Illumination and displacement device for a projection exposure apparatus

Lithographic patterning process and resists to use therein

Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device

Dendritic compounds, photoresist compositions and methods of making electronic devices

Wynn-dyson imaging system with reduced thermal distortion

Resist composition and method for forming resist pattern

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

Method and apparatus for ultraviolet (UV) patterning with reduced outgassing

Method of lithography

Reflective mask blank and method of manufacturing a reflective mask

Optical writer for flexible foils

Resist composition and patterning process

Substrates and methods of forming a pattern on a substrate

Method for making correction map of dose amount, exposure method, and method for manufacturing semiconductor device

Selective masking by photolithography (SMP) for making electrochemical measurements

Controllable transmission and phase compensation of transparent material

Thin film patterning method and method of manufacturing semiconductor device using the thin film patterning method

Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film

Scanning exposure apparatus using a plurality of microlens arrays with adjustable inclination

Optical wavelength dispersion device and method of manufacturing the same

PHOTOMASK AND PATTERN FORMATION METHOD

Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method

Method for producing microstructure

Dose responsive UV indicator

Method of lithography

PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD

Circuit apparatus having a rounded trace

Digital optical chemistry micromirror imager

Method of improving print performance in flexographic printing plates

Applications of semiconductor nano-sized particles for photolithography

Reflective mask blank and method of manufacturing a reflective mask

Photosensitive ink compositions and transparent conductors and method of using the same

ELECTROCHEMICAL CELL

Electrochemical cell

ELECTROCHEMICAL CELL

Color filter manufacturing method, patterned substrate manufacturing method, and small photomask

METHOD FOR PRODUCING LAYERED MATERIALS USING LONG-LIVED PHOTO-INDUCED ACTIVE CENTERS

Substrate patterning using a digital optical chemistry micromirror imager

Methods for the synthesis of arrays of DNA probes

Oxime ester photoinitiators

Exposure method and exposure apparatus

LITHOGRAPHY APPARATUS AND MANUFACTURING METHOD USING THE SAME

APPLICATIONS OF SEMICONDUCTOR NANO-SIZED PARTICLES FOR PHOTOLITHOGRAPHY

Applications of semiconductor nano-sized particles for photolithography

Exposure device with mechanism for forming alignment marks and exposure process conducted by the same

Enhancing photoresist performance using electric fields

Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method

Resists for lithography

Photolithographic method and apparatus employing a polychromatic mask

Composition for forming pattern and in-plane printing method using the same

Method of forming three-dimensional lithographic pattern

Digital optical chemistry micromirror imager

Method for forming a interference fringe and method for forming a interference pattern

Method of manufacturing a LIGA mold by backside exposure

Planographic printing method, original printing plate and printing press

Maskless photolithography for etching and deposition

Maskless photolithography for using photoreactive agents

Plate exposing apparatus

Process of preparing planographic printing plate

Exposure apparatus and method

Exposure apparatus and method

Exposure apparatus and method

Liquid transfer articles and method for producing the same using digital imaging photopolymerization

Liquid transfer articles and method for producing the same using digital imaging photopolymerization

Projection exposure apparatus and method

Method of forming optical images, diffration element for use with this method, apparatus for carrying out this method

Enhancing photoresist performance using electric fields

Methods for forming ordered and disordered nanovoided composite polymers

Method for adhering embellishments to a glass substrate

Resist composition

In-plane scanning probe microscopy tips and tools for wafers and substrates with diverse designs on one wafer or substrate

Methods of producing multicolor images in a single layer of cholesteric liquid crystal polymer

Liquid duct for an electrowetting display

In-plane scanning probe microscopy tips and tools for wafers and substrates with diverse designs on one wafer or substrate

Electrowetting display pixel walls and spacers having surface features

Joining of pixel wall and photospacers in an electrowetting display

Unsaturated monomeric formulations for the fabrication of polymeric waveguides

Forming conductive metal patterns using water-soluble copolymers

Pattern formation using electroless plating and articles