177126 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Processing photosensitive materials; Apparatus therefor; Stripping or agents therefor using plasma means only
SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#2SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
#3CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION INCLUDING COPOLYMER ADDITIVE AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME
#4PLASMA MULTI-WAFER ASHING SYSTEM
#5CRITICAL DIMENSION UNIFORMITY TUNING BASED ON MASK DESIGN FEATURE DENSITY
#6REWORK OF METAL-CONTAINING PHOTORESIST
#7METHOD FOR REMOVING RESIST LAYER, METHOD OF FORMING A PATTERN AND METHOD OF MANUFACTURING A PACKAGE
#8SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#9SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
#10SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING
#11PLASMA-ACTIVATED LIQUIDS
#12Touch sensor and manufacturing method thereof
#13Composite Hard Masks For Ultra-Thin Magnetic Sensors
#14SEMICONDUCTOR MACHINE SYSTEM AND MANUFACTURING METHOD USING THEREOF
#15Method and system for cleaning a process chamber
#16Gas distribution plate with UV blocker
#17Semiconductor devices and methods of manufacturing
#18METHOD AND DEVICE FOR LOCALLY REMOVING AND/OR MODIFYING A POLYMER MATERIAL ON A SURFACE
#19Ash rate recovery method in plasma strip chamber
#20Method for removing resist layer, method of forming a pattern and method of manufacturing a package
#21PHOTORESIST UNDERLAYER COMPOSITIONS AND PATTERNING METHODS
#22METHOD OF FORMING HOLE INJECTION LAYER, HOLE INJECTION LAYER INK COMPOSITION, AND LIGHT-EMITTING DEVICE MANUFACTURED BY USING HOLE INJECTION LAYER INK COMPOSITION
#23Advanced temperature monitoring system with expandable modular layout design
#24Plasma Strip Tool with Multiple Gas Injection
#25SUBSTRATE TREATING APPARATUS
#26Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus
#27Method of manufacturing metal wire and metal wire grid, wire grid polarizer, electronic device
#28Plasma ashing method using residue gas analyzer
#29Sensor Apparatus and Plasma Ashing System
#30Methods for processing a workpiece using fluorine radicals
#31Semiconductor devices and methods of manufacturing
#32Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus
#33METHOD FOR PRODUCING A PLANAR POLYMER STACK
#34Resist removing method and resist removing apparatus
#35Method and system for cleaning a process chamber
#36Strip process for high aspect ratio structure
#37PLASMA PROCESSING METHOD FOR PROCESSING SUBSTRATE
#38Processing chamber with substrate edge enhancement processing
#39Plasma treatment method to improve photo resist roughness and remove photo resist scum
#40Method for removing photoresistor layer, method of forming a pattern and method of manufacturing a package
#41Method for high aspect ratio photoresist removal in pure reducing plasma
#42Photoresist removal method using residue gas analyzer
#43Etching substrates using ALE and selective deposition
#44METHOD FOR REMOVING PATTERNED NEGATIVE PHOTORESIST
#45METHOD OF PRODUCING METAL MESH TYPE TRANSPARENT CONDUCTING FILM USING PHOTORESIST ENGRAVED PATTERN AND SURFACE MODIFICATION AND TRANSPARENT CONDUCTING FILM PRODUCED BY THE SAME
#46Surface treatment of substrates using passivation layers
#47METHOD FOR FABRICATING SEMICONDUCTOR STRUCTURE INVOLVING CLEANING MASK MATERIAL
#48Method for cleaning a process chamber
#49Substrate processing method and substrate processing device
#50Manufacturing method for metal grating, metal grating and display device
#51Plasma processing method and plasma processing apparatus
#52Substrate treating apparatus and substrate treating method
#53Plasma Processing Apparatus
#54Plasma Strip Tool With Multiple Gas Injection Zones
#55A METHOD FOR IMPROVING THE MASK STRIPPING EFFICIENCY OF AN ARRAY SUBSTRATE, AN ARRAY SUBSTRATE AND A DISPLAY PANEL
#56Photoresist stripping apparatus, and methods of stripping photoresist and forming thin film pattern using the same
#57Lithographic mask layer
#58Plasma generating device
#59Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus
#60Stripping process
#61Method of manufacturing a semiconductor device
#62Strip process for high aspect ratio structure
#63Back-side friction reduction of a substrate
#64MICRON PATTERNED SILICONE HARD-COATED POLYMER (SHC-P) SURFACES
#65Method for Manufacturing Pillar or Hole Structures in a Layer of a Semiconductor Device, and Associated Semiconductor Structure
#66Etching substrates using ale and selective deposition
#67Substrate cleaning method, substrate processing method, substrate processing system and semiconductor device manufacturing method
#68Plasmonic nanohole arrays on hybrid substrate for highly sensitive label-free biosensing
#69Pretreatment method for photoresist wafer processing
#70Conductive film and method of making same
#71Methods of dry stripping boron-carbon films
#72Chemically amplified positive resist composition and patterning process
#73Ultra low silicon loss high dose implant strip
#74Method of patterning a device
#75Photoresist system and method
#76Method for high aspect ratio photoresist removal in pure reducing plasma
#77Plasma generation and pulsed plasma etching
#78Method of producing structure containing phase-separation structure, method of forming pattern, and method of forming fine pattern
#79Ashing device
#80Recycling unit, substrate treating apparatus and recycling method using the recycling unit
#81Plasma mediated ashing processes that include formation of a protective layer before and/or during the plasma mediated ashing process
#82Method and system for modifying photoresist using electromagnetic radiation and ion implantation
#83Plasma etcher design with effective no-damage in-situ ash
#84PLASMA GENERATING APPARATUS AND PROCESS FOR SIMULTANEOUS EXPOSURE OF A WORKPIECE TO ELECTROMAGNETIC RADIATION AND PLASMA
#85Bare aluminum baffles for resist stripping chambers
#86Photoresist strip processes for improved device integrity
#87In-situ photoresist strip during plasma etching of active hard mask
#88Capacitively-coupled plasma processing system having a plasma processing chamber for processing a substrate
#89RESIN REMOVAL METHOD, RESIN REMOVAL APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#90PLASMA ASHING COMPOUNDS AND METHODS OF USE
#91Plasma processing apparatus, plasma processing method, and non-transitory computer-readable medium
#92Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus
#93CLUSTER BEAM GENERATING APPARATUS, SUBSTRATE PROCESSING APPARATUS, CLUSTER BEAM GENERATING METHOD, AND SUBSTRATE PROCESSING METHOD
#94SHOWERHEAD CONFIGURATIONS FOR PLASMA REACTORS
#95Method and system for modifying photoresist using electromagnetic radiation and ion implantation
#96Method of Manufacturing Semiconductor Devices
#97PLASMA MEDIATED ASHING PROCESSES
#98Method and apparatus for removing photoresist
#99PLASMA MEDIATED ASHING PROCESSES
#100Plasma ashing method
#101THERMAL ISOLATION ASSEMBLIES FOR WAFER TRANSPORT APPARATUS AND METHODS OF USE THEREOF
#102ULTRA LOW SILICON LOSS HIGH DOSE IMPLANT STRIP
#103Ashing method and ashing device
#104Low damage photoresist strip method for low-K dielectrics
#105Post chromium alloy plasma etch ashing process
#106PLASMA-BASED ORGANIC MASK REMOVAL WITH SILICON FLUORIDE
#107METHOD FOR REWORKING SILICON-CONTAINING ARC LAYERS ON A SUBSTRATE
#108Photoreactive Removal of Ion Implanted Resist
#109METHOD OF REMOVING PHOTORESIST AND ETCH-RESIDUES FROM VIAS
#110Method of manufacturing magnetic recording medium
#111Method for removing implanted photo resist from hard disk drive substrates
#112Method for removing resist and for producing a magnetic recording medium, and systems thereof
#113Bare aluminum baffles for resist stripping chambers
#114Method of removing resist and apparatus therefor
#115Strip with reduced low-K dielectric damage
#116ETCHING LOW-K DIELECTRIC OR REMOVING RESIST WITH A FILTERED IONIZED GAS
#117PROCESS FOR STRIPPING PHOTORESIST AND REMOVING DIELECTRIC LINER
#118RESIST REMOVING METHOD, SEMICONDUCTOR MANUFACTURING METHOD, AND RESIST REMOVING APPARATUS
#119SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
#120ASHING DEVICE
#121INFRARED ENDPOINT DETECTION FOR PHOTORESIST STRIP PROCESSES
#122Fine pattern forming method
#123Method of removing photoresist
#124PROCESS AND HARDWARE FOR PLASMA TREATMENTS
#125Method and apparatus for removing photoresist
#126Method for removing a hardened photoresist
#127Processing apparatus, processing method, and plasma source
#128Plasma ashing apparatus and endpoint detection process
#129METHOD OF PHOTORESIST REMOVAL IN THE PRESENCE OF A LOW-K DIELECTRIC LAYER
#130Method for generating hollow cathode plasma and method for treating large area substrate using hollow cathode plasma
#131PHASE CHANGE BASED HEATING ELEMENT SYSTEM AND METHOD
#132METHOD AND APPARATUS FOR REMOVING POLYMER FROM A SUBSTRATE
#133Array substrate for liquid crystal display device and method of fabricating the same
#134METHOD OF SUBSTRATE POLYMER REMOVAL
#135METHOD AND APPARATUS FOR REMOVING POLYMER FROM A SUBSTRATE
#136PLASMA MEDIATED ASHING PROCESSES THAT INCLUDE FORMATION OF A PROTECTIVE LAYER BEFORE AND/OR DURING THE PLASMA MEDIATED ASHING PROCESS
#137Reducing damage to low-K materials during photoresist stripping
#138METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS
#139Method for increasing the removal rate of photoresist layer
#140Method of manufacturing semiconductor device
#141METHOD OF REMOVING PHOTORESIST
#142Enhanced stripping of low-K films using downstream gas mixing
#143Method for Resist Strip in Presence of Low K Dielectric Material and Apparatus for Performing the Same
#144PLASMA PROCESSING APPARATUS AND PLASMA GENERATION CHAMBER
#145Substrate processing method, substrate processing system, and computer-readable storage medium
#146System and Method for Removal of Materials from an Article
#147In-situ photoresist strip during plasma etching of active hard mask
#148Apparatus and Method for Supercritical Fluid Removal or Deposition Processes
#149METHOD OF REMOVING PHOTORESIST LAYER AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
#150BATCH PHOTORESIST DRY STRIP AND ASH SYSTEM AND PROCESS
#151Film removal method and apparatus
#152Methods of etching photoresist on substrates
#153Bare aluminum baffles for resist stripping chambers
#154Methods for removing photoresist from semiconductor structures having high-k dielectric material layers
#155Method and apparatus for processing a substrate using plasma
#156Technique for removing resist material after high dose implantation in a semiconductor device
#157Dry photoresist stripping process and apparatus
#158Method for processing semiconductor wafer
#159Method and apparatus for ashing a substrate using carbon dioxide
#160Ashing Method And Ashing Apparatus
#161PLASMA PROCESSING METHOD AND APPARATUS, AND STORAGE MEDIUM
#162Plasma for resist removal and facet control of underlying features
#163METHODS FOR REMOVING PHOTORESIST FROM A SEMICONDUCTOR SUBSTRATE
#164Method for removing photoresist layer and method of forming opening
#165Method for detecting an end point of resist peeling, method and apparatus for peeling resist, and computer-readable storage medium
#166REWORK METHODOLOGY THAT PRESERVES GATE PERFORMANCE
#167METHOD OF REMOVING PHOTORESIST
#168Apparatus and method for treating substrates
#169Photoresist trimming process
#170Photoresist trimming process
#171Method of removing photoresist
#172Cleaning method and cleaning apparatus
#173Removal of organic-containing layers from large surface areas
#174PROCESSING METHOD
#175Method of removing a photoresist pattern, method of forming a dual polysilicon layer using the removing method and method of manufacturing a semiconductor device using the removing
#176Apparatus and method for photoresist removal processing
#177Method of manufacturing semiconductor device
#178Film removal method and apparatus
#179SUBSTRATE CLEANING APPARATUS AND METHOD
#180REMOVAL OF HIGH-DOSE ION-IMPLANTED PHOTORESIST USING SELF-ASSEMBLED MONOLAYERS IN SOLVENT SYSTEMS
#181Plasma dielectric etch process including ex-situ backside polymer removal for low-dielectric constant material
#182Method of removing residue from a substrate
#183Medium pressure plasma system for removal of surface layers without substrate loss
#184Method to manipulate post metal etch/side wall residue
#185Processes for monitoring the levels of oxygen and/or nitrogen species in a substantially oxygen and nitrogen-free plasma ashing process
#186Systems and Methods for Photoresist Strip and Residue Treatment in Integrated Circuit Manufacturing
#187Systems and Methods for Photoresist Strip and Residue Treatment in Integrated Circuit Manufacturing
#188Cleaning process
#189Systems and methods for gas assisted resist removal
#190SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#191Plasma processing device and ashing method
#192Supercritical fluid-based cleaning compositions and methods
#193Remote plasma pre-clean with low hydrogen pressure
#194Hydrogen plasma photoresist strip and polymeric residue cleanup process for low dielectric constant materials
#195Batch photoresist dry strip and ash system and process
#196Method of fabricating semiconductor devices
#197Substrate processing method, substrate processing apparatus and computer-readable memory medium
#198Hydrogen treatment to improve photoresist adhesion and rework consistency
#199Method of removing a photoresist and method of manufacturing a semiconductor device using the same
#200Plasma ashing method
#201Gas mixture for removing photoresist and post etch residue from low-k dielectric material and method of use thereof
#202Methods and apparatus for stripping
#203METHOD OF STRIPPING PHOTORESIST
#204Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same
#205Semiconductor processing using energized hydrogen gas and in combination with wet cleaning
#206Method for removing photoresist using a thermal bake in the presence of hydrogen and a semiconductor device manufactured using the same
#207System and method for mid-pressure dense phase gas and ultrasonic cleaning
#208Removal of residues for low-k dielectric materials in wafer processing
#209Hydrogen and oxygen based photoresist removal process
#210Method for the removal of organic residues from finely structured surfaces
#211METHOD OF REMOVING A PHOTORESIST PATTERN AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME
#212Method for resist strip in presence of regular low k and/or porous low k dielectric materials
#213Method for forming conductive line of semiconductor device
#214Treatment of substrate using functionalizing agent in supercritical carbon dioxide
#215Method for forming a semiconductor device including a plasma ashing treatment for removal of photoresist
#216PORTABLE SYSTEM FOR SEMICONDUCTOR MANUFACTURING
#217Methods of removing resist from substrates in resist stripping chambers
#218Phase change based heating element system and method
#219Plasma processing method and plasma processing apparatus
#220Methods of etching photoresist on substrates
#221H20 PLASMA AND H20 VAPOR METHODS FOR RELEASING CHARGES
#222Method of in-situ ash strip to eliminate memory effect and reduce wafer damage
#223REMOVAL OF POST ETCH RESIDUE FOR A SUBSTRATE WITH OPEN METAL SURFACES
#224METHOD AND SYSTEM FOR TREATING A SUBSTRATE WITH A HIGH PRESSURE FLUID USING A PEROXIDE-BASED PROCESS CHEMISTRY IN CONJUNCTION WITH AN INITIATOR
#225System and method for removal of materials from an article
#226Photo resist stripping and de-charge method for metal post etching to prevent metal corrosion
#227Low-pressure removal of photoresist and etch residue
#228Dry stripping equipment comprising plasma distribution shower head
#229Low-pressure removal of photoresist and etch residue
#230Method of manufacturing a semiconductor device
#231Method of forming contact pads
#232Method for the removal of organic residues from finely structured surfaces
#233Photoresist strip using solvent vapor
#234Method for removing photoresist layer and method for forming metal line in semiconductor device using the same
#235Apparatus and method for removing photoresist in a semiconductor device
#236Process for removing a residue from a metal structure on a semiconductor substrate
#237High ion energy and reative species partial pressure plasma ash process
#238METHOD FOR TREATING A SUBSTRATE WITH A HIGH PRESSURE FLUID USING A PREOXIDE-BASED PROCESS CHEMISTRY
#239System for removing a residue from a substrate using supercritical carbon dioxide processing
#240Method for removing a residue from a substrate using supercritical carbon dioxide processing
#241In-situ absolute measurement process and apparatus for film thickness, film removal rate, and removal endpoint prediction
#242Atmospheric process and system for controlled and rapid removal of polymers from high aspect ratio holes
#243Plasma processing method and apparatus, and storage medium
#244Method for photoresist stripping and treatment of low-k dielectric material
#245Methods of etching photoresist on substrates
#246Atmospheric pressure plasma processing reactor
#247Semiconductor processing using energized hydrogen gas and in combination with wet cleaning
#248Apparatus and plasma ashing process for increasing photoresist removal rate
#249Organic solvents having ozone dissolved therein for semiconductor processing utilizing sacrificial materials
#250Methods of downstream microwave photoresist removal and via clean, particularly following Stop-On TiN etching
#251Photoresist trimming process
#252Low oxygen content photoresist stripping process for low dielectric constant materials
#253Silicon recess improvement through improved post implant resist removal and cleans
#254Method for stripping photoresist from etched wafer
#255H2O plasma for simultaneous resist removal and charge releasing
#256Bare aluminum baffles for resist stripping chambers
#257System and methods for surface cleaning
#258Method for surface cleaning
#259Manufacturing method of semiconductor device
#260Plasma processing method and apparatus
#261Hydrogen plasma photoresist strip and polymeric residue cleanup process for low dielectric constant materials
#262Method of removing resist, semiconductor device thereby and method of manufacturing a semiconductor device
#263Method and system for treating a hard mask to improve etch characteristics
#264Advanced multi-pressure workpiece processing
#265Resist removal method and semiconductor device manufactured by using the same
#266Apparatus for heating a substrate in a variable temperature process using a fixed temperature chuck
#267Solvent free photoresist strip and residue removal processing for post etching of low-k films
#268Method for removal of pattern resist over patterned metal having an underlying spacer layer
#269Method for removing color photoresist
#270Method and apparatus for removing photoresist from a substrate
#271Gas assisted method for applying resist stripper and gas-resist stripper combinations
#272Method of in-situ damage removal - post O2 dry process
#273Method and apparatus for treating a substrate surface by bubbling
#274Minimizing the loss of barrier materials during photoresist stripping
#275Damage-free resist removal process for ultra-low-k processing
#276Systems and methods for photoresist strip and residue treatment in integrated circuit manufacturing
#277FRAM capacitor stack clean
#278Systems and methods for photoresist strip and residue treatment in integrated circuit manufacturing
#279Plasma monitoring method, plasma processing method, method of manufacturing semiconductor device, and plasma processing system
#280Method for providing uniform removal of organic material
#281Touch sensor and manufacturing method thereof
#282Surface treatment of substrates using passivation layers
#283Atomic layer etch methods and hardware for patterning applications