177142 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Mask illumination systems; Illumination settings, i.e. intensity distribution in the pupil plane, angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole, quadrupole; Partial coherence control, i.e. sigma or numerical aperture [NA] Off-axis setting using a programmable means, e.g. LCD or DMD
Device manufacturing method and lithographic apparatus
#302OPTICAL SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY
#303Spatial light modulation unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
#304Illumination optical apparatus, exposure apparatus, and device manufacturing method
#305Controller for optical device, exposure method and apparatus, and method for manufacturing device
#306Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
#307Illumination optical apparatus, exposure apparatus, and device manufacturing method
#308Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
#309Illumination optical system, exposure apparatus, and device manufacturing method
#310Illumination optical system, exposure apparatus, and device manufacturing method
#311SPATIAL LIGHT MODULATION UNIT, ILLUMINATION APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
#312Write-pattern determination for maskless lithography
#313Write-pattern determination for maskless lithography
#314Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
#315Exposure apparatus and method of exposing a semiconductor substrate
#316ILLUMINATION SYSTEM FOR EUV LITHOGRAPHY
#317Lithographic apparatus and method
#318Method and device for controlling a plurality of actuators and an illumination device for lithography
#319Optical components, illumination systems, and methods
#320Lithographic apparatus and method
#321Lithographic apparatus and method
#322Pixelated modulation of illumination pupil image
#323Illumination optics for projection microlithography
#324Lithographic apparatus and method
#325Measurement apparatus and method
#326Illumination system for microlithography
#327Mirror array for lithography
#328Lithographic apparatus and device manufacturing method
#329Lithographic apparatus and device manufacturing method
#330Illumination system for a microlithography projection exposure installation
#331Oblique mirror-type normal-incidence collector system for light sources, particularly EUV plasma discharge sources
#332System and method utilizing an illumination beam adjusting system
#333Illumination system particularly for microlithography
#334ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
#335System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination mode
#336Active faceted mirror system for lithography
#337Dynamic illumination uniformity and shape control for lithography
#338Illumination system for microlithography
#339Attenuator for attenuating wavelengths unequal to a used wavelength
#340Optical apparatus for illuminating an object
#341Light source for photolithography
#342Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method
#343Micro-mirror device including dielectrophoretic liquid
#344Multi mirror system for an illumination system