SAMPLE DAMAGE AVOIDANCE IN DEVICES AND METHODS FOR SAMPLE PROCESSING AND SAMPLE REPAIR

SRAF CONTROL METHOD AND SYSTEM FOR WAFER EXPOSURE, AND MASK MANUFACTURING METHOD USING THE METHOD

METHODS OF REPAIRING EXTREME ULTRAVIOLET PHOTOMASKS

METHOD OF CORRECTING AN ERROR OF A LAYOUT OF A PATTERN AND METHOD OF FORMING A PATTERN USING THE SAME

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

METHOD FOR REMOVING DEFECT ON EUV MASK

METHOD, LITHOGRAPHY MASK, USE OF A LITHOGRAPHY MASK, AND PROCESSING ARRANGEMENT

CORRECTING RULE VIOLATIONS IN A LAYOUT

STRUCTURE AND METHOD OF RETICLE POD HAVING INSPECTION WINDOW

PHASE SHIFT MASK AND METHOD FOR MANUFACTURING PHASE SHIFT MASK

METHODS OF REPAIRING EXTREME ULTRAVIOLET PHOTOMASKS

CONTROL DEVICE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

ITERATIVE MASK OPTIMIZATION BIASED TOWARDS CRITICAL REGIONS OF LAYOUT

METHOD AND APPARATUS FOR MASK REPAIR

PHOTOMASK REPAIRING METHOD AND SYSTEM THEREOF

METHOD FOR CORRECTING ERRORS IN PHOTOLITHOGRAPHIC MASKS WHILE AVOIDING DAMAGE TO REAR-SIDE COATINGS

METHOD OF REMOVING DEFECT OF MASK

OVERLAY CORRECTION FOR ADVANCED INTEGRATED-CIRCUIT DEVICES

METHOD, APPARATUS, AND SYSTEM WITH RESIST IMAGE ESTIMATION

METHOD AND DEVICE FOR QUALIFYING A MASK OF A LITHOGRAPHY SYSTEM

PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK

PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME

METHOD FOR CORRECTING LITHOGRAPHY PATTERN OF SURFACE PLASMA

METHOD AND APPARATUS FOR CHARACTERIZATION OF A MICROLITHOGRAPHY MASK

Use of adaptive replacement maps in digital lithography for local cell replacement

METHOD AND APPARATUS FOR PROCESSING A SAMPLE

METHOD AND APPARATUS FOR OPTIMIZING A DEFECT CORRECTION FOR AN OPTICAL ELEMENT USED IN A LITHOGRAPHIC PROCESS

PHOTOMASK DESIGN CORRECTION METHOD

Structure and method of reticle pod having inspection window

Photomask repairing method and system thereof

SYSTEM, METHOD AND PROGRAM PRODUCT FOR PHOTOMASK SURFACE TREATMENT

APPARATUS FOR CORRECTING PHOTOMASK AND METHOD THEREOF

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE

APPARATUS AND METHOD FOR TREATING SUBSTRATE

Use of adaptive replacement maps in digital lithography for local cell replacement

Photomask repairing method and system thereof

LIGHT-EMITTING DEVICE

METHOD FOR DETERMINING A REGISTRATION ERROR

Photomask and method of repairing photomask

Photomask including fiducial mark and method of making a semiconductor device using the photomask

Structure and method of reticle pod having inspection window

ORIGINAL PLATE MANUFACTURING METHOD, DRAWING DATA CREATION METHOD, AND PATTERN DEFECT REPAIRING METHOD

Photomask and method of repairing photomask

Method and apparatus for repairing defects of a photolithographic mask for the EUV range

Photomask including fiducial mark and method of making semiconductor device using the photomask

Stochastic optical proximity corrections

Method for measuring photomasks

Structure and method of reticle pod having inspection window

Devices and methods for examining and/or processing an element for photolithography

System and method for reducing printable defects on extreme ultraviolet pattern masks

Photomask and method of repairing photomask

Method for forming photomask and photolithography method

Photomask and method for forming the same

EXTREME ULTRAVIOLET PHOTOMASK MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE FABRICATION METHOD INCLUDING THE SAME

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Method and device for superimposing at least two images of a photolithographic mask

MASK REPAIR APPARATUS AND METHOD FOR REPAIRING MASK

Inspection system with non-circular pupil

MASK TREATING METHOD AND SYSTEM THEREOF

Method and apparatus for determining positions of a plurality of pixels to be introduced in a substrate of a photolithographic mask

Mask pattern correction system, and semiconductor device manufacturing method utilizing said correction system

Method of exposing a semiconductor structure, apparatus for controlling a lithography process performed by a lithography apparatus across a semiconductor structure, non-transitory computer readable medium having instructions stored thereon for generating a weight function

Method of fabricating and servicing a photomask

Correction pattern generation device, pattern defect correction system, correction pattern generation method, and semiconductor device manufacturing method

Photomask and method for forming the same

Method for detecting particles on the surface of an object, wafer, and mask blank

Method and apparatus for analyzing a defective location of a photolithographic mask

Method and apparatus for ascertaining a repair shape for processing a defect of a photolithographic mask

Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device

Photomask and methods for manufacturing and correcting photomask

Method and device for permanently repairing defects of absent material of a photolithographic mask

Substrate processing control apparatus, recording medium, and method of manufacturing photomask

Method for determining a structure-independent contribution of a lithography mask to a fluctuation of the linewidth

Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask

Photolithography plate and mask correction method

Optical system and method for correcting mask defects using the system

Method for forming photomask and photolithography method

Method of mask data synthesis and mask making

Simulation-assisted wafer rework determination

Method of sequential infiltration synthesis treatment of infiltrateable material and structures and devices formed using same

Method for examining photolithographic masks and mask metrology apparatus for performing the method

EUV PATTERNING USING PHOTOMASK SUBSTRATE TOPOGRAPHY

Stretchable layout design for EUV defect mitigation

Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask

Method and apparatus to correct for patterning process error

Photomask and methods for manufacturing and correcting photomask

METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR

Method and apparatus to correct for patterning process error

Method of using equipment method and system for manufacturing mask or display substrate

METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR

Pattern inspection apparatus, pattern position measurement apparatus, aerial image measurement system, method for measuring aerial image, pattern position repairing apparatus, method for repairing pattern position, aerial image data processing apparatus, method for processing aerial image data, pattern exposure apparatus, method for exposing pattern, method for manufacturing mask, and mask manufacturing system

Method and apparatus for repairing defects of a photolithographic mask for the EUV range

Reflection-type exposure mask

Method and apparatus to correct for patterning process error

Focused radiation beam induced deposition

Manufacturing method of photomask and recording medium

Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices

Method and device for synthesizing a circuit layout

Process for Reducing the Defects in an Ordered Film of Block Copolymer

Method for repairing a mask

METHOD AND APPARATUS FOR USING PATTERNING DEVICE TOPOGRAPHY INDUCED PHASE

Method of calculating a shift value of a cell contact

Mask and manufacturing method of mask

Environmental-surrounding-aware OPC

Method and device for permanently repairing defects of absent material of a photolithographic mask

Photomask structure with an etch stop layer that enables repairs of detected defects therein and extreme ultraviolet(EUV) photolithograpy methods using the photomask structure

Method and device for the simulation of a photolithographic process for generating a wafer structure

Apparatus and method for imparting direction-selective light attenuation

METHOD FOR PRODUCING A MASK FOR THE EXTREME ULTRAVIOLET WAVELENGTH RANGE, MASK AND DEVICE

Focused radiation beam induced deposition

Method and system for EUV mask cleaning with non-thermal solution

Method for repairing a mask

Optical proximity correction (OPC) method and method of fabricating mask using the OPC method

Method for repairing mask defects

Method of correcting mask pattern and method of manufacturing reticle

Photomask and methods for manufacturing and correcting photomask

Defect inspecting method, sorting method and producing method for photomask blank

Environmental-surrounding-aware OPC

Method of fabricating cylindrical polymer mask

Method and apparatus for generating a predetermined three-dimensional contour of an optical component and/or a wafer

Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask, and method of manufacturing the integrated circuit device

Method and apparatus for correcting errors on a wafer processed by a photolithographic mask

Optical proximity correction for directed-self-assembly guiding patterns

Guiding patterns optimization for directed self-assembly

Efficient solution for removing EUV native defects

Pattern formation method, control device, and semiconductor device manufacture method

Durable metal film deposition for mask repair

Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof

Method for repairing a mask

Method for lithography patterning

Apparatus and method for indirect surface cleaning

Method of manufacturing an extreme ultraviolet (EUV) mask and the mask manufactured therefrom

Pattern verifying method

OPC enlarged dummy electrode to eliminate ski slope at eSiGe

Method of calculating a shift vale of a cell contact

Photomasks, methods of fabricating the photomasks, and method of fabricating semiconductor devices by using the photomasks

Mask processing apparatus and mask processing method

Surface defect repair by irradiation

System and methods for OPC model accuracy management and disposition

Mask manufacturing equipment and mask manufacturing method

Method of fabricating an integrated circuit with enhanced defect repairability

Laser surgical apparatus and methods of its use minimizing damage during the ablation of tissue using a focused ultrashort pulsed laser beam wherein the slope of fluence breakdown is a function of the pulse width

Lithography-oriented photomask repair

Methods of modifying masking reticles to remove forbidden pitch regions thereof

Method of repairing a mask

Surface delayering with a programmed manipulator

Reflective mask blank for EUV lithography, method of manufacturing thereof, reflective mask for EUV lithography and method of manufacturing thereof

Apparatus and method for indirect surface cleaning

Technique for repairing a reflective photo-mask

Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask, and method of manufacturing the integrated circuit device

Photomask and methods for manufacturing and correcting photomask

Method for repairing a mask

Method for repairing a mask

Method and apparatus for locally deforming an optical element for photolithography

Method for forming photo-mask and OPC method

Method of manufacturing an extreme ultraviolet (EUV) mask and the mask manufactured therefrom

Methods of reducing registration errors of photomasks and photomasks formed using the methods

Method for manufacturing EUV masks minimizing the impact of substrate defects

Methods of reducing a registration error of a photomask, and related photomasks and methods of manufacturing an integrated circuit

Film-growth model using level sets

Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks

Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof

Method for mask fabrication and repair

Technique for repairing an EUV photo-mask

Method for repairing a mask

METHOD AND APPARATUS FOR PROTECTING A SUBSTRATE DURING PROCESSING BY A PARTICLE BEAM

Reticle defect correction by second exposure

Lithography mask repair methods

Double-mask photolithography method minimizing the impact of substrate defects

Mask repair with passivation

Defective artifact removal in photolithography masks corrected for optical proximity

EUV mask

Apparatus of repairing a mask and a method for the same

Apparatus and method for lithography patterning

Method for mask fabrication and repair

Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks

Method and apparatus for correcting errors on a wafer processed by a photolithographic mask

Blank masks for extreme ultra violet lithography, methods of fabricating the same, and methods of correcting registration errors thereof

METHOD FOR MANUFACTURING A MASK

Mask and repairing method therefor

Method for repairing mask for EUV exposure and mask for EUV exposure

System and method for combined intraoverlay metrology and defect inspection

Method for repairing photomask

Method of designing pattern layouts

Abrasive-free planarization for EUV mask substrates

Reticle defect correction by second exposure

Layout design defect repair using inverse lithography

OPC Checking and Classification

Reticle defect correction by second exposure

Method of manufacturing EUV mask

Exposure method and exposure mask

Debris removal in high aspect structures

Method of correcting defects in a reflection-type mask and mask-defect correction apparatus

Mask fabrication supporting method, mask blank providing method, and mask blank dealing system

Lithographic apparatus, device manufacturing method, and method of correcting a mask

Method of manufacturing a transfer mask and method of manufacturing a semiconductor device

Method and apparatus for inspecting a reflective lithographic mask blank and improving mask quality

ADVANCED PHOTOMASK REPAIR

METHOD AND APPARATUS FOR CORRECTING ERRORS ON A WAFER PROCESSED BY A PHOTOLITHOGRAPHIC MASK

PHOTOMASK AND FORMATION METHOD THEREOF

Pattern-dependent proximity matching/tuning including light manipulation by projection optics

Method and apparatus for the determination of laser correcting tool parameters

Photomask blank and making method, photomask, light pattern exposure method, and design method of transition metal/silicon base material film

Correction of errors of a photolithographic mask using a joint optimization process

Photomask and methods for manufacturing and correcting photomask

MASKS FOR MICROLITHOGRAPHY AND METHODS OF MAKING AND USING SUCH MASKS

METHOD FOR CORRECTING IMAGE PLACEMENT ERROR IN PHOTOMASK

Lithographic plane check for mask processing

Cost-effective method for extreme ultraviolet (EUV) mask production

Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks

Masks for microlithography and methods of making and using such masks

Apparatus and method for repairing photo mask

Laser-assisted nanomaterial deposition, nanomanufacturing, in situ monitoring and associated apparatus

Optical component for EUVL and smoothing method thereof

Enhanced quality of laser ablation by controlling laser repetition rate

Method for repairing phase shift masks

Verification method for repairs on photolithography masks

Methods of forming and using reticles

SYSTEM AND METHOD FOR ELIMINATING THE STRUCTURE AND EDGE ROUGHNESS PRODUCED DURING LASER ABLATION OF A MATERIAL

Apparatus for processing photomask, methods of using the same, and methods of processing photomask

Beam-induced etching

Multiple magnification optical system with single objective lens

METHOD OF ETCHING MATERIALS WITH ELECTRON BEAM AND LASER ENERGY

PHOTOLITHOGRAPHY SYSTEMS WITH LOCAL EXPOSURE CORRECTION AND ASSOCIATED METHODS

Mask fabrication supporting method, mask blank providing method, and mask blank dealing system

Photomask

Method and apparatus for analyzing a group of photolithographic masks

Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof

Techniques for reducing degradation and/or modifying feature size of photomasks

Compensation of Process-Induced Displacement

Removing reflective layers from EUV mirrors

Method for minimizing sample damage during the ablation of a first biological material disposed on a second biological material using a focused ultrashort pulsed laser beam wherein the slope of fluence breakdown is a function of the pulse width

Method for correcting pattern critical dimension in photomask

Slit width adjusting device and microscope laser processing apparatus

Manufacturing method of semiconductor integrated circuit device

Process for smoothing surface of glass substrate

Photomask and method of fabricating the same

Method for correcting critical dimension of mask pattern

PHOTOMASK DEFECT CORRECTION METHOD, PHOTOMASK MANUFACTURING METHOD, PHASE SHIFT MASK MANUFACTURING METHOD, PHOTOMASK, PHASE SHIFT MASK, PHOTOMASK SET, AND PATTERN TRANSFER METHOD

Photolithography mask repair

Method for error reduction in lithography

Method of correcting defect in photomask

METHOD OF REPAIRING A POLYMER MASK

Method of manufacturing phase shift photomask

PHOTOMASK DEFECT CORRECTION DEVICE AND PHOTOMASK DEFECT CORRECTION METHOD

Method of correcting pattern critical dimension of photomask

Debris removal in high aspect structures

Masks for microlithography and methods of making and using such masks

PHOTOMASK DEFECT CORRECTION DEVICE AND PHOTOMASK DEFECT CORRECTION METHOD

EUV mask and method for repairing an EUV mask

Methods of forming and using reticles

METHOD OF FORMING PHOTOMASK OF SEMICONDUCTOR DEVICE

Method for fabricating photo mask

Method of fabricating a mask for a semiconductor device

Method of correcting a design pattern for an integrated circuit and an apparatus for performing the same

Sample holding mechanism and sample working/observing apparatus

Method of reducing radiation-induced damage in fused silica and articles having such reduction

Method for fabricating photomask in semiconductor device

METHOD FOR REPAIRING A DEFECT ON A PHOTOMASK

System and method for eliminating the structure and edge roughness produced during laser ablation of a material

Manufacturing method for photo mask

METHOD FOR MANUFACTURING A PHOTOMASK

Method for repairing bridge in photo mask

Method of Correcting Photomask Defect

METHOD TO AUTOMATICALLY REPAIR TRIM PHOTOMASK DESIGN RULE VIOLATIONS FOR ALTERNATING PHASE SHIFT LITHOGRAPHY

LASER REPAIR SYSTEM AND GLASS MASK USED FOR THE SAME

Scanning probe microscopy inspection and modification system

Method of Correcting Photomask Defect

Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks

Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof

Method for repairing photomask pattern defects

Defect repair method for photomask and defect-free photomask

Method of correcting opaque defect of chrome mask, in which atomic force microscope fine working apparatus has been used

Method and arrangement for repairing photolithography masks

Method of correcting critical dimension in photomask and photomask having corrected critical dimension using the method

Photomask registration errors of which have been corrected and method of correcting registration errors of photomask

Method of correcting opaque defect of photomask using atomic force microscope fine processing device

Method for repairing errors of patterns embodied in thin layers

Pattern forming method and phase shift mask manufacturing method

Mask fabrication supporting method, mask blank providing method, and mask blank dealing system

White defect repairing method and apparatus of photomask, manufacturing method of photomask, and manufacturing method of semiconductor device

Reclaim method for extreme ultraviolet lithography mask blank and associated products

Mask defect repairing method and semiconductor device manufacturing method

Scanning probe microscopy inspection and modification system

Method for adjusting dimensions of photomask features

Photoreduction method for metal complex ions

Methods for converting reticle configurations and methods for modifying reticles

Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device

Scanning probe device and processing method of scanning probe

Scanning probe device and processing method by scanning probe

Method and apparatus for repair of reflective photomasks

Single trench repair method with etched quartz for attenuated phase shifting mask

Systems and methods for modifying a reticle's optical properties

Method for repairing mask-blank defects using repair-zone compensation

Beam-induced etching

MASK REPAIR

Translation generation for a mask pattern

Method to correct EUVL mask substrate non-flatness

Arrangement for the production of photomasks

Method of correcting deviations of critical dimensions of patterns formed on a wafer in a EUVL process