166130 ⎘
Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter of wafers or semiconductor substrates, e.g. using Rapid Thermal Processing
OPTICAL FAULT ISOLATION APPARATUS FOR SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE SUPPORT PLATE
#2HIGH-SPEED TEMPERATURE MEASUREMENT METHOD AND HIGH- SPEED TEMPERATURE MEASUREMENT DEVICE
#3METHOD FOR PERFORMANCE EVALUATION AND STRUCTURE OPTIMIZATION OF HIGH-POWER SEMICONDUCTOR LASER CHIP, AND SYSTEM FOR PERFORMANCE EVALUATION
#4Fiber Optic Temperature Sensor System
#5REFERENCE WAFER FOR HIGH FIDELITY IN-SITU TEMPERATURE METROLOGY CALIBRATION
#6THERMAL PROPERTY MEASUREMENT SYSTEMS AND METHODS FOR ELECTRONICS
#7Workpiece Processing Apparatus with Thermal Processing Systems
#8IN-SITU PYROMETER FOR SILICON CARBIDE WAFER
#9SUBSTRATE PROCESSING SYSTEMS, METHODS, AND RELATED APPARATUS AND CHAMBERS, FOR DETECTING PROCESSING SHIFTS
#10TEMPERATURE PROFILE MEASUREMENT AND SYNCHRONIZED CONTROL ON SUBSTRATE AND SUSCEPTOR IN AN EPITAXY CHAMBER
#11DUAL SENSOR WAFER TEMPERATURE MEASUREMENT SYSTEM
#12THERMAL PROCESSING SYSTEM FOR PROCESSING WORKPIECES
#13METHODS AND SYSTEMS FOR HEATING A WIDE BANDGAP SUBSTRATE
#14METHOD FOR EMISSIVITY-CORRECTED PYROMETRY
#15CHAMBER KITS, SYSTEMS, AND METHODS FOR CALIBRATING TEMPERATURE SENSORS FOR SEMICONDUCTOR MANUFACTURING
#16Workpiece Processing Apparatus with Thermal Processing Systems
#17SYSTEMS, APPARATUS, AND METHODS FOR MONITORING PLATE TEMPERATURE FOR SEMICONDUCTOR MANUFACTURING
#18METHODS OF FORMING STRUCTURES, SEMICONDUCTOR PROCESSING SYSTEMS, AND SEMICONDUCTOR DEVICE STRUCTURES
#19REFLECTOR PLATE FOR SUBSTRATE PROCESSING
#20SUBSTRATE PROCESSING APPARATUS
#21RADIATION TEMPERATURE MEASUREMENT DEVICE AND RADIATION TEMPERATURE MEASUREMENT METHOD
#22SUBSTRATE HEAT-TREATING APPARATUS USING LASER LIGHT-EMITTING DEVICE
#23SYNCHRONIZATION BETWEEN TEMPERATURE MEASUREMENT DEVICE AND RADIATION SOURCES
#24METHOD FOR EMISSIVITY-CORRECTED PYROMETRY
#25Temperature Sensor Arrangement in Semiconductor Module
#26PYROMETER CONTROLLED MULTI-WAFER CLEANING PROCESS
#27TEMPERATURE MEASUREMENT METHOD AND HEAT TREATMENT APPARATUS
#28Methods and systems for heating a wide bandgap substrate
#29RADIATION THERMOMETER
#30Temperature calibration with deposition and etch process
#31Method for heating a wide bandgap substrate by providing a resistive heating element which emits radiative heat in a mid-infrared band
#32THERMOREFLECTANCE ENHANCEMENT COATINGS AND METHODS OF MAKING AND USE THEREOF
#33WAFER TEMPERATURE GRADIENT CONTROL TO SUPPRESS SLIP FORMATION IN HIGH-TEMPERATURE EPITAXIAL FILM GROWTH
#34Methods of forming structures, semiconductor processing systems, and semiconductor device structures
#35Temperature measurement method, optical heating method, and optical heating device
#36Combined near and mid infrared sensor in a chip scale package
#37Workpiece processing apparatus with thermal processing systems
#38Real time chuck temperature monitoring
#39Reflector plate for substrate processing
#40Temperature profile measurement and synchronized control on substrate and susceptor in an epitaxy chamber
#41Method and apparatus for measuring temperature
#42METHOD AND APPARATUS FOR CONTROLLING THE TEMPERATURE OF A SEMICONDUCTOR WAFER
#43Method and device for failure analysis using RF-based thermometry
#44Thermal imaging sensor for integration into track system
#45Heat treatment method and heat treatment apparatus
#46Thermal imaging for within wafer variability feedforward or feedback information
#47Semiconductor device including temperature sensing circuit
#48Device and method for measuring film longitudinal temperature field during nitride epitaxial growth
#49Heat treatment method and heat treatment apparatus of light irradiation type
#50Continuous spectra transmission pyrometry
#51Contactless workpiece temperature sensor
#52Method and apparatus for calibration of substrate temperature using pyrometer
#53Method for determining a surface temperature
#54Apparatus and method for measuring the surface temperature of a substrate
#55Inspection system
#56Thermal processing chamber with low temperature control
#57INTEGRATED SUBSTRATE TEMPERATURE MEASUREMENT ON HIGH TEMPERATURE CERAMIC HEATER
#58Deposition apparatus having particular arrangement of raw material supply port, partition plate, and opening for measuring a temperature
#59Purged viewport for quartz dome in epitaxy reactor
#60Heat treatment apparatus and temperature control method
#61Systems And Methods For Thermal Processing And Temperature Measurement Of A Workpiece At Low Temperatures
#62Method and apparatus for measuring temperature
#63Laser noise elimination in transmission thermometry
#64Apparatus and method for online and real-time detection of temperature of epitaxial wafer
#65Semiconductor substrate measuring apparatus and plasma treatment apparatus using the same
#66Self-calibration apparatus and method for real-time temperature measurement system of MOCVD device
#67Thermal processing apparatus and thermal processing method through light irradiation
#68Radiation thermometer
#69Substrate temperature monitoring
#70Self-contained metrology wafer carrier systems
#71Substrate treatment method and substrate treatment apparatus
#72Continuous spectra transmission pyrometry
#73Thermal cooling member with low temperature control
#74Integrated substrate temperature measurement on high temperature ceramic heater
#75APPARATUS AND METHOD TO MEASURE TEMPERATURE OF 3D SEMICONDUCTOR STRUCTURES VIA LASER DIFFRACTION
#76Non-contact temperature calibration tool for a substrate support and method of using the same
#77Method of adjusting measurement position of radiation thermometer and heat treatment apparatus
#78In-situ temperature measurement for inside of process chamber
#79NON-CONTACT SUBSTRATE TEMPERATURE MEASUREMENT TECHNIQUE BASED ON SPECTRAL INTEFEROMETRY
#80Substrate processing apparatus and method
#81Self-contained metrology wafer carrier systems
#82Light-irradiation thermal treatment apparatus
#83NON-CONTACT TEMPERATURE SENSING APPARATUS
#84Substrate temperature monitoring
#85Pyrometer background elimination
#86Control device and method for monitoring a function of a semiconductor component during the operation thereof and electrical assembly having a control device
#87Analysis system and analysis method
#88In-situ temperature measurement in a noisy environment
#89Optical nondestructive testing method and optical nondestructive testing apparatus
#90THERMAL PROCESSING APPARATUS AND THERMAL PROCESSING METHOD THROUGH LIGHT IRRADIATION
#91RADIATION THERMOMETER, RADIATION TEMPERATURE MEASUREMENT SYSTEM, STORAGE MEDIUM HAVING PROGRAM FOR RADIATION THERMOMETER STORED THEREIN, AND RADIATION TEMPERATURE MEASUREMENT METHOD
#92Multizone control of lamps in a conical lamphead using pyrometers
#93System and method of monitoring and controlling temperature of semiconductor substrates in FOUP
#94Electronic device
#95TEMPERATURE MEASURING METHOD AND HEAT PROCESSING APPARATUS
#96Heat treatment apparatus and temperature control method
#97Measurement object, method for the production thereof and device for the thermal treatment of substrates
#98Radiation thermometer and thermometry method
#99Temperature control for GaN based materials
#100Determining thermal profiles of semiconductor structures
#101Dynamic differential thermal measurement systems and methods
#102Temperature measuring method and plasma processing system
#103Apparatus for substrate treatment and method for operating the same
#104Pyrometer background elimination
#105System and process for calibrating pyrometers in thermal processing chambers
#106Device for determining the temperature of a substrate
#107Method for measuring temperature of film in reaction chamber
#108Apparatus and method of detecting temperature and apparatus for processing substrate
#109In-situ temperature measurement in a noisy environment
#110Device for determining the temperature of a substrate
#111Apparatus for calibrating pyrometer
#112Apparatus for calibrating pyrometer
#113Temperature control for GaN based materials
#114Radiation thermometer using off-focus telecentric optics
#115Laser noise elimination in transmission thermometry
#116High resolution thermography
#117Apparatus and method to measure temperature of 3D semiconductor structures via laser diffraction
#118PATTERN INSPECTION APPARATUS AND METHOD
#119METHOD AND APPARATUS FOR WAFER TEMPERATURE MEASUREMENT USING AN INDEPENDENT LIGHT SOURCE
#120System and process for calibrating pyrometers in thermal processing chambers
#121Temperature measuring system, substrate processing apparatus and temperature measuring method
#122TEMPERATURE MEASURING APPARATUS, SUBSTRATE PROCESSING APPARATUS AND TEMPERATURE MEASURING METHOD
#123Temperature measurement apparatus, method of measuring temperature profile, recording medium and heat treatment apparatus
#124Heat treatment method and heat treatment apparatus for heating substrate by irradiating substrate with light
#125Temperature measuring apparatus and temperature measuring method
#126Methods for determining wafer temperature
#127Low temperature measurement and control using low temperature pyrometry
#128Methods and systems for in-situ pyrometer calibration
#129Heat treatment apparatus and heat treatment method for heating substrate by irradiating substrate with flashes of light
#130Temperature sensing device and heating device
#131System and process for calibrating pyrometers in thermal processing chambers
#132Apparatus and method for aligning a wafer's backside to a wafer's frontside
#133Method and apparatus for uniform microwave treatment of semiconductor wafers
#134Method and apparatus for controlled thermal processing
#135Pyrometer adapted for detecting UV-radiation and use thereof
#136Pyrometer
#137RADIATION THERMOMETRY AND RADIATION THERMOMETRY SYSTEM
#138Method for calibrating a pyrometer, method for determining the temperature of a semiconducting wafer and system for determining the temperature of a semiconducting wafer
#139Apparatus and method for real time measurement of substrate temperatures for use in semiconductor growth and wafer processing
#140SUBSTRATE COOL DOWN CONTROL
#141System and process for calibrating pyrometers in thermal processing chambers
#142Plasma processing apparatus and temperature measuring method and apparatus used therein
#143SUBSTRATE TEMPERATURE MEASURING APPARATUS AND SUBSTRATE TEMPERATURE MEASURING METHOD
#144Temperature uniformity measurement during thermal processing
#145Temperature measurement with reduced extraneous infrared in a processing chamber
#146SUBSTRATE TEMPERATURE MEASUREMENT BY INFRARED TRANSMISSION IN AN ETCH PROCESS
#147Methods for determining wafer temperature
#148Automatic focus and emissivity measurements for a substrate system
#149Apparatus and method for real time measurement of substrate temperatures for use in semiconductor growth and wafer processing
#150Calibration substrate and method of calibration therefor
#151Monitoring system comprising infrared thermopile detector
#152Method and apparatus for reducing the effects of window clouding on a viewport window in a reactive environment
#153IN SITU OPTICAL SURFACE TEMPERATURE MEASURING TECHNIQUES AND DEVICES
#154Substrate temperature measurement by infrared transmission
#155Methods for determining wafer temperature
#156Infrared thermopile detector system for semiconductor process monitoring and control
#157In situ optical surface temperature measuring techniques and devices
#158Apparatus and method for measuring the temperature of substrates
#159Apparatus and method for real time measurement of substrate temperatures for use in semiconductor growth and wafer processing
#160Temperature measuring system, heating device using it and production method for semiconductor wafer, heat ray insulating translucent member, visible light reflection membner, exposure system-use reflection mirror and exposure system, and semiconductor device produced by using them and vetical heat treating device
#161Solder reflow with optical endpoint control