Methods of forming a photoresist-comprising pattern on a substrate

Fabrication of suspended carbon micro and nanoscale structures

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN AND SEMICONDUCTOR DEVICE

METHOD AND APPARATUS FOR REFORMING FILM AND CONTROLLING SLIMMING AMOUNT THEREOF

Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method

PATTERN FORMING METHOD, AND RESIST COMPOSITION, DEVELOPER AND RINSING SOLUTION USED IN THE PATTERN FORMING METHOD

Color filter and production method thereof, and solid-state image sensor using the same

Hardmask Process for Forming a Reverse Tone Image

System and method for critical dimension reduction and pitch reduction

Method for forming pattern, and material for forming coating film

Customized lithographic particles

Solution for treatment of resist substrate after development processing and method for treatment of resist substrate using the same

Etching method for use in deep-ultraviolet lithography

Positive photosensitive resin composition

SURFACE TREATING AGENT FOR RESIST PATTERN FORMATION, RESIST COMPOSITION, METHOD OF TREATING SURFACE OF RESIST PATTERN THEREWITH AND METHOD OF FORMING RESIST PATTERN

Method and apparatus for thermal processing of photosensitive printing elements

Pattern forming method

Developing method for immersion lithography, solvent used for the developing method and electronic device using the developing method

Method for formation of miniaturized pattern and resist substrate treatment solution for use in the method

Method for improving surface roughness of processed film of substrate and apparatus for processing substrate

Process for adjusting the size and shape of nanostructures

PHOTORESIST COMPOSITION, METHOD OF FORMING A METAL PATTERN, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME

Method of fine patterning a thin film and method of manufacturing a display substrate using the method

RESIN COMPOSITION FOR MICROPATTERN FORMATION AND METHOD OF MICROPATTERN FORMATION

Pattern-forming method, metal oxide film-forming material and method for using the metal oxide film-forming material

Method of forming microfined resist pattern

Massively parallel assembly of composite structures using depletion attraction

ANTI-REFLECTIVE COATINGS USING VINYL ETHER CROSSLINKERS

Composition for coating over a photoresist pattern

TREATED SUBSTRATE HAVING PATTERN OF WATER REPELLENT REGION, ITS PRODUCTION PROCESS, AND PROCESS FOR PRODUCING MEMBER HAVING PATTERN MADE OF FUNCTIONAL MATERIAL FILM FORMED

Block copolymer and substrate processing method

Chemical trim of photoresist lines by means of a tuned overcoat material

Method for forming micropattern

METHOD AND APPARATUS FOR RESIST DEVELOPMENT

COMPOSITION FOR FORMING CURED FILM PATTERN AND METHOD FOR PRODUCING CURED FILM PATTERN BY USING THE SAME

Method for manufacturing semiconductor device

METHOD FOR FORMING A PATTERN OF A SEMICONDUCTOR DEVICE

Method for manufacturing lenticular sheet

Array substrate for liquid crystal display device and method of fabricating the same

Method of forming pattern

Methods of forming structures supported by semiconductor substrates

Photopatternable dielectric materials for BEOL applications and methods for use

Patterning process

SURFACE TREATING AGENT FOR RESIST-PATTERN, AND PATTERN-FORMING METHOD USING SAME

Method of forming fine patterns of semiconductor device by using double patterning process which uses acid diffusion

Polyorganosiloxane, resin composition, and patterning process

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION

Mask patterns including gel layers for semiconductor device fabrication

Double patterning method

Double patterning process

Process for Shrinking Dimensions Between Photoresist Pattern Comprising a Pattern Hardening Step

Photoresist Image-Forming Process Using Double Patterning

Method for removing residues from a patterned substrate

THIN FILM ETCHING METHOD

Method of optical fabrication of three-dimensional polymeric structures with out of plane profile control

Photopatternable dielectric materials for BEOL applications and methods for use

PEB APPARATUS AND CONTROL METHOD

Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same

Monomer, resist composition, and patterning process

Method of manufacturing semiconductor device, and resist coating and developing system

METHOD FOR REDUCING SURFACE DEFECTS ON PATTERNED RESIST FEATURES

Double patterning process

PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS

Si device making method by using a novel material for packing and unpacking process

Fluorine-containing polymer, purification method, and radiation-sensitive resin composition

Positive photosensitive resin compositions

HARDMASK OPEN PROCESS WITH ENHANCED CD SPACE SHRINK AND REDUCTION

POSITIVE PHOTOSENSITIVE POLYMER COMPOSITION

Photosensitive resin composition and photosensitive film

Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof

Method of forming fine patterns

Contiguous microlens array and photomask for defining the same

PLASMA CURING OF PATTERNING MATERIALS FOR AGGRESSIVELY SCALED FEATURES

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Positive photosensitive resin composition, and semiconductor device and display therewith

ETCH WITH HIGH ETCH RATE RESIST MASK

Photoresist double patterning

Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program

Protective layer for implant photoresist

Photoresist compositions and method for multiple exposures with multiple layer resist systems

Photoresist compositions and method for multiple exposures with multiple layer resist systems

Substrate processing method and substrate processing system

Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent

Line edge roughness reduction and double patterning

METHOD FOR FORMING MASK PATTERN

METHODS AND APPARATUS FOR CURING PIXEL MATRIX FILTER MATERIALS

METHOD FOR ORGANIC MATERIAL LAYER FORMATION

System, method and apparatus for pattern clean-up during fabrication of patterned media using forced assembly of molecules

Substrate processing apparatus

Film-forming material and method of forming pattern

Patterning process

Integrated color mask

Photopatternable deposition inhibitor containing siloxane

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Photoresist compositions and process for multiple exposures with multiple layer photoresist systems

Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent

Pattern forming method

Method for forming fine pattern in semiconductor device

Method and apparatus for smoothening rough edges of lithographic patterns

Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program

Method for reducing pillar structure dimensions of a semiconductor device

LITHOGRAPHIC PRINTING PLATE SURFACE PROTECTIVE AGENT AND PLATEMAKING METHOD FOR LITHOGRAPHING PRINTING PLATE

Patterning process and resist composition used therein

Directed assembly of triblock copolymers

Method of controlling striations and CD loss in contact oxide etch

Patterning process

UV-LIGA process for fabricating a multilayer metal structure having adjacent layers that are not entirely superposed, and the structure obtained

Developing method and developing apparatus

Norbornene polymer for photoresist and photoresist composition comprising the same

Aqueous developable benzocyclobutene-based polymer composition and method of use of such compositions

Photosensitive polyimide resin composition

Polymers, Methods Of Use Thereof, And Methods Of Decomposition Thereof

Negative-tone,Ultraviolet Photoresists for Fabricating High Aspect Ratio Microstructures

Cluster tool architecture for processing a substrate

Cluster tool architecture for processing a substrate

Cluster tool architecture for processing a substrate

Method for on-press developing laser sensitive lithographic printing plate

Patterning process and pattern surface coating composition

Patterning process

Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program

Double exposure semiconductor process for improved process margin

Rinsing method and developing method

Method of forming fine patterns

Layer patterning using double exposure processes in a single photoresist layer

Photosensitive resin composition, production method for cured relief pattern using it, and semiconductor device

Method of forming fine patterns

Method for manufacturing semiconductor device

Method for Fabricating Photoresist Pattern

Method for manufacturing semiconductor device

Spacer lithography

Negative photosensitive fluorinated aromatic resin composition

Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent

Method and material for forming high etch resistant double exposure patterns

Lithography process

PATTERN FORMING METHOD

Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide

Method of forming protection layer on photoresist pattern and method of forming fine pattern using the same

Coating compositions for use in forming patterns and methods of forming patterns

POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH THE SAME

Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials

COAT/DEVELOP MODULE WITH SHARED DISPENSE

Electronic device manufacture

Coating material for photoresist pattern and method of forming fine pattern using the same

Method of use for photopatternable dielectric materials for BEOL applications

Method of forming a fine pattern of a semiconductor device using a resist reflow measurement key

Method of forming pattern of semiconductor device

PHOTOLITHOGRAPHY PROCESS INCLUDING A CHEMICAL RINSE

Resist pattern swelling material, and method for patterning using same

UV radiation blocking protective layers compatible with thick film pastes

Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method

Resist pattern and reflow technology

Method for Producing Flexographic Printing forms and Appropriate Flexographic Printing Element

Composition for coating over a photoresist pattern comprising a lactam

Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent

Method for producing structure

Method of forming pattern of semiconductor device

Photosensitive Paste Composition, Plasma Display Panel Manufactured Using the Same and Method of Manufacturing the Plasma Display Panel

Phenolic polymers and photoresists comprising same

Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates

Photosensitive composition, and cured relief pattern production method and semiconductor device using the same

Method of fabricating color filter substrate and infrared heating apparatus for the same

CLUSTER TOOL ARCHITECTURE FOR PROCESSING A SUBSTRATE

Photoresists and methods for use thereof

Methods of reworking a semiconductor substrate and methods of forming a pattern in a semiconductor device

Photosensitive polymer composition, method of producing pattern and electronic parts

Etching media for oxidic, transparent, conductive layers

Printing Plate Ovens

Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method

Method to print photoresist lines with negative sidewalls

Photoresist composition, coating method thereof, method of forming organic film pattern using the same and display device fabricated thereby

Resist collapse prevention using immersed hardening

Aqueous Solution and Method for Removing Ionic Contaminants from the Surface of a Workpiece

Method for producing reflective layers in LCD display

Cluster tool architecture for processing a substrate

Water soluble resin composition and method for pattern formation using the same

Compositions for use in forming a pattern and methods of forming a pattern

Composite photoresist structure

Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method

Methods of etching photoresist on substrates

Method of fabricating semiconductor device, and developing apparatus using the method

Developing method for laser sensitive lithographic printing plate

Method of forming semiconductor device with multiple level patterning

Method of forming semiconductor device

Method for forming a fine pattern in a semicondutor device

METHOD FOR FORMING A RESIST PATTERN USING A SHRINKING TECHNOLOGY

Positive photoresist composition

Photoresist composition and method for forming pattern of a semiconductor device

Lithographic device manufacturing method, lithographic cell, and computer program product

METHOD FOR MANUFACTURING A PHOTOMASK

Substrate processing method, substrate processing system, and computer-readable recording medium recording program thereon

METHOD OF PROCESSING SUBSTRATE AND CHEMICAL USED IN THE SAME

METHOD OF PROCESSING SUBSTRATE AND CHEMICAL USED IN THE SAME

REDUCTION OF LINE EDGE ROUGHNESS WITH A CONFORMAL COATING OF A SEALANT

METHOD FOR FORMING A FILM PATTERN HAVING A REDUCED PATTERN SIZE

Method of forming fine patterns

Pattern formation method using fine pattern formation material for use in semiconductor fabrication step

Material for Metallic-Pattern Formation, Crosslinking Monomer, and Method of Forming Metallic Pattern

Resist pattern forming method

Coating Compositions for Use in Forming Patterns and Methods of Forming Patterns

Method of manufacturing multilayer thin film pattern and display device

Photoresist compositions and methods of forming a pattern using the same

Method for using negative tone silicon-containing resist for e-beam lithography

Positive Photosensitive Insulating Resin Composition And Cured Product Thereof

Baking apparatus, substrate heat treatment method and semiconductor device manufacturing method for using baking apparatus, pattern forming method and semiconductor device manufacturing method for using pattern forming method

Cleaning liquid for lithography and method for resist pattern formation

Patterned printing plates and processes for printing electrical elements

Process for forming resist pattern, and resist coating and developing apparatus

Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device

Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating, composition for fine pattern formation, and method of fabricating semiconductor device

Apparatus and method for heating semiconductor wafers with improved temperature uniformity

ACCURACY OF OPTICAL METROLOGY MEASUREMENTS

Methods and apparatus for changing the optical properties of resists

Resist pattern thickening material, method for forming resist pattern, semiconductor device and method for manufacturing the same

Negative-working radiation-sensitive compositions and imageable materials

Method of forming fine pattern of semiconductor device

Method for forming fine pattern of semiconductor device

Process Solutions Containing Surfactants

SUPERCRITICAL FLUID CLEANING OF SEMICONDUCTOR SUBSTRATES

Methods of improving single layer resist patterning scheme

Method of manufacturing semiconductor device

Process for forming resist pattern, semiconductor device and manufacturing method for the same

Method for forming resist pattern, semiconductor device and production method thereof

Fine Pattern Forming Material, Method Of Forming Fine Resist Pattern And Electronic Device

Method for forming metal pattern flat panel display using metal pattern formed by the method

Photoresist coating composition and method for forming fine contact of semiconductor device

Photoresist trimming process

Photoresist trimming process

Method for developing a photoresist

Method for forming micropattern

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

Cationic photopolymerizable epoxy resin composition, minute structural member using the same and method for manufacturing minute structural member

PATTERN FORMING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES

Substrate processing apparatus

MEHTOD FOR PREPARATION OF LITHOGRAPHIC PRINTING PLATE AND LITHOGRAPHIC PRINTING PLATE

Photoacid generators, chemically amplified resist compositions, and patterning process

ETCH FEATURES WITH REDUCED LINE EDGE ROUGHNESS

Process for producing photonic crystals and controlled defects therein

Nanoparticle patterning process

Stabilization of deep ultraviolet photoresist

Method of manufacturing semiconductor device

Photoresist undercoat-forming material and patterning process

Biolithographical deposition and materials and devices formed therefrom

APPARATUS FOR PROCESSING SUBSTRATE AND METHOD OF DOING THE SAME

Pattern forming method used in semiconductor device manufacturing and method of manufacturing semiconductor device

Method for producing conductive film and light-sensitive material for conductive film production

Method of inhibiting photoresist pattern collapse

Method for forming high-resolution pattern having desired thickness or high aspect ratio using dry film resist

Resin composition for forming fine pattern and method for forming fine pattern

Polymer resin composition, related method for forming a pattern, and related method for fabricating a capacitor

Resist pattern forming method, thin-film pattern forming method, and microdevice manufacturing method

TWO-LAYER FILM AND METHOD OF FORMING PATTERN WITH THE SAME

Method for fine pattern formation

Substrate treatment method for etching a base film using a resist pattern

Resin composition comprising catalyst precursor for electroless plating to form electromagnetic wave shielding layer, methods for forming metal patterns using the resin composition and metal patterns formed by the methods

Coating compositions for photolithography

Substrate treatment method and substrate treatment apparatus

Method for manufacturing semiconductor device

Method for Shrinking Opening Sizes of a Photoresist Pattern

Radiation-sensitive negative resin composition

Device and method for the treatment of wafers

Method of processing substrate

Method of forming resist pattern and method of manufacturing semiconductor device

Method for imaging a lithographic printing form

Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same

Rinse Solution For Lithography

Photosensitive resin composition, pattern forming method and electronic parts using the photosensitive resin composition

Resist pattern forming method and composite rinse agent

Methods for fabrication of positional and compositionally controlled nanostructures on substrate

Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent

Fabricating method of single electron transistor (SET) by employing nano-lithographical technology in the semiconductor process

Circuit Board, Method Of Manufacturing Circuit Board, And Display Device Having Circuit Board

Method and apparatus for curing epoxy-based photoresist using a continuously varying temperature profile

Method of processing a substrate

Substrate processing method

Resist pattern forming method and apparatus

Line edge roughness reduction

METHOD FOR FORMING FINE PATTERN OF SEMICONDUCTOR DEVICE

RADIATION-SENSITIVE POSITIVE RESIN COMPOSITION FOR PRODUCING PLATINGS, TRANSFER FILM, AND PROCESS FOR PRODUCING PLATINGS

Apparatus and method for reflowing photoresist

Positively radiation-sensitive resin composition

Negative radiation-sensitive resin composition

Method of applying patterned metallization to block filter resonators

Positive resist composition and method of pattern formation with the same

Method for manufacturing electrodes of a plasma display panel

Heat processing apparatus and heat processing method

METHOD OF FORMING A MICRO DEVICE

Photosensitive resin composition and manufacturing method of semiconductor device using the same

Adhesion method using gray-scale photolithography

Water-developable photopolymer plate for letterpress printing

Method of forming photoresist pattern and method of manufacturing perpendicular magnetic recording head

Chalcogenide layer etching method

METHODS OF RELEASING PHOTORESIST FILM FROM SUBSTRATE AND BONDING PHOTORESIST FILM WITH SECOND SUBSTRATE

Patterning method and methods for producing electro-optic device, color filter, illuminant, and thin-film transistor

Controlling system and method for operating the same

System and method for plasma induced modification and improvement of critical dimension uniformity

Corona etching

Rinsing method and developing method

MATERIAL FOR FORMING FINE PATTERN, METHOD OF FORMING FINE PATTERN, METHOD OF MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE MANUFACTURED FROM THE SAME

Photoresist resin composition, method of forming a photoresist pattern, and method of manufacturing a display substrate using the same

Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same