177038 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
Method of manufacturing a semiconductor device
#302Transfer material, process for producing a color filter using the same, a color filter and liquid crystal display device
#303HOLOGRAM LAMINATE, HOLOGRAM COPY METHOD, AND HOLOGRAM PRODUCING METHOD
#304Lithographic method
#305Structure for pattern formation, method for pattern formation, and application thereof
#306Compositions and processes for photolithography
#307Dual-layer light-sensitive developer-soluble bottom anti-reflective coatings for 193-nm lithography
#308PATTERN FORMING METHOD
#309Methods of Double Patterning, Photo Sensitive Layer Stack for Double Patterning and System for Double Patterning
#310Photoresists and methods for optical proximity correction
#311Photoresist compositions and methods related to near field masks
#312Ink jet recording head manufacturing method
#313On-track process for patterning hardmask by multiple dark field exposures
#314Multiple exposure photolithography methods and photoresist compositions
#315Method for reducing side lobe printing using a barrier layer
#316Method for forming an electrical structure comprising multiple photosensitive materials
#317INKJET-IMAGEABLE LITHOGRAPHIC PRINTING MEMBERS AND METHODS OF PREPARING AND IMAGING THEM
#318Pattern Formation Method
#319Bottom antireflective coating compositions
#320Radiation-Sensitive, Wet Developable Bottom Antireflective Coating Compositions and Their Applications in Semiconductor Manufacturing
#321Photoactive adhesion promoter
#322Multi-tone resist compositions
#323Method of pattern formation in semiconductor fabrication
#324Photo-resist material structure and method of producing the same
#325Resist pattern swelling material, and method for patterning using same
#326Organic Film Composition and Method for Forming Resist Pattern
#327Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
#328Structure for pattern formation, method for pattern formation, and application thereof
#329Device manufacturing process utilizing a double patterning process
#330Method of patterning an organic planarization layer
#331Method of photolithographic exposure
#332High resolution imaging process using an in-situ image modifying layer
#333Anti-reflective coating forming composition containing vinyl ether compound
#334Lithographic method
#335Method for fabricating master stamper/imprinters for patterned recording media utilizing hybrid resist
#336Method and System For Making Photo-Resist Patterns
#337STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF
#338Structure for pattern formation, method for pattern formation, and application thereof
#339Method of patterning an anti-reflective coating by partial developing
#340Contrast enhancing layers
#341STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF
#342Multilayer dry film resist, method of manufacturing the resist, and method of manufacturing display plate for liquid crystal display panel using the resist
#343Structure for pattern formation, method for pattern formation, and application thereof
#344Method of forming plated product using negative photoresist composition and photosensitive composition used therein
#345Structure for pattern formation, method for pattern formation, and application thereof
#346Method for producing a lens
#347Positive and negative dual function magnetic resist lithography
#348Photosensitive Film, Photosensitive Film Laminate and Photosensitive Film Roll
#349Method of forming a fine pattern
#350Method of forming a resist structure
#351TWO-LAYER FILM AND METHOD OF FORMING PATTERN WITH THE SAME
#352Metal pattern forming method, metal pattern obtained by the same, printed wiring board, conductive film forming method, and conductive film obtained by the same
#353Method for forming a material layer
#354Compositions and processes for photolithography
#355Multiple resist layer phase shift mask (PSM) blank and PSM formation method
#356Composition for forming a photosensitive organic anti-reflective layer and method of forming a pattern using the same
#357Method for manufacturing electrodes of a plasma display panel
#358Image forming method
#359Photopolymer printing form with reduced processing time
#360Photosensitive coating for enhancing a contrast of a photolithographic exposure
#361Method for forming photoresist pattern
#362Developable undercoating composition for thick photoresist layers
#363Photoimageable, thermosettable fluorinated resists
#364Compositions and processes for photolithography
#365Water-soluble material, chemically amplified resist and pattern formation method using the same
#366Substrate, method of exposing a substrate, machine readable medium
#367Substrate, method of exposing a substrate, machine readable medium
#368Multi-layer photoresist and method for making the same and method for etching a substrate
#369Method for manufacturing minute structure, method for manufacturing liquid discharge head, and liquid discharge head
#370Manufacturing method of a display device using a two-layered resist
#371Resin for under-layer material, under-layer material, laminate and method for forming resist pattern
#372Antireflective hardmask composition and methods for using same
#373Bilayer film including an underlayer having vertical acid transport properties
#374Method for manufacturing electrodes of a plasma display panel
#375Intermediate semiconductor device structures using photopatternable, dielectric materials
#376Method for manufacturing semiconductor devices using a photo acid generator
#377Process for producing an image using a first minimum bottom antireflective coating composition
#378Method for forming positive metal pattern and EMI filter using the same
#379Methods of forming intermediate semiconductor device structures using spin-on, photopatternable, interlayer dielectric materials
#380Inkjet-imageable lithographic printing members and methods of preparing and imaging them
#381Micropatterning of molecular surfaces via selective irradiation
#382Inkjet-imageable lithographic printing members and methods of preparing and imaging them
#383Inkjet-imageable lithographic printing members and methods of preparing and imaging them
#384Inkjet-imageable lithographic printing members and methods of preparing and imaging them
#385Resist exposure system and method of forming a pattern on a resist
#386Method for producing an exposed substrate
#387Semiconductor device fabrication method
#388Method for forming patterns on a semiconductor device
#389Selectively growing a polymeric material on a semiconductor substrate
#390Microstructure comprising an adhesive layer and method of fabrication of said microstructure
#391Portable conformable deep ultraviolet master mask
#392Negative-working photoimageable bottom antireflective coating
#393Top anti-reflective coating composition, method for forming the pattern of a semiconductor device using the same, and semiconductor device comprising the pattern
#394Controlling resist profiles through substrate modification
#395Imageable bottom anti-reflective coating for high resolution lithography
#396Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same
#397Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer
#398Manufacturing method of thick film member pattern
#399Semiconductor constructions
#400Dual damascene process
#401Lithographic semiconductor manufacturing using a multi-layered process
#402Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device
#403Method of forming pattern for semiconductor device
#404Negative resist composition comprising hydroxy-substituted base polymer and Si-containing crosslinker having epoxy ring and a method for patterning semiconductor devices using the same
#405Composite layer method for minimizing PED effect
#406Pattern forming method, graft pattern material, conductive pattern forming method and conductive pattern material
#407Method for creating a pattern in a material and semiconductor structure processed therewith
#408Water-soluble material, chemically amplified resist and pattern formation method using the same
#409Device manufacturing method and substrate comprising multiple resist layers
#410Method for forming openings in a substrate using a packing and unpacking process
#411Method of forming patterns
#412Resist pattern forming method
#413Wet developable hard mask in conjunction with thin photoresist for micro photolithography
#414Method for fabricating complex three-dimensional structures on the submicrometric scale by combined lithography of two resists
#415Method of forming metal fine particle pattern and method of forming electroconductive pattern
#416Light-sensitive sheet comprising support, first and second light-sensitive layers and barrier layer
#417Resist exposure system and method of forming a pattern on a resist
#418Photoactive adhesion promoter
#419Method of fabricating patterned structure