G02B17/0647 - CPC Classification Index

ClassID:

174552 ⎘

G02B17/0647 - CPC Classification

Classification description:

Systems with reflecting surfaces, with or without refracting elements; Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors

Sub-classes:

G02B17/0652 » {on-axis systems with at least one of the mirrors having a central aperture} 44
G02B17/0657 » {off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry} 118
G02B17/0663 » {off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements} 147

Recent Application in this class:

20240369813

2024-11-07

TWO MIRROR SCANNING RELAY OPTICS

20240258757

2024-08-01

PULSE STRETCHER AND ELECTRONIC DEVICE MANUFACTURING METHOD

20240231062

2024-07-11

Long Focal Length, Five Mirror, Anastigmat Optical System

20210255449

2021-08-19

High performance telescope

20210227187

2021-07-22

Two mirror scanning relay optics

20190310555

2019-10-10

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

20190204571

2019-07-04

Method and device for producing an optical component having at least three monolithically arranged optical functional surfaces and optical component

20190107696

2019-04-11

Image forming optical system, and imaging apparatus and projecting apparatus having the same

20190033565

2019-01-31

Cloaking devices with curved mirrors

#10

20180357758

2018-12-13

Method for three-dimensionally measuring a 3D aerial image of a lithography mask

#11

20180299784

2018-10-18

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

#12

20180246410

2018-08-30

Imaging optical unit for imaging an object field into an image field, and projection exposure apparatus including such an imaging optical unit

#13

20170315449

2017-11-02

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

#14

20170160527

2017-06-08

Elongating a travel path of a light beam by an optical delay device

#15

20170131528

2017-05-11

Imaging optical unit for a metrology system for examining a lithography mask

#16

20160195818

2016-07-07

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

#17

20160147051

2016-05-26

Miltonian Mirror for Oblique Catoptric Telescopes

#18

20140320838

2014-10-30

Imaging optical system

#19

20140253999

2014-09-11

Compact internal field of view switch and pupil relay

#20

20140253892

2014-09-11

Extreme Ultraviolet Lithography Projection Optics System and Associated Methods

#21

20140218704

2014-08-07

HIGH NA (NUMERICAL APERTURE) RECTANGULAR FIELD EUV CATOPTRIC PROJECTION OPTICS USING TILTED AND DECENTERED ZERNIKE POLYNOMIAL MIRROR SURFACES

#22

20140078484

2014-03-20

Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type

#23

20140071418

2014-03-13

Imaging optical unit

#24

20140071414

2014-03-13

Microlithography projection system with an accessible diaphragm or aperture stop

#25

20130342821

2013-12-26

Imaging optical system with at most 11.6% of the illuminated surfaces of the pupil plane being obscured

#26

20130141707

2013-06-06

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

#27

20120236282

2012-09-20

Imaging optical system

#28

20120224186

2012-09-06

Mirror of a projection exposure apparatus for microlithography with mirror surfaces on different mirror sides, and projection exposure apparatus

#29

20120069312

2012-03-22

Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type

#30

20120008124

2012-01-12

Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type

#31

20110292367

2011-12-01

Imaging optical system

#32

20110261338

2011-10-27

Microlithography projection system with an accessible diaphragm or aperture stop

#33

20110194072

2011-08-11

Compact adaptive optic-optical coherence tomography system

#34

20110177463

2011-07-21

Illumination system for EUV microlithography

#35

20110141446

2011-06-16

Projection objective

#36

20100149490

2010-06-17

Compact adaptive optic-optical coherence tomography system

#37

20100103455

2010-04-29

Image reading apparatus and image forming apparatus capable of adjusting the difference between the spectral characteristics

#38

20080170310

2008-07-17

Imaging optical system

#39

20080024746

2008-01-31

Microlithography projection system with an accessible diaphragm or aperture stop

#40

20070195317

2007-08-23

Groupwise corrected objective

#41

20070058274

2007-03-15

Illumination system for microlithography

#42

14839302

2019-04-16

Telecentric reflective imager