177118 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Processing photosensitive materials; Apparatus therefor Treatment after imagewise removal, e.g. baking
Method for manufacturing semiconductor device
#2102Anti-reflective coatings using vinyl ether crosslinkers
#2103Method of forming etching mask
#2104Method of fixing organic molecule and micro/nano article
#2105Rework process for photoresist film
#2106In-situ plasma treatment of advanced resists in fine pattern definition
#2107Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof
#2108Pattern forming method and manufacturing method of semiconductor device
#2109Photosensitive coating for enhancing a contrast of a photolithographic exposure
#2110Method for photolithography in semiconductor manufacturing
#2111Developing method and developing apparatus
#2112Method for manufacturing insulating resin layer, substrate for electro-optical devices, method for manufacturing electro-optical device, and electro-optical device
#2113Method for producing color filter for image sensor
#2114Photosensitive coating for enhancing a contrast of a photolithographic exposure
#2115Method for forming patterns of semiconductor device
#2116Apparatus and method for argon plasma induced ultraviolet light curing step for increasing silicon-containing photoresist selectivity
#2117METHOD FOR FORMING A RESIST PATTERN
#2118Method for chemical mechanical planarization of a metal layer located over a photoresist layer and a method for manufacturing a micro pixel array using the same
#2119Micropattern formation material and method of micropattern formation
#2120Method of forming high etch resistant resist patterns
#2121Coating compositions for use in forming patterns and methods of forming patterns
#2122Resist composition, method for forming resist pattern, semiconductor device and method for manufacturing thereof
#2123Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same
#2124Photosensitive resin composition and method for manufacturing semiconductor device using the same
#2125Method of producing a trench in a photo-resist on a III-V wafer and a compound wafer having a photo-resist including such a trench
#2126Etch features with reduced line edge roughness
#2127Method to print photoresist lines with negative sidewalls
#2128Positive photoresist composition and method for forming resist pattern
#2129Etching solutions and processes for manufacturing flexible wiring boards
#2130Polymide thin film self-assembly process
#2131Method for forming a lithography pattern
#2132Method of manufacturing an electronic device
#2133Method of fabricating semiconductor device
#2134Polymers, methods of use thereof, and methods of decomposition thereof
#2135Radiation curable polymer films having improved laser ablation properties and radiation curable sensitizers therefor
#2136Methods of fabricating a semiconductor device
#2137Encapsulation of chemically amplified resist template for low pH electroplating
#2138Method for manufacturing printing plate
#2139Process solutions containing surfactants
#2140Process solutions containing surfactants
#2141Pattern forming method, film forming apparatus and pattern forming apparatus
#2142Method of forming fine pattern, liquid crystal display device having a fine pattern and fabricating method thereof
#2143Method for fabricating semiconductor device
#2144Cure during rinse to prevent resist collapse
#2145Method of fabricating a semiconductor device
#2146Cluster tool architecture for processing a substrate
#2147Cluster tool architecture for processing a substrate
#2148Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same
#2149Laser ablating of printing plates and/or printing rollers to decrease taper and TIR
#2150Photoresist coating composition and method for forming fine contact of semiconductor device
#2151Method of forming fine patterns
#2152Photoresist coating composition and method for forming fine pattern using the same
#2153Photoresist coating composition and method for forming fine pattern using the same
#2154Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent
#2155Method for forming conductive line of semiconductor device
#2156Methods of eliminating pattern collapse on photoresist patterns
#2157Method and device for wetting a substrate with a liquid
#2158METHOD OF FORMING BANK, METHOD OF FORMING FILM PATTERN, SEMICONDUCTOR DEVICE, ELECTRO OPTIC DEVICE, AND ELECTRONIC APPARATUS
#2159Method of plasma etching a substrate
#2160Method for preparing semiconductor device
#2161Micropattern forming material and method for forming micropattern
#2162Optimized cluster tool transfer process and collision avoidance design
#2163Method for improving surface roughness of processed film of substrate and apparatus for processing substrate
#2164Method for manufacturing electrodes of a plasma display panel
#2165Method for semiconductor manufacturing using a negative photoresist with thermal flow properties
#2166Semiconductor device manufacturing method for preventing patterns from inclining in drying process
#2167Semiconductor device fabrication method
#2168Protected polyvinyl alcohol auxiliary for forming fine pattern and process for producing the same
#2169Line edge roughness reduction compatible with trimming
#2170Fine pattern forming method
#2171Method for reducing linewidth and size of metal, semiconductor or insulator patterns
#2172Method for forming photoresist pattern and method for manufacturing semiconductor device
#2173Pattern forming method and semiconductor device manufacturing method
#2174Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same
#2175Norbornene polymer for photoresist and photoresist composition comprising the same
#2176Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same
#2177Method of manufacturing a reflector and liquid crystal display device including such a reflector
#2178Lift-off method
#2179Material for forming fine pattern and method for forming fine pattern using the same
#2180Resist collapse prevention using immersed hardening
#2181Pattern formation method
#2182Water soluble resin composition, method of pattern formation and method of inspecting resist pattern
#2183Distributed temperature control system for point of dispense temperature control on track systems utilizing mixing of hot and cold streams
#2184Method for post lithographic critical dimension shrinking using thermal reflow process
#2185Method for forming a finely patterned resist
#2186METHOD FOR REDUCING FEATURE LINE EDGE ROUGHNESS
#2187Method for post lithographic critical dimension shrinking using post overcoat planarization
#2188Method of forming resist pattern, positive resist composition, and layered product
#2189Water soluble negative tone photoresist
#2190Resist composition, multilayer body, and method for forming resist pattern
#2191Water-soluble composition for coating photoresist pattern and method for forming fine patterns using the same
#2192Composition for coating a photoresist pattern
#2193Methods and systems for controlling variation in dimensions of patterned features across a wafer
#2194Porous biodegradable polymeric materials for cell transplantation
#2195Methods and compositions for forming aperiodic patterned copolymer films
#2196Method and system for determining post exposure bake endpoint
#2197Coat/develop module with independent stations
#2198Cluster tool architecture for processing a substrate
#2199Developer endpoint detection in a track lithography system
#2200Purged vacuum chuck with proximity pins
#2201Cluster tool substrate throughput optimization
#2202Cluster tool architecture for processing a substrate
#2203Coat/develop module with shared dispense
#2204Method and an apparatus for the drying of the printing plates for flexography
#2205METHOD FOR FORMING PHOTORESIST PATTERN AND METHOD FOR TRIMING PHOTORESIST PATTERN
#2206Double photolithography methods with reduced intermixing of solvents
#2207Method for forming resist pattern and resist pattern
#2208Etching process compatible with DUV lithography
#2209Apparatus for treating a substrate with an ozone-solvent solution
#2210Positive resist containing naphthol functionality
#2211Low activation energy positive resist
#2212Method and apparatus for applying surface treatments to photosensitive printing elements during thermal development
#2213System and method for plasma induced modification and improvement of critical dimension uniformity
#2214Method for reducing pattern dimension in photoresist layer
#2215Method of processing substrate and chemical used in the same
#2216Method of processing substrate and chemical used in the same
#2217Composition for coating over a photoresist pattern
#2218Method for forming self-synthesizing conductive or conjugated polymer film and application
#2219Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent
#2220Method of patterning a thick-film paste material layer, method of manufacturing cold- cathode field emission device, and method of manufacturing a cold-cathode field emission display
#2221Semiconductor device having improved contact hole structure and method for fabricating the same
#2222Pattern designing method, photomask manufacturing method, resist pattern forming method and semiconductor device manufacturing method
#2223Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the same
#2224Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for producing the same
#2225Substrate processing method
#2226Positive resist composition
#2227Mask patterns including gel layers for semiconductor device fabrication and methods of forming the same
#2228Micro lens array, optical member and method of producing micro lens array
#2229Methods of etching photoresist on substrates
#2230Radiation sensitive compositions and methods
#2231Methods of forming transistor gates; and methods of forming programmable read-only memory constructions
#2232Photoactive resist capping layer
#2233Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device
#2234Implanted photoresist to reduce etch erosion during the formation of a semiconductor device
#2235Microlens forming method
#2236Photoresist trimming process
#2237Process control method, a method for forming monitor marks, a mask for process control, and a semiconductor device manufacturing method
#2238Resist pattern forming method based on near-field exposure, and substrate processing method and device manufacturing method using the resist pattern forming method
#2239Method of forming fine patterns
#2240Nano-structure and method of fabricating nano-structures
#2241Method of forming pattern
#2242Lithographic semiconductor manufacturing using a multi-layered process
#2243Resist pattern thickening material and process for forming the same, and semiconductor device and process for manufacturing the same
#2244Method for processing a photomask for semiconductor devices
#2245Photosensitive resin compositions
#2246Etch-resistant film, forming method thereof, surface-modified resist pattern, forming method thereof, semiconductor device and manufacturing method thereof
#2247Method of processing light sensitive planographic printing plate material
#2248Method of patterning a photoresist film using a lithographic
#2249Methods of patterning photoresist
#2250Method of processing resist, semiconductor device, and method of producing the same
#2251Multiple exposure and shrink to achieve reduced dimensions
#2252Anti-reflective coatings using vinyl ether crosslinkers
#2253Resist pattern and reflow technology
#2254Development of photolithographic masks for semiconductors
#2255Apparatus used in reshaping a surface of a photoresist
#2256Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent
#2257Negative resist composition comprising hydroxy-substituted base polymer and Si-containing crosslinker having epoxy ring and a method for patterning semiconductor devices using the same
#2258Cleaning solution and method of cleaning semiconductor devices using the same
#2259Cleaning solution for photoresist, method for forming a photoresist pattern using the same, and semiconductor device
#2260Semiconductor constructions
#2261Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance
#2262Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device
#2263UV radiation blocking protective layers compatible with thick film pastes
#2264Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device
#2265Methods of eliminating pattern collapse on photoresist patterns
#2266Fabrication and use of superlattice
#2267Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof
#2268Anti-reflective coatings
#2269Resist pattern formation method, patterned substrate manufacturing method, and resist pattern formation apparatus
#2270Method of improving the uniformity of a patterned resist on a photomask
#2271Method and apparatus for reforming film and controlling slimming amount thereof
#2272Method for smoothing areas in structures by utilizing the surface tension
#2273Method and system for treating a hard mask to improve etch characteristics
#2274Apparatus for uniformly baking substrates such as photomasks
#2275Methods of patterning a surface using single and multilayer molecular films
#2276Antistatic film forming composition, and producing method for conductive film pattern, electron source and image display apparatus
#2277Mask pattern data producing method, patterning method, reticle correcting method, reticle manufacturing method, and semiconductor apparatus manufacturing method
#2278Wordline structures including stabilized 193nm resist
#2279Acetylenic diol ethylene oxide/propylene oxide adducts and processes for their manufacture
#2280Coating forming agent for reducing pattern dimension and method of forming fine pattern therewith
#2281Chemical liquid apparatus and deaerating method
#2282Method of forming contact hole and method of manufacturing semiconductor device
#2283Controlled shrinkage of bilayer photoresist patterns
#2284Method for manufacturing wiring substrate and method for manufacturing electronic device
#2285Mask, method of fabricating the same, and method of fabricating organic electro-luminescence device using the same
#2286Inverse resist coating process
#2287Photoimageable composition
#2288Method of joining a workpiece and a microstructure light exposure
#2289Electron exposure to reduce line edge roughness
#2290Pattern formation method
#2291LIGA developer apparatus system
#2292Sensors
#2293Solvent vapor-assisted plasticization of photoresist films to achieve critical dimension reduction during temperature reflow
#2294Pre-exposure of patterned photoresist films to achieve critical dimension reduction during temperature reflow
#2295Method for processing photoresist
#2296Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them
#2297Lithography pattern shrink process and articles
#2298Semiconductor device having improved contact hole structure and method for fabricating the same
#2299Patterned microelectronic mask layer formation method employing multiple feed-forward linewidth measurement
#2300Method for producing a hard mask in a capacitor device and a hard mask for use in a capacitor device
#2301Pattern forming method and method for manufacturing a semiconductor device
#2302Pattern formation method
#2303Method for forming pattern and method for manufacturing semiconductor device
#2304Coating material for pattern fineness enhancement and method of forming fine pattern with the same
#2305Photoimageable composition
#2306Single layer resist liftoff process for nano track width
#2307Water soluble negative tone photoresist
#2308Method for the production of a semiconductor device
#2309Resist reflow measurement key and method of forming a fine pattern of a semiconductor device using the same
#2310Reducing photoresist line edge roughness using chemically-assisted reflow
#2311Increasing the etch resistance of photoresists
#2312Direct photo-patterning of nanoporous organosilicates, and method of use
#2313Pattern formation method
#2314Resist pattern forming method and semiconductor device fabrication method
#2315Method of controlling critical dimension microloading of photoresist trimming process by selective sidewall polymer deposition
#2316Methods for fabricating semiconductor devices
#2317Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method
#2318Method of processing substrate and chemical used in the same
#2319Method of forming a resist pattern and fabricating tapered features
#2320Method to print photoresist lines with negative sidewalls
#2321Method for forming a micro pattern, micro pattern, method for fabricating a mold for forming the micro pattern through transcription, and mold for forming the micro pattern through transcription
#2322Method for reducing pattern dimension in photoresist layer
#2323Pattern designing method, photomask manufacturing method, resist pattern forming method and semiconductor device manufacturing method
#2324Method of plasma etching a substrate
#2325Mask trimming apparatus and mask trimming method
#2326Microstructure drying treatment method and its apparatus and its high pressure vessel
#2327Technique for enhancing accuracy of critical dimensions of a gate electrode by using characteristics of an ARC layer
#2328Method for forming image and apparatus for forming image
#2329Post-etch clean process for porous low dielectric constant materials
#2330Method for manipulating the topography of a film surface
#2331Biocompatible microchip and a method for producing the same
#2332Method for forming fine resist pattern
#2333Method for postbaking a lithographic printing plate
#2334Photoresists processable under biocompatible conditions for multi-biomolecule patterning
#2335Methods, photoresists and substrates for ion-implant lithography
#2336Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device
#2337Method of etching materials patterned with a single layer 193nm resist
#2338Resist compositions including thermal crosslinking agents
#2339Method of treating wafers with photoresist to perform metrology analysis using large current e-beam systems
#2340Method for forming pattern, and optical element
#2341Method of forming fine patterns
#2342Temperature calibration method for baking processing apparatus, adjustment method for development processing apparatus, and method of manufacturing semiconductor apparatus
#2343Patterned polymer microgel and method of forming same
#2344Etching process including plasma pretreatment for generating fluorine-free carbon-containing polymer on a photoresist pattern
#2345Methods of forming patterned compositions
#2346Method and apparatus for fabrication of large area 3D photonic crystals with embedded waveguides
#2347High refractive index gratings for waveguide displays manufactured by self-aligned stacked process
#2348Dynamic adjustment of post exposure bake during lithography utilizing real-time feedback for wafer exposure delay
#2349Manufacturing method of array substrate and manufacturing method of photo spacer structure thereof
#2350Method for manufacturing an OLED backplate and method for manufacturing an OLED panel
#2351Microstructure patterned surfaces for integrated lead disk drive head suspensions
#2352Photosensitive insulated resin composition and method of producing insulated film thereof
#2353Method of patterning a film layer
#2354Joining of pixel wall and photospacers in an electrowetting display
#2355Compositions and processes for self-assembly of block copolymers
#2356Method and apparatus for fabrication of large area 3D photonic crystals with embedded waveguides
#2357Lithographically defined microporous carbon-composite structures
#2358Pixel wall configuration for an electrowetting display