177036 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antistatic means, e.g. for charge depletion
COMBINATORIAL TREATMENTS FOR EUV PATTERNED LAYERS
#2Electronic device and method for manufacturing target substrate
#3CONDUCTIVE POLYMER COMPOSITION, COATED PRODUCT, AND PATTERNING PROCESS
#4PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, CURED FILM, LAMINATE, TOUCH PANEL, METHOD FOR PRODUCING POLYMER, AND METHOD FOR PRODUCING PHOTOSENSITIVE COMPOSITION
#5PHOTOSENSITIVE TRANSFER FILM, MANUFACTURING METHOD OF ANTISTATIC PATTERN, MANUFACTURING METHOD OF PHOTOSENSITIVE TRANSFER FILM, LAMINATE, TOUCH PANEL, MANUFACTURING METHOD OF TOUCH PANEL, AND DISPLAY DEVICE WITH TOUCH PANEL
#6CONDUCTIVE COMPOSITION AND METHOD FOR MANUFACTURING SAME, AND CONDUCTOR AND METHOD FOR MANUFACTURING SAME
#7Electroconductive film and method for manufacturing electroconductive pattern
#8Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography
#9CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE, AND PATTERNING PROCESS
#10Water-soluble diacetylene, photolithography composition comprising water-soluble diacetylene monomer and conductive polymer, and fine pattern preparation method using same
#11Underlying absorbing or conducting layer for Ebeam direct write (EBDW) lithography
#12Electroconductive film and method for manufacturing electroconductive pattern
#13Conductive composition, antistatic film, laminate and production therefor, and production method for photomask
#14Conductive polymer composition, coated article, and patterning process
#15Polymer compound, positive resist composition, laminate, and resist patterning process
#16Conductive polymer composition, coated article, and patterning process
#17Photomask blank, resist pattern forming process, and method for making photomask
#18Laminated structure
#19CONDUCTIVE COMPOSITION, CONDUCTOR, METHOD FOR FORMING CONDUCTOR, AND METHOD FOR PRODUCING POLYMER
#20Conductive polymer composition, coated article, patterning process and substrate
#21Conductive polymer composition, coated article, patterning process, and substrate
#22Optically transitioned metal-insulator surface
#23Conductive polymer composition, coated article having antistatic film formed from the composition, and patterning process using the composition
#24Composition for forming antistatic film and oligomer compound
#25Process for the production of a layered body and layered bodies obtainable therefrom
#26High-resolution photolithographic method for forming nanostructures, in particular in the manufacture of integrated electronic devices
#27Composition for forming resist underlayer film with reduced outgassing
#28PROCESS FOR PRODUCING SUBSTRATE HAVING PATTERNED CONDUCTIVE POLYMER FILM AND SUBSTRATE HAVING PATTERNED CONDUCTIVE POLYMER FILM
#29METHOD FOR FORMING CONDUCTIVE POLYMER PATTERN
#30Method for improving sensitivity of resist
#31Antistatic treatment agent, and antistatic film, coated article and pattern forming method using the agent
#32Lithography patterning method
#33Method for electroconductive pattern formation
#34Material for forming conductive antireflection film, method for forming conductive antireflection film, method for forming resist pattern, semiconductor device, and magnetic head
#35Manufacturing method for electronic device
#36ANTISTATIC TREATMENT AGENT, AND ANTISTATIC FILM, COATED ARTICLE AND PATTERN FORMING METHOD USING THE AGENT
#37Enhancing photoresist performance using electric fields
#38PATTERN FORMING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME
#39UV-photopolymerizable composition for producing organic conductive layers, patterns or prints
#40Conductive lithographic polymer and method of making devices using same
#41Antistatic Treatment Agent, and Antistatic Film, Coated Article and Pattern Forming Method Using the Agents
#42Electronic device and manufacturing method therefor
#43Antistatic agent, antistatic film and articles coated with antistatic film
#44Lithographic template and method of formation and use
#45Charged particle beam exposure equipment and charged particle beam exposure method
#46Pattern forming method and method of manufacturing semiconductor device
#47Conductive lithographic polymer and method of making devices using same
#48Printing plate material and printing plate
#49Antistatic film, method of producing the same, and recording element using the same
#50Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device
#51Composition which forms an electrically conductive resist layer and a method for patterning a photoresist using the resist layer
#52Method of increasing the shelf life of a photomask substrate
#53Enhancing photoresist performance using electric fields
#54Antistatic conductive grid pattern with integral logo
#55Pattern forming method, semiconductor device and method for manufacturing the same
#56Photopatterning of conductive electrode layers containing electrically-conductive polymer particles
#57Biocompatible microchip and a method for producing the same
#58Method for coating a substrate for euv lithography and substrate with photoresist layer