177085 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure; Apparatus therefor; Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam Electron scattering (proximity) correction or prevention methods
METHOD OF MANUFACTURING INTEGRATED CIRCUIT
#2Method of manufacturing integrated circuit
#3ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METHOD, AND RECORDING MEDIUM
#4ELECTRON BEAM WRITING APPARATUS AND ELECTRON BEAM WRITING METHOD
#5Electron beam lithography with dynamic fin overlay correction
#6Method and system for determining a charged particle beam exposure for a local pattern density
#7Dummy insertion for improving throughput of electron beam lithography
#8METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE FOR A LOCAL PATTERN DENSITY
#9MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI-CHARGED PARTICLE BEAM WRITING METHOD
#10Method of mask data synthesis and mask making
#11Resist Composition
#12Electron beam lithography with dynamic fin overlay correction
#13Dummy insertion for improving throughput of electron beam lithography
#14Method and system for determining a charged particle beam exposure for a local pattern density
#15Method of mask data synthesis and mask making
#16Method and system for determining a charged particle beam exposure for a local pattern density
#17Fabricating unique chips using a charged particle multi-beamlet lithography system
#18Dummy insertion for improving throughput of electron beam lithography
#19Fabricating unique chips using a charged particle multi-beamlet lithography system
#20Method for projecting a beam of particles onto a substrate with correction of scattering effects
#21Method for acquiring parameter for dose correction of charged particle beam, charged particle beam writing method, and charged particle beam writing apparatus
#22Method for making a grating
#23Fabricating unique chips using a charged particle multi-beamlet lithography system
#24Method for acquiring parameter for dose correction of charged particle beam, charged particle beam writing method, and charged particle beam writing apparatus
#25Method and system for design of enhanced edge slope patterns for charged particle beam lithography
#26Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
#27Patterning method using electron beam and exposure system configured to perform the same
#28Method and System for Design of Enhanced Edge Slope Patterns for Charged Particle Beam Lithography
#29Conductive polymer composition, coated article having antistatic film formed from the composition, and patterning process using the composition
#30Patterning method using electron beam and exposure system configured to perform the same
#31Charged particle beam writing apparatus and method for acquiring dose modulation coefficient of charged particle beam
#32Method for estimating patterns to be printed on a plate or mask by means of electron-beam lithography and corresponding printing device
#33Charged particle beam lithography apparatus and charged particle beam pattern writing method
#34Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
#35Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes
#36Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area
#37Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosages
#38Method of electron-beam lithography with correction of corner roundings
#39Method for correcting electronic proximity effects using off-center scattering functions
#40Method and system for fracturing a pattern using lithography with multiple exposure passes
#41Method and system for design of enhanced edge slope patterns for charged particle beam lithography
#42SUBSTRATE FOR ELECTRON-BEAM DRAWING
#43Method for fracturing and forming a pattern using circular characters with charged particle beam lithography
#44Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography
#45Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosages
#46Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography
#47Method for manufacturing semiconductor devices, and method for forming a pattern onto an exposure mask
#48Method and system for lithography simulation and measurement of critical dimensions
#49Method and system for lithography simulation and measurement of critical dimensions with improved CD marker generation and placement
#50Method for producing resist substrates
#51Photo mask, method of manufacturing photo mask, and method of generating mask data
#52Method and system for determining a charged particle beam exposure for a local pattern density
#53Resist composition