ClassID:

176898

G03F1/32 - CPC Classification

Classification description:

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof; Phase shift masks [PSM]; PSM blanks; Preparation thereof Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion,; Preparation thereof

Recent Application in this class:
#1
20250370328
2025-12-04

PHOTOMASK BLANK

#2
20250322135
2025-10-16

SEMICONDUCTOR DEVICE

#3
20250321477
2025-10-16

LITHOGRAPHY MASK AND METHODS

#4
20250253153
2025-08-07

MANUFACTURING METHOD OF PHOTOMASK, AND PHOTOMASK BLANK

#5
20250248125
2025-07-31

ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF, MASK AND DISPLAY PANEL

#6
20250216765
2025-07-03

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV LITHOGRAPHY, AND METHOD FOR MANUFACTURING SAME

#7
20250147408
2025-05-08

PHASE SHIFT MASK AND METHOD FOR MANUFACTURING PHASE SHIFT MASK

#8
20250130488
2025-04-24

PHOTOMASK BLANK, PHOTOMASK, AND METHOD FOR MANUFACTURING PHOTOMASK

#9
20250044677
2025-02-06

MASK BLANK

#10
20250036021
2025-01-30

EXTREME ULTRAVIOLET LITHOGRAPHY METHOD AND EUV PHOTOMASK

#11
20240427229
2024-12-26

MANUFACTURING METHOD FOR PHOTOMASK, AND PHOTOMASK

#12
20240393675
2024-11-28

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#13
20240361683
2024-10-31

MASK BLANK AND PHASE SHIFT MASK

#14
20240345468
2024-10-17

BLANK MASK AND PHOTOMASK USING THE SAME

#15
20240329516
2024-10-03

PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY

#16
20240248390
2024-07-25

APPARATUS FOR FABRICATING BLANK MASK AND METHOD OF FABRICATING THE SAME

#17
20240248389
2024-07-25

APPARATUS FOR FABRICATING BLANK MASK AND METHOD OF FABRICATING THE SAME

#18
20240210814
2024-06-27

Reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method for manufacturing same

#19
20240184195
2024-06-06

METHOD OF MANUFACTURING PHASE SHIFT PHOTO MASKS

#20
20240184194
2024-06-06

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

#21
20240176224
2024-05-30

Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective mask

#22
20240152045
2024-05-09

PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, METHOD FOR MANUFACTURING PHASE SHIFT MASK, AND METHOD FOR MODIFYING PHASE SHIFT MASK

#23
20240134268
2024-04-25

LITHOGRAPHY MASK

#24
20240094623
2024-03-21

ATTENUATED PHASE SHIFT MASK FOR TALBOT LITHOGRAPHY

#25
20240069431
2024-02-29

METHOD OF MANUFACTURING PHOTO MASKS

#26
20240061324
2024-02-22

BLANK MASK AND PHOTOMASK USING THE SAME

#27
20240053672
2024-02-15

MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

#28
20240045319
2024-02-08

Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereof

#29
20240036458
2024-02-01

Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device

#30
20240036457
2024-02-01

Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method

#31
20240027892
2024-01-25

METHOD OF MAKING A HARD DISK DRIVE WRITE POLE USING A TRI-TONE ATTENUATED PHASE SHIFT MASK

#32
20230418150
2023-12-28

BLANK MASK AND PHOTOMASK USING THE SAME

#33
20230393457
2023-12-07

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

#34
20230385508
2023-11-30

SEMICONDUCTOR DEVICE

#35
20230367200
2023-11-16

BLANK MASK AND PHOTOMASK USING THE SAME

#36
20230350285
2023-11-02

Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective mask

#37
20230324785
2023-10-12

Reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method for manufacturing same

#38
20230314929
2023-10-05

MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#39
20230259015
2023-08-17

MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

#40
20230194973
2023-06-22

MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#41
20230185185
2023-06-15

METHOD AND APPARATUS FOR FORMING A BLANK MASK AND A LAYER FOR A BLANK MASK

#42
20230168575
2023-06-01

Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method

#43
20230135037
2023-05-04

BLANK MASK AND PHOTOMASK USING THE SAME

#44
20230110529
2023-04-13

BLANK MASK AND PHOTOMASK USING THE SAME

#45
20230097280
2023-03-30

MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

#46
20230087016
2023-03-23

Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device

#47
20230083755
2023-03-16

BLANK MASK AND PHOTOMASK USING THE SAME

#48
20230082514
2023-03-16

RESIST PATTERN FORMING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

#49
20230069092
2023-03-02

MASK BLANK AND METHOD OF MANUFACTURING PHOTOMASK

#50
20220414310
2022-12-29

Semiconductor device with reduced power and method of manufacturing the same

#51
20220397819
2022-12-15

BLANK MASK AND PHOTOMASK USING THE SAME

#52
20220390827
2022-12-08

LITHOGRAPHY MASK AND METHODS

#53
20220382141
2022-12-01

Blank mask and photomask using the same

#54
20220366117
2022-11-17

Method of making semiconductor device and semiconductor device

#55
20220365417
2022-11-17

Lithography mask

#56
20220357647
2022-11-10

BLANK MASK AND PHOTOMASK USING THE SAME

#57
20220350238
2022-11-03

PHOTOMASK BLANK, PHOTOMASK, AND MANUFACTURING METHOD OF SEMICONDUCTOR ELEMENT

#58
20220350237
2022-11-03

PHOTOMASK BLANK AND PHOTOMASK USING THE SAME

#59
20220342294
2022-10-27

MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#60
20220317555
2022-10-06

HALFTONE MASK, MANUFACTURING METHOD OF DISPLAY PANEL, AND ULTRAVIOLET MASK

#61
20220252972
2022-08-11

MASK BLANK, PHASE SHIFT MASK AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

#62
20220236638
2022-07-28

Phase shift mask blank, manufacturing method thereof, and phase shift mask

#63
20220236635
2022-07-28

Phase shift blankmask and photomask for EUV lithography

#64
20220231089
2022-07-21

Display device and photomask for defining opening in the display device

#65
20220229358
2022-07-21

Photomask blank, method for producing photomask, and photomask

#66
20220214610
2022-07-07

A PATTERNING DEVICE

#67
20220214609
2022-07-07

BLANK MASK AND PHOTOMASK USING THE SAME

#68
20220214608
2022-07-07

Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device

#69
20220206380
2022-06-30

BLANK MASK AND PHOTOMASK USING THE SAME

#70
20220179304
2022-06-09

MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTI-LAYER REFLECTIVE COATING, REFLECTION-TYPE MASK BLANK, REFLECTION-TYPE MASK, TRANSMISSION-TYPE MASK BLANK, TRANSMISSION-TYPE MASK, AND SEMICONDUCTOR DEVICE PRODUCTION METHOD

#71
20220179300
2022-06-09

MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

#72
20220163881
2022-05-26

Phase-shift reticle for use in photolithography

#73
20220137502
2022-05-05

Phase shift mask blank, manufacturing method of phase shift mask, and phase shift mask

#74
20220131077
2022-04-28

Mask plate, display panel and display device

#75
20220130870
2022-04-28

Array substrate and display panel having array substrate

#76
20220128898
2022-04-28

Mask blank, phase shift mask, and method of manufacturing semiconductor device

#77
20220121106
2022-04-21

METHODS OF FABRICATING PHASE SHIFT PHOTOMASKS

#78
20220121105
2022-04-21

Patterning device and method of use thereof

#79
20220121104
2022-04-21

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

#80
20220082929
2022-03-17

Phase shift mask blank, method for producing phase shift mask, and phase shift mask

#81
20220075258
2022-03-10

BLANKMASK AND PHOTOMASK

#82
20220050372
2022-02-17

MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

#83
20220043335
2022-02-10

MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING METHOD

#84
20220035235
2022-02-03

MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING METHOD

#85
20220035234
2022-02-03

Reflective mask blank for EUV lithography, mask blank for EUV lithography, and manufacturing methods thereof

#86
20220005844
2022-01-06

Array substrate and manufacturing method thereof

#87
20210407803
2021-12-30

Manufacturing method of photomask, and photomask blank

#88
20210364910
2021-11-25

Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device

#89
20210364909
2021-11-25

Mask blank, phase shift mask, and method of manufacturing semiconductor device

#90
20210364840
2021-11-25

PHOTOMASK FOR FABRICATING PADDED BLACK PHOTO SPACER AND LIQUID CRYSTAL DISPLAY PANEL

#91
20210356856
2021-11-18

Phase shift mask and electronic component manufacturing method

#92
20210286254
2021-09-16

MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

#93
20210255538
2021-08-19

Mask blank, phase shift mask, and method for manufacturing semiconductor device

#94
20210223681
2021-07-22

Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device

#95
20210216007
2021-07-15

Method of accelerated hazing of mask assembly

#96
20210208498
2021-07-08

Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method

#97
20210173296
2021-06-10

Photomask blank, manufacturing method of photomask and photomask

#98
20210149294
2021-05-20

Mask blank, method for manufacturing phase shift mask, and method for manufacturing semiconductor device

#99
20210149293
2021-05-20

Mask blank, phase shift mask and method for manufacturing semiconductor device

#100
20210132488
2021-05-06

MASK BLANK, PHASE-SHIFT MASK, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

#101
20210124254
2021-04-29

Half-tone attenuated phase shift blankmask and photomask for EUV lithography

#102
20210109436
2021-04-15

Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device

#103
20210096455
2021-04-01

Halftone phase shift-type photomask blank, method of manufacturing thereof, and halftone phase shift-type photomask

#104
20210088895
2021-03-25

Mask blank, phase shift mask, and method for manufacturing semiconductor device

#105
20210048740
2021-02-18

Mask blank, phase shift mask, and method of manufacturing semiconductor device

#106
20210048739
2021-02-18

Method for producing photomask, method for producing semiconductor device, method for forming pattern, and photomask

#107
20210026235
2021-01-28

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

#108
20200409252
2020-12-31

Mask blank, phase shift mask, and method of manufacturing semiconductor device

#109
20200379338
2020-12-03

MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#110
20200371425
2020-11-26

Method of manufacturing phase shift photo masks

#111
20200350344
2020-11-05

Method of preparing thin film transistor substrate

#112
20200310241
2020-10-01

Phase shift mask blank and phase shift mask

#113
20200310240
2020-10-01

Phase shift mask blank, manufacturing method thereof, and phase shift mask

#114
20200285144
2020-09-10

MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

#115
20200272052
2020-08-27

Photopolymerizable resin composition, display device using same, and manufacturing method thereof

#116
20200249561
2020-08-06

Halftone phase shift photomask blank, making method, and halftone phase shift photomask

#117
20200209733
2020-07-02

Semiconductor device

#118
20200203167
2020-06-25

Semiconductor device

#119
20200176053
2020-06-04

Memory system having write assist circuit including memory-adapted transistors

#120
20200150524
2020-05-14

MASK BLANK, TRANSFER MASK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

#121
20200117077
2020-04-16

Mask blanks, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device

#122
20200105671
2020-04-02

Hybrid power rail structure

#123
20200066766
2020-02-27

ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF

#124
20200064727
2020-02-27

Mask blank, phase-shift mask, and method of manufacturing semiconductor device

#125
20200033718
2020-01-30

Mask blank, phase shift mask, and method for manufacturing semiconductor device

#126
20200026181
2020-01-23

Halftone phase shift mask blank and halftone phase shift mask

#127
20200026180
2020-01-23

Method for preparing halftone phase shift mask blank, halftone phase shift mask blank, halftone phase shift mask, and thin film forming apparatus

#128
20200012185
2020-01-09

Photomask blank, photomask, and photomask manufacturing method

#129
20190369485
2019-12-05

Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device

#130
20190354004
2019-11-21

BLANK PHASE SHIFT PHOTOMASKS, PHASE SHIFT PHOTOMASKS FABRICATED USING BLANK PHASE SHIFT PHOTOMASKS, AND METHODS OF FABRICATING PHASE SHIFT PHOTOMASKS USING BLANK PHASE SHIFT PHOTOMASKS

#131
20190346727
2019-11-14

Display panel manufacturing method and display panel

#132
20190339608
2019-11-07

Reflective mask blank, reflective mask and method of manufacturing semiconductor device

#133
20190332006
2019-10-31

Photomask and methods for manufacturing and correcting photomask

#134
20190319222
2019-10-17

PHOTOMASK AND METHOD FOR MANUFACTURING DISPLAY DEVICE

#135
20190258155
2019-08-22

Mask assembly and haze acceleration method

#136
20190227428
2019-07-25

Method for manufacturing a mask blank substrate, method for manufacturing a mask blank, method for manufacturing a transfer mask, method for manufacturing a semiconductor device, a mask blank substrate, a mask blank, and a transfer mask

#137
20190187551
2019-06-20

Mask blank, phase shift mask, method of manufacturing phase shift mask, and method of manufacturing semiconductor device

#138
20190187550
2019-06-20

Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device

#139
20190163047
2019-05-30

Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device

#140
20190163011
2019-05-30

Color filter substrate and method of manufacturing the same

#141
20190155138
2019-05-23

Mask for extreme-ultraviolet (extreme-UV) lithography and method for manufacturing the same

#142
20190146327
2019-05-16

Mask blank, phase-shift mask, and method of manufacturing semiconductor device

#143
20190146326
2019-05-16

Method of manufacturing phase shift photo masks

#144
20190137862
2019-05-09

Masks and methods of forming the same

#145
20190101818
2019-04-04

Lithography mask and method for manufacturing the same

#146
20190096927
2019-03-28

MANUFACTURING METHOD OF THIN FILM TRANSISTOR AND MASK

#147
20190079383
2019-03-14

Reflective mask blank, reflective mask and method of manufacturing semiconductor device

#148
20190064651
2019-02-28

Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device

#149
20190064650
2019-02-28

Halftone phase shift photomask blank and making method

#150
20190064649
2019-02-28

Mask blank

#151
20190056626
2019-02-21

Method for fabricating array substrate, array substrate and display device

#152
20190033703
2019-01-31

Photomask blank, photomask blank making method, and photomask making method

#153
20190018312
2019-01-17

Mask blank, phase shift mask, and method for manufacturing semiconductor device

#154
20190004420
2019-01-03

Photomask blank and photomask

#155
20190004419
2019-01-03

Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor device

#156
20180373081
2018-12-27

Mask structure and manufacturing method for array substrate

#157
20180356720
2018-12-13

Phase shift mask blank, phase shift mask, and blank preparing method

#158
20180341172
2018-11-29

Method of fabricating phase shift mask and method of fabricating semiconductor device

#159
20180340886
2018-11-29

Apparatus and methods for measuring phase and amplitude of light through a layer

#160
20180335692
2018-11-22

PHASE-SHIFT BLANKMASK AND PHASE-SHIFT PHOTOMASK

#161
20180329285
2018-11-15

Reflective mask blank, reflective mask and method of manufacturing semiconductor device

#162
20180321582
2018-11-08

Photomask and methods for manufacturing and correcting photomask

#163
20180301185
2018-10-18

Device having write assist circuit including memory-adapted transistors and method for making the same

#164
20180299767
2018-10-18

Mask blank, method for manufacturing phase shift mask, and method for manufacturing semiconductor device

#165
20180294434
2018-10-11

Substrate and method of producing the same with display apparatus and producing method thereof

#166
20180267398
2018-09-20

Photomask blank, method for manufacturing photomask, and mask pattern formation method

#167
20180259843
2018-09-13

Photomask blank

#168
20180259842
2018-09-13

Halftone phase shift photomask blank

#169
20180259841
2018-09-13

Mask blank, transfer mask, method of manufacturing transfer mask and method of manufacturing semiconductor device

#170
20180252995
2018-09-06

Mask blank, phase shift mask and method for manufacturing semiconductor device

#171
20180224737
2018-08-09

Method for preparing photomask blank, photomask blank, method for preparing photomask, photomask, and metallic chromium target

#172
20180210331
2018-07-26

Mask blank, phase shift mask, phase shift mask manufacturing method, and semiconductor device manufacturing method

#173
20180196348
2018-07-12

Phase shift mask

#174
20180180987
2018-06-28

Mask blank, phase-shift mask and method for manufacturing semiconductor device

#175
20180180986
2018-06-28

Photomask blank, and preparation method thereof

#176
20180180946
2018-06-28

Apparatus for improving optical alignment of panels manufactured on a same mother substrate

#177
20180180931
2018-06-28

Black matrix mask, method for manufacturing black matrix, and application thereof

#178
20180164675
2018-06-14

Photomask and fabrication method therefor

#179
20180164169
2018-06-14

Stress measurement method and system for optical materials

#180
20180149961
2018-05-31

Mask blank, phase shift mask, and method for manufacturing semiconductor device

#181
20180143528
2018-05-24

Mask blank, phase shift mask, and method for manufacturing semiconductor device

#182
20180129130
2018-05-10

Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device

#183
20180120601
2018-05-03

OPTIMIZATION METHOD OF THICKNESS UNIFORMITY OF ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY PANEL

#184
20180101092
2018-04-12

Manufacturing method of a mask plate and a color filter substrate

#185
20180088457
2018-03-29

Halftone phase shift mask blank and halftone phase shift mask

#186
20180088456
2018-03-29

Halftone phase shift photomask blank, making method, and halftone phase shift photomask

#187
20180059532
2018-03-01

Method for preparing halftone phase shift mask blank, halftone phase shift mask blank, halftone phase shift mask, and thin film forming apparatus

#188
20180052387
2018-02-22

Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor device

#189
20180033612
2018-02-01

Mask blank and phase shift mask using same

#190
20180031963
2018-02-01

Mask blanks, phase shift mask, and method for manufacturing semiconductor device

#191
20170371238
2017-12-28

Mask for photolithography, method of manufacturing the same and method of manufacturing substrate using the same

#192
20170285458
2017-10-05

Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device

#193
20170212417
2017-07-27

Halftone phase shift photomask blank and making method

#194
20170184968
2017-06-29

Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process

#195
20170176848
2017-06-22

Mask blank, phase-shift mask, method of manufacturing mask blank, method of manufacturing phase-shift mask and method of manufacturing semiconductor device

#196
20170168384
2017-06-15

Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device

#197
20170139316
2017-05-18

Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device

#198
20170123306
2017-05-04

Method of manufacturing photomask blank and photomask blank

#199
20170123305
2017-05-04

Mask blank, phase shift mask, and production method thereof

#200
20170075213
2017-03-16

Photomask and methods for manufacturing and correcting photomask

#201
20170075210
2017-03-16

Mask blank, method of manufacturing phase shift mask, phase shift mask, and method of manufacturing semiconductor device

#202
20170068156
2017-03-09

Photomask blank

#203
20170059983
2017-03-02

Halftone phase shift photomask blank, making method, and halftone phase shift photomask

#204
20170023855
2017-01-26

Photomask blank and method for manufacturing photomask blank

#205
20170010526
2017-01-12

Mask blank, and transfer mask

#206
20170003583
2017-01-05

Mask blank and transfer mask

#207
20160377975
2016-12-29

Mask blank, phase-shift mask and method for manufacturing semiconductor device

#208
20160343746
2016-11-24

DOPING METHOD AND DOPING APPARATUS OF ARRAY SUBSTRATE

#209
20160315199
2016-10-27

PHOTO MASK, THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR

#210
20160291456
2016-10-06

Halftone phase shift mask blank, halftone phase shift mask, and pattern exposure method

#211
20160291455
2016-10-06

Method for preparing halftone phase shift photomask blank

#212
20160291454
2016-10-06

Method for preparing halftone phase shift photomask blank

#213
20160291453
2016-10-06

Phase shift mask blank, phase shift mask, and blank preparing method

#214
20160291452
2016-10-06

Halftone phase shift mask blank and halftone phase shift mask

#215
20160274402
2016-09-22

Display device having a furrow structure on a light blocking member

#216
20160258901
2016-09-08

Producing a separation medium using grayscale mask

#217
20160202603
2016-07-14

Mask blank, transfer mask, and method for manufacturing transfer mask

#218
20160202602
2016-07-14

Mask blank, transfer mask and methods of manufacturing the same

#219
20160195803
2016-07-07

Mask blank, mask blank with negative resist film, phase shift mask, and method for producing pattern formed body using same

#220
20160187769
2016-06-30

Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor device

#221
20160170294
2016-06-16

Phase shift mask, method for manufacturing the same, and method for forming micro pattern

#222
20160109794
2016-04-21

Photomask and method of forming the same and methods of manufacturing electronic device and display device using the photomask

#223
20160033858
2016-02-04

Halftone phase shift photomask blank and making method

#224
20160033857
2016-02-04

Mask for photolithography, method of manufacturing the same and method of manufacturing substrate using the same

#225
20160013295
2016-01-14

Mask, manufacturing method thereof and manufacturing method of a thin film transistor

#226
20150355537
2015-12-10

Method for manufacturing mask blank substrate, method for manufacturing mask blank and method for manufacturing transfer mask

#227
20150338731
2015-11-26

Mask blank, phase-shift mask, and method for manufacturing the same

#228
20150331309
2015-11-19

Reticle and method of fabricating the same

#229
20150270297
2015-09-24

Half tone mask plate and method for manufacturing array substrate using the same

#230
20150219951
2015-08-06

Display panel and manufacturing method thereof, mask and manufacturing method thereof, and display device

#231
20150177612
2015-06-25

Mask and method for forming the same

#232
20150168823
2015-06-18

Phase shift mask blank, method of manufacturing the same, and phase shift mask

#233
20150140480
2015-05-21

Photomask and methods for manufacturing and correcting photomask

#234
20150125785
2015-05-07

Halftone phase shift photomask blank, halftone phase shift photomask and pattern exposure method

#235
20150086909
2015-03-26

Method for manufacturing photomask blank

#236
20150086908
2015-03-26

Photomask blank and method for manufacturing photomask blank

#237
20150072273
2015-03-12

Mask blank, transfer mask, and methods of manufacturing the same

#238
20150017575
2015-01-15

Photomasks, methods of forming a photomask, and methods of photolithographically patterning a substrate

#239
20150010853
2015-01-08

Method of manufacturing photomask blank and photomask blank

#240
20140242518
2014-08-28

Patterning process and resist composition

#241
20140162177
2014-06-12

Optical mask for forming pattern

#242
20140127614
2014-05-08

Photomask blank, method of manufacturing the same, photomask, and method of manufacturing the same

#243
20140106280
2014-04-17

Lithography methods, methods for forming patterning tools and patterning tools

#244
20140072902
2014-03-13

Attenuated phase shift mask for multi-patterning

#245
20130323627
2013-12-05

Photomasks, methods of forming a photomask, and methods of photolithographically patterning a substrate

#246
20130309600
2013-11-21

Photomask blank and method for manufacturing photomask

#247
20130309598
2013-11-21

Half-tone phase shift mask blank and method for manufacturing half-tone phase shift mask

#248
20130280644
2013-10-24

Mask and method for forming the same

#249
20130130159
2013-05-23

Light pattern exposure method, halftone phase shift mask, and halftone phase shift mask blank

#250
20130122403
2013-05-16

Mask for exposure and method of fabricating substrate using said mask

#251
20130101926
2013-04-25

Halftone phase shift blank photomasks and halftone phase shift photomasks

#252
20130071777
2013-03-21

Phase shift mask blank, method of manufacturing the same, and phase shift mask

#253
20130052566
2013-02-28

Lithography methods, methods for forming patterning tools and patterning tools

#254
20130040242
2013-02-14

Method and system for exposure of a phase shift mask

#255
20130040231
2013-02-14

METHOD FOR ETCHING A MOLYBDENUM LAYER SUITABLE FOR PHOTOMASK FABRICATION

#256
20130034806
2013-02-07

Photomask making method, photomask blank and dry etching method

#257
20130011772
2013-01-10

Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film

#258
20120328987
2012-12-27

Patterning process and resist composition

#259
20120315581
2012-12-13

PATTERNING PROCESS AND RESIST COMPOSITION

#260
20120258387
2012-10-11

Method and mask for enhancing the resolution of patterning 2-row holes

#261
20120251931
2012-10-04

Transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device

#262
20120251930
2012-10-04

Photomask blank and method for manufacturing photomask

#263
20120251929
2012-10-04

Phase shift mask blank, phase shift mask, and method for manufacturing phase shift mask blank

#264
20120214093
2012-08-23

Photomask blank, photomask blank manufacturing method, and photomask manufacturing method

#265
20120196209
2012-08-02

L-shaped feature, method of making an L-shaped feature and method of making an L-shaped structure

#266
20120156597
2012-06-21

Lithographic mask and manufacturing method thereof

#267
20120141929
2012-06-07

METHOD FOR MANUFACTURING HALF-TONE MASK, AND HALF-TONE MASK

#268
20120129084
2012-05-24

Photomask blank and production method thereof, and photomask production method, and semiconductor device production method

#269
20120117523
2012-05-10

Inverse lithography for high transmission attenuated phase shift mask design and creation

#270
20120070768
2012-03-22

Methods of fabricating reticles with subdivided blocking regions

#271
20120064438
2012-03-15

Photomask blank and making method, photomask, light pattern exposure method, and design method of transition metal/silicon base material film

#272
20120052419
2012-03-01

Photomask, manufacturing apparatus and method of semiconductor device using the same, and photomask feature layout method

#273
20120045713
2012-02-23

Photomask blank, method of manufacturing the same, photomask, and method of manufacturing the same

#274
20120034552
2012-02-09

Method of manufacturing a photomask

#275
20120034551
2012-02-09

Binary photomask blank and binary photomask making method

#276
20120034434
2012-02-09

Mask blank, transfer mask, and film denseness evaluation method

#277
20120015287
2012-01-19

Halftone mask having shielding parts and plural overapping halftone patterns of different widths

#278
20120003573
2012-01-05

Photomasks

#279
20110318674
2011-12-29

Photomask blank, photomask, and methods of manufacturing the same

#280
20110294045
2011-12-01

Photomask and methods for manufacturing and correcting photomask

#281
20110262849
2011-10-27

Photomask and pattern formation method using the same

#282
20110236831
2011-09-29

Acetal compound, polymer, resist composition, and patterning process

#283
20110217631
2011-09-08

Method of fabricating a halftone mask having a shielding pattern and plural overlapping halftone patterns of different widths

#284
20110212388
2011-09-01

Advanced phase shift lithography and attenuated phase shift mask for narrow track width d write pole definition

#285
20110207033
2011-08-25

Method and structure for fabricating dark-periphery mask for the manufacture of semiconductor wafers

#286
20110207032
2011-08-25

Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film

#287
20110193202
2011-08-11

METHODS TO ACHIEVE 22 NANOMETER AND BEYOND WITH SINGLE EXPOSURE

#288
20110183240
2011-07-28

Mask blank, mask blank manufacturing method, transfer mask, and transfer mask manufacturing method

#289
20110171567
2011-07-14

Phase shift mask blank, phase shift mask, and method for manufacturing phase shift mask blank

#290
20110165505
2011-07-07

Photomasks, methods of forming photomasks, and methods of photolithographically-patterning substrates

#291
20110111332
2011-05-12

Phase shift mask blank and phase shift mask

#292
20110104593
2011-05-05

PHASE-SHIFT MASK AND METHOD OF FORMING THE SAME

#293
20110104591
2011-05-05

Methods of fabricating halftone phase shift blank photomasks and halftone phase shift photomasks

#294
20110089346
2011-04-21

METHOD AND SYSTEM FOR PATTERN WRITING WITH CHARGED-PARTICLE BEAM

#295
20110086296
2011-04-14

Phase shift masks

#296
20110081605
2011-04-07

Photomask blank and method for manufacturing the same

#297
20110053058
2011-03-03

SEMICONDUCTOR DEVICE FABRICATION MASK AND METHOD OF MANUFACTURING THE SAME

#298
20110033785
2011-02-10

Method of fabricating integrated circuit using alternating phase-shift mask and phase-shift trim mask

#299
20110033656
2011-02-10

PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD AND ELECTRONIC DEVICE

#300
20110027703
2011-02-03

Reflective mask blank, reflective mask, and method of manufacturing the same