apparatus, semiconductor manufacturing apparatus, and method for manufacturing semiconductor

Thin film producing method

Quartz Jig and Semiconductor Manufacturing Apparatus

CVD reactor with RF-heated process chamber

Batch reaction chamber employing separate zones for radiant heating and resistive heating

Hotwall reactor and method for reducing particle formation in GaN MOCVD

Germanium deposition

Epitaxial Reactor Cooling Method and Reactor Cooled Thereby

Radial temperature control for lattice-mismatched epitaxy

Vapor phase deposition apparatus and support table

Vapor phase growth apparatus

Large aluminum nitride crystals with reduced defects and methods of making them

Method and apparatus for producing large, single-crystals of aluminum nitride

Temperature control method of epitaxial growth apparatus

Process for manufacture of super lattice using alternating high and low temperature layers to block parasitic current path

Gas phase reaction processing device

Apparatus and method for atomic layer deposition on substrates

WAFER HEATER AND WAFER CHUCK INCLUDING THE SAME

Epitaxial layer structures, precursors for topotactic anion exchange films

Hybrid beam deposition system and methods for fabricating metal oxide-ZnO films, p-type ZnO films, and ZnO-based II-VI compound semiconductor devices

Vapor phase growth method by controlling the heat output in the gas introduction region

Susceptor system

Topotactic anion exchange oxide films and method of producing the same

Support system for a treatment apparatus

Apparatus for thermal treatment of substrates

Reactor having a movable shutter

Vapor-phase growth apparatus

Germanium deposition

Vapor-phase epitaxial apparatus and vapor phase epitaxial method

Method and device for the temperature control of surface temperatures of substrates in a CVD reactor

Epitaxial silicon wafer with intrinsic gettering and a method for the preparation thereof

Composition for preparing silicon carbide ingot and method for preparing silicon carbide ingot using the same

Methods for producing 2D materials by moving forming layers disposed on carriers through a reaction chamber open to the atmosphere

Continuous system for fabricating multilayer heterostructures via hydride vapor phase epitaxy

Apparatus for producing graphene and other 2D materials