177142 ⎘
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Mask illumination systems; Illumination settings, i.e. intensity distribution in the pupil plane, angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole, quadrupole; Partial coherence control, i.e. sigma or numerical aperture [NA] Off-axis setting using a programmable means, e.g. LCD or DMD
MEMS MIRROR ARRAY MODULE
#2MASKLESS EXPOSURE SYSTEM HAVING IMAGE PROCESSING FUNCTION FOR SUBSTRATE POSITIONING
#3SUBSTRATE PROCESSING METHOD
#4INDIVIDUAL MIRROR FOR A FACETED MIRROR OF AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOSURE SYSTEM
#5EXTREME ULTRAVIOLET LITHOGRAPHY DEVICE AND OPERATING METHOD THEREOF
#6DATA TRANSFER DEVICE, EXPOSURE DEVICE, DEVICE, AND DEVICE MANUFACTURING METHOD
#7METHOD OF DETERMINATION OF OPTICAL PROPERTIES OF AN OPTICAL SYSTEM
#8LITHOGRAPHY APPARATUS AND METHOD FOR OPERATING A LITHOGRAPHY APPARATUS
#9SQUARE PIXEL PATTERNS FOR HIGH RESOLUTION DIGITAL LITHOGRAPHY
#10DIGITAL LITHOGRAPHY APPARATUS WITH IMAGING DEVICE POSITIONED TO MITIGATE MOIRE EFFECT
#11SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
#12MIRROR ASSEMBLY FOR MICROMIRROR ARRAY
#13METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM
#14INDIVIDUAL MIRROR OF A PUPIL FACET MIRROR AND PUPIL FACET MIRROR FOR AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOSURE APPARATUS
#15MICROELECTROMECHANICAL DEVICE
#16METHOD FOR OPERATING A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, MICROLITHOGRAPHIC MASK AND PROJECTION EXPOSURE APPARATUS
#17METHOD FOR MEASURING AN ILLUMINATION ANGLE DISTRIBUTION ON AN OBJECT FIELD AND ILLUMINATION OPTICS UNIT HAVING AN ILLUMINATION CHANNEL ALLOCATION INTENDED THEREFOR
#18HIGH RESOLUTION PHOTOLITHOGRAPHY
#19INSPECTION SYSTEM FOR RETICLE PARTICLE DETECTION USING A STRUCTURAL ILLUMINATION WITH APERTURE APODIZATION
#20PATTERN EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
#21High-performance EUV microscope device with free-form illumination system structure having elliptical mirror
#22FACET SYSTEM AND LITHOGRAPHY APPARATUS
#23HIGH FORCE LOW VOLTAGE PIEZOELECTRIC MICROMIRROR ACTUATOR
#24HIGH ACCURACY TEMPERATURE-COMPENSATED PIEZORESISTIVE POSITION SENSING SYSTEM
#25Extreme ultraviolet lithography device and method of operating extreme ultraviolet lithography device
#26FIELD FACET SYSTEM AND LITHOGRAPHY APPARATUS
#27FIELD FACET SYSTEM AND LITHOGRAPHY APPARATUS
#28EXPOSURE APPARATUS
#29DIGITAL MICROMIRROR DEVICE FOR AN ILLUMINATION OPTICAL COMPONENT OF A PROJECTION EXPOSURE SYSTEM
#30Method of assembling a facet mirror of an optical system
#31SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
#32Method and apparatus to register template with spatial light modulator
#33MATCHING PUPIL DETERMINATION
#34Micromirror arrays
#35Micromirror arrays
#36Method for controlling extreme ultraviolet light
#37Method and apparatus for photolithographic imaging
#38Optical arrangement and lithography apparatus
#39Method and apparatus for controlling extreme ultraviolet light
#40Matching pupil determination
#41Tunable illuminator for lithography systems
#42Apparatus and related method to control radiation transmission through mask pattern
#43Photolithography device having illuminator and method for adjusting intensity uniformity
#44Exposure apparatus and article manufacturing method
#45Test of operational status of a digital scanner during lithographic exposure process
#46Illumination optical unit and optical system for EUV projection lithography
#47Mirror array
#48MIRROR ASSEMBLY WITH HEAT TRANSFER MECHANISM
#49Spatial light modulator, method of driving same, and exposure method and apparatus
#50Tilting an optical element
#51Component for a mirror array for EUV lithography
#52Determination of operability of a digital scanner with shearing interferometry
#53Sensor device
#54Imprint system and imprinting process with spatially non-uniform illumination
#55Illumination optical assembly, exposure device, and device manufacturing method
#56Discrete source mask optimization
#57Spatial light modulator unit, illumination optical system, exposure device, and device manufacturing method
#58Method for adjusting a lighting setting
#59Illumination optical system, exposure apparatus, device production method, and light polarization unit
#60Method for predicting at least one illumination parameter for evaluating an illumination setting
#61Method for producing a reflective optical element and reflective optical element
#62Illumination system for illuminating a mask in a microlithographic exposure apparatus
#63ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#64ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
#65Beam transmission system, exposure device, and illumination optical system of the exposure device
#66Illumination system of a microlithographic projection device and method for operating such a system
#67METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
#68Optical assembly with a protective element and optical arrangement therewith
#69Lithographic method and apparatus
#70Illumination system for EUV projection lithography
#71Method of operating a microlithographic projection apparatus and illumination system of such an apparatus
#72Controller for optical device, exposure method and apparatus, and method for manufacturing device
#73Sensor arrangement for a lithography system, lithography system, and method for operating a lithography system
#74Determination of operability of a digital scanner with shearing interferometry
#75PROJECTION EXPOSURE METHODS AND SYSTEMS
#76OPTICAL UNIT, ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
#77Lighting system of a microlithographic projection exposure system and method for operating such a lighting system
#78Lithography apparatus and method for operating a lithography apparatus
#79Microelectromechanical mirror assembly
#80Mirror element, in particular for a microlithographic projection exposure apparatus
#81Illumination optic for EUV projection lithography
#82Faceted mirror for EUV projection lithography and illumination optical unit with same
#83Spatial light modulator unit, illumination optical system, exposure device, and device manufacturing method
#84Illumination system of a microlithographic projection exposure apparatus
#85Illumination system for illuminating a mask in a microlithographic exposure apparatus
#86EUV lithography system for dense line patterning
#87Euv lithography system for dense line patterning
#88Illumination device for optimizing polarization in an illumination pupil
#89Lithographic apparatus and method
#90Illumination system
#91Mirror device
#92Illumination system of a microlithographic projection exposure apparatus
#93Arrangement for actuating at least one optical element in an optical system
#94ILLUMINATION APPARATUS, ILLUMINATION METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
#95Illumination optical system, exposure apparatus, device production method, and light polarization unit
#96Facet mirror for an illumination optical unit for projection lithography
#97Flexible illuminator
#98Illumination optical assembly for projection lithography
#99Illumination optical assembly for a projection exposure apparatus
#100Illumination optical unit for projection lithography
#101Tilting an optical element
#102Mirror arrangement for microlithographic projection exposure apparatus and related method
#103Controller for optical device, exposure method and apparatus, and method for manufacturing device
#104Illumination optical assembly, exposure device, and device manufacturing method
#105Optical system of a microlithographic projection exposure apparatus
#106Device and method for controlling positioning of multiple adjustable mirror elements in a multi-mirror arrangement
#107Optical component
#108Lighting system of a microlithographic projection exposure system and method for operating such a lighting system
#109Lighting system of a microlithographic projection exposure system and method for operating such a lighting system
#110Mirror array
#111Method for illuminating an object field of a projection exposure system
#112Illumination optical unit for projection lithography
#113Method for displacing at least one optical component
#114Facet mirror for use in a projection exposure apparatus for microlithography
#115Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#116Support apparatus for an optical device, optical device and lithography system
#117Illumination system for EUV projection lithography
#118Device for determining a tilt angle of at least one mirror of a lithography system, and method
#119Spatial light modulator unit, illumination optical system, exposure device, and device manufacturing method
#120Illumination system of a microlithographic projection exposure apparatus
#121Illumination optical device, illumination method, and exposure method and device
#122Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
#123Microlithography illumination system and microlithography illumination optical unit
#124Illumination system and illumination optical unit for EUV projection lithography
#125Illumination system of a microlithographic projection exposure apparatus with a birefringent element
#126Illumination system for illuminating a mask in a microlithographic exposure apparatus
#127Illumination optical unit for EUV projection lithography
#128Illumination optical unit and illumination system for EUV projection lithography
#129Facet mirror for a projection exposure apparatus
#130Controller for optical device, exposure method and apparatus, and method for manufacturing device
#131Lithographic apparatus and method
#132Optical component
#133Illumination device and method for using the same in the projection lithography machine
#134Illumination system of a microlithographic projection exposure apparatus
#135Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system
#136Reflecting coating with optimized thickness
#137Optical module
#138Illumination system for an EUV lithography device and facet mirror therefor
#139Discrete source mask optimization
#140Illumination optical unit for projection lithography
#141Optical assembly for increasing the etendue
#142Illumination optical unit for projection lithography
#143Method for evaluating and improving pupil luminance distribution, illumination optical system and adjustment method thereof, exposure apparatus, exposure method, and device manufacturing method
#144Arrangement for the actuation of at least one element in an optical system
#145Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#146Illumination system of a microlithographic projection exposure apparatus
#147Optical system of a microlithographic projection exposure apparatus
#148Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devices
#149Illumination optical apparatus, exposure apparatus, and device manufacturing method
#150Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devices
#151Optical system of a microlithographic projection exposure apparatus
#152Illumination system and lithographic apparatus
#153Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
#154Monitor system for determining orientations of mirror elements and EUV lithography system
#155Arrangement for actuating at least one optical element in an optical system
#156Method for assigning a pupil facet of a pupil facet mirror of an illumination optical unit of a projection exposure apparatus to a field facet of a field facet mirror of the illumination optical unit
#157Illumination optical unit for EUV projection lithography
#158Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
#159Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus
#160Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation
#161EUV light source for generating a usable output beam for a projection exposure apparatus
#162Method of operating a microlithographic apparatus
#163Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
#164Projection exposure methods and systems
#165Method for adjusting an illumination setting
#166Method for operating a microlithographic projection exposure apparatus
#167Illumination system of a microlithographic projection exposure apparatus
#168Illumination system of a microlithographic projection exposure apparatus
#169Illumination system for an EUV projection lithographic projection exposure apparatus
#170Extreme ultraviolet lithography process to print low pattern density features
#171Spatial light modulator and exposure apparatus
#172Illumination optical unit
#173Optical system of a microlithographic projection exposure apparatus
#174Illumination system of a microlithographic projection exposure apparatus
#175Assembly for a projection exposure apparatus for EUV projection lithography
#176Illumination optical unit for projection lithography
#177Microelectromechanical mirror assembly
#178Mirror assembly with heat transfer mechanism
#179Illumination optical unit for EUV projection lithography
#180Optical system of a microlithographic projection exposure apparatus
#181Optical system for a microlithographic projection exposure apparatus
#182Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure system
#183Illumination system for EUV lithography
#184Method for adjusting an optical system of a microlithographic projection exposure apparatus
#185Illumination optical unit for a projection exposure apparatus
#186Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
#187Microlithographic projection exposure apparatus
#188Optical component
#189Optical component
#190Controller for optical device, exposure method and apparatus, and method for manufacturing device
#191Illumination system of a microlithographic projection exposure apparatus having a temperature control device
#192Visual training devices, systems, and methods
#193Illumination system of a microlithographic projection exposure apparatus
#194Illumination optical system, exposure apparatus, device production method, and light polarization unit
#195Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#196Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#197Light modulator and illumination system of a microlithographic projection exposure apparatus
#198Illumination method, illumination optical device, and exposure device
#199Optical module for guiding a radiation beam
#200Illumination optical assembly, exposure device, and device manufacturing method
#201Spatial light modulation element and exposure apparatus
#202Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure
#203Illumination optical unit for projection lithography
#204Facet mirror device
#205Mirror array
#206Method and system for creation of binary spatial filters
#207Illumination system of a microlithographic projection exposure apparatus
#208EUV lithography system
#209Illumination system for illuminating a mask in a microlithographic exposure apparatus
#210Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
#211Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errors
#212Illumination device for optimizing polarization in an illumination pupil
#213Microlithographic projection exposure apparatus
#214Illumination system of a microlithographic projection exposure apparatus
#215Methods and devices for driving micromirrors
#216Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
#217Microlithography illumination optical system and microlithography projection exposure apparatus including same
#218Microlithographic projection exposure apparatus
#219Optical system of a microlithographic projection exposure apparatus
#220Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system
#221Illumination system of a microlithographic projection exposure apparatus
#222Optical system for semiconductor lithography
#223Optical element having a plurality of reflective facet elements
#224Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#225FACET MIRROR FOR USE IN MICROLITHOGRAPHY
#226ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND ILLUMINATION METHOD
#227Illumination system for lithographic apparatus with control system to effect an adjustment of an imaging parameter
#228Optical apparatus for conditioning a radiation beam for use by an object, lithography apparatus and method of manufacturing devices
#229Illumination optical device, illumination method, and exposure method and device
#230Illumination optical system, exposure apparatus, and device manufacturing method
#231Lithographic apparatus and device manufacturing method with corrective positioning of reflective element
#232Spatial light modulation unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
#233Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
#234Illumination system, lithographic apparatus and method
#235ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
#236Spatial light modulator unit, illumination optical system, exposure device, and device manufacturing method
#237Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method
#238Illumination optical unit for microlithography
#239Illumination system, lithographic apparatus and method of adjusting an illumination mode
#240Optical apparatus, and method of orienting a reflective element
#241Light source optimizing method, exposure method, device manufacturing method, program, exposure apparatus, lithography system, light source evaluation method, and light source modulation method
#242Microlithographic projection exposure apparatus and related method
#243LITHOGRAPHIC APPARATUS AND METHOD
#244OPTICAL MODULE FOR GUIDING A RADIATION BEAM
#245Lens heating compensation in photolithography
#246Illumination system, lithographic apparatus and method of forming an illumination mode
#247Method to match exposure tools using a programmable illuminator
#248Microlithographic projection exposure apparatus
#249Illumination system of a microlithographic projection exposure apparatus
#250Illumination system and lithographic apparatus
#251Visual training devices, systems, and methods
#252OPTICAL UNIT, ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARTUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
#253Illumination system and lithographic apparatus
#254Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for radiation system and method for forming a spectral purity filter
#255Speckle reduction
#256ILLUMINATION METHODS AND DEVICES FOR PARTIALLY COHERENT ILLUMINATION
#257Illumination optical system, aligner, and process for fabricating device
#258Methods and devices for driving micromirrors
#259Microlithographic projection exposure apparatus
#260Illumination system of a microlithographic projection exposure apparatus having a temperature control device
#261Illumination optical unit for EUV microlithography
#262Microlithography illumination system and microlithography illumination optical unit
#263Illumination system of a microlithographic projection exposure apparatus
#264EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD
#265Illumination system for a microlithography projection exposure apparatus, microlithography projection exposure apparatus comprising such an illumination system, and fourier optical system
#266Illumination system for microlithography
#267Illumination optical system for microlithography and illumination system and projection exposure system with an illumination optical system of this type
#268Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method
#269OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MICROLITHOGRAPHIC EXPOSURE METHOD
#270SPATIAL LIGHT MODULATING UNIT, ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
#271Illumination system for illuminating a mask in a microlithographic projection exposure apparatus
#272Facet mirror for use in a projection exposure apparatus for microlithography
#273ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
#274Illumination device of a microlithographic projection exposure apparatus, and microlithographic projection exposure method
#275Measurement apparatus and method
#276Illumination system for a microlithographic projection exposure apparatus
#277Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation
#278Microlithographic projection exposure apparatus
#279Illumination system of a microlithographic projection exposure apparatus
#280Illumination system for illuminating a mask in a microlithographic exposure apparatus
#281OBLIQUE MIRROR-TYPE NORMAL-INCIDENCE COLLECTOR SYSTEM FOR LIGHT SOURCES, PARTICULARLY EUV PLASMA DISCHARGE SOURCES
#282SPATIAL LIGHT MODULATING UNIT, ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
#283Bundle-guiding optical collector for collecting the emission of a radiation source
#284ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE INSTALLATION
#285Illumination system of a microlithographic projection exposure apparatus with a birefringent element
#286Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus
#287Illumination system of a microlithographic projection exposure apparatus
#288ILLUMINATION DEVICE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND MICROLITHOGRAPHIC PROJECTION EXPOSURE METHOD
#289Illumination system of a microlithographic projection exposure apparatus
#290Illumination system for illuminating a mask in a microlithographic exposure apparatus
#291Controllable radiation lithographic apparatus and method
#292Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
#293Projection exposure methods and systems
#294Lithographic apparatus and method involving a pockels cell
#295ILLUMINATION OPTICS FOR PROJECTION MICROLITHOGRAPHY AND RELATED METHODS
#296Exposure apparatus and a method of manufacturing a device that conduct exposure using a set light source shape
#297Microlithography exposure apparatus using polarized light and microlithography projection system having concave primary and secondary mirrors
#298Optical system for semiconductor lithography
#299OPTICAL UNIT, ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARTUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
#300Lithographic apparatus and device manufacturing method