177080 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure; Apparatus therefor Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
Sub-classes:SUBSTARATE PROCESSING APPARATUS WITH VUV INTENSITY CONTROL
#2DIGITAL LITHOGRAPHY APPARATUS WITH AUTOFOCUS POSITION CONTROL AND METHODS OF USE THEREOF
#3SYSTEMS AND METHODS FOR DIGITAL LITHOGRAPHY SCAN SEQUENCING
#4MASKLESS PHOTOLITHOGRAPHY PROCESS FOR THE SYNTHESIS OF METALLIC NANOSTRUCTURES OF FRACTAL GEOMETRY DIRECTLY ON 2D PRINTED CARBON-BASED NANOSHEETS UNDER ROOM TEMPERATURE UV IRRADIATION
#5STRUCTURE COMPRISING MICROCHANNEL, PRODUCTION METHOD FOR SAID STRUCTURE, AND MICROCHANNEL DEVICE
#6ENHANCING EFFICIENCY OF RESIST PATTERNING
#7METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING
#8Maskless based lithography methods
#9MASKLESS EXPOSURE DEVICE AND DISPLAY DEVICE
#10Multi Pattern Maskless Lithography Method and System
#11Manufacturing method for cured substance, manufacturing method for laminate, and manufacturing method for semiconductor device, and treatment liquid
#12TOOL DRIFT COMPENSATION WITH MACHINE LEARNING
#13METHODS TO IMPROVE PROCESS WINDOW AND RESOLUTION FOR DIGITAL LITHOGRAPHY WITH TWO EXPOSURES
#14PHOTORESISTS CONTAINING TANTALUM
#15MASKLESS PHOTOLITHOGRAPHY DEVICES, METHODS, AND SYSTEMS
#16METHODS AND SYSTEMS FOR PHOTOPATTERNING AND MINIATURIZATION
#17Method and system for nanoscale data recording
#18CIRCUIT PATTERN FORMING SHEET, CIRCUIT PATTERN MANUFACTURING APPARATUS, CIRCUIT PATTERN MANUFACTURING METHOD, AND CIRCUIT PATTERN MANUFACTURING PROGRAM
#19Methods for variable etch depths
#20SYSTEMS AND METHODS FOR OPTIMIZATION OF PARAMETERS FOR EXPOSING FLEXOGRAPHIC PHOTOPOLYMER PLATES
#21Method and apparatus for illuminating image points
#22DEVELOPMENT METHOD AND TREATMENT METHOD FOR PATTERNING METAL LAYER
#23Digital exposure machine and exposure control method thereof
#24Method and system for nanoscale data recording
#25Maskless photolithography devices, methods, and systems
#26Light irradiating device, light irradiating method and recording medium
#27Digital masking system, pattern imaging apparatus and digital masking method
#28Method and system for nanoscale data recording
#29Digital Projection System for the Development of Photolithography Devices
#30Image exposure device
#31Photoactive Catalyst Compositions
#32Method and system for nanoscale data recording
#33Grating structure, manufacturing method thereof and display device
#34Method for manufacturing array substrate and method for manufacturing liquid crystal antenna
#35Liquid masks for microfabrication processes
#36MASKLESS PHOTOLITHOGRAPHY DEVICES, METHODS, AND SYSTEMS
#37Systems, devices, and methods for printing on three-dimensional objects
#38Method and device for exposure of photosensitive layer
#39Critical dimension correction via calibrated trim dosing
#40Creating rewritable lenses
#41Line edge roughness reduction via step size alteration
#42LM guide assembling method using half division and computer-readable record medium having program recorded for executing same
#43Method and system for nanoscale data recording
#44Maskless exposure method, maskless exposure apparatus and method of manufacturing a semiconductor device using the same
#45DIGITAL MASKING SYSTEM, PATTERN IMAGING APPARATUS AND DIGITAL MASKING METHOD
#46Critical dimension control by use of a photo agent
#47Method for manufacturing pattern for electronic devices, and fiber-type electronic device comprising the pattern for electronic devices
#48Method of providing photopatterned functional surfaces
#49Nanoscale pattern exposure system
#50Position adjusting unit of optical element and maskless exposure apparatus including the same
#51Circuit pattern forming sheet, circuit pattern manufacturing apparatus, circuit pattern manufacturing method, and circuit pattern manufacturing program
#52System and method for generating mask pattern and exposure system
#53IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE
#54Active eye-to-eye with alignment by X-Y capacitance measurement
#55Critical dimension control by use of a photo agent
#56Exposure method, exposure equipment and 3-D structure
#57Grid refinement method
#58Method of reducing shot count in direct writing by a particle or photon beam
#59Line edge roughness reduction via step size alteration
#60Exposure head, exposure apparatus and method of operating an exposure head
#61System for creating nanoscale patterns
#62PHOTOCONDUCTIVE LAYER WITH ADJUSTABLE ELECTRICAL PROPERTY
#63Grid refinement method
#64Maskless lithography for web based processing
#65System and method for maskless direct write lithography
#66CORE-SHELL NANOPARTICLES, METHODS OF MAKING SAME, AND USES OF SAME
#67Reagent for enhancing generation of chemical species
#68METHOD OF MANUFACTURING PHOTOSENSITIVE GLASS SUBSTRATE
#69Metering device for metering a light-curing material in a manually controlled manner
#70Systems, devices, and methods for printing on three-dimensional objects
#71Super-resolution exposure system
#72Maskless digital lithography systems and methods with image motion compensation
#73Maskless exposure device, maskless exposure method and display substrate manufactured by the maskless exposure device and the maskless exposure method
#74Grid refinement method
#75Exposure apparatus and a method for exposing a photosensitive element and a method for preparing a printing form from the photosensitive element
#76Electric/magnetic field guided acid profile control in a photoresist layer
#77Method for writing nanoscale patterns
#78Apparatus and method of direct writing with photons beyond the diffraction limit using two-color resist
#79Composition for forming resist underlayer film for nanoimprint
#80METHOD FOR RECORDING AN IMAGE AND ASSOCIATED MEDIUM
#81Method and system for nanopatterning
#82Forming method and substrate
#83Digital exposure device using digital micro-mirror device and a method for controlling the same
#84Grid refinement method
#85Method and apparatus for the formation of conductive films on a substrate
#86Exposure apparatus and exposure method
#87Exposure apparatus and a method for exposing a photosensitive element and a method for preparing a printing form from the photosensitive element
#88Exposure apparatus and a method for controlling radiation from a lamp for exposing a photosensitive element
#89Flow through MEMS package
#90Programmable photolithography
#91Methods of patterning block copolymer layers and patterned structures
#92Pattern generator for a lithography system
#93Maskless process for pre-tilting liquid crystal molecules
#94Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image
#95Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image
#96Method and system for improving critical dimension uniformity using shaped beam lithography
#97Composition, process of preparation and method of application and exposure for light imaging paper
#98Photoresist composition and method of forming a black matrix using the same
#99METHOD OF EXPOSING A SEMICONDUCTOR WAFER AND EXPOSURE APPARATUS
#100Optical writer for flexible foils
#101Photoresist composition and method of forming a color filter using the same
#102IMPRINT MOLD FOR MANUFACTURING BIT-PATTERNED MEDIUM AND MANUFACTURING METHOD OF THE SAME
#103Grid refinement method
#104Fabrication of enclosed nanochannels using silica nanoparticles
#105Support, lithographic apparatus and device manufacturing method
#106Method of direct writing with photons beyond the diffraction limit
#107Optical irradiation apparatus with super luminescent diodes
#108Illuminating waveguide fabrication method
#109Flow through MEMS package
#110Method of optical fabrication of three-dimensional polymeric structures with out of plane profile control
#111Nanolithography system
#112Use of patterned UV source for photolithography
#113COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT
#114Diffraction unlimited photolithography
#115Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image
#116Beam pen lithography
#117Method of exposing a semiconductor wafer and exposure apparatus
#118Maskless exposure apparatus and stitching exposure method using the same
#119Composition, process of preparation and method of application and exposure for light imaging paper
#120Self-aligned, sub-wavelength optical lithography
#121ELECTROCHEMICAL CELL
#122Electrochemical cell
#123ELECTROCHEMICAL CELL
#124METHOD AND APPARATUS FOR HIGH DENSITY STORAGE OF ANALOG DATA IN A DURABLE MEDIUM
#125Illuminating waveguide fabrication method
#126Nanolithography system
#127Curing of photo-curable printing plates using a light tunnel of mirrored walls and having a polygonal cross-section like a kaleidoscope
#128Method for Producing Two-Dimensional Periodic Structures in a Polymeric Medium
#129MANUFACTURING METHOD OF CIRCUIT BOARD
#130Self-aligned, sub-wavelength optical lithography
#131Method for Manufacturing a Device Using Imprint Lithography and Direct Write Technology
#132Image Recording Device and Image Recording Method
#133Nanolithography system
#134Method for manufacturing a patterned structure
#135Patterning method
#136Maskless photolithography for etching and deposition
#137Pulse light pattern writer
#138System and method for manufacturing printed circuit boards employing non-uniformly modified images
#139Apparatus and method for repairing resist latent images
#140Method and apparatus for controlling the vacuum distribution in an exposer for printing originals
#141Fabrication of enclosed nanochannels using silica nanoparticles
#142Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems
#143Matched multiple charged particle beam systems for lithographic patterning, inspection, and accelerated yield ramp
#144Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems
#145Matched multiple charged particle beam systems for lithographic patterning, inspection, and accelerated yield ramp