ClassID:

177249

G03F2009/005 - CPC Classification

Classification description:

Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Recent Application in this class:
#1
20190155175
2019-05-23

Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method

#2
20190033710
2019-01-31

Imprint apparatus, imprint method, and article manufacturing method

#3
20180275535
2018-09-27

Detection apparatus, pattern forming apparatus, obtaining method, detection method, and article manufacturing method

#4
20170343905
2017-11-30

Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method

#5
20170239850
2017-08-24

Transfer method and apparatus and computer program product

#6
20170168403
2017-06-15

Environmental control of systems for photolithography process

#7
20160313657
2016-10-27

Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method

#8
20160231648
2016-08-11

Lithography apparatus, control method therefor, and method of manufacturing article

#9
20150212435
2015-07-30

Lithographic apparatus and device manufacturing method

#10
20150116686
2015-04-30

Edge-dominant alignment method in exposure scanner system

#11
20150042969
2015-02-12

Lithography apparatus, and article manufacturing method

#12
20140362357
2014-12-11

Exposure apparatus and method of manufacturing article

#13
20140268089
2014-09-18

Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method

#14
20120127479
2012-05-24

Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method

#15
20080088843
2008-04-17

Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method