177056 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
Sub-classes:MAIN CHAIN SCISSIONABLE BLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS
#2ILLUMINATION OPTICAL SYSTEM INCLUDING TEMPERATURE COMPENSATED APERTURE
#3LAMINATE, PROCESS FOR MANUFACTURING LAMINATE, AND PATTERNING PROCESS
#4POLYMERS WITH PHOTOSELECTIVE POLYMERIZATION AND DEGRADATION PATHWAYS
#5EUV PHOTOMASK AND RELATED METHODS
#6LASER SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD
#7MICROCHANNEL CHIP AND METHOD FOR PRODUCING THE SAME
#8IRRADIATION UNIT, LAMP UNIT, AND LAMP HOLDER
#9DRY FILM MEMBRANE TENTING
#10SEMICONDUCTOR DEVICE
#11RESIST COMPOSITION, DRY FILM RESIST, METHOD FOR PRODUCING DRY FILM RESIST, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PLATED OBJECT
#12PSEUDO-HOMOGENEOUS PHOTO-PATTERNABLE SEMICONDUCTING POLYMER BLENDS FOR ORGANIC THIN-FILM TRANSISTORS (OTFT)
#13SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHODS OF FORMING PATTERNS USING THE COMPOSITION
#14OBJECT HOLDING DEVICE, EXPOSURE DEVICE, OBJECT MOVING METHOD, AND OBJECT HOLDING SYSTEM
#15SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
#163D MICRO-CURVED EPITAXIAL STRUCTURE AND PREPARATION METHOD
#17SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS
#18SELECTIVE DEPOSITION OF CARBON ON PHOTORESIST LAYER FOR LITHOGRAPHY APPLICATIONS
#19PELLICLE FOR FLAT PANEL DISPLAY PHOTOMASK
#20METHODS OF ESTIMATING LINE WIDTH AND SYSTEMS THEREOF
#21Method of Using and Fabricating a Nanoimprint Template with a Mesa Sidewall Coating
#22STATUS MONITORING AND REPORTING FOR ULTRAVIOLET LIGHT SOURCES
#23SEMICONDUCTOR STRUCTURE INSPECTION METHOD, EXTREME ULTRAVIOLET (EUV) MASK INSPECTION METHOD, AND EUV LITHOGRAPHY METHOD
#24TIN COMPOUND, TIN COMPOSITION, PRODUCING METHODS THEREOF, RESIST SOLUTION, PATTERN FORMING METHOD, THIN FILM, PATTERNED THIN FILM, AND METHOD FOR PRODUCING SUBSTRATE
#25FABRICATION OF DENTAL APPLIANCES FROM PHASE-SEPARATED COMPOSITIONS
#26ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
#27UV NANOIMPRINTED LITHOGRAPHIC DEVICES MADE FROM POLYCYCLOOLEFINIC POLYMERS FOR MICROFLUIDICS
#28SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR PACKAGE
#29CATALYST-FREE CROSSLINKING OF PROPIOLATE-ESTER-FUNCTIONALIZED MOLECULES AND POLYMERS
#30METHOD OF FABRICATING AND SERVICING A PHOTOMASK
#31Dual-modal information storage and anti-counterfeiting material, and its preparation method
#32SUBSTRATE PROCESSING METHOD, COMPUTER RECORDING MEDIUM, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING APPARATUS
#33MICROFLUIDIC POROUS MEMBRANE ELECTRICAL CELL-SUBSTRATE IMPEDANCE SENSING
#34PRINTED CIRCUIT BOARD MANUFACTURING PROCESS AND PRINTED CIRCUIT BOARD
#35METHOD FOR PRODUCING PRINTING PLATE AND PRINTING METHOD
#36IMAGING SYSTEM
#37Method of manufacturing photo masks
#38Tissue Scaffold with Patterned Microstructure
#39EUV SENSITIVE METAL OXIDE MATERIAL AS UNDERLAYER FOR THIN CAR TO IMPROVE PATTERN TRANSFER
#40FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF FLEXOGRAPHIC PRINTING PLATE
#41PHOTORESIST PROCESS
#42PHOTOLITHOGRAPHY METHOD BASED ON BILAYER PHOTORESIST
#43LASER SYSTEM, PULSE LASER LIGHT GENERATING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD
#44RADIATIVE COOLING FILM WITH SURFACE PERIODIC MICRO-NANO STRUCTURE AND PREPARATION METHOD
#45Pellicle for flat panel display photomask
#46METHOD AND ARRANGEMENT FOR DETERMINING THERMALLY-INDUCED DEFORMATIONS
#47TIN CARBOXYLATE PRECURSORS FOR METAL OXIDE RESIST LAYERS AND RELATED METHODS
#48EXPOSURE APPARATUS
#49SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS
#50EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF MANUFACTURING OPTICALLY-ANISOTROPIC LAYER
#51DIELECTRIC FILM FORMING COMPOSITION CONTAINING ACYL GERMANIUM COMPOUND
#52PHOTO-DEFINABLE HYDROPHOBIC COMPOSITIONS
#53Systems for fabricating appliances from polymerizable compositions
#54Polymer, Resist Composition, And Patterning Process
#55Electronic device and method for manufacturing target substrate
#56DEPOSITION DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE USING THE SAME
#57PHOTORESIST HAVING STRENGTHENING MATERIAL
#58CRITICAL DIMENSION INSPECTION METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME
#59COMPOSITION INCLUDING QUANTUM DOT, MANUFACTURING METHOD QUANTUM DOT AND COLOR FILTER
#60IMPRINT APPARATUS, IMPRINT METHOD AND ARTICLE MANUFACTURING METHOD
#61EUV PHOTOMASK AND RELATED METHODS
#62SEMICONDUCTOR DEVICE
#63PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN
#64BLOCK COPOLYMER FOR LITHOGRAPHY AND LITHOGRAPHY METHOD USING THE SAME
#65PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM, CURED FILM, INTERLAYER INSULATING FILM, COVER COAT LAYER, SURFACE PROTECTION FILM, AND ELECTRONIC COMPONENT
#66Dry Developing Metal-Free Photoresists
#67PATTERN FORMING METHOD, KIT, AND RESIST COMPOSITION
#68COMPOSITION FOR FORMING UNDERLAYER FILM, COLOR FILTER, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE
#69Method of fabricating and servicing a photomask
#70Resist underlayer film-forming composition containing indolocarbazole novolak resin
#71METHOD OF MANUFACTURING OPTICAL ELEMENT AND OPTICAL EXPOSURE SYSTEM
#72Method of lithography process and transferring a reticle
#73Quantum dot-polymer composite pattern, production method thereof, and electronic device including the same
#74Method of manufacturing photo masks
#75SEMICONDUCTOR FABRICATION APPARATUS
#76ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
#77LOW OXYGEN SCANNING UV SOURCE WITH LOCALIZED PURGE
#78Mask orientation
#79Systems and Methods for Biological Analysis
#80LITHOGRAPHIC METHOD BY USING A PHOTOMASK CONTAINED IN A TRANSPARENT POD
#81Pellicle for flat panel display photomask
#82OPTICAL DEVICES AND METHODS FOR MANUFACTURING THE OPTICAL DEVICES
#83PHOTOCURABLE POLYMER COMPOSITIONS
#84PHOTOCHEMICAL AND THERMAL RELEASE LAYER PROCESSES AND USES IN DEVICE MANUFACTURING
#85METHOD FOR FORMING A PATTERN
#86RADIATION SENSITIVE COMPOSITION
#87Light irradiation device, and exposure apparatus provided therewith
#88Method of forming a pattern
#89Organometallic solution based high resolution patterning compositions
#90Organometallic solution based high resolution patterning compositions
#91Organometallic solution based high resolution patterning compositions
#92Methods for fabricating appliances from polymerizable compositions
#93Resist underlayer film-forming composition containing indolocarbazole novolak resin
#94PAG-FREE POSITIVE CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHODS OF USING THE SAME
#95Method of making semiconductor device and semiconductor device
#96Organometallic solution based high resolution patterning compositions
#97Radiation-sensitive resin composition and method for forming pattern
#98Chemical Composition for Tri-Layer Removal
#99LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF USE
#100SUBSTRATES FOR ELECTRONIC SKINS
#101Method of fabricating and servicing a photomask
#102Photosensitive resin composition, polyimide production method, and semiconductor device
#103Method of manufacturing photo masks
#104Method of lithography process using reticle container with discharging device
#105Resist Composition
#106Method of creating a design on a helmet
#107SPIKE SPECTRUM OUTPUT-TYPE PRESSURE SENSOR COMPRISING ELECTROLYTE, AND METHOD FOR MANUFACTURING SAME
#108NANOIMPRINT LITHOGRAPHY PROCESSES FOR SWITCHING MECHANICAL PROPERTIES OF IMPRINT MATERIALS
#109Mask orientation
#110Semiconductor structure and manufacturing method thereof
#111Flow cells and methods for making the same
#112EXPOSING APPARATUS AND METHOD FOR MANUFACTURING ARTICLE
#113Overlay pattern
#114Method for manufacturing a part comprising at least one three-dimensional metallised pattern
#115NANOIMPRINT LITHOGRAPHY PROCESS USING LOW SURFACE ENERGY MASK
#116FLEXOGRAPHIC PRINTING PLATE PRECURSOR, IMAGING ASSEMBLY AND USE
#117Selective deposition of carbon on photoresist layer for lithography applications
#118Pellicle for flat panel display photomask
#119UV patternable polymer blends for organic thin-film transistors
#120Frame member for electron beam lithography device and electron beam lithography device
#121PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN
#122EUV PHOTOMASK AND RELATED METHODS
#123Photomask, photolithography system and manufacturing process
#124Pattern forming method and template manufacturing method
#125Photosensitive resin composition, pattern forming method, cured film, laminate, and device
#126Quantum dot-polymer composite film, method of manufacturing the same, and device including the same
#127THREE-DIMENSIONAL SHAPED MICROPARTICLES HAVING PROTECTED REGIONS FOR HOLDING CELLS AND USES THEREOF
#128Metal mask
#129Method of fabricating a photomask and method of inspecting a photomask
#130Mask orientation
#131Photosensitive bismaleimide composition
#1323D/flip/motion photo-substrate, imaging processes, and applications thereof
#133Phase-change memory with no drift
#134Methods and apparatus for creating a large area imprint without a seam
#135Imprinted substrates
#136Splicing nano-imprint template with repair adhesive layer, repair method of splicing seam thereof, and manufacturing method thereof
#137Processing method for multi-row, multi-column flat lens with equivalent negative refractive index
#138Sulfonium salt, photoacid generator, curable composition, and resist composition
#139Method of forming a narrow trench
#140Method for fabricating spherical concave mirror in optical waveguide based on ultraviolet grayscale lithography
#141Substrate processing apparatus, substrate processing method, and storage medium
#142Method of manufacturing photo masks
#143Photolithography for Making Electrochemical Measurements
#144Positive tone photopatternable silicone
#145Process for modification of a solid surface
#146Methods of forming a pattern and methods of fabricating a semiconductor device
#147Stepped substrate coating composition containing compound having curable functional group
#148System and method of planarization control using a cross-linkable material
#149Method of designing a mask and method of manufacturing a semiconductor device using the same
#150METHOD OF FORMING INSULATING LAYER
#1513D printed composites from a single resin by patterned light exposures
#152Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and polymer
#153Directly photo-patternable, stretchable, electrically conductive polymer
#154Chemical composition for tri-layer removal
#155Method for selective delamination and transfer of thin film using liquid platform
#156Broadband, polarization-independent, omnidirectional, metamaterial- based antireflection coating
#157PHOTOSENSITIVE COLORING COMPOSITION, CURED FILM, METHOD FOR FORMING PATTERN, COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE
#158Quantum dot-polymer composite pattern, production method thereof, and electronic device including the same
#159Processing apparatus and method thereof
#160Exposure apparatus and exposure method, and flat panel display manufacturing method
#161Method of forming an apparatus comprising perovskite
#162Photomask design for generating plasmonic effect
#163PHOTOSENSITIVE RESIN COMPOSITION, POLYIMIDE PRODUCTION METHOD, AND SEMICONDUCTOR DEVICE
#164Method of line roughness improvement by plasma selective deposition
#165Variable-etch-depth gratings
#166Array substrate and method for manufacturing the same
#167Light generation method and system
#1683D printed composites from a single resin by patterned light exposures
#169Composition for forming silicon-containing resist underlayer film and patterning process
#170Positive photoresist composition, via-forming method, display substrate and display device
#171Iodine-containing polymers for chemically amplified resist compositions
#172METHOD FOR DOUBLE-SIDED PATTERNING AND METHOD FOR MANUFACTURING TOUCH PANEL
#173Positive resist composition and patterning process
#174Semiconductor device
#175Radiation-sensitive compositions and patterning and metallization processes
#176Optical wavelength dispersion device and manufacturing method therefor
#177Method of forming gratings
#178Methods of forming devices on a substrate
#179Method of manufacturing semiconductor structure
#180Radiation-sensitive composition and resist pattern-forming method
#181MASK BLANK, TRANSFER MASK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#182PHOTOSENSITIVE INK COMPOSITIONS AND TRANSPARENT CONDUCTORS AND METHOD OF USING THE SAME
#183Composition for forming resist underlayer film, resist underlayer film, method for forming resist pattern and method for producing semiconductor device
#184Anti-reflective coating by ion implantation for lithography patterning
#185Lithography mask with both transmission-type and reflective-type overlay marks and method of fabricating the same
#186Hybrid power rail structure
#187Vessel for extreme ultraviolet radiation source
#188Method for globally adjusting spacer critical dimension using photo-active self-assembled monolayer
#189Apparatus and method for monitoring reflectivity of the collector for extreme ultraviolet radiation source
#190Method of fabricating and servicing a photomask
#191METHOD FOR PERFORATING CARBON NANOMATERIAL, AND METHOD FOR PRODUCING FILTER MOLDED ARTICLE
#192Method and apparatus for determining a radiation beam intensity profile
#193LITHOGRAPHIC PRINTING PLATE PRECURSOR AND COLOR-FORMING COMPOSITION
#194Semiconductor structure and manufacturing method thereof
#195Tunable adhesion of EUV photoresist on oxide surface
#196MASK AND CONTROL METHOD THEREOF
#197Photosensitive middle layer
#1983D printed composites from a single resin by patterned light exposures
#199Method of simulating resist pattern, resist material and method of optimizing formulation thereof, apparatus and recording medium
#200Structure and method to improve overlay performance in semiconductor devices
#201Motor assembly, lithographic apparatus and device manufacturing method
#202NOVEL METHOD FOR FABRICATION OF EUV PHOTOMASK FIDUCIALS
#203Photosensitive resin composition and pattern forming process
#204Thin film transistor, array substrate, display panel and method for manufacturing thin film transistor
#205Touch panel and manufacturing method thereof
#206Oxime ester photoinitiators
#207Oxime ester photoinitiators
#208Oxime ester photoinitiators
#209RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD
#210Package substrate having polymer-derived ceramic core
#211Method for producing plated shaped structure and photosensitive resin composition for production of plated shaped structures
#212Organic EL display device
#213Blocking layer material composition and methods thereof in semiconductor manufacturing
#214Extreme ultraviolet photoresist and method
#215Systems and methods for biological analysis
#216Method for manufacturing substrate equipped with wiring electrode, and substrate equipped with wiring electrode
#217Positive-type photosensitive resin composition and cured film prepared therefrom
#218Organometallic solution based high resolution patterning compositions
#219Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
#220Substrate processing apparatus
#221TRANSFERRING EUV RESIST PATTERN TO ELIMINATE PATTERN TRANSFER DEFECTIVITY
#222Nanoimprint lithography process using low surface energy mask
#223Nanoimprint lithography material with switchable mechanical properties
#224Nanoimprint lithography processes for switching mechanical properties of imprint materials
#225Optical arrangement, in particular lithography system, with a transport lock
#226Coating and developing method and coating and developing apparatus
#227Photosensitive compositions and quantum dot polymer composite patterns including the same
#228Mask and control method and use method thereof
#229Methods and apparatus for creating a large area imprint without a seam
#230FUNCTIONAL FILM LAYER PATTERN, DISPLAY SUBSTRATE, METHOD FOR MANUFACTURING DISPLAY SUBSTRATE, AND DISPLAY DEVICE
#231SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING ORGANIC GROUP HAVING DIHYDROXY GROUP
#232Apparatus for lithographically forming wafer identification marks and alignment marks
#233Method for determining a structure-independent contribution of a lithography mask to a fluctuation of the linewidth
#234Negative-type photosensitive resin composition, cured film, element and display device provided with cured film, and production method therefor
#235Relief image-forming method and assembly
#236Method for producing resist pattern coating composition with use of solvent replacement method
#237Chemical liquid, chemical liquid storage body, pattern forming method, and kit
#2383D/FLIP/MOTION PHOTO-SUBSTRATE, IMAGING PROCESSES, AND APPLICATIONS THEREOF
#239Mask plate, display substrate, method for manufacturing display substrate, and display device
#240Buffer layer to prevent etching by photoresist developer
#241Resist composition, method of forming resist pattern, polymeric compound, and copolymer
#242Photosensitive composite material and method for forming composite film using the same
#243ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE
#244Photomask and exposure method
#245Resist underlayer composition, and method of forming patterns using the composition
#246Tunable adhesion of EUV photoresist on oxide surface
#247System and method for producing an optical mask for surface treatment, and surface treatment plant and method
#248METHOD FOR FABRICATING BROADBAND NEAR INFRARED PLASMONIC WAVEGUIDE
#249Silsesquioxane resin and oxaamine composition
#250Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method of manufacturing electronic device, compound, and resin
#251Liquid discharge apparatus, imprint apparatus, and method
#252Anti-reflective coating by ion implantation for lithography patterning
#253Patterning process
#254Array substrate assembly, method of manufacturing array substrate assembly, display panel and display apparatus
#255Mask for generating features in a microwell plate
#256CONTROL APPARATUS, CONTROL SYSTEM, AND CONTROL METHOD
#257DRY ETCHING COMPOSITION, KIT, PATTERN FORMATION METHOD, AND METHOD OF MANUFACTURING OPTICAL FILTER
#258Method of manufacturing substrate of organic light-emitting display device
#259Method of manufacturing photo masks
#260Photoresist composition and method of forming photoresist pattern
#261Positive photoresist composition, via-forming method, display substrate and display device
#262Inspection method of a photomask and an inspection system
#263Method of forming a passivation layer
#264Polyimides
#265Composition including quantum dot, manufacturing method quantum dot and color filter
#266Salt and photoresist composition containing the same
#267Method for manufacturing display panel, display panel and display device
#268Method of fabricating integrated circuit devices
#269CELL CULTURE BASE MATERIAL FOR TRAIT INDUCTION CONTROL OF MESENCHYMAL STEM CELLS AND TRAIT CONTROL METHOD THEREOF
#270Method for fabricating planarization layer
#271Methods of forming semiconductor device structures
#272Exposure device, substrate processing apparatus, exposure method and substrate processing method
#273Dielectric film forming composition
#274Exposure apparatus and method
#275Reticles for lithography
#276Dielectric film forming composition
#277Photosensitive resin composition, polyimide production method, and semiconductor device
#278Chemical composition for tri-layer removal
#279Photolithography process and photolithography apparatus
#280Method of determining a parameter of a pattern transfer process, device manufacturing method
#281Method for fabricating array substrate, array substrate and display device
#282Wafer table chuck having a particle recess
#283Photosensitive microcapsules
#284Wire grid polarizer manufacturing method
#285Silicon-containing underlayers
#286Composite member and method of manufacturing the same, and aliphatic polycarbonate-containing layer
#2873D printed composites from a single resin by patterned light exposures
#288Treatment liquid, method of manufacturing treatment liquid, pattern forming method, and method of manufacturing electronic device
#289Mask for thin film deposition, method of manufacturing the same, and method of manufacturing a display apparatus using the same
#290Glass member for display device, method of fabricating the glass member, and display device including the glass member
#291Compound, resin, composition, resist pattern formation method, and circuit pattern formation method
#292Photomask design for generating plasmonic effect
#293OPTICAL DEVICES FOR AUTHENTICATION AND METHODS OF MAKING SAME
#294COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
#295Iodine-containing polymers for chemically amplified resist compositions
#296RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZOLE NOVOLAK RESIN
#297Flexible, biodegradable, and biocompatible supercapacitors
#298Element chip manufacturing method
#299Extreme ultraviolet photoresist and method
#300Method of providing photopatterned functional surfaces