176974 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists involving an interaction between the metallic and non-metallic component, e.g. photodope systems
PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES USING THE SAME
#2METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
#3DOSE REDUCTION BOTTOM ANTI-REFLECTIVE COATING FOR METALLIC PHOTORESIST
#4PHOTORESIST COMPOSITION AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE
#5SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING THE COMPOSITION
#6ADDITIVES FOR METALLIC PHOTORESIST
#7SELECTIVE PASSIVATION OF PHOTORESISTS
#8TREATMENTS FOR METAL OXIDE PHOTORESIST FILMS
#9PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME
#10PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME
#11ORGANOTIN ALKOXIDES AS PRECURSORS FOR PATTERNING COMPOSITIONS WITH FLUORINE SUBSTITUENTS AND CARBON-CARBON DOUBLE BONDS
#12ORGANOTIN CLUSTER PHOTORESISTS AND STABILIZATION METHODS
#13DOSE REDUCTION BOTTOM ANTI-REFLECTIVE COATING FOR METALLIC PHOTORESIST
#14METHODS AND MATERIALS FOR METALLIC PHOTORESIST
#15PHOTORESIST AND FORMATION METHOD THEREOF
#16RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
#17SWITCHABLE SUBSTRATE FOR EXTREME ULTRAVIOLET OR E-BEAM METALLIC RESIST
#18PHOTOSENSITIVE COMPOSITION
#19SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERS USING THE COMPOSITION
#20ORGANOMETALLIC TIN CLUSTERS AS EUV PHOTORESIST
#21ADDITIVES FOR METAL OXIDE PHOTORESISTS, POSITIVE TONE DEVELOPMENT WITH ADDITIVES, AND DOUBLE BAKE DOUBLE DEVELOP PROCESSING
#22ZINC-BASED METAL ORGANIC NANOPARTICLE, PREPARATION METHOD THEREFOR, AND PHOTORESIST
#23SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#24METHOD FOR NANOMATERIAL DISTRIBUTION WITHIN A MATRIX MATERIAL
#25PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
#26Sensitivity Enhanced Photoresists
#27SECONDARY ELECTRON GENERATING COMPOSITION
#28BLANK MASK AND PHOTOMASK USING THE SAME
#29Solution, solution storage body, actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and manufacturing method of semiconductor device
#30Sample support
#31METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#32METALORGANIC FILMS FOR EXTREME ULTRAVIOLET PATTERNING
#33METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
#34PHOTOCURABLE COMPOSITION AND PATTERN FORMING METHOD
#35PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME
#36VAPOR DEPOSITION OF CARBON-DOPED METAL OXIDES FOR USE AS PHOTORESISTS
#37Lithographic printing plate precursor and method of use
#38Quantum dot-polymer composite film, method of manufacturing the same, and device including the same
#39PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
#40TRANSFER FILM, MANUFACTURING METHOD OF CURED FILM, MANUFACTURING METHOD OF LAMINATE, AND MANUFACTURING METHOD OF TOUCH PANEL
#41Photoresist composition and method of forming photoresist pattern
#42RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION AND PRODUCTION METHOD THEREOF
#43Secondary electron generating composition
#44Zirconium nitride powder and production method therefor
#45Photoresist composition and method of forming photoresist pattern
#46Photoresist composition and method of forming photoresist pattern
#47PHOTORESIST RESIN COMPOSITION, FILM PREPARED THEREFROM, COLOR CONVERSION ELEMENT INCLUDING THE FILM, AND ELECTRONIC DEVICE INCLUDING THE COLOR CONVERSION ELEMENT
#48Solution, solution storage body, actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and manufacturing method of semiconductor device
#49RESIST COMPOSITIONS
#50RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD
#51Development unit, substrate processing apparatus, development method and substrate processing method
#52ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, METHOD FOR PURIFYING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
#53Actinic ray-sensitive or radiation-sensitive composition, method for producing actinic ray-sensitive or radiation-sensitive composition, pattern forming method, and method for manufacturing electronic device
#54Photosensitive compositions, quantum dot polymer composite produced therefrom, and layered structures and electronic device including the same
#55Photosensitive compositions, preparation methods thereof, and quantum dot polymer composite pattern produced therefrom
#56Quantum dots, a composition or composite including the same, and en electronic device including the same
#57COMPOSITIONS AND METHODS FOR FORMING A PIXEL-DEFINING LAYER
#58ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION FILM USING THE COMPOSITION
#59Quantum dot-polymer composite film, method of manufacturing the same, and device including the same
#60Pre-patterned lithography templates, processes based on radiation patterning using the templates and processes to form the templates
#61Pattern-forming method
#62Secondary electron generating composition
#63Photosensitive composition, method for forming pattern, and method for manufacturing semiconductor device