176970 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor Photosensitive materials
Sub-classes:PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#2MONOMER AND POLYMER COMPOSITIONS FOR REVERSIBLE OVERCOAT WAFER PATTERNING
#3CARBOXYLIC ACID GENERATING AGENT, CARBOXYLATE, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
#4Photosensitive Resin Composition, Method Of Manufacturing Pattern Cured Film, Cured Film, Interlayer Insulating Film, Cover Coat Layer, Surface Protective Film, And Electronic Component
#5PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
#6METHOD OF MANUFACTURING RESIST
#7METHOD FOR PRODUCING POLYMER SOLUTION
#8RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN
#9PHOTOSENSITIVE COMPOSITION CONTAINING PFAS-FREE POLYCYCLOOLEFINIC TERPOLYMERS AND SEMICONDUCTOR DEVICE MADE THEREOF
#10CURABLE COMPOSITION, CURED FILM MANUFACTURED USING COMPOSITION, COLOR FILTER INCLUDING CURED FILM, AND DISPLAY DEVICE INCLUDING COLOR FILTER
#11METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
#12MULTI-PITCH TOLERABLE BLOCK COPOLYMERS WITH ENHANCED KINETICS FOR DIRECTED SELF-ASSEMBLY APPLICATIONS
#13PHOTOSENSITIVE SURFACE TREATMENT AGENT, LAMINATE, TRANSISTOR, METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING TRANSISTOR
#14CORE-SHELL DYE, NEAR-INFRARED ABSORBING COMPOSITION INCLUDING THE SAME, AND NEAR-INFRARED ABSORBING FILM
#15SOLVENT COMPATIBLE NOZZLE PLATE
#16PHOTOCURABLE COMPOSITION, LIGHT CONDENSING LAYER, AND DISPLAY DEVICE
#17RESIN COMPOSITION FOR SOLDER RESIST, SOLDER RESIST FILM, AND CIRCUIT BOARD
#18Photosensitive resin composition
#19Method of manufacturing a semiconductor device
#20SEMICONDUCTOR ASSEMBLIES WITH SYSTEM AND METHOD FOR SMOOTHING SURFACES OF 3D STRUCTURES
#21PHOTOSENSITIVE POLYMER, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE
#22FLUORINE-CONTAINING RESIN COMPOSITION AND PREPARATION METHOD THEREOF, AND PREPARATION METHOD OF CURED FILM CONTAINING SAME
#23REFLECTIVE MASK BLANK AND REFLECTIVE MASK
#24CROSSLINKING LIGAND, METHOD FOR PATTERNING NANOPARTICLE LAYER, QUANTUM DOT LIGHT-EMITTING DEVICE, AND DISPLAY DEVICE
#25SHADOW WALLS FOR USE IN FABRICATING DEVICES
#26COLORED RESIN COMPOSITION
#27RESIST MATERIAL AND PATTERNING PROCESS
#28PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE
#29CURED COATING FILM
#30PHOTORESIST RESIN, METHOD FOR PRODUCING PHOTORESIST RESIN, PHOTORESIST RESIN COMPOSITION, AND METHOD FOR FORMING PATTERN
#31Solvent compatible nozzle plate
#32Photosensitive Resin Composition, Method Of Manufacturing Pattern Cured Film, Cured Film, Interlayer Insulating Film, Cover Coat Layer, Surface Protective Film, And Electronic Component
#33HIGHLY SEQUENCED COPOLYMER FOR DUAL-TONE PHOTORESISTS, RESIST COMPOSITION AND PATTERNING PROCESS THEREOF
#34MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER
#35Thermal acid generator and resist composition using same
#36PHOTOSENSITIVE COLORING COMPOSITION, CURED FILM, COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE
#37Low temperature cure photoimageable dielectric compositions and methods of their use
#38PATTERN-FORMING METHOD AND COMPOSITION
#39Cross-linked polymer for resist
#40On-press development type lithographic printing plate precursor, method for preparing lithographic printing plate, and lithographic printing method
#41Photosensitive resin composition, cured film, inductor and antenna
#42Triphenylsulfonium salt compound, and uses thereof
#43PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#44Method of manufacturing a semiconductor device
#45Photosensitive compositions, preparation methods thereof, and quantum dot polymer composite prepared therefrom
#46Photodynamic compositions, methods of making, and uses thereof
#47High dynamic range two-stage photopolymers
#48LITHOGRAPHIC PRINTING ORIGINAL PLATE, METHOD FOR MANUFACTURING LITHOGRAPHIC PRINTING PLATE, AND METHOD FOR MANUFACTURING PRINTS USING SAME
#49Mask and method for manufacturing the same, lithography method, display panel, display device and exposure device
#50Composition for forming silicon-containing resist underlayer film and patterning process
#51Apparatus for forming a photoresist layer, method for forming a masking layer, and method for forming a photoresist layer
#52STRUCTURE INCLUDING A PHOTORESIST UNDERLAYER AND METHOD OF FORMING SAME
#53Bifunctional (meth)acrylate compound and polymer
#54PHOTOSENSITIVE RESIN COMPOSITION
#55Molecular resist composition and patterning process
#56Lithographic printing plate precursor, method of producing same, lithographic printing plate precursor laminate, and lithographic printing method
#57Compound, resin, resist composition and method for producing resist pattern
#58Thin film circuit substrate and manufacturing method thereof
#59Lithographic printing plate precursor, method of producing same, lithographic printing plate precursor laminate, and lithographic printing method
#60Lithographic printing plate precursor, method of producing same, lithographic printing plate precursor laminate, plate-making method for lithographic printing plate, and lithographic printing method
#61Image exposure device and image exposure method
#62Lithographic printing plate precursor, method of producing lithographic printing plate, and lithographic printing method
#63MANUFACTURING METHOD OF COLOR FILTER FILM SUBSTRATE
#64Iodine-containing polymers for chemically amplified resist compositions
#65Thermal acid generator and resist composition using same
#66Light- or heat-curing method and curable resin composition
#67Photoresist composition and method of forming photoresist pattern
#68Photolithography method, method of preparing flexible substrate and photoresist drying device
#69Photosensitive resin composition, solder resist film using said photosensitive resin composition, flexible printed circuit and image display device
#70Display panel and display apparatus
#71CHEMICAL LIQUID MANUFACTURING METHOD AND CHEMICAL LIQUID MANUFACTURING DEVICE
#72Photosensitive coloring composition, cured film, color filter, solid-state imaging element, and image display device
#73Radiation-sensitive composition, pattern-forming method, and metal-containing resin and production method thereof
#74Photosensitive composition, cured film, optical filter, solid image pickup element, image display device, and infrared sensor
#75Resin composition, resin film, method of manufacturing resin film, optical filter, solid-state imaging element, image display device, and infrared sensor
#76Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generator
#77Resin, resist composition and method for producing resist pattern
#78Transfer film, electrode protective film, laminate, capacitive input device, and manufacturing method of touch panel
#79Radiation-sensitive resin composition, onium salt compound and method for forming resist pattern
#80Spontaneous-emission type photosensitive resin composition, color filter manufactured using same, and image display apparatus
#81Photosensitive resin composition, method of producing electrically conductive pattern, substrate, touch panel, and display
#82Lithographic printing plate precursor, method of producing same, and printing method using same
#83Metal-containing onium salt compound, photodegradable base, resist composition, and method for manufacturing device using said resist composition
#84Photosensitive compound, photoacid generator and resist composition containing the photosensitive compound, and method for manufacturing device using the resist composition
#85Resin composition
#86Photosensitive composition, colored pattern and method for producing same
#87Lithographic printing plate precursor, method of producing same, lithographic printing plate precursor laminate, plate-making method for lithographic printing plate, and lithographic printing method
#88Infrared LED
#89Black pigment, method for producing same, pigment dispersion liquid, photosensitive composition and cured product of said photosensitive composition
#90Cationic photoinitiator and preparation method and use thereof
#91Lithographic printing plate precursor, method of producing same, lithographic printing plate precursor laminate, and lithographic printing method
#92Positive type lithographic printing plate precursor, method of producing same, and method of preparing lithographic printing plate
#93Photosensitive adhesive composition
#94Curable composition, manufacturing method of curable composition, cured film, manufacturing method of cured film, color filter, solid-state imaging element, solid-state imaging device, and infrared sensor
#95Color developing composition, lithographic printing plate precursor, method for producing lithographic printing plate, and compound
#96Negative photoresist composition for KRF laser, having high resolution and high aspect ratio
#97Exposure apparatus and method for exposure of transparent substrate
#98Antireflective compositions with thermal acid generators
#99Composition for forming fine pattern and method for forming fine pattern using the same
#100Photocuring method, compound and composition used therein
#101Positive-type photosensitive resin composition
#102DISPLAY PANEL
#103Iodine-containing polymers for chemically amplified resist compositions
#104Resist patterning method and resist material
#105Photosensitive Material Sets
#106Method for producing film
#107Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin
#108Liquid solder resist composition and covered-printed wiring board
#109Negative photoresist composition for KrF laser for forming semiconductor patterns
#110Sensitizer for UV-LED photocuring and preparation method and use thereof
#111Chemically amplified positive resist composition and resist pattern forming process
#112Post-baking device and post-baking method for forming black matrix
#113LITHOGRAPHIC PRINTING PLATE PRECURSOR AND USE
#114TRANSFER FILM, ELECTRODE PROTECTIVE FILM FOR ELECTROSTATIC CAPACITANCE-TYPE INPUT DEVICE, LAMINATE, METHOD FOR MANUFACTURING LAMINATE, AND ELECTROSTATIC CAPACITANCE-TYPE INPUT DEVICE
#115Method for preparing flexographic printing plates
#116Liquid solder resist composition and printed wiring board
#117Resist base material, resist composition and method for forming resist pattern
#118Compound, resist composition, and method for forming resist pattern using it
#119Resist composition, method for forming resist pattern, and polyphenol compound used therein
#120Coloring composition, film, color filter, pattern forming method, method for manufacturing color filter, solid image pickup element, and infrared sensor
#121Photosensitive resin composition, photosensitive resin composition film, cured product, insulating film and multilayer wiring board
#122Photosensitive composition and color converting film
#123Photosensitive resin composition, method for manufacturing cured resin film, and semiconductor device
#124Sulfonic acid derivative, photoacid generator using same, resist composition, and device manufacturing method
#125Triazine-ring-containing polymer and composition containing same
#126Nanoimprint lithography adhesion layer
#127Lithographic printing plate precursor, method of producing same, and printing method using same
#128Flexo printing plate
#129Method of preparing article with polyaniline coating
#130Green pigment composition for color filters, and color filter
#131Solder resist composition and covered printed wiring board
#132Coloring composition, method for producing coloring composition, color filter, pattern forming method, method for manufacturing color filter, solid-state imaging device, and image display device
#133Method of improving light stability of flexographic printing plates featuring flat top dots
#134Composition, laminate, method of manufacturing laminate, transistor, and method of manufacturing transistor
#135Resist underlayer film-forming composition including a compound having an amino group protected with a tert-butoxycarbonyl group
#136Imidazole compound, metal surface treatment liquid, metal surface treatment method, and laminate production method
#137Positive resist composition and pattern forming process
#138Sulfonate compound, photoacid generator, and resin composition for photolithography
#139Photosensitive colored ink composition for bezel, bezel pattern formed by using same, and display substrate containing same
#140NEGATIVELY-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD
#141Planographic printing plate precursor, method of producing same, and printing method using same
#142Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
#143Photosensitive resin composition, planographic printing plate precursor, method for producing planographic printing plate, and polymer compound
#144Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device
#145Oxime ester compound and photopolymerization initiator containing said compound
#146Resist material, resist composition and method for forming resist pattern
#147Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device
#148Photoresist having sensitizer bonded to acid generator
#149Developer for lithography
#150Imprint apparatus, imprinting method, and manufacturing method of article
#151Photosensitive compositions, preparation methods thereof, and quantum dot polymer composite prepared therefrom
#152Photosensitive element, laminate, permanent mask resist, method for producing same, and method for producing semiconductor package
#153Photosensitive resin composition, method of manufacturing conductive pattern, substrate, element, and touch panel
#154Composites transmissive to visual and infrared radiation and compositions and methods for making the composites
#155Composite white pigment, photoresist material comprising the pigment and use thereof
#156Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound
#157Nitro-containing bisoxime ester photoinitiator and preparation method and use thereof
#158Diazo-resin, photoresist composition and method of preparing same
#159Method for processing photoresist materials and structures
#160Resin composition, resist film using same, resist-coated mask blank, resist pattern forming method, and photo mask
#161Polymers of maleimide and cycloolefinic monomers as permanent dielectric materials
#162Composition and a method for manufacturing a component
#163Method and device for curing at least in part a photoresist applied to a substrate
#164Chemically amplified positive-type photosensitive resin composition
#165Lithographic printing plate precursor
#166Metal azo pigments
#167Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compound
#168Spin-on layer for directed self assembly with tunable neutrality
#169Negative resist composition, method of forming resist pattern and complex
#170Lithographic resist with floating protectant
#171Functional material and preparation method thereof, resin composition, film, and display device
#172Composition and method for lithography patterning
#173Curable composition, cured coating film using same, and printed wiring board
#174Silicone skeleton-containing polymer compound, chemically amplified negative resist composition, photo-curable dry film and method for producing same, patterning process, layered product, substrate, and semiconductor apparatus
#175Developer and patterning process using the same
#176Photoresist pattern trimming compositions and methods
#177Method for controlling the synthesis of a block copolymer containing at least one nonpolar block and at least one polar block and use of said block copolymer in applications of nanolithography by direct self-assembly
#178Compound containing phenolic hydroxy group, photosensitive composition, composition for resists, resist coating film, curable composition, composition for resist underlayer films, and resist underlayer film
#179Method for fabricating display device and display device
#180Polyether compound, method for preparing same and photoresist composition
#181Polymer, organic layer composition, organic layer, and method of forming patterns
#182Pattern forming process and shrink agent
#183Photoresist overcoat compositions and methods of forming electronic devices
#184Polymerizable oligomer and photoresist composition comprising the same
#185Compound, resin, resist composition and method for producing resist pattern
#186Photoresist compositions and methods of forming photolithographic patterns
#187Photoacid generator bound to floating additive polymer
#188Pattern formation method
#189Coloring composition, colored cured film, color filter, solid-state image sensor and image display device
#190Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device
#191Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
#192Photoresist composition and method of manufacturing substrate for display device by using the same
#193Photo-sensitive resin composition, cured film, method for forming a pixel, solid state image sensor, color filter and ultraviolet absorber
#194Photoresist monomer, photoresist and method for the preparation thereof, color filter
#195Photosensitive resin composition, dry film using same, printed wiring board, and method for producing printed wiring board
#196Alkali-soluble resin and method for preparing the same
#197Acid generators and photoresists comprising same
#198Cyclodextrin derivatives and method for preparing the same, photoresist composition and display device
#199PHOTOSENSITIVE RESIN COMPOSITION FOR BLACK MATRIX AND APPLICATION THEREOF
#200Resist overlayer film forming composition for lithography and method for producing semiconductor device using the same
#201Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, compound, and method for producing compound
#202Molecular glass of spirofluorene derivative, preparation method thereof and use thereof in photo-etching
#203Liquid crystal composition
#204Colored photo-sensitive composition, color filter, and method for manufacturing color filter
#205Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, pattern forming method, process for manufacturing electronic device and electronic device
#206Process for the laser treatment of coatings
#207COMPOSITION, LAMINATE, METHOD OF MANUFACTURING LAMINATE, TRANSISTOR, AND METHOD OF MANUFACTURING TRANSISTOR
#208Photosensitive resin composition and photosensitive film using same
#209Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition
#210Aromatic imide compound and method for producing same
#211Photosensitive resin composition, resist laminate, and articles obtained by curing same (5)
#212PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD
#213Directed self-assembly pattern formation methods and compositions
#214Resist composition
#215Composition for pattern formation, and pattern-forming method
#216Chemically amplified positive-type photosensitive resin composition
#217Method of forming pattern and laminate
#218Polymer, photosensitive resin composition and electronic device
#219REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES
#220Polyimide compositions
#221Positive photosensitive resin composition and cured film forming method using the same
#222Photocurable composition and method of manufacturing film using the composition
#223Photo-curable and thermo-curable resin composition and dry film solder resist
#224Hard mask composition and method for forming pattern using same
#225Pigment dispersing agent, pigment dispersion solution, color photoresist and manufacture and use thereof
#226Dispersant, dispersion of color pigment, and photosensitive resist
#227Layered structure and photosensitive dry film to be used therefor
#228Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device
#229Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device
#230Lithographic printing plate precusor
#231Photoresist overcoat compositions and methods of forming electronic devices
#232Photosensitive oligomer for photosensitive resist, method for preparing the same, and negative photosensitive resist resin composition
#233Colored photosensitive resin composition and colored filter and display device containing such composition
#234Superoleophobic surfaces and methods of making same
#235Alkaline soluble resin, process for preparing same, and photoresist composition containing same
#236Resist composition and method of forming resist pattern
#237METHOD FOR PRODUCING POLYMER COMPOUND, POLYMER COMPOUND, AND PHOTORESIST RESIN COMPOSITION
#238Resin, photoresist composition, and method for producing photoresist pattern
#239Forming patterns using crosslinkable reactive polymers
#240Method of patterning
#241Developing solution composition for lithographic printing plate precursor and method for producing lithographic printing plate
#242Resin composition and pattern forming method using the same
#243METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD
#244METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD
#245PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
#246Colored curable composition and color filter
#247Copolymer for lithography and method of manufacturing the same, resist composition, and method of manufacturing substrate
#248Mask forming imageable material and use
#249Sulfonium salt, chemically amplified resist composition, and pattern forming process
#250Sulfonic acid ester containing polymers for organic solvent based dual-tone photoresists
#251Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device
#252Masking layer formed by applying developable photosensitive resin compositions on panel structure
#253Lithographic printing plate precursors and processes for preparing lithographic printing plates
#254Photosensitive conductive paste
#255PHOTO-SENSITIVE RESIN COMPOSITION FOR BEZEL OF TOUCH SCREEN MODULE AND BEZEL FOR TOUCH SCREEN MODULE USING THE SAME
#256Curable composition for imprints, cured product and method for manufacturing a cured product
#257Pigment dispersion and yellow resist composition for color filter and ink composition containing the pigment dispersion
#258Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the composition
#259Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition
#260Donor film and thermal imaging method using the same
#261Pattern-forming method, and composition for forming resist underlayer film
#262Photoresist treatment method by low bombardment plasma
#263METHODS AND SYSTEMS FOR REDUCING BUBBLES IN LAYERS OF PHOTORESIST MATERIAL
#264Composition for forming pattern and in-plane printing method using the same
#265LITHOGRAPHIC PRINTING PLATE PRECURSORS AND PROCESSES FOR PREPARING LITHOGRAPHIC PRINTING PLATES
#266Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method and resist film using the composition, and electronic device manufacturing method and electronic device using these
#267Novel Dual-Tone Resist Formulations And Methods
#268Composition comprising a polymeric thermal acid generator and processes thereof
#269Method for producing resist composition
#270Mask forming imageable material and use
#271Cyclic compound, method for producing same, composition, and method for forming resist pattern
#272Photosensitive negative resin composition
#273Photosensitive resin composition and photosensitive paste including the same
#274Resist pattern-forming method, and radiation-sensitive resin composition
#275Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same
#276Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the composition
#277Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method
#278Photoresist system and method
#279Pattern-forming method
#280Photo-resist with floating acid
#281Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, mask blank and method of forming pattern
#282Photosensitive composition, cured film and production process thereof, and electronic part
#283Copolymers for near-infrared radiation-sensitive coating compositions for positive-working thermal lithographic printing plates
#284Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation
#285Polymerizable fluoromonomer, fluoropolymer, resist material, and method of pattern formation
#286METHOD FOR PROCESSING SAMPLE AND SAMPLE PROCESSING APPARATUS
#287Conductive composition, conductive member and production method thereof, touch panel, and solar cell
#288Patterning process, resist composition, polymer, and monomer
#289Ink composition usable in solar battery manufacturing process, and method of forming pattern using the same
#290Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device
#291Dendritic compounds, photoresist compositions and methods of making electronic devices
#292Acid generators and photoresists comprising same
#293Resist composition and patterning process
#294Curable coatings for photoimaging
#295Vinyl ether group-containing copolymer, preparation process and use thereof
#296Coloring matter compound, ink, resist composition for color filter, and heat-sensitive transfer recording sheet
#297Coloring matter compound, ink, resist composition for color filter, and heat-sensitive transfer recording sheet
#298Polymerization method of high-molecular weight compound, resist composition, and method for forming resist pattern
#299Self-assembled structures, method of manufacture thereof and articles comprising the same
#300Self-assembled structures, method of manufacture thereof and articles comprising the same