Patents-Review.com
ClassID:

177077 ⎘

G03F7/2045 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure; Apparatus therefor using originals with apertures, e.g. stencil exposure masks

Sub-classes:
Recent Application in this class:
#1
20250353292
2025-11-20

SCREEN MASK FOR SCREEN PRINTING AND MANUFACTURING METHOD OF THE SAME

 #2
20250166991
2025-05-22

WAFER BOW COMPENSATION BY PATTERNED UV CURE

 #3
20240186100
2024-06-06

BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

 #4
20230251576
2023-08-10

SEMICONDUCTOR FABRICATION APPARATUS

 #5
20220197150
2022-06-23

Method and system for nanoscale data recording

 #6
20220019147
2022-01-20

CIRCUIT PATTERN FORMING SHEET, CIRCUIT PATTERN MANUFACTURING APPARATUS, CIRCUIT PATTERN MANUFACTURING METHOD, AND CIRCUIT PATTERN MANUFACTURING PROGRAM

 #7
20210389585
2021-12-16

Stretchable transparency-adjusting film having an orientated heterogeneous interface, method for manufacturing the same and smart window having stretchable transparency-adjusting film

 #8
20210124273
2021-04-29

Method and system for nanoscale data recording

 #9
20210048749
2021-02-18

Method and process for stochastic driven detectivity healing

 #10
20180246411
2018-08-30

Custom multiwell plate design for rapid assembly of photo-patterned hydrogels

 #11
20180196342
2018-07-12

Devices and methods for non-planar photolithography of nail polish

 #12
20180157177
2018-06-07

Exposure device

 #13
20180139849
2018-05-17

Circuit pattern forming sheet, circuit pattern manufacturing apparatus, circuit pattern manufacturing method, and circuit pattern manufacturing program

 #14
20170307981
2017-10-26

EXPOSURE METHOD AND EXPOSURE MACHINE

 #15
20170229492
2017-08-10

Mask plate and method for manufacturing array substrate

 #16
20170146831
2017-05-25

Mask Device for Optical Alignment and Equipment Thereof

 #17
20160334649
2016-11-17

Mask processing using films with spatially selective birefringence reduction

 #18
20160238940
2016-08-18

Exposure device and exposure method

 #19
20160162624
2016-06-09

Methods for optical proximity correction in the design and fabrication of integrated circuits using extreme ultraviolet lithography

 #20
20160133458
2016-05-12

Generalization of shot definitions for mask and wafer writing tools

 #21
20150348775
2015-12-03

Projection patterning with exposure mask

 #22
20150235840
2015-08-20

Apparatus and method for irradiating

 #23
20150234283
2015-08-20

Special layout design printed rectangular pattern and improved pattern critical dimension uniformity

 #24
20150070672
2015-03-12

LIGHT EXPOSURE METHOD, LIGHT EXPOSURE DEVICE, AND REFLECTIVE PROJECTION LIGHT EXPOSURE MASK

 #25
20150049324
2015-02-19

Adaptive photomasks and methods for using the same

 #26
20140329173
2014-11-06

Reticles for use in forming implant masking layers and methods of forming implant masking layers

 #27
20140127612
2014-05-08

Photomask for exposure and method of manufacturing pattern using the same

 #28
20140038103
2014-02-06

Lithography using photoresist with photoinitiator and photoinhibitor

 #29
20140030637
2014-01-30

Reticles for use in forming implant masking layers and methods of forming implant masking layers

 #30
20140017603
2014-01-16

Optical element, illumination device, measurement apparatus, photomask, exposure method, and device manufacturing method

 #31
20120312774
2012-12-13

Illuminating waveguide fabrication method

 #32
20120257183
2012-10-11

Nanolithography system

 #33
20100075259
2010-03-25

Illuminating waveguide fabrication method

 #34
20100073657
2010-03-25

Nanolithography system

 #35
20070125969
2007-06-07

Nanolithography system

 #36
20050106861
2005-05-19

Resistless lithography method for fabricating fine structures