ClassID:

177080

G03F7/2051 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure; Apparatus therefor Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source

Sub-classes:
Recent Application in this class:
#1
20250244684
2025-07-31

SUBSTARATE PROCESSING APPARATUS WITH VUV INTENSITY CONTROL

#2
20250076768
2025-03-06

DIGITAL LITHOGRAPHY APPARATUS WITH AUTOFOCUS POSITION CONTROL AND METHODS OF USE THEREOF

#3
20250076767
2025-03-06

SYSTEMS AND METHODS FOR DIGITAL LITHOGRAPHY SCAN SEQUENCING

#4
20250068086
2025-02-27

MASKLESS PHOTOLITHOGRAPHY PROCESS FOR THE SYNTHESIS OF METALLIC NANOSTRUCTURES OF FRACTAL GEOMETRY DIRECTLY ON 2D PRINTED CARBON-BASED NANOSHEETS UNDER ROOM TEMPERATURE UV IRRADIATION

#5
20240408595
2024-12-12

STRUCTURE COMPRISING MICROCHANNEL, PRODUCTION METHOD FOR SAID STRUCTURE, AND MICROCHANNEL DEVICE

#6
20240255854
2024-08-01

ENHANCING EFFICIENCY OF RESIST PATTERNING

#7
20240248407
2024-07-25

METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING

#8
20240077805
2024-03-07

Maskless based lithography methods

#9
20240036471
2024-02-01

MASKLESS EXPOSURE DEVICE AND DISPLAY DEVICE

#10
20230400776
2023-12-14

Multi Pattern Maskless Lithography Method and System

#11
20230350305
2023-11-02

Manufacturing method for cured substance, manufacturing method for laminate, and manufacturing method for semiconductor device, and treatment liquid

#12
20230296987
2023-09-21

TOOL DRIFT COMPENSATION WITH MACHINE LEARNING

#13
20230288812
2023-09-14

METHODS TO IMPROVE PROCESS WINDOW AND RESOLUTION FOR DIGITAL LITHOGRAPHY WITH TWO EXPOSURES

#14
20230288798
2023-09-14

PHOTORESISTS CONTAINING TANTALUM

#15
20230168588
2023-06-01

MASKLESS PHOTOLITHOGRAPHY DEVICES, METHODS, AND SYSTEMS

#16
20230084088
2023-03-16

METHODS AND SYSTEMS FOR PHOTOPATTERNING AND MINIATURIZATION

#17
20220197150
2022-06-23

Method and system for nanoscale data recording

#18
20220019147
2022-01-20

CIRCUIT PATTERN FORMING SHEET, CIRCUIT PATTERN MANUFACTURING APPARATUS, CIRCUIT PATTERN MANUFACTURING METHOD, AND CIRCUIT PATTERN MANUFACTURING PROGRAM

#19
20210351069
2021-11-11

Methods for variable etch depths

#20
20210318620
2021-10-14

SYSTEMS AND METHODS FOR OPTIMIZATION OF PARAMETERS FOR EXPOSING FLEXOGRAPHIC PHOTOPOLYMER PLATES

#21
20210247697
2021-08-12

Method and apparatus for illuminating image points

#22
20210223695
2021-07-22

DEVELOPMENT METHOD AND TREATMENT METHOD FOR PATTERNING METAL LAYER

#23
20210132501
2021-05-06

Digital exposure machine and exposure control method thereof

#24
20210124273
2021-04-29

Method and system for nanoscale data recording

#25
20210124271
2021-04-29

Maskless photolithography devices, methods, and systems

#26
20200409269
2020-12-31

Light irradiating device, light irradiating method and recording medium

#27
20200401048
2020-12-24

Digital masking system, pattern imaging apparatus and digital masking method

#28
20200379356
2020-12-03

Method and system for nanoscale data recording

#29
20200247038
2020-08-06

Digital Projection System for the Development of Photolithography Devices

#30
20200201188
2020-06-25

Image exposure device

#31
20200183276
2020-06-11

Photoactive Catalyst Compositions

#32
20200166850
2020-05-28

Method and system for nanoscale data recording

#33
20200142108
2020-05-07

Grating structure, manufacturing method thereof and display device

#34
20200124969
2020-04-23

Method for manufacturing array substrate and method for manufacturing liquid crystal antenna

#35
20190384161
2019-12-19

Liquid masks for microfabrication processes

#36
20190302620
2019-10-03

MASKLESS PHOTOLITHOGRAPHY DEVICES, METHODS, AND SYSTEMS

#37
20190294048
2019-09-26

Systems, devices, and methods for printing on three-dimensional objects

#38
20190293924
2019-09-26

Method and device for exposure of photosensitive layer

#39
20190287795
2019-09-19

Critical dimension correction via calibrated trim dosing

#40
20190258080
2019-08-22

Creating rewritable lenses

#41
20190243250
2019-08-08

Line edge roughness reduction via step size alteration

#42
20190219099
2019-07-18

LM guide assembling method using half division and computer-readable record medium having program recorded for executing same

#43
20190155167
2019-05-23

Method and system for nanoscale data recording

#44
20190146347
2019-05-16

Maskless exposure method, maskless exposure apparatus and method of manufacturing a semiconductor device using the same

#45
20190129308
2019-05-02

DIGITAL MASKING SYSTEM, PATTERN IMAGING APPARATUS AND DIGITAL MASKING METHOD

#46
20190043765
2019-02-07

Critical dimension control by use of a photo agent

#47
20190024268
2019-01-24

Method for manufacturing pattern for electronic devices, and fiber-type electronic device comprising the pattern for electronic devices

#48
20180329302
2018-11-15

Method of providing photopatterned functional surfaces

#49
20180173106
2018-06-21

Nanoscale pattern exposure system

#50
20180164687
2018-06-14

Position adjusting unit of optical element and maskless exposure apparatus including the same

#51
20180139849
2018-05-17

Circuit pattern forming sheet, circuit pattern manufacturing apparatus, circuit pattern manufacturing method, and circuit pattern manufacturing program

#52
20180088460
2018-03-29

System and method for generating mask pattern and exposure system

#53
20180067392
2018-03-08

IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE

#54
20180024436
2018-01-25

Active eye-to-eye with alignment by X-Y capacitance measurement

#55
20170330806
2017-11-16

Critical dimension control by use of a photo agent

#56
20170293226
2017-10-12

Exposure method, exposure equipment and 3-D structure

#57
20170102624
2017-04-13

Grid refinement method

#58
20170097571
2017-04-06

Method of reducing shot count in direct writing by a particle or photon beam

#59
20170068163
2017-03-09

Line edge roughness reduction via step size alteration

#60
20170038690
2017-02-09

Exposure head, exposure apparatus and method of operating an exposure head

#61
20160377987
2016-12-29

System for creating nanoscale patterns

#62
20160357108
2016-12-08

PHOTOCONDUCTIVE LAYER WITH ADJUSTABLE ELECTRICAL PROPERTY

#63
20160246912
2016-08-25

Grid refinement method

#64
20160238941
2016-08-18

Maskless lithography for web based processing

#65
20160211117
2016-07-21

System and method for maskless direct write lithography

#66
20160202606
2016-07-14

CORE-SHELL NANOPARTICLES, METHODS OF MAKING SAME, AND USES OF SAME

#67
20160194300
2016-07-07

Reagent for enhancing generation of chemical species

#68
20160194240
2016-07-07

METHOD OF MANUFACTURING PHOTOSENSITIVE GLASS SUBSTRATE

#69
20160158791
2016-06-09

Metering device for metering a light-curing material in a manually controlled manner

#70
20160147153
2016-05-26

Systems, devices, and methods for printing on three-dimensional objects

#71
20160116846
2016-04-28

Super-resolution exposure system

#72
20160085156
2016-03-24

Maskless digital lithography systems and methods with image motion compensation

#73
20160077449
2016-03-17

Maskless exposure device, maskless exposure method and display substrate manufactured by the maskless exposure device and the maskless exposure method

#74
20160055291
2016-02-25

Grid refinement method

#75
20160041468
2016-02-11

Exposure apparatus and a method for exposing a photosensitive element and a method for preparing a printing form from the photosensitive element

#76
20160011515
2016-01-14

Electric/magnetic field guided acid profile control in a photoresist layer

#77
20150198895
2015-07-16

Method for writing nanoscale patterns

#78
20150185617
2015-07-02

Apparatus and method of direct writing with photons beyond the diffraction limit using two-color resist

#79
20150099070
2015-04-09

Composition for forming resist underlayer film for nanoimprint

#80
20150093706
2015-04-02

METHOD FOR RECORDING AN IMAGE AND ASSOCIATED MEDIUM

#81
20150042971
2015-02-12

Method and system for nanopatterning

#82
20150017397
2015-01-15

Forming method and substrate

#83
20150015859
2015-01-15

Digital exposure device using digital micro-mirror device and a method for controlling the same

#84
20140368806
2014-12-18

Grid refinement method

#85
20140333916
2014-11-13

Method and apparatus for the formation of conductive films on a substrate

#86
20140320840
2014-10-30

Exposure apparatus and exposure method

#87
20140315132
2014-10-23

Exposure apparatus and a method for exposing a photosensitive element and a method for preparing a printing form from the photosensitive element

#88
20140313497
2014-10-23

Exposure apparatus and a method for controlling radiation from a lamp for exposing a photosensitive element

#89
20140300880
2014-10-09

Flow through MEMS package

#90
20140300877
2014-10-09

Programmable photolithography

#91
20140234589
2014-08-21

Methods of patterning block copolymer layers and patterned structures

#92
20140220494
2014-08-07

Pattern generator for a lithography system

#93
20140212798
2014-07-31

Maskless process for pre-tilting liquid crystal molecules

#94
20140170566
2014-06-19

Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image

#95
20140137055
2014-05-15

Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image

#96
20140127628
2014-05-08

Method and system for improving critical dimension uniformity using shaped beam lithography

#97
20140080057
2014-03-20

Composition, process of preparation and method of application and exposure for light imaging paper

#98
20140045121
2014-02-13

Photoresist composition and method of forming a black matrix using the same

#99
20140036244
2014-02-06

METHOD OF EXPOSING A SEMICONDUCTOR WAFER AND EXPOSURE APPARATUS

#100
20130335504
2013-12-19

Optical writer for flexible foils

#101
20130302727
2013-11-14

Photoresist composition and method of forming a color filter using the same

#102
20130287881
2013-10-31

IMPRINT MOLD FOR MANUFACTURING BIT-PATTERNED MEDIUM AND MANUFACTURING METHOD OF THE SAME

#103
20130273475
2013-10-17

Grid refinement method

#104
20130193065
2013-08-01

Fabrication of enclosed nanochannels using silica nanoparticles

#105
20130164688
2013-06-27

Support, lithographic apparatus and device manufacturing method

#106
20130130182
2013-05-23

Method of direct writing with photons beyond the diffraction limit

#107
20120320561
2012-12-20

Optical irradiation apparatus with super luminescent diodes

#108
20120312774
2012-12-13

Illuminating waveguide fabrication method

#109
20120307215
2012-12-06

Flow through MEMS package

#110
20120264065
2012-10-18

Method of optical fabrication of three-dimensional polymeric structures with out of plane profile control

#111
20120257183
2012-10-11

Nanolithography system

#112
20120156592
2012-06-21

Use of patterned UV source for photolithography

#113
20120128891
2012-05-24

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT

#114
20120092632
2012-04-19

Diffraction unlimited photolithography

#115
20120060131
2012-03-08

Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image

#116
20110305996
2011-12-15

Beam pen lithography

#117
20110279798
2011-11-17

Method of exposing a semiconductor wafer and exposure apparatus

#118
20110267594
2011-11-03

Maskless exposure apparatus and stitching exposure method using the same

#119
20110250545
2011-10-13

Composition, process of preparation and method of application and exposure for light imaging paper

#120
20110207054
2011-08-25

Self-aligned, sub-wavelength optical lithography

#121
20110159374
2011-06-30

ELECTROCHEMICAL CELL

#122
20110159373
2011-06-30

Electrochemical cell

#123
20110156316
2011-06-30

ELECTROCHEMICAL CELL

#124
20100151391
2010-06-17

METHOD AND APPARATUS FOR HIGH DENSITY STORAGE OF ANALOG DATA IN A DURABLE MEDIUM

#125
20100075259
2010-03-25

Illuminating waveguide fabrication method

#126
20100073657
2010-03-25

Nanolithography system

#127
20090290891
2009-11-26

Curing of photo-curable printing plates using a light tunnel of mirrored walls and having a polygonal cross-section like a kaleidoscope

#128
20080257873
2008-10-23

Method for Producing Two-Dimensional Periodic Structures in a Polymeric Medium

#129
20080197294
2008-08-21

MANUFACTURING METHOD OF CIRCUIT BOARD

#130
20080165338
2008-07-10

Self-aligned, sub-wavelength optical lithography

#131
20080102225
2008-05-01

Method for Manufacturing a Device Using Imprint Lithography and Direct Write Technology

#132
20080056788
2008-03-06

Image Recording Device and Image Recording Method

#133
20070125969
2007-06-07

Nanolithography system

#134
20060183309
2006-08-17

Method for manufacturing a patterned structure

#135
20060183057
2006-08-17

Patterning method

#136
20060121395
2006-06-08

Maskless photolithography for etching and deposition

#137
20060103719
2006-05-18

Pulse light pattern writer

#138
20050213806
2005-09-29

System and method for manufacturing printed circuit boards employing non-uniformly modified images

#139
20050189499
2005-09-01

Apparatus and method for repairing resist latent images

#140
20050067776
2005-03-31

Method and apparatus for controlling the vacuum distribution in an exposer for printing originals

#141
14868128
2018-08-28

Fabrication of enclosed nanochannels using silica nanoparticles

#142
14607821
2015-12-08

Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems

#143
14607799
2015-11-10

Matched multiple charged particle beam systems for lithographic patterning, inspection, and accelerated yield ramp

#144
14299891
2015-04-07

Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems

#145
14198145
2015-04-07

Matched multiple charged particle beam systems for lithographic patterning, inspection, and accelerated yield ramp