ClassID:

177012

G03F7/0384 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Photosensitive materials; Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer

Recent Application in this class:
#1
20260118762
2026-04-30

POLYMER FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION

#2
20260118761
2026-04-30

COMPOUND FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, POLYMER, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION

#3
20260079394
2026-03-19

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND AND ACID DIFFUSION CONTROL AGENT

#4
20250386722
2025-12-18

COMPOUND, POLYMER COMPOUND, PHOTOSENSITIVE SURFACE TREATMENT AGENT, LAMINATE, SUBSTRATE FOR PATTERN FORMATION, TRANSISTOR, PATTERN FORMATION METHOD, AND TRANSISTOR MANUFACTURING METHOD

#5
20250377591
2025-12-11

PHOTORESIST COMPOSITION AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

#6
20250355355
2025-11-20

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, DISPLAY DEVICE, AND MANUFACTURING METHOD OF PHOTOSENSITIVE RESIN LAYER

#7
20250291248
2025-09-18

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND SEMICONDUCTOR DEVICE USING THE SAME

#8
20250237952
2025-07-24

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD

#9
20250172871
2025-05-29

METHOD FOR PREPARING PIXEL DEFINE LAYER

#10
20250172869
2025-05-29

WAFER END PROTECTIVE-FILM FORMING COMPOSITION FOR SEMICONDUCTOR MANUFACTURING

#11
20250147420
2025-05-08

Polymer, Positive And Negative Photosensitive Resin Compositions, Patterning Process, Method For Forming Cured Film, Interlayer Insulating Film, Surface Protective Film, And Electronic Component

#12
20250123561
2025-04-17

COMPOSITION, TRANSFER FILM, MANUFACTURING METHOD OF LAMINATE, LAMINATE, AND MANUFACTURING METHOD OF SEMICONDUCTOR PACKAGE

#13
20250116800
2025-04-10

FLEXIBLE MICROPOROUS MULTI-RESONANT PLASMONICS MESHES

#14
20250068073
2025-02-27

PHOTOSENSITIVE RESIN COMPOSITION

#15
20240353754
2024-10-24

PHOTOSENSITIVE COMPOSITION FOR PATTERN FORMATION, AND FLEXOGRAPHIC PLATE

#16
20240310726
2024-09-19

PHOTORESIST PROCESS

#17
20240272548
2024-08-15

SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

#18
20240126171
2024-04-18

HOLLOW STRUCTURE, ELECTRONIC COMPONENT USING SAME, AND NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION

#19
20230176478
2023-06-08

PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING

#20
20230152694
2023-05-18

PHOTORESIST COMPOSITIONS AND METHODS OF FABRICATING A SEMICONDUCTOR DEVICE

#21
20230127537
2023-04-27

Photosensitive composition, negative photosensitive composition, pixel division layer and organic EL display device

#22
20220260908
2022-08-18

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD

#23
20210389671
2021-12-16

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD

#24
20200285149
2020-09-10

Resist composition and patterning process

#25
20200041901
2020-02-06

SEMICONDUCTOR RESIST COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

#26
20190345289
2019-11-14

Photosensitive polyimide resin composition and method of manufacturing cover film using the same

#27
20190160734
2019-05-30

Sacrificial pyrolysis method for additively manufactured ceramics

#28
20190146342
2019-05-16

Photoresist composition and method of forming photoresist pattern

#29
20190086805
2019-03-21

Pattern formation material and pattern formation method

#30
20180362696
2018-12-20

Photocurable resin composition

#31
20180348634
2018-12-06

Fabrication of Electronic Products Using Flexible Substrates

#32
20180346652
2018-12-06

Photosensitive polyimide resin composition and method of manufacturing cover film using the same

#33
20180203352
2018-07-19

Monomers, polymers and photoresist compositions

#34
20180203351
2018-07-19

Negative photoresist composition for KrF laser for forming semiconductor patterns

#35
20180157175
2018-06-07

Aromatic resins for underlayers

#36
20180065925
2018-03-08

Salt and photoresist composition containing the same

#37
20180004088
2018-01-04

Silicone skeleton-containing polymer, photo-curable resin composition, photo-curable dry film, laminate, and patterning process

#38
20170192354
2017-07-06

Photopatternable compositions, patterned high k thin film dielectrics and related devices

#39
20170129268
2017-05-11

Lithographic printing plate precursor including (ethylene, vinyl acetal) copolymers

#40
20160190337
2016-06-30

Photopatternable materials and related electronic devices and methods

#41
20160187776
2016-06-30

COMPOUND FOR SEMICONDUCTOR PACKAGE, PHOTOSENSITIVE RESIN COMPOSITION INCLUDING THE SAME AND SEMICONDUCTOR PACKAGE STRUCTURE THEREOF

#42
20160170300
2016-06-16

Photoresist composition and method for producing photoresist pattern

#43
20160147148
2016-05-26

Forming conductive metal patterns using thiosulfate copolymers

#44
20160139508
2016-05-19

Compound, resin, resist composition and method for producing resist pattern

#45
20160085150
2016-03-24

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING CIRCUIT PATTERN USING THE SAME

#46
20160085148
2016-03-24

Sulfonic acid derivative compounds as photoacid generators in resist applications

#47
20160033863
2016-02-04

Photoresist composition to reduce photoresist pattern collapse

#48
20160018731
2016-01-21

Photoresist composition and method of manufacturing substrate for display device by using the same

#49
20150357571
2015-12-10

Photoresist employing photodimerization chemistry and method for manufacturing organic light emitting diode display using the same

#50
20150293451
2015-10-15

Forming conductive metal patterns using thiosulfate copolymers

#51
20150241773
2015-08-27

Two-step photoresist compositions and methods

#52
20150241772
2015-08-27

DOUBLE COATED NEGATIVE-WORKING DRY-FILM PHOTORESIST

#53
20150212413
2015-07-30

Photosensitive resin composition for screen printing, photosensitive film, and screen plate

#54
20150205200
2015-07-23

Photoresist composition, method of forming a pattern and method of manufacturing a thin film transistor substrate

#55
20150198883
2015-07-16

Negative resist composition and patterning process using same

#56
20150198882
2015-07-16

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM AND RESIST UNDERLAYER FILM-FORMING METHOD, AND PATTERN-FORMING METHOD

#57
20150148441
2015-05-28

Polymeric photoinitiators and photoinitiator monomers

#58
20150147700
2015-05-28

Black photosensitive resin composition and light blocking layer using the same

#59
20150132700
2015-05-14

Photoresist with rare-earth sensitizers

#60
20150126005
2015-05-07

Photoresist composition and method of manufacturing thin film transistor substrate using the same

#61
20150125791
2015-05-07

Line pattern collapse mitigation through gap-fill material application

#62
20150115209
2015-04-30

PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER AND LIQUID CRYSTAL DISPLAY DEVICE HAVING THE SAME

#63
20150111156
2015-04-23

Photosensitive resin composition and light blocking layer using the same

#64
20150079506
2015-03-19

Amine treated maleic anhydride polymers, compositions and applications thereof

#65
20150056553
2015-02-26

Photopatternable materials and related electronic devices and methods

#66
20150050595
2015-02-19

Photosensitive resin composition and light blocking layer using the same

#67
20150024327
2015-01-22

Negative photoresist composition and patterning method for device

#68
20150024173
2015-01-22

Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component

#69
20150021597
2015-01-22

Photopatternable materials and related electronic devices and methods

#70
20150021289
2015-01-22

Photoresist composition, coated substrate, and method of forming electronic device

#71
20140363758
2014-12-11

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME AND ELECTRONIC DEVICE

#72
20140356790
2014-12-04

Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition

#73
20140349222
2014-11-27

Photosensitive resin composition, method for producing hardened relief pattern, semiconductor device and display device

#74
20140272722
2014-09-18

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM AND RESIST UNDERLAYER FILM-FORMING METHOD, AND PATTERN-FORMING METHOD

#75
20140255849
2014-09-11

Methanofullerenes

#76
20140255843
2014-09-11

Patterning process and resist composition

#77
20140205948
2014-07-24

Self-imageable layer forming polymer and compositions thereof

#78
20140186766
2014-07-03

Resin composition for masks

#79
20140170560
2014-06-19

Negative resist composition and patterning process using the same

#80
20140154827
2014-06-05

Photoresist employing photodimerization chemistry and method for manufacturing organic light emitting diode display using the same

#81
20140147776
2014-05-29

Photocurable/thermosetting resin composition

#82
20140087293
2014-03-27

Maleimide containing cycloolefinic polymers and applications thereof

#83
20130171566
2013-07-04

Alkaline soluble resin and light sensible resin composition comprising same and use thereof

#84
20130084705
2013-04-04

Method for forming pattern, and composition for forming resist underlayer film

#85
20130017488
2013-01-17

Self-imageable layer forming polymer and compositions thereof

#86
20120292286
2012-11-22

Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition

#87
20120219900
2012-08-30

Lithographic printing plate precursor and plate making method thereof

#88
20110274853
2011-11-10

Negative photoresist composition and patterning method for device

#89
20110205505
2011-08-25

Line pattern collapse mitigation through gap-fill material application

#90
20090308842
2009-12-17

Photochemical method for manufacturing nanometrically surface-decorated substrates

#91
20080254375
2008-10-16

Hologram recording material and hologram recording medium

#92
20070196594
2007-08-23

Photo-alignment material and liquid crystal display device and its manufacturing method using the same