177115 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Processing photosensitive materials; Apparatus therefor; Imagewise removal by selective transfer, e.g. peeling away using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds
Composition for Forming Organic Film, Method for Forming Organic Film and Patterning Process
#2EUV-INDUCED CONDENSATION OF POLYSILOXANE SOL-GEL THIN FILM
#3METHOD TO REDUCE LINE EDGE ROUGHNESS FOR EUV PHOTORESIST PATTERN
#4BLOCK COPOLYMER FOR LITHOGRAPHY AND LITHOGRAPHY METHOD USING THE SAME
#5CURABLE COMPOSITION FOR IMPRINTING, COATING FILM, METHOD FOR PRODUCING FILM, CURED PRODUCT, METHOD FOR PRODUCING IMPRINT PATTERN, AND METHOD FOR PRODUCING DEVICE
#6PHOTOSENSITIVE MATERIAL, TRANSFER FILM, MANUFACTURING METHOD OF CIRCUIT WIRING, MANUFACTURING METHOD OF TOUCH PANEL, AND PATTERN FORMING METHOD
#7MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, COMPOUND, AND POLYMER
#8METHOD OF MAKING A PATTERNED HYDROGEL AND KIT TO MAKE IT
#9Methods and apparatus for the manufacture of microstructures
#10Decal transfer lithography