CHEMICAL-RESISTANT PROTECTIVE FILM

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM, PATTERNED CURED FILM AND SEMICONDUCTOR ELEMENT

FUNCTIONAL PHOTORESIST AND METHOD OF PATTERNING NANOPARTICLE THIN FILM USING THE SAME

PAG-FREE POSITIVE CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHODS OF USING THE SAME

Transparent electrode, process for producing transparent electrode, and photoelectric conversion device comprising transparent electrode

POSITIVE WORKING PHOTOSENSITIVE MATERIAL

Novolak/DNQ based, chemically amplified photoresist

Photosensitive resin composition, resin sheet, cured film, organic EL display device, semiconductor electronic component, semiconductor device, and method for producing organic EL display device

Resist composition and method for producing resist pattern, and method for producing plated molded article

METHOD OF MANUFACTURING HIGH-DEFINED PATTERN AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE SAME

Photoresist composition, method for preparing the same, and patterning method

Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method

Resin composition, method for producing heat-resistant resin film, and display device

Resist material

Polyimide resin and resin composition

Novolak resins and resist materials

Resin composition

STEPPED SUBSTRATE COATING COMPOSITION INCLUDING COMPOUND HAVING PHOTOCROSSLINKING GROUP DUE TO UNSATURATED BOND BETWEEN CARBON ATOMS

NOVOLAC-TYPE PHENOLIC HYDROXY GROUP-CONTAINING RESIN, AND RESIST FILM

Negative-type photosensitive resin composition, cured film, display device provided with cured film, and production method therefor

Positive working photosensitive material

PHOTO-IMAGEABLE THIN FILMS WITH HIGH DIELECTRIC CONSTANTS

PHOTO-IMAGEABLE THIN FILMS WITH HIGH DIELECTRIC STRENGTH

Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method

Patterned bank structures on substrates and formation method

Resin containing phenolic hydroxyl groups, and resist film

Positive resist film laminate and pattern forming process

Positive photosensitive resin composition

Phenolic-hydroxyl-group-containing novolac resin and resist film

PHOTOSENSITIVE RESIN COMPOSITION

Photosensitive resin composition, method for manufacturing cured resin film, and semiconductor device

PHOTOSENSITIVE COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND RESIST UNDERLAYER FILM

Novolac phenol resin, manufacturing method therefor, photosensitive composition, resist material and coating film

Resin composition including novel polymer and organic film using the same

Compound containing phenolic hydroxy group, photosensitive composition, composition for resists, resist coating film, curable composition, composition for resist underlayer films, and resist underlayer film

Photoresist composition to reduce photoresist pattern collapse

Positive photosensitive resin composition, photo-curable dry film and method for producing same, layered product, patterning process, and substrate

Photosensitive resin material and resin film

Photosensitive resin composition and photosensitive film using same

Photoresist composition, method of forming a pattern and method of manufacturing a thin film transistor substrate

Positive photosensitive resin composition and pattern forming method

Modified novolak phenolic resin, making method, and resist composition

Positive photosensitive resin composition and method for forming pattern by using the same

Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component

Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition

Photosensitive resin composition, method for producing hardened relief pattern, semiconductor device and display device

Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component

Method for manufacturing micro-structure

Photoresist composition and method of manufacturing display device using same

Photosensitive composition, cured film and production process thereof, and electronic part

Positive photosensitive resin composition and method for forming patterns by using the same

Polymeric materials and methods for making the polymeric materials

Positive photosensitive resin composition and uses thereof

Positive photosensitive resin composition, and display device and organic light emitting device using the same

Phenolic resin composition, and methods for manufacturing cured relief pattern and semiconductor

Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film

Modified novolak phenolic resin, making method, and resist composition

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERNS BY USING THE SAME

PHOTOSENSITIVE COMPOSITION, CURED FILM AND ELECTRONIC PART

Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERNS BY USING THE SAME

Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film

Ortho-nitrobenzyl ester compound and positive type photosensitive resin composition including the same

Positive lift-off resist composition and patterning process

PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME

PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME

Photosensitive resin composition

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION

Method for manufacturing micro-structure

Positive photosensitive resin composition for slit coating and using said composition for forming a pattern

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME

Photoresist composition and method of forming pattern by using the same

PHOTORESIST COMPOSITION, METHOD OF FORMING PATTERN BY USING THE PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING THIN-FILM TRANSISTOR SUBSTRATE

NOVEL DUAL-TONE RESIST FORMULATIONS AND METHODS

Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device

Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device

RADIATION-SENSITIVE RESIN COMPOSITION

Structure and method for creating surface texture of compliant coatings on piezo ink jet imaging drums

Photoresist composition and patterning method thereof

Photoresist composition and method of fabricating thin film transistor substrate

Positive-type photosensitive resin composition

Diazonaphthoquinonesulfonic acid bisphenol derivative useful in photo lithographic sub micron patterning and a process for preparation thereof

POSITIVE PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME

PHOTORESIST RESIN, AND METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING DISPLAY PANEL USING THE SAME

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME

Photosensitive resin composition and photosensitive element

Imageable elements with low pH developer solubility

Organic Film Composition and Method for Forming Resist Pattern

Photoresists comprising novolak resin blends

Positive Dry Film Photoresist and Composition For Preparing the Same

Positive type dry film photoresist

Photoresist composition and method of manufacturing a thin-film transistor substrate using the same

TWO-LAYER FILM AND METHOD OF FORMING PATTERN WITH THE SAME

Positive photosensitive insulating resin composition and cured product thereof

Near-field exposure photoresist and fine pattern forming method using the same

Positive photosensitive insulating resin composition, cured product thereof, and electronic component

Resin for under-layer material, under-layer material, laminate and method for forming resist pattern

Photoresist, photolithography method using the same, and method for producing photoresist

Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same

Positive photoresist composition and resist pattern formation

Photoresist for enhanced patterning performance

Positive photoresist composition and method of forming resist pattern

Near-field exposure photoresist and fine pattern forming method using the same

Near-field exposure photoresist and fine pattern forming method using the same

Positive photoresist composition for liquid crystal device

Positive resist composition and patterning process

Photoresist, photolithography method using the same, and method for producing photoresist

"High ortho" novolak copolymers and composition thereof