G02B17/0652 - CPC Classification Index

ClassID:

174553 ⎘

G02B17/0652 - CPC Classification

Classification description:

Systems with reflecting surfaces, with or without refracting elements; Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors on-axis systems with at least one of the mirrors having a central aperture

Recent Application in this class:

20240134173

2024-04-25

Multichannel Close-up Imaging Device

20220196997

2022-06-23

Optical system and plane spectroscopic device

20210200103

2021-07-01

Multi-mirror UV-LED optical lithography system

20210026128

2021-01-28

On-axis four mirror anastigmat telescope

20200257111

2020-08-13

Multi-channel optical system

20190025574

2019-01-24

Method for Designing Imaging Objective Lens System of Anamorphic Magnification

20180246410

2018-08-30

Imaging optical unit for imaging an object field into an image field, and projection exposure apparatus including such an imaging optical unit

20180164690

2018-06-14

Imaging optical unit for EUV projection lithography

20170307982

2017-10-26

Imaging optical unit for EUV projection lithography

#10

20170269480

2017-09-21

METHOD AND APPARATUS FOR USING PATTERNING DEVICE TOPOGRAPHY INDUCED PHASE

#11

20170102539

2017-04-13

Optical assembly, projection system, metrology system and EUV lithography apparatus

#12

20160258878

2016-09-08

All reflective wafer defect inspection and review systems and methods

#13

20160147158

2016-05-26

Imaging optical unit for EUV projection lithography

#14

20160004165

2016-01-07

IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY

#15

20140118819

2014-05-01

OPTICAL DEVICE, IMAGING SYSTEM WHICH INCORPORATES THE OPTICAL DEVICE AND METHOD IMPLEMENTED BY THE IMAGING SYSTEM FOR IMAGING A SPECIMEN

#16

20140098355

2014-04-10

Catoptric objectives and systems using catoptric objectives

#17

20140078484

2014-03-20

Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type

#18

20140063227

2014-03-06

System and method for online inspection of turbines using an optical tube with broadspectrum mirrors

#19

20140036246

2014-02-06

Imaging optical system and projection exposure system for microlithography

#20

20130314567

2013-11-28

Imaging system with multiple focal plane array sensors

#21

20130148207

2013-06-13

Laser pulse stretching unit and method for using same

#22

20130063710

2013-03-14

Catoptric objectives and systems using catoptric objectives

#23

20120274917

2012-11-01

IMAGING OPTICS

#24

20120069312

2012-03-22

Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type

#25

20120008125

2012-01-12

Imaging optics and projection exposure installation for microlithography with an imaging optics

#26

20120008124

2012-01-12

Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type

#27

20110273791

2011-11-10

Catoptric objectives and systems using catoptric objectives

#28

20110211250

2011-09-01

System in space for reinforcing photosynthesis and method

#29

20110211175

2011-09-01

Panoramic projection device, and method implemented by this device

#30

20110176205

2011-07-21

Integrated telescope baffle and mirror support

#31

20110085235

2011-04-14

All-reflective relayed focal telescope derived from the first two mirrors of an afocal three-mirror anastigmat

#32

20100309570

2010-12-09

Optical device

#33

20100231885

2010-09-16

Imaging optical system and projection exposure system for microlithography

#34

20100202073

2010-08-12

All-reflective afocal telescope derived from the first two mirrors of a focal three-mirror anastigmat telescope

#35

20100134908

2010-06-03

Catoptric objectives and systems using catoptric objectives

#36

20090237784

2009-09-24

Pointable optical system with coude optics having a short on-gimbal path length

#37

20080316451

2008-12-25

CATOPTRIC OBJECTIVES AND SYSTEMS USING CATOPTRIC OBJECTIVES

#38

20070229994

2007-10-04

Pointable optical system with coude optics having a short on-gimbal path length

#39

20070153252

2007-07-05

Projection system for EUV lithography

#40

20070070322

2007-03-29

Projection system for EUV lithography

#41

20060232867

2006-10-19

Catoptric objectives and systems using catoptric objectives

#42

20060050258

2006-03-09

Projection system for EUV lithography

#43

20050195506

2005-09-08

Grazing incidence relays

#44

20050180011

2005-08-18

Objective with pupil obscuration

#45

20050036219

2005-02-17

Multiple field cassegrain-type optical combination