Patents-Review.com
ClassID:

164276 ⎘

G01B11/065 - CPC Classification

Classification description:

Measuring arrangements characterised by the use of optical means for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization using one or more discrete wavelengths

Recent Application in this class:
#1
20250189295
2025-06-12

SECOND HARMONIC GENERATION (SHG) MEASUREMENT DEVICE AND MEASUREMENT METHOD USING THE SAME

 #2
20230034139
2023-02-02

Polarization imaging system and polarization imaging method

 #3
20230000343
2023-01-05

OPTICAL MEASUREMENT APPARATUS, MEASURING METHOD USING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

 #4
20220290974
2022-09-15

Optical metrology models for in-line film thickness measurements

 #5
20200340914
2020-10-29

Information processing apparatus, information processing method, program, and monitoring system

 #6
20200284733
2020-09-10

Methods and systems for measurement of thick films and high aspect ratio structures

 #7
20190237337
2019-08-01

Plasma processing method and plasma processing apparatus

 #8
20180238814
2018-08-23

Methods and systems for measurement of thick films and high aspect ratio structures

 #9
20180045507
2018-02-15

Method And System For Real-Time In-Process Measurement Of Coating Thickness

 #10
20160061585
2016-03-03

Optical measuring methods and apparatus

 #11
20160033259
2016-02-04

Method and system for real-time in-process measurement of coating thickness

 #12
20150198435
2015-07-16

Decoupling measurement of layer thicknesses of a plurality of layers of a circuit structure

 #13
20140132948
2014-05-15

Apparatus and method for optical metrology with optimized system parameters

 #14
20130003068
2013-01-03

Measurement of critical dimension

 #15
20120206710
2012-08-16

Measuring instrument and method for determination of the properties of an item and its surface

 #16
20110206830
2011-08-25

REVERSE INTERFEROMETRIC METHOD AND APPARATUS FOR MEASURING LAYER THICKNESS

 #17
20100121607
2010-05-13

Optical measurement apparatus, spectroscopic ellipsometer, recording medium, and measurement method

 #18
20090059236
2009-03-05

Wafer edge inspection

 #19
20080259333
2008-10-23

Method and apparatus for improved ellipsometric measurement of ultrathin films

 #20
20070165228
2007-07-19

Method and apparatus for improved ellipsometric measurement of ultrathin films

 #21
20060152716
2006-07-13

Double sided optical inspection of thin film disks or wafers

 #22
20060098197
2006-05-11

Method and apparatus for improved ellipsometric measurement of ultrathin films

 #23
20050239224
2005-10-27

Method and apparatus for measuring relative dielectric constant

 #24
20050025676
2005-02-03

Method for quantitatively and/or qualitatively detecting layer thicknesses, a microreaction vessel and titre plate