ClassID:

166130

G01J5/0007 - CPC Classification

Classification description:

Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter of wafers or semiconductor substrates, e.g. using Rapid Thermal Processing

Recent Application in this class:
#1
20260118233
2026-04-30

OPTICAL FAULT ISOLATION APPARATUS FOR SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE SUPPORT PLATE

#2
20260118180
2026-04-30

HIGH-SPEED TEMPERATURE MEASUREMENT METHOD AND HIGH- SPEED TEMPERATURE MEASUREMENT DEVICE

#3
20260110576
2026-04-23

METHOD FOR PERFORMANCE EVALUATION AND STRUCTURE OPTIMIZATION OF HIGH-POWER SEMICONDUCTOR LASER CHIP, AND SYSTEM FOR PERFORMANCE EVALUATION

#4
20260056057
2026-02-26

Fiber Optic Temperature Sensor System

#5
20260022972
2026-01-22

REFERENCE WAFER FOR HIGH FIDELITY IN-SITU TEMPERATURE METROLOGY CALIBRATION

#6
20250383236
2025-12-18

THERMAL PROPERTY MEASUREMENT SYSTEMS AND METHODS FOR ELECTRONICS

#7
20250379073
2025-12-11

Workpiece Processing Apparatus with Thermal Processing Systems

#8
20250305182
2025-10-02

IN-SITU PYROMETER FOR SILICON CARBIDE WAFER

#9
20250251285
2025-08-07

SUBSTRATE PROCESSING SYSTEMS, METHODS, AND RELATED APPARATUS AND CHAMBERS, FOR DETECTING PROCESSING SHIFTS

#10
20250231066
2025-07-17

TEMPERATURE PROFILE MEASUREMENT AND SYNCHRONIZED CONTROL ON SUBSTRATE AND SUSCEPTOR IN AN EPITAXY CHAMBER

#11
20250216268
2025-07-03

DUAL SENSOR WAFER TEMPERATURE MEASUREMENT SYSTEM

#12
20250216154
2025-07-03

THERMAL PROCESSING SYSTEM FOR PROCESSING WORKPIECES

#13
20250215551
2025-07-03

METHODS AND SYSTEMS FOR HEATING A WIDE BANDGAP SUBSTRATE

#14
20250154655
2025-05-15

METHOD FOR EMISSIVITY-CORRECTED PYROMETRY

#15
20250003806
2025-01-02

CHAMBER KITS, SYSTEMS, AND METHODS FOR CALIBRATING TEMPERATURE SENSORS FOR SEMICONDUCTOR MANUFACTURING

#16
20240347356
2024-10-17

Workpiece Processing Apparatus with Thermal Processing Systems

#17
20240337537
2024-10-10

SYSTEMS, APPARATUS, AND METHODS FOR MONITORING PLATE TEMPERATURE FOR SEMICONDUCTOR MANUFACTURING

#18
20240209510
2024-06-27

METHODS OF FORMING STRUCTURES, SEMICONDUCTOR PROCESSING SYSTEMS, AND SEMICONDUCTOR DEVICE STRUCTURES

#19
20240175753
2024-05-30

REFLECTOR PLATE FOR SUBSTRATE PROCESSING

#20
20240167879
2024-05-23

SUBSTRATE PROCESSING APPARATUS

#21
20240110834
2024-04-04

RADIATION TEMPERATURE MEASUREMENT DEVICE AND RADIATION TEMPERATURE MEASUREMENT METHOD

#22
20240071787
2024-02-29

SUBSTRATE HEAT-TREATING APPARATUS USING LASER LIGHT-EMITTING DEVICE

#23
20240014052
2024-01-11

SYNCHRONIZATION BETWEEN TEMPERATURE MEASUREMENT DEVICE AND RADIATION SOURCES

#24
20230374664
2023-11-23

METHOD FOR EMISSIVITY-CORRECTED PYROMETRY

#25
20230326823
2023-10-12

Temperature Sensor Arrangement in Semiconductor Module

#26
20230324227
2023-10-12

PYROMETER CONTROLLED MULTI-WAFER CLEANING PROCESS

#27
20230274959
2023-08-31

TEMPERATURE MEASUREMENT METHOD AND HEAT TREATMENT APPARATUS

#28
20230203643
2023-06-29

Methods and systems for heating a wide bandgap substrate

#29
20230194350
2023-06-22

RADIATION THERMOMETER

#30
20230187240
2023-06-15

Temperature calibration with deposition and etch process

#31
20230131472
2023-04-27

Method for heating a wide bandgap substrate by providing a resistive heating element which emits radiative heat in a mid-infrared band

#32
20220404204
2022-12-22

THERMOREFLECTANCE ENHANCEMENT COATINGS AND METHODS OF MAKING AND USE THEREOF

#33
20220298672
2022-09-22

WAFER TEMPERATURE GRADIENT CONTROL TO SUPPRESS SLIP FORMATION IN HIGH-TEMPERATURE EPITAXIAL FILM GROWTH

#34
20220298643
2022-09-22

Methods of forming structures, semiconductor processing systems, and semiconductor device structures

#35
20220260421
2022-08-18

Temperature measurement method, optical heating method, and optical heating device

#36
20220214223
2022-07-07

Combined near and mid infrared sensor in a chip scale package

#37
20220208572
2022-06-30

Workpiece processing apparatus with thermal processing systems

#38
20220178993
2022-06-09

Real time chuck temperature monitoring

#39
20220163394
2022-05-26

Reflector plate for substrate processing

#40
20220155148
2022-05-19

Temperature profile measurement and synchronized control on substrate and susceptor in an epitaxy chamber

#41
20220057268
2022-02-24

Method and apparatus for measuring temperature

#42
20220034708
2022-02-03

METHOD AND APPARATUS FOR CONTROLLING THE TEMPERATURE OF A SEMICONDUCTOR WAFER

#43
20210407833
2021-12-30

Method and device for failure analysis using RF-based thermometry

#44
20210285822
2021-09-16

Thermal imaging sensor for integration into track system

#45
20210272827
2021-09-02

Heat treatment method and heat treatment apparatus

#46
20210270673
2021-09-02

Thermal imaging for within wafer variability feedforward or feedback information

#47
20210156746
2021-05-27

Semiconductor device including temperature sensing circuit

#48
20210143014
2021-05-13

Device and method for measuring film longitudinal temperature field during nitride epitaxial growth

#49
20210057245
2021-02-25

Heat treatment method and heat treatment apparatus of light irradiation type

#50
20210055165
2021-02-25

Continuous spectra transmission pyrometry

#51
20200386621
2020-12-10

Contactless workpiece temperature sensor

#52
20200378832
2020-12-03

Method and apparatus for calibration of substrate temperature using pyrometer

#53
20200373177
2020-11-26

Method for determining a surface temperature

#54
20200292390
2020-09-17

Apparatus and method for measuring the surface temperature of a substrate

#55
20200158775
2020-05-21

Inspection system

#56
20200149968
2020-05-14

Thermal processing chamber with low temperature control

#57
20200118850
2020-04-16

INTEGRATED SUBSTRATE TEMPERATURE MEASUREMENT ON HIGH TEMPERATURE CERAMIC HEATER

#58
20200118849
2020-04-16

Deposition apparatus having particular arrangement of raw material supply port, partition plate, and opening for measuring a temperature

#59
20200105554
2020-04-02

Purged viewport for quartz dome in epitaxy reactor

#60
20200080895
2020-03-12

Heat treatment apparatus and temperature control method

#61
20200064198
2020-02-27

Systems And Methods For Thermal Processing And Temperature Measurement Of A Workpiece At Low Temperatures

#62
20190391017
2019-12-26

Method and apparatus for measuring temperature

#63
20190375045
2019-12-12

Laser noise elimination in transmission thermometry

#64
20190346308
2019-11-14

Apparatus and method for online and real-time detection of temperature of epitaxial wafer

#65
20190323893
2019-10-24

Semiconductor substrate measuring apparatus and plasma treatment apparatus using the same

#66
20190237348
2019-08-01

Self-calibration apparatus and method for real-time temperature measurement system of MOCVD device

#67
20190181058
2019-06-13

Thermal processing apparatus and thermal processing method through light irradiation

#68
20190178719
2019-06-13

Radiation thermometer

#69
20190153603
2019-05-23

Substrate temperature monitoring

#70
20190148180
2019-05-16

Self-contained metrology wafer carrier systems

#71
20190103296
2019-04-04

Substrate treatment method and substrate treatment apparatus

#72
20180340834
2018-11-29

Continuous spectra transmission pyrometry

#73
20180340832
2018-11-29

Thermal cooling member with low temperature control

#74
20180323093
2018-11-08

Integrated substrate temperature measurement on high temperature ceramic heater

#75
20180283957
2018-10-04

APPARATUS AND METHOD TO MEASURE TEMPERATURE OF 3D SEMICONDUCTOR STRUCTURES VIA LASER DIFFRACTION

#76
20180269089
2018-09-20

Non-contact temperature calibration tool for a substrate support and method of using the same

#77
20180269085
2018-09-20

Method of adjusting measurement position of radiation thermometer and heat treatment apparatus

#78
20180254208
2018-09-06

In-situ temperature measurement for inside of process chamber

#79
20180226282
2018-08-09

NON-CONTACT SUBSTRATE TEMPERATURE MEASUREMENT TECHNIQUE BASED ON SPECTRAL INTEFEROMETRY

#80
20180156665
2018-06-07

Substrate processing apparatus and method

#81
20180143077
2018-05-24

Self-contained metrology wafer carrier systems

#82
20180077754
2018-03-15

Light-irradiation thermal treatment apparatus

#83
20180052058
2018-02-22

NON-CONTACT TEMPERATURE SENSING APPARATUS

#84
20170362712
2017-12-21

Substrate temperature monitoring

#85
20170328775
2017-11-16

Pyrometer background elimination

#86
20170309539
2017-10-26

Control device and method for monitoring a function of a semiconductor component during the operation thereof and electrical assembly having a control device

#87
20170307682
2017-10-26

Analysis system and analysis method

#88
20170271182
2017-09-21

In-situ temperature measurement in a noisy environment

#89
20170199080
2017-07-13

Optical nondestructive testing method and optical nondestructive testing apparatus

#90
20170178979
2017-06-22

THERMAL PROCESSING APPARATUS AND THERMAL PROCESSING METHOD THROUGH LIGHT IRRADIATION

#91
20170138794
2017-05-18

RADIATION THERMOMETER, RADIATION TEMPERATURE MEASUREMENT SYSTEM, STORAGE MEDIUM HAVING PROGRAM FOR RADIATION THERMOMETER STORED THEREIN, AND RADIATION TEMPERATURE MEASUREMENT METHOD

#92
20170130359
2017-05-11

Multizone control of lamps in a conical lamphead using pyrometers

#93
20170074727
2017-03-16

System and method of monitoring and controlling temperature of semiconductor substrates in FOUP

#94
20170011984
2017-01-12

Electronic device

#95
20170003171
2017-01-05

TEMPERATURE MEASURING METHOD AND HEAT PROCESSING APPARATUS

#96
20160379897
2016-12-29

Heat treatment apparatus and temperature control method

#97
20160131532
2016-05-12

Measurement object, method for the production thereof and device for the thermal treatment of substrates

#98
20160109299
2016-04-21

Radiation thermometer and thermometry method

#99
20160041037
2016-02-11

Temperature control for GaN based materials

#100
20150362373
2015-12-17

Determining thermal profiles of semiconductor structures

#101
20150300882
2015-10-22

Dynamic differential thermal measurement systems and methods

#102
20150221482
2015-08-06

Temperature measuring method and plasma processing system

#103
20150181649
2015-06-25

Apparatus for substrate treatment and method for operating the same

#104
20150131699
2015-05-14

Pyrometer background elimination

#105
20150092813
2015-04-02

System and process for calibrating pyrometers in thermal processing chambers

#106
20150087085
2015-03-26

Device for determining the temperature of a substrate

#107
20150025832
2015-01-22

Method for measuring temperature of film in reaction chamber

#108
20140284316
2014-09-25

Apparatus and method of detecting temperature and apparatus for processing substrate

#109
20140269826
2014-09-18

In-situ temperature measurement in a noisy environment

#110
20140248720
2014-09-04

Device for determining the temperature of a substrate

#111
20140219310
2014-08-07

Apparatus for calibrating pyrometer

#112
20140219309
2014-08-07

Apparatus for calibrating pyrometer

#113
20130343426
2013-12-26

Temperature control for GaN based materials

#114
20130343425
2013-12-26

Radiation thermometer using off-focus telecentric optics

#115
20130264316
2013-10-10

Laser noise elimination in transmission thermometry

#116
20130181129
2013-07-18

High resolution thermography

#117
20130120737
2013-05-16

Apparatus and method to measure temperature of 3D semiconductor structures via laser diffraction

#118
20130063721
2013-03-14

PATTERN INSPECTION APPARATUS AND METHOD

#119
20130059403
2013-03-07

METHOD AND APPARATUS FOR WAFER TEMPERATURE MEASUREMENT USING AN INDEPENDENT LIGHT SOURCE

#120
20130028286
2013-01-31

System and process for calibrating pyrometers in thermal processing chambers

#121
20120327394
2012-12-27

Temperature measuring system, substrate processing apparatus and temperature measuring method

#122
20120327393
2012-12-27

TEMPERATURE MEASURING APPARATUS, SUBSTRATE PROCESSING APPARATUS AND TEMPERATURE MEASURING METHOD

#123
20120303313
2012-11-29

Temperature measurement apparatus, method of measuring temperature profile, recording medium and heat treatment apparatus

#124
20120288970
2012-11-15

Heat treatment method and heat treatment apparatus for heating substrate by irradiating substrate with light

#125
20120243572
2012-09-27

Temperature measuring apparatus and temperature measuring method

#126
20120201271
2012-08-09

Methods for determining wafer temperature

#127
20120201267
2012-08-09

Low temperature measurement and control using low temperature pyrometry

#128
20120170609
2012-07-05

Methods and systems for in-situ pyrometer calibration

#129
20120076477
2012-03-29

Heat treatment apparatus and heat treatment method for heating substrate by irradiating substrate with flashes of light

#130
20120008925
2012-01-12

Temperature sensing device and heating device

#131
20110216803
2011-09-08

System and process for calibrating pyrometers in thermal processing chambers

#132
20110149062
2011-06-23

Apparatus and method for aligning a wafer's backside to a wafer's frontside

#133
20110076787
2011-03-31

Method and apparatus for uniform microwave treatment of semiconductor wafers

#134
20110076786
2011-03-31

Method and apparatus for controlled thermal processing

#135
20110064114
2011-03-17

Pyrometer adapted for detecting UV-radiation and use thereof

#136
20110046916
2011-02-24

Pyrometer

#137
20100292950
2010-11-18

RADIATION THERMOMETRY AND RADIATION THERMOMETRY SYSTEM

#138
20100290500
2010-11-18

Method for calibrating a pyrometer, method for determining the temperature of a semiconducting wafer and system for determining the temperature of a semiconducting wafer

#139
20100274523
2010-10-28

Apparatus and method for real time measurement of substrate temperatures for use in semiconductor growth and wafer processing

#140
20100265988
2010-10-21

SUBSTRATE COOL DOWN CONTROL

#141
20100232470
2010-09-16

System and process for calibrating pyrometers in thermal processing chambers

#142
20100206482
2010-08-19

Plasma processing apparatus and temperature measuring method and apparatus used therein

#143
20100183045
2010-07-22

SUBSTRATE TEMPERATURE MEASURING APPARATUS AND SUBSTRATE TEMPERATURE MEASURING METHOD

#144
20100124249
2010-05-20

Temperature uniformity measurement during thermal processing

#145
20090323759
2009-12-31

Temperature measurement with reduced extraneous infrared in a processing chamber

#146
20090316749
2009-12-24

SUBSTRATE TEMPERATURE MEASUREMENT BY INFRARED TRANSMISSION IN AN ETCH PROCESS

#147
20090245320
2009-10-01

Methods for determining wafer temperature

#148
20090200279
2009-08-13

Automatic focus and emissivity measurements for a substrate system

#149
20090177432
2009-07-09

Apparatus and method for real time measurement of substrate temperatures for use in semiconductor growth and wafer processing

#150
20090122827
2009-05-14

Calibration substrate and method of calibration therefor

#151
20090039266
2009-02-12

Monitoring system comprising infrared thermopile detector

#152
20080275658
2008-11-06

Method and apparatus for reducing the effects of window clouding on a viewport window in a reactive environment

#153
20080225926
2008-09-18

IN SITU OPTICAL SURFACE TEMPERATURE MEASURING TECHNIQUES AND DEVICES

#154
20080198895
2008-08-21

Substrate temperature measurement by infrared transmission

#155
20080002753
2008-01-03

Methods for determining wafer temperature

#156
20060263916
2006-11-23

Infrared thermopile detector system for semiconductor process monitoring and control

#157
20060140248
2006-06-29

In situ optical surface temperature measuring techniques and devices

#158
20060027558
2006-02-09

Apparatus and method for measuring the temperature of substrates

#159
20050106876
2005-05-19

Apparatus and method for real time measurement of substrate temperatures for use in semiconductor growth and wafer processing

#160
20050063451
2005-03-24

Temperature measuring system, heating device using it and production method for semiconductor wafer, heat ray insulating translucent member, visible light reflection membner, exposure system-use reflection mirror and exposure system, and semiconductor device produced by using them and vetical heat treating device

#161
19084370
2026-02-17

Solder reflow with optical endpoint control