G03F7/0022 - CPC Classification Index

ClassID:

176963 ⎘

G03F7/0022 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor Devices or apparatus

Sub-classes:

G03F7/0025 » {characterised by means for coating the developer} 20
G03F7/0027 » {characterised by pressure means} 19
G03F7/003 » {characterised by storage means for the light sensitive material, e.g. cartridges} 9
G03F7/0032 » {characterised by heat providing or glossing means} 3

Recent Application in this class:

20230070924

Imprint apparatus and article manufacturing method

20220357681

INFORMATION PROCESSING METHOD

20200371433

Complex patterning device and operation method thereof

20200292935

Imprint apparatus, imprinting method, and article manufacturing method

20200257193

Imprint apparatus and article manufacturing method

20200201171

Imprint apparatus and article manufacturing method

20200183269

Frame curing template and system and method of using the frame curing template

20200110333

Forming apparatus and method of manufacturing article

20140306375

Resin mold

20130112628

TREATMENT SOLUTION SUPPLY METHOD, NON-TRANSITORY COMPUTER STORAGE MEDIUM AND TREATMENT SOLUTION SUPPLY APPARATUS

20070107615

Exposure processing method of a planographic printing plate and apparatus for executing the same method

20060024488

Creating stencils using microencapsulated material

20060024487

Creating stencils using microencapsulated material

20050285927

Image forming device and an exposure member for the device

20050227179

Exposure processing method of a planographic printing plate and apparatus for executing the same method