177063 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image; Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
Sub-classes:SYSTEM AND METHOD FOR MITIGATING TRAILING EDGE VOIDS IN FLEXO PRINTING
#2TRANSITION METAL CLUSTER COMPOUND, PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING SUBSTRATE
#3HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
#4HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
#5METHOD FOR IMAGING A MASK LAYER WITH TWO IMAGING SETTINGS AND ASSOCIATED IMAGING SYSTEM
#6HYBRID METHOD OF FORMING MICROSTRUCTURE ARRAY MOLDS, METHODS OF MAKING MICROSTRUCTURE ARRAYS, AND METHODS OF USE
#7POLYMER, COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE COMPOSITION
#8Material For Forming Organic Film, Patterning Process, And Organic Film Compound
#9METHOD FOR PRODUCING FLEXIBLE PRINTED WIRING BOARD
#10Composition For Forming Silicon-Containing Resist Underlayer Film And Patterning Process
#11Material For Forming Adhesive Film, Patterning Process, And Method For Forming Adhesive Film
#12FABRICATION OF EUV MASKS USING A COMBINATION OF MONOLAYER LITHOGRAPHY AND AREA SELECTIVE DEPOSITION
#13RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#14SYSTEM AND METHOD FOR MITIGATING TRAILING EDGE VOIDS IN FLEXO PRINTING
#15CHEMICAL-RESISTANT PROTECTIVE FILM
#16METHOD FOR FORMING CONTINUOUS LINE-END TO LINE-END SPACES WITH SPACER ASSISTED LITHOGRAPHY-ETCH-LITHOGRAPHY ETCH PROCESSES
#17COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND
#18IMPRINT METHOD FOR FABRICATION OF LOW DENSITY NANOPORE MEMBRANE
#19RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM
#20QUANTUM DOT LIGHT-EMITTING DEVICE AND MANUFACTURING METHOD THEREOF
#21RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM
#22Method for exposing photopolymerization layer comprising photopolymer
#23FLOW CELLS AND METHODS FOR MAKING THE SAME
#24Metal circuit structure based on FPC and method of making the same
#25HARDMASK COMPOSITION, HARDMASK LAYER, AND PATTERN FORMING METHOD
#26APPARATUS FOR POST EXPOSURE BAKE OF PHOTORESIST
#27METHODS FOR MAKING FLOW CELLS
#28Laminate for patterned substrates
#29Coating compositions and methods of forming electronic devices
#30HYBRID METHOD OF FORMING MICROSTRUCTURE ARRAY MOLDS, METHODS OF MAKING MICROSTRUCTURE ARRAYS, AND METHODS OF USE
#31Aromatic underlayer
#32Ultra-High Resolution Conductive Traces Flexible Biocomposites by Resist Stenciling
#33Display substrate, method for preparing the same, and display device
#34Laminate for patterned substrates
#35Photosensitive resin composition
#36Relief image-forming method and assembly
#37Mask element precursor and relief image-forming system
#38Composite panel with barrier layer and method for manufacturing a letterpress plate
#39Automated UV-LED exposure of flexographic printing plates
#40Method for producing a flexographic printing frame through multiple exposures using UV LEDS
#41Method for producing liquid crystal display apparatus with a uniform cell gap
#42Pattern formed body
#43Photo mask and exposure system
#44Pattern forming method
#45Method of manufacturing mask and method of manufacturing display device
#46Automated UV-LED exposure of flexographic printing plates
#47Pattern formation method
#48Patterning method using surface plasmon
#49Mask forming imageable material and use
#50Method for patterning flexible substrate
#51Method for patterning flexible substrate
#52Composition for forming tungsten oxide film and method for producing tungsten oxide film using same
#53Mask forming imageable material and use
#54Pattern forming method, alkali-developable thermosetting resin composition, printed circuit board and manufacturing method thereof
#55Techniques for generating three dimensional structures
#56Method to increase the pattern density of integrated circuits using near-field EUV patterning technique
#57Techniques for marking product housings
#58Method for making a retarder
#59PROCESS FOR PRODUCING FINE PATTERN
#60Method of fabricating nanostructure array and device including nanostructure array
#61Integrated color mask
#62Method of producing a relief image for printing
#63Method of producing a relief image for printing
#64Embedded vertical optical grating for heterogeneous integration
#65Method for patterning flexible substrate
#66METHOD FOR NANOPATTERNING USING NANOMASKS AND LIGHT EXPOSURE
#67Method for preparing a printing form
#68PATTERN FORMATION METHOD
#69Exposing method and method of manufacturing semiconductor device
#70Enhanced relief printing plate
#71Techniques for marking product housings
#72Integrated color mask
#73Method of producing a relief image for printing
#74Wet strippable gap fill materials
#75Method of forming patterns