Patents-Review.com
ClassID:

177087 ⎘

G03F7/2065 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure; Apparatus therefor; Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam using corpuscular radiation other than electron beams

Recent Application in this class:
#1
20260079393
2026-03-19

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

 #2
20190196328
2019-06-27

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION

 #3
20190038565
2019-02-07

Fabrication methods for nanodelivery systems for long term controlled delivery of active pharmaceutical ingredients

 #4
20170123304
2017-05-04

Method of fabricating reflective photomask

 #5
20160320700
2016-11-03

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device

 #6
20160147154
2016-05-26

Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device

 #7
20160077436
2016-03-17

Patterning method, and template for nanoimprint and producing method thereof

 #8
20160039122
2016-02-11

Device and method of manufacturing a structure made of a curable material by means of molding

 #9
20140377706
2014-12-25

Developer for photosensitive resist material and patterning process

 #10
20140370441
2014-12-18

Developer for photosensitive resist material and patterning process

 #11
20140225008
2014-08-14

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #12
20140141377
2014-05-22

Developer and patterning process

 #13
20140127628
2014-05-08

Method and system for improving critical dimension uniformity using shaped beam lithography

 #14
20130157198
2013-06-20

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #15
20110014572
2011-01-20

Self-powered lithography method and apparatus using radioactive thin films

 #16
20080283493
2008-11-20

Method for forming etching mask, method for fabricating three-dimensional structure and method for fabricating three-dimensional photonic crystalline laser device

 #17
20050106861
2005-05-19

Resistless lithography method for fabricating fine structures