G02B17/0657 - CPC Classification Index

#1

20250013156

2025-01-09

IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUCING METHOD

#2

20230296868

2023-09-21

REFLECTIVE PUPIL RELAY OPTICS FOR MEMS SCANNING SYSTEM

#3

20230024028

2023-01-26

Image-forming optical system, exposure apparatus, and device producing method

#4

20220404599

2022-12-22

SMALL FORM FACTOR 4-MIRROR BASED IMAGING SYSTEMS

#5

20220131328

2022-04-28

Optical pulse stretcher, laser device, and electronic device manufacturing method

#6

20210200100

2021-07-01

Image-forming optical system, exposure apparatus, and device producing method

#7

20210041678

2021-02-11

Small form factor 4-mirror based imaging systems

#8

20210026120

2021-01-28

Imaging apparatus and manufacturing method of imaging apparatus

#9

20200174375

2020-06-04

Reflective image-forming optical system, exposure apparatus, and device manufacturing method

#10

20200081342

2020-03-12

Image offsetting apparatuses, systems, and methods

#11

20190302621

2019-10-03

Image-forming optical system, exposure apparatus, and device producing method

#12

20190113723

2019-04-18

HIGH NA (NUMERICAL APERTURE) RECTANGULAR FIELD EUV CATOPTRIC PROJECTION OPTICS USING TILTED AND DECENTERED ZERNIKE POLYNOMIAL MIRROR SURFACES

#13

20180299781

2018-10-18

Reflective image-forming optical system, exposure apparatus, and device manufacturing method

#14

20180246410

2018-08-30

Imaging optical unit for imaging an object field into an image field, and projection exposure apparatus including such an imaging optical unit

#15

20180224642

2018-08-09

All-reflective solar coronagraph sensor and thermal control subsystem

#16

20180210347

2018-07-26

Image-forming optical system, exposure apparatus, and device producing method

#17

20180164474

2018-06-14

PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY

#18

20180045932

2018-02-15

Off-axis reflective afocal optical relay

#19

20180041702

2018-02-08

Compact wide field-of-view optical imaging method capable of electrically switching to a narrow field of view

#20

20170269480

2017-09-21

METHOD AND APPARATUS FOR USING PATTERNING DEVICE TOPOGRAPHY INDUCED PHASE

#21

20170180643

2017-06-22

Dual field of view annular folded optics with switchable mirrored surface

#22

20170123321

2017-05-04

Light source apparatus, illumination device, exposure apparatus, and device manufacturing method

#23

20170115574

2017-04-27

Reflective image-forming optical system, exposure apparatus, and device manufacturing method

#24

20170090171

2017-03-30

Five-mirror afocal wide field of view optical system

#25

20160252603

2016-09-01

Aero-wave instrument for the measurement of the optical wave-front disturbances in the airflow around airborne systems

#26

20160252451

2016-09-01

OPTICAL MEASURING DEVICE AND DEVICE HAVING OPTICAL SYSTEM

#27

20160041472

2016-02-11

Light source apparatus, illumination device, exposure apparatus, and device manufacturing method

#28

20150362438

2015-12-17

Magnifying imaging optical unit and EUV mask inspection system with such an imaging optical unit

#29

20150286145

2015-10-08

Lithographic apparatus

#30

20150219999

2015-08-06

Imaging optics, microlithography projection exposure apparatus having same and related methods

#31

20150168674

2015-06-18

Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus

#32

20150085270

2015-03-26

Reflective image-forming optical system, exposure apparatus, and device manufacturing method

#33

20150022799

2015-01-22

Microlithographic imaging optical system including multiple mirrors

#34

20140368805

2014-12-18

Method of extreme ultraviolet lithography projection objective

#35

20140253999

2014-09-11

Compact internal field of view switch and pupil relay

#36

20140098355

2014-04-10

Catoptric objectives and systems using catoptric objectives

#37

20130107239

2013-05-02

Optical arrangement for EUV lithography and method for configuring such an optical arrangement

#38

20130070227

2013-03-21

Imaging optical system

#39

20130063710

2013-03-14

Catoptric objectives and systems using catoptric objectives

#40

20130050671

2013-02-28

Imaging optics, microlithography projection exposure apparatus having same and related methods

#41

20120300184

2012-11-29

Surface correction on coated mirrors

#42

20120287413

2012-11-15

Image-forming optical system, exposure apparatus, and device producing method

#43

20120236272

2012-09-20

Combination stop for catoptric projection arrangement

#44

20120224160

2012-09-06

Reflective optical imaging system

#45

20120218630

2012-08-30

Wide Angle Telescope with Five Mirrors

#46

20120208115

2012-08-16

Imaging optics

#47

20120182533

2012-07-19

Optical arrangement and microlithographic projection exposure apparatus including same

#48

20120140351

2012-06-07

Magnifying imaging optical unit and metrology system including same

#49

20120075608

2012-03-29

Projection objective and projection exposure apparatus with negative back focus of the entry pupil

#50

20120069314

2012-03-22

IMAGING OPTICS AND PROJECTION EXPOSURE INSTALLATION FOR MICROLITHOGRAPHY WITH AN IMAGING OPTICS OF THIS TYPE

#51

20120008125

2012-01-12

Imaging optics and projection exposure installation for microlithography with an imaging optics

#52

20110317294

2011-12-29

Multi-field of view annular folded optics

#53

20110299184

2011-12-08

High NA annular field catoptric projection optics using Zernike polynomial mirror surfaces

#54

20110286002

2011-11-24

LIGHT REFLECTING MASK, EXPOSURE APPARATUS, AND MEASURING METHOD

#55

20110273791

2011-11-10

Catoptric objectives and systems using catoptric objectives

#56

20110199599

2011-08-18

SIX-MIRROR EUV PROJECTION SYSTEM WITH LOW INCIDENCE ANGLES

#57

20110165522

2011-07-07

Microlithographic imaging optical system including multiple mirrors

#58

20110116062

2011-05-19

Reflective imaging optical system, exposure apparatus, and method for producing device

#59

20110090559

2011-04-21

Projection objective for a microlithographic EUV projection exposure apparatus

#60

20110085235

2011-04-14

All-reflective relayed focal telescope derived from the first two mirrors of an afocal three-mirror anastigmat

#61

20110063596

2011-03-17

Projection objective and projection exposure apparatus with negative back focus of the entry pupil

#62

20100265480

2010-10-21

Mirror for the EUV wavelength range, projection objective for microlithography comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective

#63

20100231886

2010-09-16

Catoptric imaging optical system with an arc-shaped object field

#64

20100208225

2010-08-19

PROJECTION OBJECTIVE FOR MICRLOLITHOGRAPHY HAVING AN OBSCURATED PUPIL

#65

20100190113

2010-07-29

Optical element, exposure apparatus using this, and device manufacturing method

#66

20100149509

2010-06-17

Optical system, exposure apparatus, and method of manufacturing electronic device

#67

20100134908

2010-06-03

Catoptric objectives and systems using catoptric objectives

#68

20090273772

2009-11-05

Light reflecting mask, exposure apparatus, and measuring method

#69

20090185152

2009-07-23

Projection optical system, exposure apparatus and device fabricating method

#70

20090141356

2009-06-04

OPTICAL ELEMENT, AND LIGHT SOURCE UNIT AND EXPOSURE APPARATUS HAVING THE SAME

#71

20090128831

2009-05-21

Optical element positioning apparatus

#72

20090097106

2009-04-16

Reflective-Type Projection Optical System and Exposure Apparatus Equipped with the Reflective-Type Projection Optical System

#73

20090079952

2009-03-26

Six-mirror EUV projection system with low incidence angles

#74

20090027644

2009-01-29

Projection objective

#75

20090021714

2009-01-22

Combination stop for catoptric projection arrangement

#76

20090021713

2009-01-22

Illumination system and microlithographic projection exposure apparatus including same

#77

20090009897

2009-01-08

Wide field four mirror telescope using off-axis aspherical mirrors

#78

20080316451

2008-12-25

CATOPTRIC OBJECTIVES AND SYSTEMS USING CATOPTRIC OBJECTIVES

#79

20080266687

2008-10-30

All-reflective, wide-field-of-view, inverse-telephoto optical system with external posterior aperture stop and long back focal length

#80

20080247067

2008-10-09

CATOPTRIC REDUCTION PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE

#81

20080186569

2008-08-07

Phased-array light telescope

#82

20080144202

2008-06-19

Mirror with a mirror carrier and projection exposure apparatus

#83

20080137183

2008-06-12

8-mirror microlithography projection objective

#84

20080130076

2008-06-05

Illumination system particularly for microlithography

#85

20080112045

2008-05-15

Projection optical system, exposure apparatus and device fabricating method

#86

20080079924

2008-04-03

Projection optical system, exposure apparatus, and exposure method

#87

20070283591

2007-12-13

EUV-lithography apparatus having a chamber for cleaning an optical element

#88

20070223119

2007-09-27

Reflection-type projection-optical systems, and exposure apparatus comprising same

#89

20070223112

2007-09-27

Projection objective and projection exposure apparatus with negative back focus of the entry pupil

#90

20070188729

2007-08-16

Projection Lens for a Microlithographic Projection Exposure Apparatus

#91

20070177274

2007-08-02

OPTICAL ELEMENT, AND LIGHT SOURCE UNIT AND EXPOSURE APPARATUS HAVING THE SAME

#92

20070171558

2007-07-26

Reflective projection lens for EUV-photolithography

#93

20070153252

2007-07-05

Projection system for EUV lithography

#94

20070146853

2007-06-28

Optical device with raster elements, and illumination system with the optical device

#95

20070132977

2007-06-14

Optical integrator, illumination optical device, exposure device, and exposure method

#96

20070120072

2007-05-31

Illumination system particularly for microlithography

#97

20070103689

2007-05-10

Projection optical system, exposure apparatus and device fabricating method

#98

20070085980

2007-04-19

Projection assembly

#99

20070070322

2007-03-29

Projection system for EUV lithography

#100

20070047069

2007-03-01

8-mirror microlithography projection objective

#101

20070046918

2007-03-01

Projection optical system, exposure apparatus, and device manufacturing method

#102

20060262277

2006-11-23

Projection optical system, exposure apparatus, and device manufacturing method

#103

20060245540

2006-11-02

Illumination system particularly for microlithography

#104

20060232867

2006-10-19

Catoptric objectives and systems using catoptric objectives

#105

20060209302

2006-09-21

Projection optical system, exposure apparatus, and device manufacturing method

#106

20060198039

2006-09-07

Projection optical system, exposure apparatus and device fabricating method

#107

20060119822

2006-06-08

Projection exposure apparatus and projection optical system

#108

20060098273

2006-05-11

Reflective-type projection optical system and exposure apparatus equipped with said reflective-type projection optical system

#109

20060087726

2006-04-27

Catoptric projection optical system

#110

20060050258

2006-03-09

Projection system for EUV lithography

#111

20060017905

2006-01-26

Projection optical system, exposure apparatus, and device manufacturing method

#112

20060012767

2006-01-19

Projection optical system, exposure apparatus, and exposure method in which a reflective projection optical system has a non-circular aperture stop

#113

20060001854

2006-01-05

Optical system having an optical element that can be brought into at least two positions

#114

20050264787

2005-12-01

Projection lens for a microlithographic projection exposure apparatus

#115

20050248835

2005-11-10

Reflective projection lens for EUV-photolithography

#116

20050094257

2005-05-05

Projection optical system, exposure apparatus and device fabricating method

#117

20050088760

2005-04-28

Illumination system particularly for microlithography

#118

20050088630

2005-04-28

Projection optical system, exposure apparatus and device fabricating method