Patents-Review.com
ClassID:

176970 ⎘

G03F7/004 - page 2 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor Photosensitive materials

Recent Application in this class:
#301
20140141374
2014-05-22

Negative-working lithographic printing plate precursors

 #302
20140141372
2014-05-22

Photosensitive polymer, resist composition including the photosensitive polymer and method of preparing resist pattern using the resist composition

 #303
20140134540
2014-05-15

Photosensitive composition, planographic printing plate precursor, polyurethane, and method for producing polyurethane

 #304
20140134539
2014-05-15

Alcohol compound and method for producing same, method for producing lactone compound, (meth)acrylate ester and method for producing same, polymer and method for producing same, and resist composition and method for producing substrate using same

 #305
20140127627
2014-05-08

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same

 #306
20140113233
2014-04-24

Photopolymerizable flexographic printing elements for printing with UV inks

 #307
20140113232
2014-04-24

Self-assemblable polymer and methods for use in lithography

 #308
20140099580
2014-04-10

Spatial and temporal control of brush formation on surfaces

 #309
20140099572
2014-04-10

Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern

 #310
20140080061
2014-03-20

Photoresists containing polymer-tethered nanoparticles

 #311
20140080057
2014-03-20

Composition, process of preparation and method of application and exposure for light imaging paper

 #312
20140065543
2014-03-06

Compound, photosensitive composition comprising the same and photosensitive material

 #313
20140065542
2014-03-06

Photoresist composition and method of forming a black matrix using the same

 #314
20140055825
2014-02-27

Photoengraving consumable material remote administration method

 #315
20140045119
2014-02-13

Photosensitive organic particles

 #316
20140045118
2014-02-13

Negative-working lithographic printing plate precursors with IR dyes

 #317
20140038102
2014-02-06

Photoresist compositions and methods of forming photolithographic patterns

 #318
20140030640
2014-01-30

Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks

 #319
20140017617
2014-01-16

Method of producing ammonium salt compound, method of producing compound, and compound, polymeric compound, acid generator, resist composition and method of forming resist pattern

 #320
20140011136
2014-01-09

Patterning process and resist composition

 #321
20140011134
2014-01-09

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM

 #322
20140004463
2014-01-02

Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound

 #323
20130344442
2013-12-26

Polymer, positive resist composition and patterning process

 #324
20130344440
2013-12-26

Lithographic printing plate precursors and processes for preparing lithographic printing plates

 #325
20130344439
2013-12-26

Photoresists comprising amide component

 #326
20130344438
2013-12-26

Photoacid generator, photoresist, coated substrate, and method of forming an electronic device

 #327
20130344436
2013-12-26

Resist composition and method of forming resist pattern

 #328
20130337387
2013-12-19

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

 #329
20130337385
2013-12-19

NEGATIVE PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION

 #330
20130337383
2013-12-19

Patterning process and resist composition

 #331
20130337382
2013-12-19

Compound, resist composition and method of forming resist pattern

 #332
20130337380
2013-12-19

Positive photosensitive material

 #333
20130323647
2013-12-05

Polymer, resist composition and patterning process

 #334
20130323645
2013-12-05

Resist composition, method of forming resist pattern, and compound

 #335
20130316287
2013-11-28

PHOTORESIST COMPOSITION

 #336
20130316285
2013-11-28

Resist composition, method of forming resist pattern, polymeric compound and method of producing polymeric compound

 #337
20130309614
2013-11-21

Resist composition, method of forming resist pattern, polymeric compound and compound

 #338
20130302736
2013-11-14

Resist composition, method for forming resist pattern, and compound

 #339
20130302726
2013-11-14

Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compound

 #340
20130298398
2013-11-14

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD

 #341
20130295382
2013-11-07

Polyester film and photosensitive resin structure

 #342
20130288179
2013-10-31

Radiation-sensitive resin composition and compound

 #343
20130287351
2013-10-31

Optical waveguide forming epoxy resin composition, optical waveguide forming curable film, light transmission flexible printed board, and production method for the flexible printed board

 #344
20130285182
2013-10-31

Photosensitive transparent composition for color filter of solid-state imaging device, and production method of color filter of solid-state imaging device, color filter of solid-state imaging device, and solid-state imaging device, each using the same

 #345
20130280658
2013-10-24

Radiation-sensitive composition, and compound

 #346
20130280657
2013-10-24

Photoresist composition and resist pattern-forming method

 #347
20130280655
2013-10-24

Aromatic hydrocarbon resin, underlayer film forming composition for lithography, and method for forming multilayer resist pattern

 #348
20130277627
2013-10-24

Photosensitive resin composition and applications of the same

 #349
20130273476
2013-10-17

Pattern-forming method, resist underlayer film, and composition for forming resist underlayer film

 #350
20130273473
2013-10-17

Direct drawing-type waterless lithographic printing original plate

 #351
20130266778
2013-10-10

Negative photosensitive resin composition, partition walls for optical device and production process thereof, process for producing optical device having the partition walls, and ink repellent solution

 #352
20130264099
2013-10-10

Photosensitive resin composition and use thereof

 #353
20130260319
2013-10-03

METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

 #354
20130260315
2013-10-03

RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN-FORMING METHOD, POLYMER, AND COMPOUND

 #355
20130260312
2013-10-03

Resist composition, method of forming resist pattern, and polymeric compound

 #356
20130256264
2013-10-03

Composition for forming resist underlayer film, and pattern-forming method

 #357
20130252181
2013-09-26

Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon

 #358
20130252180
2013-09-26

Resist composition, method of forming resist pattern and polymeric compound

 #359
20130252171
2013-09-26

Resist composition and method of forming resist pattern

 #360
20130251965
2013-09-26

Photo-patternable multifunctional polymer nanocomposite

 #361
20130244181
2013-09-19

Polymers, methods of use thereof, and methods of decomposition thereof

 #362
20130244180
2013-09-19

Photoresist overcoat compositions and methods of forming electronic devices

 #363
20130244178
2013-09-19

PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT

 #364
20130244176
2013-09-19

Resist composition and method of forming resist pattern

 #365
20130244174
2013-09-19

Positive-type photoresist composition

 #366
20130236832
2013-09-12

Acid generator, chemically amplified resist composition, and patterning process

 #367
20130236149
2013-09-12

Optical waveguide forming epoxy resin composition, curable film formed from the epoxy resin composition for formation of optical waveguide, and light transmission flexible printed board

 #368
20130235119
2013-09-12

Photosensitive negative resin composition

 #369
20130230803
2013-09-05

Resist pattern-forming method, and radiation-sensitive resin composition

 #370
20130230802
2013-09-05

ACRYLAMIDE DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION

 #371
20130228727
2013-09-05

Photosensitive resin composition and application of the same

 #372
20130224666
2013-08-29

Resist pattern-forming method, and radiation-sensitive resin composition

 #373
20130224661
2013-08-29

Pattern-forming method, and radiation-sensitive resin composition

 #374
20130224660
2013-08-29

Preparation of polymer, resulting polymer, resist composition, and patterning process

 #375
20130224659
2013-08-29

Polymer, making method, resist composition, and patterning process

 #376
20130224658
2013-08-29

Resist composition and method of forming resist pattern

 #377
20130224657
2013-08-29

Acid generator, chemically amplified resist composition, and patterning process

 #378
20130224656
2013-08-29

Resist composition and method of forming resist pattern

 #379
20130224655
2013-08-29

Positive-type photoresist composition

 #380
20130224654
2013-08-29

Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions

 #381
20130216951
2013-08-22

Radiation-sensitive resin composition, polymer and compound

 #382
20130216949
2013-08-22

Water mark defect prevention for immersion lithography

 #383
20130216948
2013-08-22

Radiation-sensitive resin composition and pattern-forming method

 #384
20130216947
2013-08-22

CHEMICAL COATING COMPOSITION FOR FORMING A LASER-MARKABLE MATERIAL AND A LASER-MARKABLE MATERIAL

 #385
20130209936
2013-08-15

Patterning process and resist composition

 #386
20130209935
2013-08-15

Monomer, polymer, resist composition, and patterning process

 #387
20130209934
2013-08-15

Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefrom

 #388
20130207238
2013-08-15

Block co-polymer photoresist

 #389
20130203000
2013-08-08

Radiation-sensitive resin composition, polymer, and resist pattern-forming method

 #390
20130202999
2013-08-08

Pattern forming method, chemical amplification resist composition and resist film

 #391
20130189624
2013-07-25

Photosensitive resin composition production kit, and use thereof

 #392
20130189623
2013-07-25

Positive-type photosensitive resin composition and black bank of an organic light-emitting device including same

 #393
20130189619
2013-07-25

Resist composition and method of forming resist pattern

 #394
20130189618
2013-07-25

Method of forming resist pattern

 #395
20130189609
2013-07-25

Thin films organized in nanodomains on the basis of copolymers having polysaccharide blocks for applications in nanotechnology

 #396
20130183621
2013-07-18

Pattern forming process and resist compostion

 #397
20130183015
2013-07-18

Optical waveguide and electronic device

 #398
20130177854
2013-07-11

Resist composition, method of forming resist pattern and novel compound

 #399
20130177849
2013-07-11

Epdxy resin composition having monocyclic aliphatic hydrocarbon ring

 #400
20130171569
2013-07-04

Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition

 #401
20130171561
2013-07-04

Additive for resist and resist composition comprising same

 #402
20130168829
2013-07-04

Phenolic resin composition, and methods for manufacturing cured relief pattern and semiconductor

 #403
20130164683
2013-06-27

Photosensitive resin composition for color filter and color filter using the same

 #404
20130164680
2013-06-27

PHOTORESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND PATTERN FORMING METHOD USING THEREOF

 #405
20130164679
2013-06-27

Inorganic filler and organic filler-containing curable resin composition, resist film coated printed wiring board, and method for producing the same

 #406
20130164675
2013-06-27

Acrylic ester derivative, high-molecular compound and photoresist composition

 #407
20130157201
2013-06-20

Resist composition, method of forming resist pattern, and polymeric compound

 #408
20130157194
2013-06-20

Patterning process, resist composition, polymer, and polymerizable ester compound

 #409
20130149493
2013-06-13

Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film

 #410
20130146346
2013-06-13

PHOTOSENSITIVE COMPOSITION FOR TRANSPARENT CONDUCTIVE FILM

 #411
20130143160
2013-06-06

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND

 #412
20130143159
2013-06-06

Resist composition for EUV or EB, and method of forming resist pattern

 #413
20130143157
2013-06-06

Homoadamantane derivatives, process for preparing same, and photoresist compositions

 #414
20130137049
2013-05-30

Method of forming polymeric compound, resist composition and method of forming resist pattern

 #415
20130137048
2013-05-30

Resist composition and method of forming resist pattern

 #416
20130137043
2013-05-30

Photosensitive element having reinforcing particles and method for preparing a printing form from the element

 #417
20130137042
2013-05-30

Photosensitive composition and photoresist

 #418
20130137040
2013-05-30

LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PRODUCING THEREOF

 #419
20130137038
2013-05-30

Photoresist composition

 #420
20130136900
2013-05-30

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE, EACH USING THE COMPOSITION

 #421
20130130183
2013-05-23

Negative pattern forming process

 #422
20130130178
2013-05-23

ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH

 #423
20130130177
2013-05-23

NEGATIVE PATTERN FORMING PROCESS AND NEGATIVE RESIST COMPOSITION

 #424
20130129988
2013-05-23

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

 #425
20130126472
2013-05-23

SUBSTRATE WITH ADHESION PROMOTING LAYER, METHOD FOR PRODUCING MOLD, AND METHOD FOR PRODUCING MASTER MOLD

 #426
20130122427
2013-05-16

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film

 #427
20130122426
2013-05-16

Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound

 #428
20130122423
2013-05-16

Compound, radiation-sensitive composition and resist pattern formation method

 #429
20130122419
2013-05-16

(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it

 #430
20130115557
2013-05-09

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern

 #431
20130115430
2013-05-09

Patterning of biomaterials using fluorinated materials and fluorinated solvents

 #432
20130108965
2013-05-02

RADIATION-SENSITIVE COMPOSITION

 #433
20130108964
2013-05-02

Chemically amplified positive resist composition for ArF immersion lithography and pattern forming process

 #434
20130108963
2013-05-02

PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PREPARING PHOTOSENSITIVE COMPOSITION

 #435
20130108962
2013-05-02

Radiation-sensitive composition

 #436
20130108958
2013-05-02

Production method of resist composition for lithography

 #437
20130108957
2013-05-02

Production method of resist composition for lithography

 #438
20130101940
2013-04-25

Chemical amplified photoresist composition

 #439
20130095429
2013-04-18

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME

 #440
20130095427
2013-04-18

RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN

 #441
20130095426
2013-04-18

Photosensitive polymides

 #442
20130084523
2013-04-04

Resist composition and method of forming resist pattern

 #443
20130078574
2013-03-28

Self-assemblable polymer and method for use in lithography

 #444
20130078573
2013-03-28

Negative-working lithographic printing plate precursors with IR dyes

 #445
20130078570
2013-03-28

Method of forming pattern and laminate

 #446
20130078432
2013-03-28

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for preparing electronic device, and electronic device

 #447
20130065182
2013-03-14

Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method

 #448
20130052587
2013-02-28

Patterning process and resist composition

 #449
20130035503
2013-02-07

Sulfonium compound, photoacid generator, and resist composition

 #450
20130029103
2013-01-31

Laser-engraveable compositions and flexographic printing precursors comprising organic porous particles

 #451
20130029102
2013-01-31

Laser-engraveable compositions and flexographic printing precursors

 #452
20130017491
2013-01-17

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

 #453
20130017490
2013-01-17

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

 #454
20130017489
2013-01-17

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

 #455
20130011795
2013-01-10

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

 #456
20130011794
2013-01-10

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

 #457
20130011793
2013-01-10

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

 #458
20130011792
2013-01-10

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

 #459
20130011790
2013-01-10

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

 #460
20130011789
2013-01-10

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

 #461
20130011788
2013-01-10

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

 #462
20130011787
2013-01-10

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

 #463
20130011786
2013-01-10

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

 #464
20120308930
2012-12-06

Patterning process and resist composition

 #465
20120301824
2012-11-29

Layered structure and photosensitive dry film to be used therefor

 #466
20120285929
2012-11-15

Pattern-forming method, and composition for forming resist underlayer film

 #467
20120269421
2012-10-25

System and method for lithography simulation

 #468
20120219891
2012-08-30

Resist composition, resist film therefrom and method of forming negative pattern using the composition

 #469
20120183903
2012-07-19

Patterning process and resist composition

 #470
20120178023
2012-07-12

(METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT

 #471
20120137958
2012-06-07

Dose responsive UV indicator

 #472
20120128938
2012-05-24

Etching method for surface structuring

 #473
20120115082
2012-05-10

Resin and photoresist composition comprising the same

 #474
20110281221
2011-11-17

Applications of semiconductor nano-sized particles for photolithography

 #475
20110262860
2011-10-27

NOVEL DUAL-TONE RESIST FORMULATIONS AND METHODS

 #476
20110252993
2011-10-20

Photopolymerizable flexographic printing elements for printing with UV inks

 #477
20110250545
2011-10-13

Composition, process of preparation and method of application and exposure for light imaging paper

 #478
20110244188
2011-10-06

Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation

 #479
20110242631
2011-10-06

Method and composition for producing optical elements having a gradient structure

 #480
20110236595
2011-09-29

Curable composition for imprints, patterning method and pattern

 #481
20110229661
2011-09-22

Positive photosensitive resin composition and cured film forming method using the same

 #482
20110217657
2011-09-08

METHODS TO FABRICATE A PHOTOACTIVE SUBSTRATE SUITABLE FOR MICROFABRICATION

 #483
20110217655
2011-09-08

Lithographic dry development using optical absorption

 #484
20110217654
2011-09-08

Latent acids and their use

 #485
20110196122
2011-08-11

(METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT

 #486
20110189610
2011-08-04

PHOTORESIST COMPOSITION

 #487
20110189609
2011-08-04

Actinic-ray—or radiation-sensitive resin composition and method of forming pattern using the composition

 #488
20110189608
2011-08-04

Photoresist composition for fabricating probe array, method of fabricating probe array using the photoresist composition, composition for photosensitive type developed bottom anti-reflective coating, fabricating method of patterns using the same and fabricating method of semiconductor device using the same

 #489
20110189607
2011-08-04

Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process

 #490
20110183273
2011-07-28

Water mark defect prevention for immersion lithography

 #491
20110183259
2011-07-28

Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same

 #492
20110136932
2011-06-09

Polymers, methods of use thereof, and methods of decomposition thereof

 #493
20110111340
2011-05-12

Siloxane polymer compositions

 #494
20110083113
2011-04-07

System and method for lithography simulation

 #495
20110033803
2011-02-10

Patterning process and resist composition

 #496
20100311613
2010-12-09

Patterned nanosubstrates made by directed self assembly of amphiphilic molecules

 #497
20100203294
2010-08-12

Polymers, Methods Of Use Thereof, And Methods Of Decomposition Thereof

 #498
20100104979
2010-04-29

Alpha-hydroxyketones

 #499
20100086874
2010-04-08

Photosensitive polymides

 #500
20090280433
2009-11-12

Radiation-sensitive composition and process for producing low-molecular compound for use therein

 #501
20090274977
2009-11-05

Compound and radiation-sensitive composition

 #502
20090239161
2009-09-24

APPLICATIONS OF SEMICONDUCTOR NANO-SIZED PARTICLES FOR PHOTOLITHOGRAPHY

 #503
20090236509
2009-09-24

Solid-state image sensor including a light-shielding color filter formed from a photosensitive resin composition, photosensitive resin composition and method of producing a light-shielding color filter

 #504
20090081594
2009-03-26

Applications of semiconductor nano-sized particles for photolithography

 #505
20090076291
2009-03-19

Photoactive adhesion promoter

 #506
20090075199
2009-03-19

Photosensitive element having reinforcing particles and method for preparing a printing form from the element

 #507
20090069458
2009-03-12

Polymers, Methods Of Use Thereof, And Methods Of Decomposition Thereof

 #508
20090023878
2009-01-22

(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it

 #509
20080318156
2008-12-25

Adamantane Based Molecular Glass Photoresists for Sub-200 Nm Lithography

 #510
20080032241
2008-02-07

Resist polymer, process for production thereof, resist composition, and process for production of substrated with patterns thereon

 #511
20080026321
2008-01-31

Positive-working photoresist composition for thick film formation

 #512
20070273053
2007-11-29

Composition for forming pattern and in-plane printing method using the same

 #513
20070262300
2007-11-15

Method of forming fine pattern using azobenzene-functionalized polymer and method of manufacturing nitride-based semiconductor light emitting device using the method of forming fine pattern

 #514
20070218403
2007-09-20

(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it

 #515
20070123736
2007-05-31

Calixarene compound, process for producing the same, intermediate therefor, and composition thereof

 #516
20070077516
2007-04-05

Water mark defect prevention for immersion lithography

 #517
20070031761
2007-02-08

Polymers, methods of use thereof, and methods of decomposition thereof

 #518
20070022402
2007-01-25

System and method for lithography simulation

 #519
20060051706
2006-03-09

Radiation sensitive compositions and methods

 #520
20050166174
2005-07-28

System and method for lithography simulation

 #521
20050122500
2005-06-09

System and method for lithography simulation

 #522
20050120327
2005-06-02

System and method for lithography simulation

 #523
20050097500
2005-05-05

System and method for lithography simulation

 #524
20050091633
2005-04-28

System and method for lithography simulation

 #525
20050076322
2005-04-07

System and method for lithography simulation

 #526
20050014096
2005-01-20

Photoactive adhesion promoter

 #527
14845450
2017-05-09

Bis(azobenzene) diamines and photomechanical polymers made therefrom