174555 ⎘
Systems with reflecting surfaces, with or without refracting elements; Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
IMAGING EUV OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE FIELD
#2OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS HAVING AN OPTICAL SYSTEM
#3IMAGING EUV OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE FIELD
#4LITHOGRAPHY CONTAMINATION CONTROL
#5ILLUMINATION OPTICAL DEVICE COMPRISING A COLLIMATOR HAVING LOW INTRINSIC NOISE
#6OPTICAL PULSE STRETCHER, LASER APPARATUS, AND ELECTRONIC DEVICE MANUFACTURING METHOD
#7IMAGING OPTICAL UNIT
#8IMAGING OPTICAL UNIT
#9Lithography contamination control
#10Lithography contamination control
#11Optical element and lithography system
#12On-board light source calibration
#13Hybrid reflective/refractive head mounted display
#14OPTICAL ORTHORECTIFICATION SYSTEM
#15Cassegrain telescope with a segmented focal plane
#16Method and device for determining the heating state of a mirror in an optical system
#17COMPACT DUAL-BAND SENSOR
#18Image projection device
#19Reflective optical element and stereo camera device
#20Optical objective for operation in EUV spectral region
#21Image offsetting apparatuses, systems, and methods
#22Optical system, image capturing apparatus, distance measuring apparatus, and vehicle-mounted system
#23All-reflective solar coronagraph sensor and thermal control subsystem
#24Projection optical unit for EUV projection lithography
#25Reflective optical configurations with prescribed optical field mappings for back-scanned imagers
#26Reflective telescope with wide field of view
#27IMAGING OPTICAL SYSTEM
#28Projection optical unit for imaging an object field into an image field, and projection exposure apparatus comprising such a projection optical unit
#29High-performance beam director for high-power laser systems or other systems
#30Imaging optical unit for imaging an object field into an image field, and projection exposure apparatus including such an imaging optical unit
#31Imaging optical unit for EUV projection lithography
#32Imaging optical unit and projection exposure apparatus including same
#33Imaging optical unit and projection exposure unit including same
#34Off-axis reflective afocal optical relay
#35Head-up display and moving body equipped with head-up display
#36DIAGNOSTIC SYSTEM, DIAGNOSTIC METHOD, AND STORAGE MEDIUM
#37Light source unit and projector having the same light source unit
#38COMPACT FIVE-REFLECTION OPTICAL SYSTEM AS A UNITY MAGNIFICATION FINITE CONJUGATE RELAY
#39Adjusting a beam diameter and an aperture angle of a laser beam
#40Imaging optical unit for EUV projection lithography
#41Imaging optical system
#42Five-mirror afocal wide field of view optical system
#43Mirror, in particular for a microlithographic projection exposure apparatus
#44Reflective beam shaper
#45Reflective telescope with wide field of view
#46Anamorphically imaging projection lens system and related optical systems, projection exposure systems and methods
#47Aero-wave instrument for the measurement of the optical wave-front disturbances in the airflow around airborne systems
#48Method for designing freeform surfaces off-axial imaging system with a real exit pupil
#49Method for designing off-axial optical system with freeform surface
#50Imaging optical unit for EUV projection lithography
#51Projection optical unit for imaging an object field into an image field, and projection exposure apparatus comprising such a projection optical unit
#52COUPLING OPTICAL SYSTEM
#53Magnifying imaging optical unit and EUV mask inspection system with such an imaging optical unit
#54Reflective optical element for EUV lithography and method of manufacturing a reflective optical element
#55Imaging optical unit and projection exposure apparatus for projection lithography, having such imaging optical unit
#56Imaging optics, microlithography projection exposure apparatus having same and related methods
#57Scanning space observation optical system
#58Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus
#59Optical system for a microlithographic projection exposure apparatus
#60Microlithographic imaging optical system including multiple mirrors
#61Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unit
#62Magnifying imaging optical unit and metrology system including same
#63Head mounted display with micro-display alignment mechanism
#64Head mounted display having alignment maintained via structural frame
#65Imaging optical system
#66Optical arrangement, EUV lithography apparatus and method for configuring an optical arrangement
#67Head mounted display assembly with structural frame and separate outer frame
#68Head mounted display with non-pupil forming optical path
#69Imaging catoptric EUV projection optical unit
#70Projection objective for microlithography
#71Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
#72Imaging optical unit
#73Imaging optical unit for a projection exposure apparatus
#74Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirror
#75Imaging optical system with at most 11.6% of the illuminated surfaces of the pupil plane being obscured
#76Imaging optical system for microlithography
#77Anamorphically imaging projection lens system and related optical systems, projection exposure systems and methods
#78Derived all-reflective afocal optical system with aspheric figured beam steering mirror
#79Imaging optical system and projection exposure installation for microlithography including same
#80Imaging optics, microlithography projection exposure apparatus having same and related methods
#81Projection objective having mirror elements with reflective coatings
#82Projection objective of a microlithographic projection exposure apparatus
#83Imaging optical system
#84ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
#85Catoptric objectives and systems using catoptric objectives
#86Imaging optical system and illumination optical system
#87Magnifying imaging optical unit and metrology system including same
#88Magnifying imaging optical system and metrology system with an imaging optical system of this type
#89Microlithographic projection exposure apparatus and related method
#90Anamorphic relayed imager having multiple rotationally symmetric powered mirrors
#91Optical arrangement in a projection objective of a microlithographic projection exposure apparatus
#92Imaging optics and projection exposure installation for microlithography with an imaging optics
#93Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
#94IMAGE ACQUISITION APPARATUS INCLUDING ADAPTIVE OPTICS
#95Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
#96Imaging optical system
#97Optical spectrometer with wide field of view fore-optics
#98Extreme broadband compact optical system with multiple fields of view
#99Microlithographic imaging optical system including multiple mirrors
#100Imaging optics
#101Projection objective for microlithography
#102Extreme broadband compact optical system with multiple fields of view
#103Real-time optical compensation of orbit-induced distortion effects in long integration time imagers
#104All-reflective afocal telescope derived from the first two mirrors of a focal three-mirror anastigmat telescope
#105Projection objective having mirror elements with reflective coatings
#106Method and Apparatus for Combining EUV Sources
#107Projection objective and method for its manufacture
#108PROJECTION OBJECTIVE
#109DEFORMABLE MIRROR, MIRROR APPARATUS, AND EXPOSURE APPARATUS
#110Insertion of laser path in multiple field of view reflective telescope
#111Catoptric objectives and systems using catoptric objectives
#112Pointable optical system with coude optics having a short on-gimbal path length
#113OPTICAL ELEMENT AND OPTICAL APPARATUS
#114Catoptric objectives and systems using catoptric objectives
#115PROJECTION OBJECTIVE AND METHOD FOR ITS MANUFACTURE
#116Imaging optical system and image reading apparatus using the same
#117Imaging optical system
#118Holding structure for optical element including an elastic biasing section and a displacement restricting section (as amneded)
#119Illumination system particularly for microlithography
#120Optical apparatus, barrel, exposure apparatus, and production method for device
#121Imaging optical system and image reading apparatus including four, free-form shaped, resin off-axis reflective elements
#122Pointable optical system with coude optics having a short on-gimbal path length
#123Projection display apparatus
#124Synthesis of arrays of oligonucleotides and other chain molecules
#125Method of designing a projection system, lithographic apparatus and device manufacturing method
#126Optical integrator, illumination optical device, exposure device, and exposure method
#127Projection optical system and exposure apparatus with the same
#128Illumination system particularly for microlithography
#129Multi-telescope imaging system utilizing a single common image sensor
#130Catoptric objectives and systems using catoptric objectives
#131Apparatus for evaluating EUV light source, and evaluation method using the same
#132Projection optical system
#133Projection display apparatus
#134Imaging optical system and image reading apparatus using the same
#135Illumination apparatus, projection exposure apparatus, and device fabricating method
#136Optical system having three fields of view using two all-reflective optical modules
#137Image projection apparatus
#138Reflective optical assembly
#139Multi-aperture interferometric optical system
#140Exposure apparatus and device fabrication method using the same
#141Display apparatus
#142Optical unit and X-ray exposure system
#143Projection objective and method for its manufacture
#144Optical units
#145Apparatus and method for optical characterization of a sample over a broadband of wavelengths while minimizing polarization changes
#146Apparatus and method for optical characterization of a sample over a broadband of wavelengths with a small spot size
#147High-resolution, all-reflective imaging spectrometer
#148Illumination system particularly for microlithography
#149Projection optical system and optical system
#150Decentered optical system, light transmitting device, light receiving device, and optical system
#151Reflective triplet foreoptics for multi-channel double-pass dispersive spectrometers
#152Beam focusing and beam collecting optics with wavelength dependent filter element adjustment of beam area