177049 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Coating processes; Apparatus therefor Coating on a rotating support, e.g. using a whirler or a spinner
Film removing device and film removing method
#1202Liquid treatment apparatus, mounting and dismounting method of a cup body, and storage medium
#1203Film forming apparatus, film forming method, and semiconductor device
#1204Chemical liquid supply nozzle and chemical liquid supply method
#1205Compositions Including Magnetic Materials
#1206Resist coating method and resist coating apparatus
#1207Substrate processing apparatus and substrate processing method
#1208METHOD OF MANUFACTURING AN OPTICAL DATA STORAGE MEDIUM, OPTICAL DATA STORAGE MEDIUM AND APPARATUS FOR PERFORMING SAID METHOD
#1209Coating and developing apparatus and coating and developing method
#1210MELTS
#1211Pattern forming method and manufacturing method of semiconductor device
#1212Device and method for wet treating plate-like-articles
#1213Coating treatment method, computer storage medium, and coating treatment apparatus
#1214Resist solution supply apparatus, resist solution supply method, and computer storage medium
#1215Coating treatment method and coating treatment apparatus
#1216Coating apparatus having coater chuck
#1217Apparatus and method of forming an applied film
#1218APPARATUS AND METHOD FOR RESIST APPLICATION
#1219Resist coating apparatus
#1220PHOTORESIST TOOL CLEANING JIG CONFIGURED TO RECEIVE FLOW FROM TOP AND BOTTOM
#1221CHEMICAL LIQUID RECOVERY CUP AND CHEMICAL LIQUID COATING DEVICE
#1222Method for discharging chemical solution
#1223Substrate heating apparatus and method and coating and developing system
#1224Method for manufacturing semiconductor device
#1225Coating method
#1226LIQUID SUPPLYING DEVICE AND METHOD OF USING THE SAME
#1227Multi-channel developer system
#1228SUBSTRATE COATING METHOD AND SUBSTRATE COATING APPARATUS
#1229Substrate treating apparatus for adjusting temperature of treating liquid
#1230Coating treatment method, coating treatment apparatus, and computer-readable storage medium
#1231Liquid processing apparatus and liquid processing method
#1232Method and apparatus for coating resin
#1233Substrate processing method and apparatus
#1234Liquid processing apparatus, liquid processing method and storage medium
#1235Coating and processing apparatus and method
#1236PHOTORESIST SOLUTION DISPENSING VOLUME MONITORING SYSTEM AND METHOD THEREOF
#1237Photoresist coating process
#1238METHOD AND SYSTEM FOR DISPENSING RESIST SOLUTION
#1239Developing method and developing apparatus
#1240Coating/developing apparatus and method
#1241COATING TREATMENT METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND COATING TREATMENT APPARATUS
#1242Coating apparatus and method
#1243Coating apparatus and method
#1244Film coating apparatus
#1245Device and Method for Coating a Micro-and/or Nano-Structured Structural Substrate and Coated Structural Substrate
#1246Coating process apparatus and coating film forming method
#1247Spin-on film processing using acoustic radiation pressure
#1248RESIST SOLUTION SUPPLY APPARATUS, RESIST SOLUTION SUPPLY METHOD, AND COMPUTER STORAGE MEDIUM
#1249Method for forming photoresist layer
#1250Spin coating method and spin coating apparatus
#1251Melts
#1252Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
#1253Coating process and equipment for reduced resist consumption
#1254Substrate processing method, program, computer-readable storage medium, and substrate processing system
#1255METHOD OF TREATING SUBSTRATE AND COMPUTER STORAGE MEDIUM
#1256Chemical liquid supply unit, and substrate treating apparatus and method using the same
#1257Coating Apparatus and Coating Method
#1258Method and apparatus for manufacturing relief material for seamless printing
#1259Photoresist coating apparatus having nozzle monitoring unit and method for supplying photoresist using the same
#1260Method of producing positive resist composition, positive resist composition, and method of forming resist pattern
#1261Coating treatment method, coating treatment apparatus, and computer-readable storage medium
#1262METHOD AND APPARATUS FOR HMDS TREATMENT OF SUBSTRATE EDGES
#1263Substrate processing apparatus
#1264METHOD OF SHORTENING PHOTORESIST COATING PROCESS
#1265Apparatus and method for rotational coating
#1266Coater/developer, coating/developing method, and storage medium
#1267Sample surface inspection apparatus and method
#1268Resist pipe and resist coating device
#1269APPARATUS AND METHODS FOR APPLYING A LAYER OF A SPIN-ON MATERIAL ON A SERIES OF SUBSTRATES
#1270System and method for replacing resist filter to reduce resist filter-induced wafer defects
#1271Resist coating method and apparatus
#1272Registration detection system
#1273Method for determining optimal resist thickness
#1274Coating/developing apparatus and pattern forming method
#1275Coating treatment method and coating treatment apparatus
#1276Apparatus for applying a layer to a hydrophobic surface
#1277Resist pattern forming method
#1278COATING TREATMENT APPARATUS, SUBSTRATE TREATMENT SYSTEM, COATING TREATMENT METHOD, AND COMPUTER STORAGE MEDIUM
#1279Method for depositing a polymer layer on a surface of a support comprising at least a recessed zone
#1280Surface Microstructuring Device
#1281METHOD AND APPARATUS FOR MAKING COATING FILM
#1282Apparatus for and method of dispensing chemical solution in spin-coating equipment
#1283Liquid treatment apparatus, mounting and dismounting method of a cup body, and storage medium
#1284Photoresist coating liquid supplying apparatus, and photoresist coating liquid supplying method and photoresist coating apparatus using such photoresist coating liquid supplying apparatus
#1285Method and system of coating polymer solution on a substrate in a solvent saturated chamber
#1286Coating treatment method
#1287Coating treatment method, computer-readable storage medium, and coating treatment apparatus
#1288Film removing device and film removing method
#1289Buffer tank, intermediate accumulation apparatus, liquid treatment apparatus, and supplying method of treating liquid
#1290Chuck for a photoresist spin coater
#1291Chemical liquid supply device
#1292METHOD AND APPARATUS FOR COATING RESIN
#1293Liquid processing apparatus and method
#1294Liquid processing apparatus
#1295Chemical dispense system
#1296Resist coating method, resist coating apparatus and storage medium
#1297Coating Film Forming Apparatus and Coating Film Forming Method
#1298Coating compositions for photolithography
#1299Blanket for a printing roll, method of manufacturing the same, patterning method using the same, and method of manufacturing liquid crystal display device
#1300Liquid coating apparatus and method thereof
#1301Coater/developer and coating/developing method
#1302Apparatus for coating photoresist material
#1303Spin-coating method, determination method for spin-coating condition and mask blank
#1304Method for coating photoresist material
#1305Processing liquid coating apparatus and a processing liquid coating method
#1306Device for spin-coating substrates
#1307Method and apparatus for control of layer thicknesses
#1308Photosensitive composition
#1309Resist coating method and resist coating apparatus
#1310Resist coating method and resist coating apparatus
#1311Method of manufacturing high sag lens and high sag lens manufactured thereby
#1312Method of controlling substrate processing apparatus and substrate processing apparatus
#1313Thinner composition for inhibiting photoresist from drying
#1314Spin-on coater, rotation processing method and color-filter fabricating method
#1315Photoresist coating apparatus, medium, and method efficiently spraying photoresist
#1316Method of processing a substrate and apparatus processing the same
#1317Etching technique to planarize a multi-layer structure
#1318Deposition technique to planarize a multi-layer structure
#1319Photoresist coating system and method
#1320Apparatus and method of forming an applied film
#1321Method for in situ photoresist thickness characterization
#1322Method and computer-readable medium for in situ photoresist thickness characterization
#1323Method for compensating film height modulations in spin coating of a resist film layer
#1324System for situ photoresist thickness characterizaton
#1325Method for in situ photoresist thickness characterization
#1326Device for controlling dispensing error in photo spinner equipment
#1327Immersion lithography edge bead removal
#1328Substrate processing apparatus
#1329Apparatus for applying coating solution and method of fabricating liquid crystal display device using the same
#1330Chemical solution application apparatus and chemical solution application method
#1331Method for improving high-viscosity thick film photoresist coating in UV LIGA process
#1332Device and method for forming improved resist layer
#1333METHOD AND APPARATUS FOR COATING A WAFER
#1334Substrate heating apparatus and method and coating and developing system
#1335Method of manufacturing mask blank
#1336Semiconductor manufacturing apparatus
#1337Method and device for manufacturing relief printing plate terminal for seamless printing
#1338Coating and developing system
#1339Coating/developing device and method
#1340Manufacturing method of semiconductor device
#1341METHOD OF COATING PHOTORESIST AND PHOTORESIST LAYER FORMED BY THE SAME
#1342Device for supplying a solution onto a substrate and method for supplying the solution onto the substrate by using the same
#1343Melts
#1344Photoresist supply apparatus and method of controlling the operation thereof
#1345Substrate rotation type treatment apparatus
#1346SEMICONDUCTOR PROCESS AND PHOTORESIST COATING PROCESS
#1347Coating device and coating film forming method
#1348Flow control feedback system and method of automatically controlling fluid flow
#1349Method of manufacturing an optical data storage medium, optical data storage medium and apparatus for performing said method
#1350Process for producing photoresist composition, filter, coater and photoresist composition
#1351Apparatus and method for processing a substrate
#1352Method and system for dispensing resist solution
#1353Method for applying a layer to a hydrophobic surface
#1354Thin film coating device, thin film coating method, immersion exposure device, and immersion exposure method
#1355Resist pattern forming apparatus and method thereof
#1356Bake apparatus for use in spin-coating equipment
#1357Apparatus for coating photoresist
#1358Apparatus and method of dispensing photosensitive solution in semiconductor device fabrication equipment
#1359Film forming method, and substrate-processing apparatus
#1360Solvent prewet and method to dispense the solvent prewet
#1361Pattern forming method and manufacturing method of semiconductor device
#1362Device and method for forming improved resist layer
#1363Chemical liquid apparatus and deaerating method
#1364Method for manufacturing a semiconductor device and a cleaning device for stripping resist
#1365Sample surface inspection apparatus and method
#1366Coating film forming apparatus and coating unit
#1367Method and system of coating polymer solution on surface of a substrate
#1368Method, apparatus, system and computer-readable medium for in situ photoresist thickness characterization
#1369Method and system for coating polymer solution on a substrate in a solvent saturated chamber
#1370Substrate treatment apparatus
#1371Coating film forming method and coating film forming apparatus
#1372Substrate processing method and substrate processing system
#1373Method and system of controlling dummy dispense
#1374Photoresist coating process for microlithography
#1375Photo resist dispensing system and method
#1376Mask blanks and method of producing the same
#1377Photoresist supply apparatus and method of controlling the operation thereof
#1378Resist supply apparatus with resist recycling function, coating system having the same and method of resist recycling
#1379PHOTORESIST COATING SYSTEM
#1380Solvent prewet and method to dispense the solvent prewet
#1381Waveguides with high refractive index gratings manufactured by post-patterning infusion
#1382Apparatus and method for dispensing developer onto semiconductor substrate
#1383Resist composition
#1384Semiconductor method of protecting wafer from bevel contamination
#1385Cationic particle containing slurries and methods of using them for CMP of spin-on carbon films
#1386Wet strippable gap fill materials
#1387Joining of pixel wall and photospacers in an electrowetting display