IMAGING ELLIPSOMETER FOR AREAL LAYER THICKNESS MEASUREMENT OF A SAMPLE AND METHOD USING AN IMAGING ELLIPSOMETER

FILM THICKNESS MEASUREMENT DEVICE

SEMICONDUCTOR PROCESS DEVICE AND METHOD OF MONITORING SEMICONDUCTOR PROCESS

COMBINATION OF MULTIWAVELENGTH RAMAN AND SPECTROSCOPIC ELLIPSOMETRY TO MEASURE A FILM STACK

ANGLE-RESOLVED SPECTROSCOPIC ELLIPSOMETER USING SPATIAL LIGHT MODULATOR AND THICKNESS MEASURING METHOD FOR THIN FILM

Apparatus to characterize substrates and films

Contactless method for polymer coating thickness measurement

Systems and methods for augmentation of sensor systems and imaging systems with polarization

SUBSTRATE PROCESSING APPARATUS AND METHOD OF MEASURING FILM THICKNESS

Spectroscopic Reflectometry And Ellipsometry Measurements With Electroreflectance Modulation

Device and method for measuring the profile of flat objects comprising unknown materials

Systems and methods for surface normals sensing with polarization

Optical metrology models for in-line film thickness measurements

THICKNESS MEASUREMENT DEVICE AND METHOD FOR MEASURING THICKNESS OF FIRST LAYER OF PLANT LEAF

Laser absorptivity measurement device

LAMINATED COATING LAYER, METHOD FOR MANUFACTURING SAME, AND METHOD FOR DETERMINING LAMINATED STRUCTURE

Ellipsometer

Scatterometry based methods and systems for measurement of strain in semiconductor structures

In-situ full wafer metrology system

Two-degree-of-freedom heterodyne grating interferometry measurement system

MULTILAYER STRUCTURE INSPECTION APPARATUS AND METHOD, AND SEMICONDUCTOR DEVICE FABRICATING METHOD USING THE INSPECTION METHOD

Optical monitor

Ellipsometer and method for estimating thickness of film

Rapid measurement method for ultra-thin film optical constant

Multi-dimensional model of optical dispersion

Methods and systems for measurement of thick films and high aspect ratio structures

Scatterometry based methods and systems for measurement of strain in semiconductor structures

Optical metrology device for measuring samples having thin or thick films

Phase revealing optical and X-ray semiconductor metrology

Ellipsometer and method for estimating thickness of film

System and method for use in high spatial resolution ellipsometry

HALFWAY CUTTER CHANGING METHOD FOR LARGE-AREA MICROSTRUCTURE CUTTING BASED ON IN-SITUATION FILM THICKNESS MEASUREMENT

IN-SITU ELLIPSOMETRY FOR ELECTRIC VEHICLE BATTERY CELL LITHIUM PLATING CHARACTERIZATION

Prism coupling methods of characterizing stress in glass-based ion-exchanged articles having problematic refractive index profiles

Thin film analysis apparatus and method for a curved surface

Measurement methodology of advanced nanostructures

Optimizing computational efficiency by multiple truncation of spatial harmonics

Detection and measurement of dimensions of asymmetric structures

Multilayer film metrology using an effective media approximation

Method for measuring thickness variations in a layer of a multilayer semiconductor structure

Methods and systems for measurement of thick films and high aspect ratio structures

Inspection apparatus and inspection method using the same

Control wafer making device

Achromatic rotating-element ellipsometer and method for measuring mueller-matrix elements of sample using the same

Method And System For Real-Time In-Process Measurement Of Coating Thickness

Compensation for Goos-Hanchen error in autofocus systems

Optical technique for coating characterization

Laminate substrate measurement method, laminate substrate and measurement apparatus

Critical dimension measurements with gaseous adsorption

METHOD OF AUTHENTICATING A POLYMER FILM BY THICKNESS MEASUREMENT WITH A WHITE LIGHT INTERFEROMETER

Control wafer making device and method for measuring and monitoring control wafer

Methods and apparatus for measuring height on a semiconductor wafer

Optimizing computational efficiency by multiple truncation of spatial harmonics

Method and device for determining the position and orientation of a specular surface forming a diopter

Method and device for measuring large-area and massive scattered field in nanoscale

Prism-coupling systems and methods for characterizing ion-exchanged waveguides with large depth-of-layer

Film thickness measuring device and film thickness measuring method

Substrate target for in-situ lithography metrology, metrology method for in-situ lithography, and method of manufacturing integrated circuit device by using in-situ metrology

Method and system for real-time in-process measurement of coating thickness

FILM THICKNESS MEASUREMENT DEVICE AND METHOD

Integrated system, integrated system operation method and film treatment method

Automatic selection of sample values for optical metrology

Metrology systems and methods

Atmospheric molecular contamination control with local purging

Electronic component thickness measurement method, method for manufacturing a series of electronic components using the measurement method, a series of electronic components manufactured by the manufacturing method, and electronic component inspection apparatus

Metrology system optimization for parameter tracking

Defect inspecting apparatus and defect inspecting method

Measurement device and method for vapour deposition applications

Apparatus and method for optical metrology with optimized system parameters

METHOD OF AUTHENTICATING A POLYMER FILM

Metrology systems and methods

Optical metrology using targets with field enhancement elements

Layer Thickness Measurement

Film thickness monitor

Optical characteristic measuring apparatus and optical characteristic measuring method

MODULATED ELLIPSOMETER FOR THE DETERMINATION OF THE PROPERTIES OF OPTICAL MATERIALS

Atmospheric molecular contamination control with local purging

Reconfigurable spectroscopic ellipsometer

PATTERN INSPECTION METHOD AND DEVICE FOR SAME

Multiple measurement techniques including focused beam scatterometry for characterization of samples

POSITION-SENSITIVE METROLOGY SYSTEM

High resolution monitoring of CD variations

Methods and apparatus for the measurement of film thickness

Method of manufacturing eyeglass lens

Spectroscopic Scatterometer System

Inspection apparatus for lithography

Goos-Hanchen compensation in autofocus systems

Metrology systems and methods

Method of authenticating a polymer film by thickness measurement with a white light interferometer

System and method for performing ellipsometric measurements on an arbitrarily large or continuously moving sample

Single polarizer focused-beam ellipsometer

Method and apparatus for phase-compensated sensitivity-enhanced spectroscopy (PCSES)

Spectroscopic scatterometer system

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

Sample analyzing method, sample analyzing apparatus, manufacturing method of organic EL element, manufacturing equipment, and recording medium

Film Thickness Measuring Method and Substrate Processing Apparatus

Methods and apparatus for wavefront manipulations and improved 3-D measurements

Virtual measuring device and method

Method and apparatus for determining liquid crystal cell parameters from full mueller matrix measurements

Modeling conductive patterns using an effective model

High resolution monitoring of CD variations

Characterizing films using optical filter pseudo substrate

Optical metrology systems and methods

Spectroscopic ellipsometer and ellipsometry

Method for the in-situ and real-time determination of the thickness, optical properties and quality of transparent coatings during their growth onto polymeric substrates and determination of the modification, activation and the modification depth of polymeric materials surfaces

Detector configurations for optical metrology

SPECTROSCOPIC ELLIPSOMETER AND FILM THICKNESS MEASURING APPARATUS

Apparatus for detecting position of substrate, ellipsometer, and film thickness measuring apparatus

Systems and methods for characterizing thickness and topography of microelectronic workpiece layers

Apparatus and method for removing organic contamination adsorbed onto substrate, and apparatus and method for measuring thickness of thin film formed on substrate

Optical inspection system for a wafer

Optical Monitoring Apparatus and Method of Monitoring Optical Coatings

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

Purge gas flow control for high-precision film measurements using ellipsometry and reflectometry

Systems and methods for immersion metrology

Detector configurations for optical metrology

Method and apparatus for the treatment of a semiconductor wafer

Metrological characterisation of microelectronic circuits

Extracting ordinary and extraordinary optical characteristics for critical dimension measurement of anisotropic materials

High resolution monitoring of CD variations

PULSED ELLIPSOMETER DEVICE

Sample analyzing method, sample analyzing apparatus, manufacturing method of organic EL element, manufacturing equipment, and recording medium

Spectroscopic scatterometer system

Methods for characterizing semiconductor material using optical metrology

Method for monitoring film thickness using heterodyne reflectometry and grating interferometry

Combined use of oscillating means and ellipsometry to determine uncorrelated effective thickness and optical constants of material deposited from a fluid

Heterodyne reflectometer for film thickness monitoring and method for implementing

Method and apparatus for optically measuring the topography of nearly planar periodic structures

Determining wafer orientation in spectral imaging

Method and system for measuring overcoat layer thickness on a thin film disk

Double sided optical inspection of thin film disks or wafers

Method and system for on-line measurement of thickness and birefringence of thin plastic films

Multiple angle of incidence spectroscopic scatterometer system

Spectrometric measuring instrument

Surface inspection apparatus

Dew point measurement method and device for carrying out said method

Film forming condition determination method, film forming method, and film structure manufacturing method

Detector configurations for optical metrology

Method of polishing thin film formed on substrate

Imaginary polarizing measuring method for simultaneously measuring the optical crystal thickness and the optic axis direction

Method and apparatus for measuring thickness of thin film formed on substrate

Measuring method, analyzing method, measuring apparatus, analyzing apparatus, ellipsometer, and computer program

Apparatus and method for removing organic contamination adsorbed onto substrate, and apparatus and method for measuring thickness of thin film formed on substrate

Systems and methods for immersion metrology

Method and apparatus for high-speed thickness mapping of patterned thin films

Circularly polarized light method and device for determining wall thickness and orientations of fibrils of cellulosic fibres

Detector configurations for optical metrology

Method of detecting and classifying scratches, particles and pits on thin film disks or wafers

Apparatus and method for measuring each thickness of a multilayer stacked on a substrate

Scatterometry to simultaneously measure critical dimensions and film properties

Reference calibration of metrology instrument

Polarization analyzing method

Film forming apparatus and film forming method

Method of measuring thickness of thin films using diffraction of polarized light through a thin film

Ellipsometer apparatus having measurement compensation

Apparatus and methods for measuring properties in a TSV structure using beam profile reflectometry