G03F7/2063 - CPC Classification Index

ClassID:

177086 ⎘

G03F7/2063 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure; Apparatus therefor; Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam for the production of exposure masks or reticles

Recent Application in this class:

20230393482

2023-12-07

EXPOSURE MASK AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE SAME

20230367213

2023-11-16

MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION

20230185188

2023-06-15

DRAWING METHOD, MASTER PLATE MANUFACTURING METHOD, AND DRAWING APPARATUS

20230176483

2023-06-08

Exposure machine and exposure method

20220382162

2022-12-01

Lithography exposure system with debris removing mechanism

20220299882

2022-09-22

SYSTEM AND METHOD FOR CLEANING AN EUV MASK WITHIN A SCANNER

20220035250

2022-02-03

MASK AND METHOD OF MANUFACTURING THE SAME

20210388479

2021-12-16

Full-size mask assembly and manufacturing method thereof

20210230734

2021-07-29

Preparation method of mask assembly and mask assembly

#10

20210108304

2021-04-15

Full-size mask assembly and manufacturing method thereof

#11

20210063890

2021-03-04

Lithography exposure method with debris removing mechanism

#12

20200341387

2020-10-29

Photomask

#13

20200218156

2020-07-09

Implanting method and apparatus

#14

20200096860

2020-03-26

Portion of layer removal at substrate edge

#15

20190368025

2019-12-05

Full-size mask assembly and manufacturing method thereof

#16

20180374675

2018-12-27

METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH VARIABLE PATTERN DOSAGE

#17

20180284620

2018-10-04

Electron beam irradiation apparatus and electron beam dynamic focus adjustment method

#18

20180164694

2018-06-14

Lithography apparatus

#19

20180108513

2018-04-19

Method and system for dimensional uniformity using charged particle beam lithography

#20

20180046073

2018-02-15

Dual exposure patterning of a photomask to print a contact, a via or curvilinear shape on an integrated circuit

#21

20180017865

2018-01-18

Pattern forming method, photo mask manufacturing method, and electronic device manufacturing method

#22

20170261854

2017-09-14

Conductive composition, antistatic film, laminate and production therefor, and production method for photomask

#23

20170213698

2017-07-27

Method and System for Forming Patterns Using Charged Particle Beam Lithography with Variable Pattern Dosage

#24

20170123304

2017-05-04

Method of fabricating reflective photomask

#25

20170068172

2017-03-09

Method for fabricating semiconductor device, pattern writing apparatus, recording medium recording program, and pattern transfer apparatus

#26

20170023862

2017-01-26

METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM LITHOGRAPHY

#27

20160342090

2016-11-24

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD, AND PHOTOMASK

#28

20160299422

2016-10-13

Method and system for forming patterns using charged particle beam lithography with variable pattern dosage

#29

20160260581

2016-09-08

Method and system for dimensional uniformity using charged particle beam lithography

#30

20160195805

2016-07-07

Method and system for design of enhanced edge slope patterns for charged particle beam lithography

#31

20160133458

2016-05-12

Generalization of shot definitions for mask and wafer writing tools

#32

20160004161

2016-01-07

Patterning method using electron beam and exposure system configured to perform the same

#33

20150355547

2015-12-10

Electron beam exposure system and methods of performing exposing and patterning processes using the same

#34

20150338737

2015-11-26

Method and System for Design of Enhanced Edge Slope Patterns for Charged Particle Beam Lithography

#35

20150331991

2015-11-19

Method and system for forming patterns using charged particle beam lithography with variable pattern dosage

#36

20150309412

2015-10-29

Method for fabricating semiconductor device, pattern writing apparatus, recording medium recording program, and pattern transfer apparatus

#37

20150261907

2015-09-17

Method and system for forming patterns with charged particle beam lithography

#38

20150243482

2015-08-27

Electron beam exposure method

#39

20150082258

2015-03-19

Method for forming circular patterns on a surface

#40

20150020037

2015-01-15

Method and system for design of a reticle to be manufactured using variable shaped beam lithography

#41

20140362353

2014-12-11

Temperature adjusting apparatus of mask substrate, mask drawing apparatus, and mask drawing method

#42

20140359542

2014-12-04

Method and system for dimensional uniformity using charged particle beam lithography

#43

20140291553

2014-10-02

Charged particle beam writing apparatus and method for acquiring dose modulation coefficient of charged particle beam

#44

20140229904

2014-08-14

Method and system for forming patterns with charged particle beam lithography

#45

20140218710

2014-08-07

Exposure apparatus for forming a reticle

#46

20140178806

2014-06-26

Negative actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, resist-coated mask blanks, resist pattern forming method, and photomask

#47

20140134523

2014-05-15

Method for forming circular patterns on a surface

#48

20140120475

2014-05-01

Electron beam exposure method

#49

20140059503

2014-02-27

Method and system for preparing a pattern to be printed on a plate or mask by electron beam lithography

#50

20130337372

2013-12-19

Method and system for design of a reticle to be manufactured using variable shaped beam lithography

#51

20130323918

2013-12-05

Methods for electron beam patterning

#52

20130309610

2013-11-21

Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes

#53

20130309608

2013-11-21

Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosages

#54

20130181379

2013-07-18

Method of electron-beam lithography with correction of corner roundings

#55

20130071776

2013-03-21

Generalization of shot definitions for mask and wafer writing tools

#56

20130065184

2013-03-14

Charged particle beam drawing method and charged particle beam drawing apparatus

#57

20130052569

2013-02-28

Exposure apparatus for forming a reticle and method of forming a reticle using the same

#58

20130034807

2013-02-07

Method and system for design of a reticle to be manufactured using variable shaped beam lithography

#59

20120281191

2012-11-08

Method and system for fracturing a pattern using lithography with multiple exposure passes

#60

20120252215

2012-10-04

Method for fabricating semiconductor device, pattern writing apparatus, recording medium recording program, and pattern transfer apparatus

#61

20120221981

2012-08-30

Method and system for design of enhanced edge slope patterns for charged particle beam lithography

#62

20120219886

2012-08-30

METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH VARIABLE PATTERN DOSAGE

#63

20120084740

2012-04-05

Method and system for design of a reticle to be manufactured using variable shaped beam lithography

#64

20120040279

2012-02-16

Method, device, and system for forming circular patterns on a surface

#65

20110191727

2011-08-04

Method and system for design of a reticle to be manufactured using variable shaped beam lithography

#66

20110189596

2011-08-04

Method for manufacturing a surface and integrated circuit using variable shaped beam lithography

#67

20110159434

2011-06-30

Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosages

#68

20110104594

2011-05-05

Method for manufacturing a surface and integrated circuit using variable shaped beam lithography

#69

20100058279

2010-03-04

Method and system for design of a reticle to be manufactured using variable shaped beam lithography

#70

20100055586

2010-03-04

Method and system for forming circular patterns on a surface