REMOTE-PLASMA ELECTRON-INDUCED MASK REPAIR

METHOD OF REPAIRING PHOTOMASK

METHOD FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE MANUFACTURED ON A SUBSTRATE

PHOTOMASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND REPAIR METHOD THEREOF

RETICLE, RETICLE REPAIR METHOD, AND SUBSTRATE PROCESSING METHOD INCLUDING THE SAME

METHOD FOR PROCESSING A DEFECT OF A MICROLITHOGRAPHIC PHOTOMASK

METHOD FOR PROCESSING DC MARKS FOR REPAIRING LITHOGRAPHY MASKS

ML REFLECTIVITY MODIFICATION

APPARATUS AND METHODS FOR THREE DIMENSIONAL RETICLE DEFECT SMART REPAIR

PHOTOMASK REPAIRING METHOD AND SYSTEM THEREOF

METHODS AND APPARATUSES FOR PROCESSING A LITHOGRAPHIC OBJECT

METHOD AND APPARATUS FOR CALIBRATING AN OPERATION ON A PHOTOMASK

METHODS AND SYSTEMS FOR RETICLE ENHANCEMENT TECHNOLOGY OF A DESIGN PATTERN TO BE MANUFACTURED ON A SUBSTRATE

METHODS AND APPARATUS FOR RUTHENIUM OXIDE REDUCTION ON EXTREME ULTRAVIOLET PHOTOMASKS

METHOD AND APPARATUS FOR PARTICLE BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROLITHOGRAPHIC PHOTOMASK

REPAIR METHOD FOR PHOTOMASK DEFECTS

REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

METHOD OF MANUFACTURING PHOTOMASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

METHOD AND DEVICE FOR CORRECTING PLACEMENT ERROR OF PHOTOMASK

Photomask repairing method and system thereof

END POINT DETERMINATION BY MEANS OF CONTRAST GAS

METHOD AND APPARATUS FOR MASK REPAIR

Method for reticle enhancement technology of a design pattern to be manufactured on a substrate

METHOD AND APPARATUS FOR MASK REPAIR

METHOD AND APPARATUS FOR REPAIRING A DEFECT OF A LITHOGRAPHIC MASK

METHOD AND APPARATUS FOR PROCESSING A LITHOGRAPHIC MASK

METHOD AND APPARATUS FOR SETTING A SIDE WALL ANGLE OF A PATTERN ELEMENT OF A PHOTOLITHOGRAPHIC MASK

METHOD FOR PARTICLE BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROLITHOGRAPHIC PHOTOMASK

Photomask repairing method and system thereof

Method for reticle enhancement technology of a design pattern to be manufactured on a substrate

METHOD, DEVICE AND COMPUTER PROGRAM FOR REPAIRING A MASK DEFECT

APPARATUS AND METHODS FOR THREE DIMENSIONAL RETICLE DEFECT SMART REPAIR

DEVICES AND METHODS FOR VARIABLE ETCH DEPTHS

Correction of Blur Variation in a Multi-Beam Writer

Devices and methods for examining and/or processing an element for photolithography

Mask defect repair apparatus and mask defect repair method

Apparatus and method for repairing a photolithographic mask

Substrate with multilayer reflective film, reflective mask blank, reflective mask, and semiconductor device manufacturing method

Method and system for increasing accuracy of pattern positioning

Method and apparatus for determining positions of a plurality of pixels to be introduced in a substrate of a photolithographic mask

Mask blanks, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device

Dispositioning defects detected on extreme ultraviolet photomasks

Method and apparatus for ascertaining a repair shape for processing a defect of a photolithographic mask

Method and device for permanently repairing defects of absent material of a photolithographic mask

MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device

Mask blank, transfer mask, method of manufacturing transfer mask and method of manufacturing semiconductor device

Focused radiation beam induced deposition

Method and device for permanently repairing defects of absent material of a photolithographic mask

Image mask film scheme and method

Focused radiation beam induced deposition

Method for repairing mask defects

Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask, and method of manufacturing the integrated circuit device

Pattern formation method, control device, and semiconductor device manufacture method

Durable metal film deposition for mask repair

Optical proximity correction method and method of manufacturing extreme ultraviolet mask by using the optical proximity correction method

Photomasks, methods of fabricating the photomasks, and method of fabricating semiconductor devices by using the photomasks

Mask blank, transfer mask and method of manufacturing transfer mask

Image mask film scheme and method

Endpoint detection for photolithography mask repair

Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask, and method of manufacturing the integrated circuit device

Methods of reducing a registration error of a photomask, and related photomasks and methods of manufacturing an integrated circuit

Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks

Endpoint detection for photolithography mask repair

Lithography mask repairing process

Image mask film scheme and method

Mask blank, transfer mask and method of manufacturing transfer mask

Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks

Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device

Method for repairing mask for EUV exposure and mask for EUV exposure

Photomask defect correcting method and device

Method and apparatus for processing a substrate with a focused particle beam

SEM repair for sub-optimal features

Mask blank and transfer mask

SEM repair for sub-optimal features

Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device

Mask inspection apparatus and image generation method

Methods of correcting optical parameters in photomasks

Defect repair apparatus and method for EUV mask using a hydrogen ion beam

METHOD FOR PROCESSING AN OBJECT WITH MINIATURIZED STRUCTURES

Beam-induced etching

Multiple magnification optical system with single objective lens

METHOD OF ETCHING MATERIALS WITH ELECTRON BEAM AND LASER ENERGY

Photomask defect correcting method and device

Composite focused ion beam device, and processing observation method and processing method using the same

Determining a repairing form of a defect at or close to an edge of a substrate of a photo mask

Defect correction method for EUV mask

Photomask, and method and apparatus for producing the same

System and method for processing an object

Photolithography mask repair

Method of correcting defect in photomask

Photomask, and method and apparatus for producing the same

Working method by focused ion beam and focused ion beam working apparatus

Reflective mask blank, reflective mask and methods of producing the mask blank and the mask

Method of Correcting Photomask Defect

Method of Correcting Photomask Defect

Method of correcting opaque defect of chrome mask, in which atomic force microscope fine working apparatus has been used

Photomask, and method and apparatus for producing the same

Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface

Photomask correction method using composite charged particle beam, and device used in the correction method

Method for Producing Phase Shifter Masks

Focused ion beam processing method

Method for quartz bump defect repair with less substrate damage

Method for removing defect material of a lithography mask

Beam-induced etching

Method of depositing a material providing a specified attenuation and phase shift

Defect inspecting apparatus and defect inspection method

Method of correcting amplitude defect in multilayer film of EUVL mask

Method for producing phase shifter masks

Photomask defect correction method employing a combined device of a focused electron beam device and an atomic force microscope

Reflection type mask blank and reflection type mask and production methods for them

Method and apparatus for producing phase shifter masks

Method for characterizing mask defects using image reconstruction from X-ray diffraction patterns

Process for the locally restricted etching of a chromium layer

Method for high-resolution processing of thin layers using electron beams

Method for transmission increase at a position on a photo mask repaired with ionic radiation by means of thermal desorption

Method for repair of photomasks

Chelation cleaning process for repairing photomasks