Patents-Review.com
ClassID:

177078 ⎘

G03F7/2047 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure; Apparatus therefor using originals with apertures, e.g. stencil exposure masks Exposure with radiation other than visible light or UV light, e.g. shadow printing, proximity printing

Recent Application in this class:
#1
20240369933
2024-11-07

MATERIALS AND METHODS FOR DRY RESIST TECHNOLOGY

 #2
20240201583
2024-06-20

PHYSICALLY DETECTABLE ID INTRODUCED BY LITHOGRAPHY SRAF INSERTION FOR HETEROGENEOUS INTEGRATION

 #3
20240118624
2024-04-11

PRINTING PLATE EXPOSURE METHOD AND APPARATUS WITH REDUCED THERMAL POLYMERIZATION

 #4
20240004300
2024-01-04

METHOD OF PROCESSING A SUBSTRATE

 #5
20230408903
2023-12-21

SHADOW MASK AND METHOD OF MANUFACTURING BLANK MASK USING THE SAME

 #6
20230084088
2023-03-16

METHODS AND SYSTEMS FOR PHOTOPATTERNING AND MINIATURIZATION

 #7
20210157239
2021-05-27

Method for making photolithography mask plate

 #8
20210018841
2021-01-21

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION AND PATTERN FORMATION METHOD

 #9
20200150525
2020-05-14

Method for making microstructures and photolithography mask plate

 #10
20200026202
2020-01-23

Method of manufacturing pattern and article manufacturing method

 #11
20190361346
2019-11-28

Resist composition, and method of forming resist pattern

 #12
20190346764
2019-11-14

Chemical liquid, chemical liquid storage body, and pattern forming method

 #13
20190310550
2019-10-10

Method for applying curable gellant composition for digital embossing and other raised print applications

 #14
20190250502
2019-08-15

Mask structure and manufacturing method thereof

 #15
20180157163
2018-06-07

Photolithography mask plate

 #16
20180070452
2018-03-08

Manufacturing method of circuit substrate and mask structure and manufacturing method thereof

 #17
20170102617
2017-04-13

Method for making a micro- or nano-scale patterned layer of material by photolithography

 #18
20170010531
2017-01-12

Photoresist composition for extreme ultraviolet and method of forming photoresist pattern using the same

 #19
20140146298
2014-05-29

Device for manufacturing a surface using character projection lithography with variable magnification

 #20
20140023973
2014-01-23

Extreme ultraviolet/soft X-ray laser nano-scale patterning using the demagnified talbot effect

 #21
20110045409
2011-02-24

Method and system for manufacturing a surface using character projection lithography with variable magnification

 #22
20090158236
2009-06-18

Semiconductor device fabrication method and fabrication apparatus using a stencil mask

 #23
20080074656
2008-03-27

Defining a pattern on a substrate

 #24
20050280792
2005-12-22

Defining a pattern on a substrate

 #25
20050170268
2005-08-04

Semiconductor device fabrication method and fabrication apparatus using a stencil mask

 #26
15894813
2020-01-07

Electron flood lithography

 #27
15443196
2018-05-15

Method and system for controlled ultraviolet light exposure