G03F7/162 - page 4 - CPC Classification Index

#901

20170307980

2017-10-26

Photolithography method

#902

20170307975

2017-10-26

Coating composition, and process for producing photoresist laminate

#903

20170306139

2017-10-26

Block copolymer

#904

20170306074

2017-10-26

Block copolymer

#905

20170305784

2017-10-26

Process for producing structured coatings

#906

20170301441

2017-10-19

Compositions Including Magnetic Materials

#907

20170299963

2017-10-19

Monomer, polymer, resist composition, and patterning process

#908

20170298186

2017-10-19

Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, positive photosensitive resin composition, patterning process, and method for forming cured film

#909

20170293227

2017-10-12

Coating liquid for resist pattern coating

#910

20170293225

2017-10-12

Photosensitive resin composition and cured product thereof

#911

20170293223

2017-10-12

Resist composition, method of forming resist pattern, compound, and acid diffusion control agent

#912

20170285478

2017-10-05

Coating compositions for photolithography

#913

20170285476

2017-10-05

Chemically amplified positive-type photosensitive resin composition

#914

20170285475

2017-10-05

Negative-working photoresist compositions for laser ablation and use thereof

#915

20170285473

2017-10-05

Composition for forming interlayer insulating film, interlayer insulating film, method for forming interlayer insulating film pattern, and device

#916

20170285472

2017-10-05

Composition for forming interlayer insulating film, interlayer insulating film, method for forming interlayer insulating film pattern, and device

#917

20170285460

2017-10-05

Mask blank, method for manufacturing mask blank and transfer mask

#918

20170283620

2017-10-05

Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold

#919

20170277037

2017-09-28

Resist composition and pattern forming process

#920

20170277036

2017-09-28

Photosensitive composition and pattern formation method

#921

20170273191

2017-09-21

Manufacturing method of circuit board and stamp

#922

20170273190

2017-09-21

Manufacturing method of circuit board

#923

20170273189

2017-09-21

Manufacturing method of circuit board

#924

20170273186

2017-09-21

Manufacturing method of circuit board

#925

20170271150

2017-09-21

Material composition and methods thereof

#926

20170269476

2017-09-21

PHOTORESIST COMPOSITION, PRODUCTION METHOD OF PHOTORESIST COMPOSITION, AND RESIST PATTERN-FORMING METHOD

#927

20170263663

2017-09-14

Photosensitive coloring composition, method for manufacturing solid-state imaging element using same, and solid-state imaging element

#928

20170261853

2017-09-14

NANOPARTICLE - POLYMER RESISTS

#929

20170260132

2017-09-14

Oxime sulfonate derivatives

#930

20170255099

2017-09-07

Photosensitive resin composition for forming interlayer insulating film, interlayer insulating film, and method for forming interlayer insulating film

#931

20170255097

2017-09-07

Positive photosensitive resin composition, photo-curable dry film and method for producing the same, patterning process, and laminate

#932

20170248848

2017-08-31

Coater with automatic cleaning function and coater automatic cleaning method

#933

20170247492

2017-08-31

Block copolymer

#934

20170247334

2017-08-31

Imidazole compound, metal surface treatment liquid, metal surface treatment method, and laminate production method

#935

20170247323

2017-08-31

Salt and photoresist composition containing the same

#936

20170243991

2017-08-24

Method of patterning a layer

#937

20170242339

2017-08-24

Positive resist composition and pattern forming process

#938

20170242338

2017-08-24

Active-light-sensitive or radiation-sensitive resin composition, active-light-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device

#939

20170242337

2017-08-24

Radiation-sensitive composition and pattern-forming method

#940

20170242336

2017-08-24

Radiation-sensitive composition and pattern-forming method

#941

20170240764

2017-08-24

PHOTOSENSITIVE ELECTROLESS PLATING UNDERCOAT AGENT

#942

20170235224

2017-08-17

Photosensitive resin composition, color filter, and liquid crystal display element thereof

#943

20170232397

2017-08-17

Method for producing filter molded article

#944

20170227850

2017-08-10

Resist underlayer film-forming composition containing novolac resin reacted with aromatic methylol compound

#945

20170227849

2017-08-10

Composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method

#946

20170227846

2017-08-10

Photopatternable compositions and methods of fabricating transistor devices using same

#947

20170226261

2017-08-10

Block copolymer

#948

20170226260

2017-08-10

Block copolymer

#949

20170226258

2017-08-10

Block copolymer

#950

20170226252

2017-08-10

Monomer, polymer, resist composition, and patterning process

#951

20170226250

2017-08-10

Polymer, resist composition, and pattern forming process

#952

20170226235

2017-08-10

Block copolymer

#953

20170219927

2017-08-03

Composition for resist patterning and method for forming pattern using same

#954

20170219922

2017-08-03

Method of manufacturing patterned substrate

#955

20170212423

2017-07-27

Method and apparatus for dynamic lithographic exposure

#956

20170210938

2017-07-27

Method of manufacturing patterned substrate

#957

20170210838

2017-07-27

Photosensitive composition containing oxime-ester photoinitiator and application thereof

#958

20170210836

2017-07-27

Polymer compound, negative resist composition, laminate, patterning process, and compound

#959

20170207080

2017-07-20

Semiconductor device manufacturing method

#960

20170205711

2017-07-20

Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition

#961

20170205709

2017-07-20

Resist composition and patterning process

#962

20170203341

2017-07-20

Cup wash disk with shims

#963

20170200615

2017-07-13

Etch resistant alumina based coatings

#964

20170199459

2017-07-13

Methods of forming patterns using compositions for an underlayer of photoresist

#965

20170199457

2017-07-13

Method for forming multi-layer film and patterning process

#966

20170199456

2017-07-13

Photoresist composition and method of manufacturing semiconductor device using the same

#967

20170199454

2017-07-13

Photosensitive resin composition, film prepared by using the photosensitive resin composition, and organic light-emitting display device including the film

#968

20170199453

2017-07-13

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

#969

20170198096

2017-07-13

Composition of anti-reflective hardmask

#970

20170192354

2017-07-06

Photopatternable compositions, patterned high k thin film dielectrics and related devices

#971

20170192353

2017-07-06

Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device

#972

20170192352

2017-07-06

Photoacid generator

#973

20170190810

2017-07-06

Polymers derived from norbornadiene and maleic anhydride and use thereof

#974

20170184970

2017-06-29

PATTERN FORMING METHOD, COMPOSITION FOR FORMING UPPER LAYER FILM, RESIST PATTERN, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

#975

20170184969

2017-06-29

Pattern forming method and manufacturing method of semiconductor device

#976

20170184967

2017-06-29

Resist composition, pattern forming process, polymer, and monomer

#977

20170184964

2017-06-29

Resist composition and patterning process

#978

20170184963

2017-06-29

Resist composition and patterning process

#979

20170184962

2017-06-29

Resist composition and patterning process

#980

20170184961

2017-06-29

Pattern-forming method

#981

20170184960

2017-06-29

Pattern-forming method

#982

20170183279

2017-06-29

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM

#983

20170178897

2017-06-22

Manufacturing method of semiconductor device

#984

20170176861

2017-06-22

Polymer, organic layer composition, and method of forming patterns

#985

20170176855

2017-06-22

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATOR AND COMPOUND

#986

20170174869

2017-06-22

COMPOSITION, METHOD OF MANUFACTURING COMPOSITION, CURABLE COMPOSITION, CURED FILM, NEAR-INFRARED CUT FILTER, SOLID-STATE IMAGING DEVICE, INFRARED SENSOR, AND CAMERA MODULE

#987

20170174801

2017-06-22

NON-CHEMICAL AMPLIFICATION TYPE RESIST COMPOSITION, NON-CHEMICAL AMPLIFICATION TYPE RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

#988

20170168397

2017-06-15

Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl group

#989

20170168396

2017-06-15

Method for forming resist pattern

#990

20170168395

2017-06-15

Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device

#991

20170168393

2017-06-15

Photoresist composition

#992

20170168391

2017-06-15

Photosensitive resin composition, method for producing cured film, cured film, liquid crystal display device, organic electroluminescent display device, and touch panel

#993

20170168270

2017-06-15

Spacer wafer for wafer-level camera and method for manufacturing same

#994

20170166700

2017-06-15

Highly heat resistant polysilsesquioxane-based photosensitive resin composition

#995

20170160635

2017-06-08

PHOTOSENSITIVE RESIN COMPOSITION AND COLOR FILTER USING SAME

#996

20170154766

2017-06-01

Silicon-containing condensate, composition for forming a silicon-containing resist under layer film, and patterning process

#997

20170153548

2017-06-01

Resist underlayer film-forming composition

#998

20170153547

2017-06-01

Coating compositions for use with an overcoated photoresist

#999

20170153546

2017-06-01

Permanent dielectric compositions containing photoacid generator and base

#1000

20170153543

2017-06-01

Photosensitive resin composition, method for forming resist pattern, and method for producing metallic pattern

#1001

20170153542

2017-06-01

Sulfonyl photoacid generators and photoresists comprising same

#1002

20170151588

2017-06-01

Apparatus for treating substrate and method for cleaning guide plate

#1003

20170151581

2017-06-01

Coating apparatus and coating method

#1004

20170145142

2017-05-25

Resist material, resist composition and method for forming resist pattern

#1005

20170144954

2017-05-25

Material for forming film for lithography, composition for forming film for lithography, film for lithography, pattern forming method and purification method

#1006

20170139325

2017-05-18

PHOTOSENSITIVE REFRACTIVE INDEX-ADJUSTING TRANSFER FILM

#1007

20170136489

2017-05-18

Substrate treating apparatus

#1008

20170131635

2017-05-11

Monomer, polymer, resist composition, and patterning process

#1009

20170131632

2017-05-11

Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production method

#1010

20170127533

2017-05-04

PRODUCTION PROCESS FOR SOLDER ELECTRODE, PRODUCTION PROCESS FOR LAMINATE, LAMINATE AND ELECTRONIC PART

#1011

20170123319

2017-05-04

Coating compositions for use with an overcoated photoresist

#1012

20170123316

2017-05-04

Block copolymers and pattern treatment compositions and methods

#1013

20170123314

2017-05-04

Thermal acid generators and photoresist pattern trimming compositions and methods

#1014

20170123313

2017-05-04

Thermal acid generators and photoresist pattern trimming compositions and methods

#1015

20170123312

2017-05-04

Secondary electron generating composition

#1016

20170121437

2017-05-04

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND MASK BLANK

#1017

20170115571

2017-04-27

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME

#1018

20170115570

2017-04-27

Resin composition, resist pattern-forming method and polymer

#1019

20170115567

2017-04-27

Chemically amplified positive resist composition and patterning process

#1020

20170115566

2017-04-27

Resist composition, patterning process, and barium, cesium and cerium salts

#1021

20170115565

2017-04-27

Resist composition and patterning process

#1022

20170115564

2017-04-27

Photosensitive composition, method for producing cured film, cured film, touch panel, touch panel display device, liquid crystal display device, and organic EL display device

#1023

20170115563

2017-04-27

ENERGY-SENSITIVE RESIN COMPOSITION

#1024

20170115562

2017-04-27

Photosensitive compositions, quantum dot polymer composite pattern prepared therefrom, and electronic devices including the same

#1025

20170115561

2017-04-27

Photosensitive compositions and quantum dot polymer composite patterns including the same

#1026

20170114181

2017-04-27

Polymer, organic layer composition, and method of forming patterns

#1027

20170108778

2017-04-20

Lithographic patterning

#1028

20170108777

2017-04-20

Additive and resist underlayer film-forming composition containing the same

#1029

20170108775

2017-04-20

Resist composition and patterning process

#1030

20170108774

2017-04-20

Resist composition and patterning process

#1031

20170107331

2017-04-20

Methods For Preparing Articles And Associated Articles Prepared Thereby

#1032

20170102613

2017-04-13

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING HARDENED RELIEF PATTERN, SEMICONDUCTOR DEVICE AND DISPLAY DEVICE

#1033

20170102612

2017-04-13

Organotin oxide hydroxide patterning compositions, precursors, and patterning

#1034

20170102610

2017-04-13

Composition and fabricating method thereof, and infrared ray sensor

#1035

20170097567

2017-04-06

Method for producing polymer

#1036

20170097566

2017-04-06

Fluorine free photopatternable phenol functional group containing polymer compositions

#1037

20170097564

2017-04-06

Resist composition, method of forming resist pattern, compound, and acid diffusion control agent

#1038

20170090293

2017-03-30

Filtration filter, filtration method, production method of purified liquid chemical product for lithography, and method of forming resist pattern

#1039

20170090288

2017-03-30

Top-layer membrane formation composition and method for forming resist pattern using same

#1040

20170090287

2017-03-30

Overcoat compositions and methods for photolithography

#1041

20170090283

2017-03-30

Photoresist compositions and methods

#1042

20170087763

2017-03-30

Surfaces with tunable adhesion based on composite structures and methods of making the same

#1043

20170082923

2017-03-23

PHOTOSENSITIVE COMPOSITION FOR PERMANENT FILMS, RESIST MATERIAL AND COATING FILM

#1044

20170076952

2017-03-16

Lithography pattern forming method using self-organizing block copolymer

#1045

20170075224

2017-03-16

Resist pattern-forming method

#1046

20170075220

2017-03-16

Resist composition and method for forming resist pattern

#1047

20170075219

2017-03-16

ONIUM SALT, PHOTOACID GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR PRODUCING DEVICE

#1048

20170068162

2017-03-09

Pattern forming method

#1049

20170066703

2017-03-09

Compound containing modified phenolic hydroxy group, method for producing compound containing modified phenolic hydroxy group, photosensitive composition, resist material, and resist coating film

#1050

20170059990

2017-03-02

RADIATION-SENSITIVE OR ACTINIC RAY-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, MASK BLANK, RESIST PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE

#1051

20170058071

2017-03-02

Block copolymer

#1052

20170052450

2017-02-23

Pattern-forming method

#1053

20170052446

2017-02-23

Photosensitive resin composition and application thereof

#1054

20170045820

2017-02-16

Resist underlayer film-forming composition and method for forming resist pattern using the same

#1055

20170045819

2017-02-16

Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure

#1056

20170045818

2017-02-16

Resist underlayer film-forming composition for lithography containing polymer having blocked isocyanate structure

#1057

20170044287

2017-02-16

COMPOSITION AND ORGANIC FILM TRANSISTOR USING THE SAME

#1058

20170038680

2017-02-09

FLUORINATED PHOTORESIST WITH INTEGRATED SENSITIZER

#1059

20170038679

2017-02-09

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND

#1060

20170038678

2017-02-09

Photosensitive resin composition for optical waveguide, photocurable film for formation of optical waveguide core layer, optical waveguide produced by using the resin composition or the photocurable film, and hybrid flexible printed wiring board for optical/electrical transmission

#1061

20170031243

2017-02-02

Resist composition and pattern forming process

#1062

20170023861

2017-01-26

Positive photosensitive composition, thin film transistor, and compound

#1063

20170023860

2017-01-26

Photosensitive polysiloxane composition and uses thereof

#1064

20170023858

2017-01-26

Coloring composition, film, color filter, pattern forming method, method of manufacturing color filter, solid image pickup element, and infrared sensor

#1065

20170012022

2017-01-12

PHOTOSENSITIVE RESIN COMPOSITION, LAMINATE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE

#1066

20170008992

2017-01-12

Block copolymer

#1067

20170008830

2017-01-12

(Meth)acrylic acid ester compound and production method therefor

#1068

20170003587

2017-01-05

Sulfonic acid derivative compounds as photoacid generators in resist applications

#1069

20170002208

2017-01-05

Priming material for substrate coating

#1070

20170001165

2017-01-05

Systems and methods to dispense and mix reagents

#1071

20160342087

2016-11-24

Method and composition of a chemically amplified copolymer resist

#1072

20160333212

2016-11-17

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORESIST COMPOSITIONS

#1073

20160311960

2016-10-27

Block copolymer

#1074

20160311959

2016-10-27

Block copolymer

#1075

20160311958

2016-10-27

Block copolymer

#1076

20160310979

2016-10-27

Substrate processing apparatus and substrate processing method

#1077

20160306278

2016-10-20

CHEMICAL FOR PHOTOLITHOGRAPHY WITH IMPROVED LIQUID TRANSFER PROPERTY AND RESIST COMPOSITION COMPRISING THE SAME

#1078

20160304700

2016-10-20

Organic layer composition, organic layer, and method of forming patterns

#1079

20160304656

2016-10-20

Block copolymer

#1080

20160304655

2016-10-20

Block copolymer

#1081

20160304654

2016-10-20

Block copolymer

#1082

20160304653

2016-10-20

Monomer and block copolymer

#1083

20160291469

2016-10-06

Chemically amplified positive-type photosensitive resin composition

#1084

20160289839

2016-10-06

Substrate processing apparatus and substrate processing method

#1085

20160282100

2016-09-29

Gauge for installation of liners in substrate spin coating tools

#1086

20160280835

2016-09-29

Block copolymer

#1087

20160280832

2016-09-29

Block copolymer

#1088

20160276151

2016-09-22

Priming material for substrate coating

#1089

20160271640

2016-09-22

Adjusment method of chemical liquid supply device, non-transitory storage medium, and chemical liquid supply device

#1090

20160266490

2016-09-15

Silicon-containing heat- or photo-curable composition

#1091

20160266489

2016-09-15

Resist pattern-forming method, substrate-processing method, and photoresist composition

#1092

20160260623

2016-09-08

Method and Apparatus for Planarization of Substrate Coatings

#1093

20160246177

2016-08-25

Masked cation exchange lithography

#1094

20160238945

2016-08-18

NOVEL PHOTORESIST STRIPPER AND APPLICATION PROCESS THEREOF

#1095

20160237195

2016-08-18

Polymer, organic layer composition, organic layer, and method of forming patterns

#1096

20160230129

2016-08-11

Thinner composition

#1097

20160195811

2016-07-07

Developing method

#1098

20160172463

2016-06-16

Metal-insulator-metal diodes and methods of fabrication

#1099

20160167079

2016-06-16

Coating method, computer storage medium and coating apparatus

#1100

20160161867

2016-06-09

Liquid treatment apparatus and method and non-transitory storage medium

#1101

20160158795

2016-06-09

Spin coating apparatus and method

#1102

20160151801

2016-06-02

Coating method and coating apparatus

#1103

20160145231

2016-05-26

Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom

#1104

20160116845

2016-04-28

Liquid delivery method, liquid delivery system, and computer-readable storage medium

#1105

20160111253

2016-04-21

Method for forming resist film and charged particle beam writing method

#1106

20160090449

2016-03-31

Polymer, organic layer composition, organic layer, and method of forming patterns

#1107

20160077439

2016-03-17

Grapho-epitaxy method for making patterns on the surface of a substrate

#1108

20160054653

2016-02-25

Liquid processing method and storage medium

#1109

20160042942

2016-02-11

Pattern forming method and manufacturing method of semiconductor device

#1110

20160038965

2016-02-11

Substrate processing apparatus for coating liquid composed of first coating liquid and second coating liquid on substrate with slit-shaped ejection port

#1111

20160033861

2016-02-04

All water-based nanopatterning

#1112

20150371853

2015-12-24

Coating treatment method with airflow control, and non-transitory recording medium having program recorded thereon for executing coating treatment with airflow control

#1113

20150362839

2015-12-17

Developing method, developing apparatus, and computer-readable storage medium

#1114

20150352587

2015-12-10

Liquid coating method, liquid coating apparatus, and computer-readable storage medium

#1115

20150343484

2015-12-03

Removable spin chamber with vacuum attachment

#1116

20150336127

2015-11-26

Multi-size adaptable spin chuck system

#1117

20150328650

2015-11-19

Method and apparatus for increased recirculation and filtration in a photoresist dispense system using a liquid empty reservoir

#1118

20150301446

2015-10-22

Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition

#1119

20150279662

2015-10-01

Photolithographic method for forming a coating layer

#1120

20150279660

2015-10-01

Lithography process and composition with de-crosslinkable crosslink material

#1121

20150251211

2015-09-10

Coating film forming apparatus having ring-shaped baffle member movable between processing position and retreated position

#1122

20150234277

2015-08-20

Liquid treatment method, substrate processing apparatus and non-transitory storage medium

#1123

20150224532

2015-08-13

Spin dispenser module substrate surface protection system

#1124

20150140485

2015-05-21

Processing liquid supplying apparatus, processing liquid supplying method and storage medium

#1125

20150083038

2015-03-26

Spin treatment apparatus

#1126

20150079806

2015-03-19

Photoresist coating scheme

#1127

20150064621

2015-03-05

SUBSTRATE TREATMENT DEVICE AND METHOD OF APPLYING TREATMENT SOLUTION

#1128

20150059642

2015-03-05

Spin treatment apparatus

#1129

20150050602

2015-02-19

Spin Development Method and Apparatus

#1130

20150048051

2015-02-19

Resist pattern-forming method, substrate-processing method, and photoresist composition

#1131

20150034594

2015-02-05

Methods of providing patterned templates for self-assemblable block copolymers for use in device lithography

#1132

20150004531

2015-01-01

Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns

#1133

20150004311

2015-01-01

Coating film forming apparatus, coating film forming method, and recording medium

#1134

20150001178

2015-01-01

Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition

#1135

20140370199

2014-12-18

Liquid processing apparatus, liquid processing method, and storage medium

#1136

20140347639

2014-11-27

Developing method for developing apparatus

#1137

20140342292

2014-11-20

DI-T-BUTOXYDIACETOXYSILANE-BASED SILSESQUIOXANE RESINS AS HARD-MASK ANTIREFLECTIVE COATING MATERIAL AND METHOD OF MAKING

#1138

20140335454

2014-11-13

Underlayer composition and method of imaging underlayer

#1139

20140327890

2014-11-06

Coating and developing apparatus and method, and storage medium

#1140

20140322919

2014-10-30

Semiconductor wafer chuck and method

#1141

20140273509

2014-09-18

Method and apparatus for planarization of substrate coatings

#1142

20140272705

2014-09-18

Photoresist application

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20140272704

2014-09-18

Thickening phase for spin coating process

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20140261163

2014-09-18

Liquid treatment apparatus

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20140261162

2014-09-18

Substrate processing apparatus

#1146

20140235070

2014-08-21

Cover plate for wind mark control in spin coating process

#1147

20140234773

2014-08-21

METHOD OF COATING RESIST AND RESIST COATING APPARATUS

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20140226137

2014-08-14

Pattern forming method and manufacturing method of semiconductor device

#1149

20140210057

2014-07-31

Method of applying photoresist to a semiconductor substrate

#1150

20140152966

2014-06-05

Facility and method for treating substrate

#1151

20140111862

2014-04-24

Light diffusion member, method for producing same, and display device

#1152

20140072709

2014-03-13

Spin coating apparatus and method

#1153

20140065843

2014-03-06

Method of forming a photoresist layer

#1154

20140060424

2014-03-06

Processing cup and substrate processing apparatus

#1155

20140054212

2014-02-27

System and method for replacing resist filter to reduce resist filter-induced wafer defects

#1156

20140030423

2014-01-30

Liquid processing apparatus, liquid processing method and storage medium for liquid processing

#1157

20140022521

2014-01-23

Substrate processing apparatus and substrate processing method

#1158

20140017615

2014-01-16

APPARATUS AND METHOD FOR RESIST COATING AND DEVELOPING

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2013-12-19

Method for forming silicon-containing resist underlayer film

#1160

20130302525

2013-11-14

Plating apparatus, plating method and storage medium

#1161

20130295777

2013-11-07

Coating treatment method

#1162

20130280425

2013-10-24

Liquid treatment apparatus and method and non-transitory storage medium

#1163

20130239887

2013-09-19

Coating treatment method, coating treatment apparatus, and computer-readable storage medium

#1164

20130239883

2013-09-19

Arrangement for the production of structured substrates

#1165

20130189852

2013-07-25

Liquid processing apparatus, liquid processing method, and storage medium

#1166

20130156948

2013-06-20

Substrate processing apparatus

#1167

20130122247

2013-05-16

Spacer Wafer For Wafer-Level Camera And Method For Manufacturing Same

#1168

20130040062

2013-02-14

Liquid processing method

#1169

20130023117

2013-01-24

Semiconductor device manufacturing method and semiconductor device manufacturing apparatus

#1170

20130014696

2013-01-17

APPARATUS TO CONDUCT SPIN-ON FILM PROCESSING

#1171

20130011555

2013-01-10

COATING APPARATUS AND COATING METHOD

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20130008868

2013-01-10

Substrate processing method and substrate processing apparatus

#1173

20120318197

2012-12-20

SPIRAL COATING APPARATUS AND SPIRAL COATING METHOD

#1174

20120315578

2012-12-13

APPARATUS AND METHOD FOR SPIN-COATING, AND METHOD FOR MANUFACTURING SUBSTRATE HAVING STRUCTURE

#1175

20120304920

2012-12-06

Substrate processing apparatus

#1176

20120301612

2012-11-29

Coating method

#1177

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2012-11-01

Coating and development treatment system with airflow control including control unit and movable airflow control plate

#1178

20120257176

2012-10-11

Substrate transport method, substrate transport apparatus, and coating and developing system

#1179

20120238106

2012-09-20

COATING METHOD AND COATING APPARATUS

#1180

20120213925

2012-08-23

Coating method

#1181

20120193763

2012-08-02

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE AND RESIST COATER

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20120189773

2012-07-26

Coating treatment apparatus, coating treatment method, and non-transitory computer storage medium

#1183

20120181239

2012-07-19

Chemical liquid supply method and chemical liquid supply system

#1184

20120135358

2012-05-31

Coating treatment method, computer-readable storage medium, and coating treatment apparatus

#1185

20120135143

2012-05-31

Device and method for coating a micro- and/or nano-structured structural substrate and coated structural substrate

#1186

20120088192

2012-04-12

Underlayer composition and method of imaging underlayer

#1187

20120085374

2012-04-12

Device and method for wet treating plate-like-articles

#1188

20120063765

2012-03-15

Coating and developing apparatus, coating and developing method and non-transitory tangible medium

#1189

20120057862

2012-03-08

Coating and developing apparatus, coating and developing method and non-transitory tangible medium

#1190

20120052190

2012-03-01

Liquid processing apparatus, liquid processing method and storage medium

#1191

20120049063

2012-03-01

Sample surface inspection apparatus and method

#1192

20120034792

2012-02-09

Coating treatment method

#1193

20120034369

2012-02-09

VAPORIZING APPARATUS, SUBSTRATE PROCESSING APPARATUS, COATING AND DEVELOPING APPARATUS, AND SUBSTRATE PROCESSING METHOD

#1194

20120015307

2012-01-19

Coating and developing apparatus and method, and storage medium

#1195

20110312190

2011-12-22

COATING METHOD AND COATING APPARATUS

#1196

20110283940

2011-11-24

Wafer Processing Device and Coating Device

#1197

20110262861

2011-10-27

Photosensitive composition

#1198

20110253038

2011-10-20

Spin coating device

#1199

20110250765

2011-10-13

Coating treatment method, non-transitory computer storage medium and coating treatment apparatus

#1200

20110250542

2011-10-13

Sulfonyl photoacid generators and photoresists comprising same