Patents-Review.com
ClassID:

177130 ⎘

G03F7/70016 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Production of exposure light, i.e. light sources by discharge lamps

Recent Application in this class:
#1
20260118621
2026-04-30

ILLUMINATION OPTICAL SYSTEM INCLUDING TEMPERATURE COMPENSATED APERTURE

 #2
20250328084
2025-10-23

SYSTEM, APPARATUS AND METHOD FOR SELECTIVE SURFACE TREATMENT

 #3
20250244684
2025-07-31

SUBSTARATE PROCESSING APPARATUS WITH VUV INTENSITY CONTROL

 #4
20250149336
2025-05-08

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME

 #5
20240402610
2024-12-05

ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, IRRADIATION METHOD, AND COMPONENT MANUFACTURING METHOD

 #6
20230418164
2023-12-28

EDGE EXPOSURE APPARATUS, METHOD OF MAKING AND USING THE SAME

 #7
20230176351
2023-06-08

Light source apparatus, lithography apparatus, and article manufacturing

 #8
20230154719
2023-05-18

Charged particle source module

 #9
20230056463
2023-02-23

Multi-charged particle beam writing apparatus, and multi-charged particle beam writing method

 #10
20220357668
2022-11-10

METHOD AND APPARATUS FOR GREYSCALE LITHOGRAPHY

 #11
20220326621
2022-10-13

Lamp, light source device, exposure apparatus, and article manufacturing method

 #12
20220221799
2022-07-14

Photoresist-free deposition and patterning with vacuum ultraviolet lamps

 #13
20220107485
2022-04-07

Light source apparatus, exposure apparatus, and article manufacturing method

 #14
20210366702
2021-11-25

Exposure apparatus and article manufacturing method

 #15
20210142976
2021-05-13

Multibeamlet charged particle device and method

 #16
20210082682
2021-03-18

Lamp device, exposure apparatus, and method of manufacturing article

 #17
20210063882
2021-03-04

Substrate processing apparatus, substrate processing method, and storage medium

 #18
20210011388
2021-01-14

Exposure equipment and exposure method

 #19
20200279717
2020-09-03

Multi-electron beam device

 #20
20200209759
2020-07-02

MIRROR FOR EXTREME ULTRAVIOLET LIGHT AND EXTREME ULTRAVIOLET LIGHT GENERATING APPARATUS

 #21
20200135428
2020-04-30

Multi-charged particle beam writing apparatus, and multi-charged particle beam writing method

 #22
20200090936
2020-03-19

Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography

 #23
20200064743
2020-02-27

Exposure device

 #24
20200043693
2020-02-06

Charged particle source module

 #25
20200026199
2020-01-23

Projection lens, projection exposure apparatus and projection exposure method

 #26
20190363226
2019-11-28

Method for forming light-transmissive member, method for producing light emitting device, and light emitting device

 #27
20190235389
2019-08-01

Multi-configuration digital lithography system

 #28
20190080898
2019-03-14

Light source, lighting device and method of lighting the same

 #29
20190064681
2019-02-28

Exposure apparatus and prevention method and system for image offset thereof

 #30
20180337048
2018-11-22

Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography

 #31
20180233363
2018-08-16

Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography

 #32
20180233362
2018-08-16

Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography

 #33
20180149980
2018-05-31

Electron-beam lithography method and system

 #34
20170135192
2017-05-11

Electrodeless single low power CW laser driven plasma lamp

 #35
20160336167
2016-11-17

Electrodeless single CW laser driven xenon lamp

 #36
20160309571
2016-10-20

Radiation source, metrology apparatus, lithographic system and device manufacturing method

 #37
20160266497
2016-09-15

Illumination optical system, exposure apparatus, and method of manufacturing article

 #38
20160255710
2016-09-01

Photon source, metrology apparatus, lithographic system and device manufacturing method

 #39
20160163531
2016-06-09

Cooling apparatus, illumination optical system, exposure apparatus, and method of manufacturing article

 #40
20140367592
2014-12-18

Gas refraction compensation for laser-sustained plasma bulbs

 #41
20120248960
2012-10-04

Discharge lamp, light source apparatus, exposure apparatus, and exposure apparatus manufacturing method

 #42
20100225232
2010-09-09

Lighting method of light source apparatus

 #43
20100165656
2010-07-01

Light source

 #44
20080218049
2008-09-11

Discharge lamp, light source apparatus, exposure apparatus, and exposure apparatus manufacturing method

 #45
20080180644
2008-07-31

Light source apparatus with reflector gas-blasting structure

 #46
20080170308
2008-07-17

Cover for shielding a portion of an arc lamp

 #47
20060227254
2006-10-12

Discharge lamp lighting apparatus

 #48
20060209544
2006-09-21

Light source device and projection-type image display device

 #49
20050269934
2005-12-08

Protective cover for a lamp, set including a lamp and a protective cover, method of installing a source in a lithographic apparatus, device manufacturing method and device manufactured thereby

 #50
20050236954
2005-10-27

Microcavity discharge device