176918 ⎘
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof; Preparation processes not covered by groups - Repair or correction of mask defects
Methods for repairing an alternating phase-shift mask
#302Method for repairing opaque defects in photolithography masks
#303Method for correction of defects in lithography masks
#304Method of patterning a substrate by feeding mask defect data forward for subsequent correction
#305Method of repairing a photomask having an internal etch stop layer
#306Systems configured to perform a non-contact method for determining a property of a specimen
#307Photo mask and method of correcting the transmissivity of a photo mask
#308Defect repair device and defect repair method
#309Photomask defect correction method employing a combined device of a focused electron beam device and an atomic force microscope
#310Stylus system for modifying small structures
#311Processing method using probe of scanning probe microscope
#312Method of processing vertical cross-section using atomic force microscope
#313Method for repairing a phase shift mask
#314Scanning probe device and processing method by scanning probe
#315Repair of photolithography masks by sub-wavelength artificial grating technology
#316Scratch repairing processing method and scanning probe microscope (SPM) used therefor
#317Processing probe
#318Simulation based PSM clear defect repair method and system
#319Method and device for correcting pattern film on a semiconductor substrate
#320Scanning probe microscopy inspection and modification system
#321System and method for processing masks with oblique features
#322Single trench repair method with etched quartz for attenuated phase shifting mask
#323Method for the repair of defects in photolithographic masks for patterning semiconductor wafers
#324Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device
#325Method for adjusting dimensions of photomask features
#326Advanced phase shift inspection method
#327Method to locally protect extreme ultraviolet multilayer blanks used for lithography
#328Method for controlling linewidth in advanced lithography masks using electrochemistry
#329Method and system for repairing defected photomasks
#330Methods for converting reticle configurations
#331Method and apparatus for repair of reflective photomasks
#332Proximity correcting lithography mask blanks
#333Geometric loading effect correction for lithography
#334Methods, systems, and computer program products for implementing an electronic design with physical simulation using layout artwork
#335Methods of controlling distortion of exposure processes