177113 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Processing photosensitive materials; Apparatus therefor Imagewise removal by selective transfer, e.g. peeling away
Sub-classes:COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS, AND RESIST UNDERLAYER FILM FORMATION PROCESS
#2BENZENESULFONIC ACID SALT COMPOUND FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS
#3COATING COMPOSITION FOR PHOTOLITHOGRAPHY
#4PATTERNED STRUCTURED TRANSFER TAPE
#5POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING WIRING PATTERN
#6RESIN MEMBRANE FILTER AND MANUFACTURING METHOD OF RESIN MEMBRANE FILTER
#7PHOTOSENSITIVE PASTE, METHOD FOR FORMING WIRING PATTERN, METHOD FOR PRODUCING ELECTRONIC COMPONENT, AND ELECTRONIC COMPONENT
#8Treatment condition setting method, storage medium, and substrate treatment system
#9TRANSFER FILM, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR CIRCUIT WIRE, AND MANUFACTURING METHOD FOR ELECTRONIC DEVICE
#10METHOD OF MANUFACTURING SEMICONDUCTOR STRUCTURE AND PHOTORESIST COMPOSITION
#11TRANSFER FILM, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR CIRCUIT WIRE, AND MANUFACTURING METHOD FOR ELECTRONIC DEVICE
#12Patterned structured transfer tape
#13Photoresist composition comprising amide compound and pattern formation methods using the same
#14CURABLE COMPOSITION FOR IMPRINTING, CURED PRODUCT, METHOD FOR PRODUCING IMPRINT PATTERN, AND METHOD FOR PRODUCING DEVICE
#15Coating composition for photolithography
#16NANOIMPRINT COMPOSITION AND PATTERN FORMING METHOD
#17Patterned structured transfer tape
#18QUANTUM DOT LIGHT-EMITTING STRUCTURE AND MANUFACTURING METHOD THEREOF, AND DISPLAY APPARATUS
#19Resist underlayer film material, patterning process, and method for forming resist underlayer film
#20WASHING DEVICE AND WASHING METHOD
#21RESIST COMPOSITION FOR PATTERN PRINTING AND PATTERN FORMING METHOD
#22Photoresist composition, method for preparing the same, and patterning method
#23PERMANENT BONDING AND PATTERNING MATERIAL
#24Treatment condition setting method, storage medium, and substrate treatment system
#25Composition for forming organic film, patterning process, and polymer
#26Nanomaterial ribbon patterning method and nanomaterial ribbon pattern manufactured thereby
#27Bottom-up conformal coating and photopatterning on PAG-immobilized surfaces
#28ADHESION LAYER-FORMING COMPOSITION AND METHOD FOR PRODUCING ARTICLE
#29Substrate treatment apparatus, substrate treatment method, and computer storage medium
#30Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device
#31Photoresist polymers, methods of forming patterns and methods of manufacturing semiconductor devices
#32Patterned structured transfer tape
#33Method of providing photopatterned functional surfaces
#34Pattern modification and patterning process
#35Flexographic printing precursor and magnetic development of the same
#36Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device
#37Flexographic printing elements that can be dried rapidly
#38Forced grid method for correcting mask patterns for a pattern transfer apparatus
#39Mask blank, method of manufacturing phase shift mask, phase shift mask, and method of manufacturing semiconductor device
#40Mask blank, method of manufacturing phase shift mask, phase shift mask, and method of manufacturing semiconductor device
#41Composition for nanoimprint, cured product, pattern forming method, and article having pattern
#42Patterned photoresist removal
#43Substrate comprising an electrical circuit pattern, method and system for providing same
#44Aromatic resins for underlayers
#45Method of manufacturing deposition mask
#46Photoresist polymers and methods of forming patterns
#47Achieving a critical dimension target based on resist characteristics
#48Methods of forming photonic device structures
#49Photosensitive element, photosensitive element roll, method for producing resist pattern, and electronic component
#50Composition for forming resist protection film for lithography and method for forming pattern of semiconductor device using the same
#51Aromatic resins for underlayers
#52Monomer, hardmask composition comprising monomer, and pattern forming method using hardmask composition
#53COMPOSITION FOR SILICON-CONTAINING FILM FORMATION, PATTERN-FORMING METHOD, AND POLYSILOXANE COMPOUND
#54Method of forming patterns and method of manufacturing integrated circuit device using the same
#55Aromatic resins for underlayers
#56Patterned structured transfer tape
#57Printed circuit board and method for manufacturing the same
#58Photosensitive resin laminate and thermal processing of the same
#59Photosensitive resin laminate and thermal processing of the same
#60Resist underlayer film-forming composition, pattern-forming method and resist underlayer film
#61Apparatus for thermal development with a conformable support
#62Method and apparatus for thermal treatment of printing surface in relief printing
#63Laminated flexographic printing sleeves and methods of making the same
#64FLEXOGRAPHIC PRINTING PLATE PRECURSOR FOR THERMAL DEVELOPMENT, AND PROCESS FOR MAKING A FLEXOGRAPHIC PRINTING PLATE
#65Photosensitive resin laminate and thermal processing of the same
#66Photosensitive resin laminate and thermal processing of the same
#67Method for patterning flexible substrate
#68Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer
#69Carrier sheet for a photosensitive printing element
#70PROCESS FOR THICK FILM CIRCUIT PATTERNING
#71Method for thermal development with a conformable support
#72APPARATUS AND METHOD FOR TREATING A CYLINDRICALLY-SHAPED ELEMENT HAVING A CLAMP ASSEMBLY
#73THICK FILM RECYCLING METHOD
#74Method and apparatus for processing flexographic printing plates
#75MULTI-LAYER MASKING FILM
#76Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer
#77Method for cleaning an automatic process device
#78Lamination and delamination technique for thin film processing
#79Method for thermally processing photosensitive printing sleeves
#80Apparatus and method for thermally developing flexographic printing elements
#81Method for thermally processing photosensitive printing sleeves
#82Method and apparatus for applying surface treatments to photosensitive printing elements during thermal development
#83Decal transfer lithography
#84Method and apparatus for thermal development with development medium remover
#85Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer
#86Process for the manufacture of flexographic printing plates
#87Flexo processor
#88Apparatus and method for thermally developing flexographic printing elements
#89Apparatus and method for thermally developing flexographic printing sleeves
#90Process for the manufacture of flexographic printing plates
#91Method of forming a resist pattern, method of forming a wiring pattern, method of fabricating a semiconductor device, electro-optic device, and electronic apparatus
#92Thermal development apparatus of flexographic plates