Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method

Photomask making method

Etching method and photomask blank processing method

Lithographic mask and method of forming a lithographic mask

Mask and manufacturing method of a semiconductor device and a thin film transistor array panel using the mask

Photomask blank and photomask

Photomask blank and photomask

Photomask blank and photomask making method

Attenuated phase-shift photomasks, method of fabricating the same and method of fabricating semiconductor using the same

Reticle constructions

Photomask blank and photomask

Semiconductor device, method of manufacturing the same, and phase shift mask

Test structures and methods

Methods of forming photomasks

Inverse Lithography For High Transmission Attenuated Phase Shift Mask Design And Creation

Patterning process

Photomask making method, photomask blank and dry etching method

Photomask blank manufacturing method and photomask manufacturing method

Method of manufacturing semiconductor device that uses both a normal photomask and a phase shift mask for defining interconnect patterns

Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film

Exposure mask and method for manufacturing semiconductor device using the same

Reticles and methods of forming semiconductor devices

Photomask blank, photomask blank manufacturing method, and photomask manufacturing method

MASK BLANK, MASK FORMED FROM THE BLANK, AND METHOD OF FORMING A MASK

Reticles with subdivided blocking regions

Phase shift mask with two-phase clear feature

Method of manufacturing mask blank and transfer mask

Phase shift mask blank, phase shift mask, and method for manufacturing phase shift mask blank

Techniques for reducing degradation and/or modifying feature size of photomasks

Mask blank and method of manufacturing a transfer mask

PHOTOMASK AND METHOD OF FABRICATING A PHOTOMASK

Photomask blank, photomask, and methods of manufacturing the same

Mask and method for fabricating semiconductor device using the same

Method for fabricating chromeless phase shift mask

Multi-layer, attenuated phase-shifting mask

Halftone type phase shift mask blank and phase shift mask thereof

Halftone mask having a shielding pattern and plural overlapping halftone patterns of different widths

MASK AND METHOD FOR MANUFACTURING THE SAME

Photomask blank, photomask, and methods of manufacturing the same

Method and structure for fabricating dark-periphery mask for the manufacture of semiconductor wafers

Mask having multiple transmittances

Photomask

Extreme ultraviolet photolithography mask, with resonant barrier layer

Photomask, and method and apparatus for producing the same

Lithographic mask and manufacturing method thereof

TRANSPARENT SUBSTRATE FOR MASK BLANK AND MASK BLANK

Phase shift mask blank and method of manufacturing phase shift mask

Method of fabricating halftone phase shift mask

PHASE SHIFT MASK AND METHOD OF FABRICATING THE SAME

Photomask blank, photomask, and methods of manufacturing the same

Methods of forming reticles

Mask blank and method for manufacturing transfer mask

Photomask blank and method of producing the same, method of producing photomask, and method of producing semiconductor device

RETICLES INCLUDING ASSISTANT STRUCTURES, METHODS OF FORMING SUCH RETICLES, AND METHODS OF UTILIZING SUCH RETICLES

Method to improve mask critical dimension uniformity (CDU)

Exposure mask and pattern forming method therefor

Test structures and methods

EXPOSURE MASK

Phase-shifting masks with sub-wavelength diffractive optical elements

Reflective photomasks and methods of determining layer thicknesses of the same

Photomask blank and production method thereof, and photomask production method, and semiconductor device production method

RETICLE FOR FORMING MICROSCOPIC PATTERN

Semiconductor device, method of manufacturing the same, and phase shift mask

Methods of manufacturing mask blank and transfer mask

Binary mask, method for fabricating the binary mask, and method for fabricating fine pattern of semiconductor device using binary mask

Method of fabricating photomask

Method of fabricating halftone phase shift mask

Graded lithographic mask

Phase-shifting masks with sub-wavelength diffractive optical elements

Photomask, method of lithography, and method for manufacturing the photomask

Method of manufacturing phase shift photomask

Exposure mask, pattern formation method, and exposure mask fabrication method

METHOD OF MANUFACTURING PHOTOMASK AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Photomask and pattern formation method using the same

Photomask and pattern formation method using the same

FILM-DEPOSITING TARGET AND PREPARATION OF PHASE SHIFT MASK BLANK

Mask and manufacturing method of a semiconductor device and a thin film transistor array panel using the mask

Methods for etching devices used in lithography

Photomask, and method and apparatus for producing the same

MASK AND MANUFACTURING METHOD THEREOF

Lithography masks for improved line-end patterning

Photomasks Used to Fabricate Integrated Circuitry, Finished-Construction Binary Photomasks Used to Fabricate Integrated Circuitry, Methods of Forming Photomasks, and Methods of Photolithographically Patterning Substrates

Methods of forming reticles

Focus sensitive lithographic apparatus, systems, and methods

Photomask, photomask fabrication method, pattern formation method using the photomask and mask data creation method

Cylinder-Type Capacitor and Storage Device, and Method(s) for Fabricating the Same

METHOD OF FORMING PHOTOMASK OF SEMICONDUCTOR DEVICE

High-transmission attenuating PSM

Photomask reticle for use in projection exposure, and manufacturing methods therefor

PHASE-SHIFTING MASK AND METHOD OF FABRICATING SAME

Method for controlling phase angle of a mask by post-treatment

Method and system for exposure of a phase shift mask

Fitting methodology of etching times determination for a mask to provide critical dimension and phase control

Photo mask, exposure method using the same, and method of generating data

Photo mask, exposure method using the same, and method of generating data

Method of manufacturing semiconductor device that uses both a normal photomask and a phase shift mask for defining interconnect patterns

Mask blank, method of manufacturing an exposure mask, and method of manufacturing an imprint template

Mask Structure for Manufacturing an Integrated Circuit by Photolithographic Patterning

Method for fabricating photomask in semiconductor device

Phase shift mask with two-phase clear feature

Pattern forming method, electronic device manufacturing method and electronic device

Exposure mask and method of forming pattern

Phase shift amount measurement apparatus and transmittance measurement apparatus

PHOTO MASK FOR DEPRESSING HAZE AND METHOD FOR FABRICATING THE SAME

Lithographic mask and methods for fabricating a semiconductor device

Phase-shift mask and method of forming the same

Structure design and fabrication on photomask for contact hole manufacturing process window enhancement

Mask data creation method

Pattern formation method

Photomask blank, photomask, and method of manufacture

Photo mask having assist pattern and method of fabricating the same

Photo mask and method for fabricating the same

Method of fabricating photomask blank

Phase shift mask structure and fabrication process

Phase shifting photomask and a method of fabricating thereof

Patterning masks, methods, and systems

CPL mask and a method and program product for generating the same

Hybrid photomask and method of fabricating the same

PHOTOMASK FOR FORMING MICRO-PATTERNS OF SEMICONDUCTOR DEVICES AND METHOD FOR MANUFACTURING THE SAME

Methods for forming and cleaning photolithography reticles

Photomask and pattern forming method employing the same

Methods for producing photomask blanks, cluster tool apparatus for producing photomask blanks and the resulting photomask blanks from such methods and apparatus

Mask and manufacturing method of microlens using thereof

Photomask, and method and apparatus for producing the same

PHOTOMASK DESIGNING APPARATUS, PHOTOMASK, PHOTOMASK DESIGNING METHOD, PHOTOMASK DESIGNING PROGRAM AND COMPUTER-READABLE STORAGE MEDIUM ON WHICH THE PHOTOMASK DESIGNING PROGRAM IS STORED

Photomask and method of manufacturing semiconductor device using the photomask

Pattern forming method and method for manufacturing semiconductor device

INTEGRATED PHASE ANGLE AND OPTICAL CRITICAL DIMENSION MEASUREMENT METROLOGY FOR FEED FORWARD AND FEEDBACK PROCESS CONTROL

Inspection apparatus, inspection method and manufacturing method of mask for exposure, and mask for exposure

Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film

Hybrid phase-shift mask and manufacturing method thereof

PHOTOMASK HAVING HALF-TONE PHASE SHIFT PORTION

Photomask blank, photomask and method for producing those

Photomask, method for producing the same, and method for forming pattern using the photomask

TARGETS FOR ALIGNMENT OF SEMICONDUCTOR MASKS

Photomask blank

Method of making a semiconductor with a high transmission CVD silicon nitride phase shift mask

Half-tone type phase-shifting mask and method for manufacturing the same

Mask data generation method and mask

Photomask blank and photomask making method

Photomask blank and photomask

Multiple resist layer phase shift mask (PSM) blank and PSM formation method

Multi-layer, attenuated phase-shifting mask

Phase calibration for attenuating phase-shift masks

Photomask structure

Pattern forming method and phase shift mask manufacturing method

Manufacturing method and apparatus of phase shift mask blank

Photomask, pattern formation method using the same and mask data creation method

Pattern formation method

Method for manufacturing attenuated phase-shift masks and devices obtained therefrom

Phase shifting mask having a calibration feature and method therefor

Mask and fabrication method thereof and application thereof

Exposure equipment having auxiliary photo mask and exposure method using the same

Phase shift mask and method for fabricating the same

Mask data creation method

Method for etching photolithographic substrates

Halftone type phase shift mask blank and halftone type phase shift mask

Photomask and method of manufacturing semiconductor device

Fabrication method for photomask, fabrication method for device and monitoring method for photomask

Mask blank and photomask having antireflective properties

Lithographic apparatus and device manufacturing method

Reticle and optical proximity correction method

Halftone phase shift mask blank, and method of manufacture

Phase-shifting masks with sub-wavelength diffractive optical elements

Method to prevent anti-assist feature and side lobe from printing out

Halftone type phase shift mask blank and phase shift mask thereof

Fabrication method of photomask-blank

Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same

High-transmittance attenuated phase-shift mask blank

Attenuated phase shift mask blank and photomask

CPL mask and a method and program product for generating the same

Method for fabricating an attenuated phase shift photomask by separate patterning of negative and positive resist layers with corresponding etching steps for underlying light-shielding and phase shift layers on a transparent substrate

Method for forming a capacitor

Capacitor for a semiconductor device

Mask and manufacturing method thereof

Lithographic apparatus, programmable patterning structure, device manufacturing method, and device manufactured thereby

Photomask, method for producing the same, and method for forming pattern using the photomask

Mask and pattern forming method by using the same

Phase shifting test mask patterns for characterizing illumination and mask quality in image forming optical systems

Process for manufacturing half-tone phase shifting mask blanks

Exposure mask

Phase shift mask blank, photo mask blank, and manufacturing apparatus and method of blanks

Cluster tool and method for process integration in manufacturing of a photomask

Phase shift photomask performance assurance method

Cluster tool and method for process integration in manufacturing of a photomask

Photomask blank, photomask and fabrication method thereof

Method for designing photomask

Method of making a semiconductor device using a dual-tone phase shift mask

Phase shifter film and process for the same

Method for checking phase shift angle of phase shift mask, lithography process and phase shift mask

Phase difference specifying method

Method of fabricating a display device by using a stepped halftone mask to form a three-step photoresist pattern on a material layer for etching and ashing

Methods for converting reticle configurations and methods for modifying reticles

Phase-shift photomask-blank, phase-shift photomask and fabrication method thereof

PHASE SHIFT MASK FOR PREVENTING HAZE

Reticles

Photo-Mask with variable transmission by ion implantation

Mask, manufacturing method for mask, and manufacturing method for semiconductor device

Forming an EUV mask with a phase-shifter layer and an intensity balancer layer

Method of exposure and attenuated type phase shift mask

Methods of forming reticles

Single trench repair method with etched quartz for attenuated phase shifting mask

Photomask structures providing improved photolithographic process windows and methods of manufacturing same

Pattern layout for forming integrated circuit

Leaky absorber for extreme ultraviolet mask

Photomask to which phase shift is applied and exposure apparatus

Lithography mask and methods for producing a lithography mask

Device and method for cleaning photomask

Composite phase shifting lithography mask including etch stop layer

Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method

Semiconductor device, method of manufacturing the same, and phase shift mask

Adjustable Transmission Phase Shift Mask

Method for forming pattern using a photomask

Photomask

Method for forming pattern

Method for forming generating mask data

Photomask, method of generating mask pattern, and method of manufacturing semiconductor device

Apparatus for projecting a pattern into an image plane

Photomask, method for forming the same, and method for forming pattern using the photomask

Half-tone stacked film, photomask-blank, photomask and fabrication method thereof

Method for etching a molybdenum layer suitable for photomask fabrication

Photo mask and method of manufacturing the same, and method of forming photosensitive film pattern of using the photo mask

Cylinder-type capacitor and storage device, and method(s) for fabricating the same

Mask pattern and method for forming resist pattern using mask pattern thereof

Mask and manufacturing method of a semiconductor device and a thin film transistor array panel using the mask

Mask and method for crystallizing amorphous silicon

Pattern formation method

Reticles and methods of forming reticles

Tri-tone trim mask for an alternating phase-shift exposure system

Photomask for forming small contact hole array and methods of fabricating and using the same

Method for forming pattern using photomask

Method of creating a layout of a set of masks

Method and resulting structure for mosaic of multi-transmission rate optical mask structures

Method of depositing a material providing a specified attenuation and phase shift

Photomask blank, photomask and fabrication method thereof

Lithographic apparatus and device manufacturing method

Transparent substrate for mask blank and mask blank

Mask and manufacturing method using mask

Method of repairing a photomask having an internal etch stop layer

Phase shift photomask

Methods of forming reticles

Method of repairing phase shift mask

Lithographic mask and manufacturing method thereof

Multi-layer, attenuated phase-shifting mask

Reflective mask useful for transferring a pattern using extreme ultra violet (EUV) radiation and method of making the same

Mask blank, phase shift mask manufacturing method and template manufacturing method

Reticle manipulations

Preparation of photomask blank and photomask

Mask blank having a protection layer

Reticle film stabilizing method

Imaging and devices in lithography

Lithography mask blank

Method for manufacturing mask blank, method for manufacturing transfer mask, sputtering target for manufacturing mask blank

Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer method

Masks for lithographic imagings and methods for fabricating the same

Film-depositing target and preparation of phase shift mask blank

Photomask and method for creating a protective layer on the same

Embedded attenuated phase shift mask with tunable transmission

Simulation based PSM clear defect repair method and system

Method for producing a phase mask

Ultra high transmission phase shift mask blanks

Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSM

Halftone phase shift mask blank, halftone phase shift mask and their preparation

Preparation of halftone phase shift mask blank

Mask blank manufacturing method and sputtering target for manufacturing the same

Common second level frame exposure methods for making embedded attenuated phase shift masks

Photomask and manufacturing method of semiconductor device

Phase shifting mask for manufacturing semiconductor device and method of fabricating the same

Photomask and pattern forming method employing the same

Integrated phase angle and optical critical dimension measurement metrology for feed forward and feedback process control

Single trench repair method with etched quartz for attenuated phase shifting mask

Method for the repair of defects in photolithographic masks for patterning semiconductor wafers

Patterning semiconductor layers using phase shifting and assist features

Extreme ultraviolet mask with molybdenum phase shifter

Method and structure for fabricating a halftone mask for the manufacture of semiconductor wafers

Photo mask and method for fabricating the same

Phase shift mask and fabricating method thereof

Adjustable transmission phase shift mask

Phase shift mask blank, phase shift mask, and pattern transfer method

Phase-shift mask and fabrication thereof

Photomask having a monitoring pattern with an asymmetrical diffraction grating that includes semi-transparent probing-phase shifters

Photomask for enhancing contrast

Manufacturing method of semiconductor integrated circuit device

Method for dual damascene patterning with single exposure using tri-tone phase shift mask

Phase shift mask

Attenuated phase shift mask for extreme ultraviolet lithography and method therefore

Methods for converting reticle configurations

Photomasking

Photomask, photomask manufacturing method and semiconductor device manufacturing method using photomask

Half tone alternating phase shift masks

Attenuating phase shift mask blank and photomask

Mask for improving lithography performance by using multi-transmittance photomask

Method of making an attenuated phase-shifting mask from a mask blank

Multiple exposure method for forming a patterned photoresist layer

Photomask having an internal substantially transparent etch stop layer

Attenuated film with etched quartz phase shift mask

Method and apparatus for dry-etching half-tone phase-shift films, half-tone phase-shift photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereof

Photo mask, exposure method using the same, and method of generating data