Patents-Review.com
ClassID:

177149 ⎘

G03F7/70175 - CPC Classification

Classification description:

Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor; Exposure apparatus for microlithography; Mask illumination systems; Details of optical elements Lamphouse reflector arrangements, i.e. collecting light from solid angle upstream of the light source

Recent Application in this class:
#1
20260079405
2026-03-19

EUV RADIATION SOURCE APPARATUS FOR LITHOGRAPHY

 #2
20260064007
2026-03-05

EUV LIGHT SOURCE DEVICE FOR EUV MASK INSPECTION

 #3
20260050226
2026-02-19

LIGHT GENERATION DEVICE AND LITHOGRAPHY APPARATUS INCLUDING THE SAME

 #4
20250321495
2025-10-16

RADIATION COLLECTOR

 #5
20250298175
2025-09-25

EUV COLLECTOR

 #6
20250258436
2025-08-14

EUV COLLECTOR FOR USE IN AN EUV PROJECTION EXPOSURE APPARATUS

 #7
20250206598
2025-06-26

APPARATUS FOR STRESS-REDUCED MOUNTING OF MEMS-BASED MICROMIRRORS

 #8
20250085643
2025-03-13

CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER

 #9
20240353766
2024-10-24

EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM

 #10
20240255856
2024-08-01

OPTICAL COMPONENT GROUP, IN PARTICULAR FOR USE IN AN ILLUMINATION DEVICE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

 #11
20240241457
2024-07-18

DETECTION APPARATUS, ALIGNMENT MICROSCOPE, AND EXPOSURE APPARATUS

 #12
20240219848
2024-07-04

EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE

 #13
20240094646
2024-03-21

EXPOSURE APPARATUS AND DECONTAMINATION APPARATUS

 #14
20240012333
2024-01-11

OPTICAL SYSTEM FOR A LITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

 #15
20240004304
2024-01-04

RADIATION COLLECTOR

 #16
20230266673
2023-08-24

OPTICAL ELEMENT, IN PARTICULAR FOR REFLECTING EUV RADIATION, OPTICAL ARRANGEMENT, AND METHOD FOR MANUFACTURING AN OPTICAL ELEMENT

 #17
20230176351
2023-06-08

Light source apparatus, lithography apparatus, and article manufacturing

 #18
20230146235
2023-05-11

EUV COLLECTOR

 #19
20230126018
2023-04-27

OPTICAL ELEMENT FOR A EUV PROJECTION EXPOSURE SYSTEM

 #20
20230122333
2023-04-20

Mirror, in particular for a microlithographic projection exposure apparatus

 #21
20230071131
2023-03-09

Collector mirror and apparatus for creating extreme ultraviolet light including the same

 #22
20220382048
2022-12-01

EUV RADIATION SOURCE APPARATUS FOR LITHOGRAPHY

 #23
20220338333
2022-10-20

EUV LIGHT SOURCE AND APPARATUS FOR LITHOGRAPHY

 #24
20220326621
2022-10-13

Lamp, light source device, exposure apparatus, and article manufacturing method

 #25
20220260756
2022-08-18

Oxygen-loss resistant top coating for optical elements

 #26
20220197160
2022-06-23

Radiation source for lithography process

 #27
20220179328
2022-06-09

Cleaning a structure surface in an EUV chamber

 #28
20220171292
2022-06-02

Optical diffraction component

 #29
20210364934
2021-11-25

Extreme ultraviolet lithography system

 #30
20210223707
2021-07-22

In-situ light detection methods and apparatus for ultraviolet semiconductor substrate processing

 #31
20210208508
2021-07-08

EUV radiation source apparatus for lithography

 #32
20210173316
2021-06-10

Radiation source for lithography process

 #33
20210063899
2021-03-04

Cleaning a structure surface in an EUV chamber

 #34
20210033983
2021-02-04

Extreme ultraviolet lithography system

 #35
20200371442
2020-11-26

Extreme ultraviolet light generation apparatus and electronic device manufacturing method

 #36
20200348241
2020-11-05

EUV vessel inspection method and related system

 #37
20200301285
2020-09-24

Extreme ultraviolet light generation device and electronic device manufacturing method

 #38
20200278617
2020-09-03

Radiation source for lithography process

 #39
20200077501
2020-03-05

Extreme ultraviolet light generation apparatus

 #40
20200037428
2020-01-30

System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector

 #41
20200025688
2020-01-23

EUV vessel inspection method and related system

 #42
20200008290
2020-01-02

EUV light source and apparatus for lithography

 #43
20200004167
2020-01-02

EUV light source and apparatus for lithography

 #44
20200004160
2020-01-02

EUV radiation source apparatus for lithography

 #45
20190289704
2019-09-19

System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector

 #46
20190155179
2019-05-23

Radiation source for lithography process

 #47
20190146350
2019-05-16

Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing method

 #48
20190104604
2019-04-04

Collector pellicle

 #49
20190094699
2019-03-28

EUV Collector

 #50
20190080811
2019-03-14

Method of controlling debris in an EUV light source

 #51
20190033225
2019-01-31

EUV vessel inspection method and related system

 #52
20180246414
2018-08-30

Suppression filter, radiation collector and radiation source for a lithographic apparatus; method of determining a separation distance between at least two reflective surface levels of a suppression filter

 #53
20180246413
2018-08-30

Optical assembly with a protective element and optical arrangement therewith

 #54
20180224747
2018-08-09

Extreme ultraviolet light generating apparatus

 #55
20180173117
2018-06-21

Extreme ultraviolet lithography system with debris trapper on exhaust line

 #56
20180160517
2018-06-07

System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector

 #57
20170254995
2017-09-07

Mirror, in particular collector mirror for microlithography

 #58
20170238407
2017-08-17

Extreme ultraviolet light generation device

 #59
20170200523
2017-07-13

EUV element having barrier to hydrogen transport

 #60
20170123321
2017-05-04

Light source apparatus, illumination device, exposure apparatus, and device manufacturing method

 #61
20170097572
2017-04-06

Faceted EUV optical element

 #62
20160370705
2016-12-22

Rotary EUV collector

 #63
20160334711
2016-11-17

Radiation source

 #64
20160252821
2016-09-01

Radiation source device, lithographic apparatus and device manufacturing method

 #65
20160209753
2016-07-21

Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing method

 #66
20160187785
2016-06-30

Illumination system

 #67
20160187632
2016-06-30

Collector

 #68
20160041472
2016-02-11

Light source apparatus, illumination device, exposure apparatus, and device manufacturing method

 #69
20160007435
2016-01-07

Systems and methods for synchronous operation of debris-mitigation devices

 #70
20150194230
2015-07-09

EUV collector

 #71
20150085264
2015-03-26

Rotary EUV collector

 #72
20150077729
2015-03-19

Module and method for producing extreme ultraviolet radiation

 #73
20140333915
2014-11-13

Radiation source

 #74
20140306115
2014-10-16

Debris protection system for reflective optic utilizing gas flow

 #75
20140192339
2014-07-10

Collector

 #76
20140132941
2014-05-15

Imaging optical system and projection exposure system including the same

 #77
20140043595
2014-02-13

EUV collector system with enhanced EUV radiation collection

 #78
20140036247
2014-02-06

Illumination optical unit

 #79
20130088697
2013-04-11

Collector mirror assembly and method for producing extreme ultraviolet radiation

 #80
20130050862
2013-02-28

Mirror device

 #81
20130027681
2013-01-31

EUV collector

 #82
20130010282
2013-01-10

ILLUMINANCE DISTRIBUTION DETECTION METHOD IN EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND POSITIONING METHOD OF LIGHT FOCUSING OPTICAL MEANS

 #83
20130003167
2013-01-03

Optical collector for collecting extreme ultraviolet radiation, method for operating such an optical collector, and EUV source with such a collector

 #84
20120305810
2012-12-06

Laser-produced-plasma EUV light source

 #85
20120182536
2012-07-19

Source collector, lithographic apparatus and device manufacturing method

 #86
20120162627
2012-06-28

Illumination optical unit for microlithography

 #87
20120140196
2012-06-07

Ex-situ removal of deposition on an optical element

 #88
20120050703
2012-03-01

EUV collector with cooling device

 #89
20110318694
2011-12-29

Source-collector module with GIC mirror and tin vapor LPP target system

 #90
20110317256
2011-12-29

Master oscillator-power amplifier drive laser with pre-pulse for EUV light source

 #91
20110309260
2011-12-22

Chamber apparatus and extreme ultraviolet light generation system

 #92
20110266467
2011-11-03

Extreme ultraviolet light source apparatus

 #93
20110242515
2011-10-06

EUV collector system with enhanced EUV radiation collection

 #94
20110211180
2011-09-01

OPTICAL COMPONENT HAVING AN IMPROVED TRANSIENT THERMAL BEHAVIOR AND METHOD FOR IMPROVING THE TRANSIENT THERMAL BEHAVIOR OF AN OPTICAL COMPONENT

 #95
20110205517
2011-08-25

Optical element mount for lithographic apparatus

 #96
20110199600
2011-08-18

COLLECTOR ASSEMBLY, RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

 #97
20110188018
2011-08-04

Alignment of collector device in lithographic apparatus

 #98
20110188014
2011-08-04

Radiation source with a debris mitigation system, lithographic apparatus with a debris mitigation system, method for preventing debris from depositing on collector mirror, and device manufacturing method

 #99
20110170079
2011-07-14

Radiation system and lithographic apparatus

 #100
20110168925
2011-07-14

Source-collector module with GIC mirror and LPP EUV light source

 #101
20110128513
2011-06-02

Cooling systems and methods for grazing incidence EUV lightography collectors

 #102
20110122389
2011-05-26

RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

 #103
20110024651
2011-02-03

RADIATION SYSTEM AND METHOD, AND A SPECTRAL PURITY FILTER

 #104
20110001948
2011-01-06

ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS

 #105
20100290015
2010-11-18

Ex-situ removal of deposition on an optical element

 #106
20100271610
2010-10-28

LITHOGRAPHIC RADIATION SOURCE, COLLECTOR, APPARATUS AND METHOD

 #107
20100265481
2010-10-21

Imaging optical system and projection exposure system including the same

 #108
20100259742
2010-10-14

OBLIQUE MIRROR-TYPE NORMAL-INCIDENCE COLLECTOR SYSTEM FOR LIGHT SOURCES, PARTICULARLY EUV PLASMA DISCHARGE SOURCES

 #109
20100253928
2010-10-07

Radiation source

 #110
20100231882
2010-09-16

Bundle-guiding optical collector for collecting the emission of a radiation source

 #111
20100182579
2010-07-22

Laser device

 #112
20100181502
2010-07-22

Self-shading electrodes for debris suppression in an EUV source

 #113
20100176313
2010-07-15

Extreme ultraviolet light source

 #114
20100157267
2010-06-24

Radiation source, lithographic apparatus and device manufacturing method

 #115
20100140514
2010-06-10

Gas management system for a laser-produced-plasma EUV light source

 #116
20100140513
2010-06-10

Extreme ultraviolet light source apparatus

 #117
20100140512
2010-06-10

Extreme ultraviolet light source apparatus

 #118
20100096557
2010-04-22

Collector optical system

 #119
20100091941
2010-04-15

MULTI-REFLECTION OPTICAL SYSTEMS AND THEIR FABRICATION

 #120
20100067653
2010-03-18

Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element

 #121
20100039631
2010-02-18

Radiation sources and methods of generating radiation

 #122
20090250639
2009-10-08

Radiation source

 #123
20090244696
2009-10-01

Device for collecting flux of electromagnetic radiation in the extreme ultraviolet

 #124
20090153975
2009-06-18

High power EUV lamp system

 #125
20090141356
2009-06-04

OPTICAL ELEMENT, AND LIGHT SOURCE UNIT AND EXPOSURE APPARATUS HAVING THE SAME

 #126
20090090877
2009-04-09

Module and method for producing extreme ultraviolet radiation

 #127
20090066924
2009-03-12

Lithographic apparatus, device manufacturing method, and use of a radiation collector

 #128
20090059196
2009-03-05

Systems and methods for in-situ reflectivity degradation monitoring of optical collectors used in extreme ultraviolet (EUV) lithography processes

 #129
20090057567
2009-03-05

Gas management system for a laser-produced-plasma EUV light source

 #130
20090021950
2009-01-22

Optical component having an improved transient thermal behavior and method for improving the transient thermal behavior of an optical component

 #131
20090014027
2009-01-15

Method and arrangement for cleaning optical surfaces in plasma-based radiation sources

 #132
20080291406
2008-11-27

Assembly comprising a radiation source, a reflector and a contaminant barrier

 #133
20080266650
2008-10-30

Efficient EUV collector designs

 #134
20080246940
2008-10-09

Illumination system for illuminating a patterning device and method for manufacturing an illumination system

 #135
20080225387
2008-09-18

COLLECTOR FOR ILLUMINATION SYSTEMS WITH A WAVELENGTH LESS THAN OR EQUAL TO 193 nm

 #136
20080130076
2008-06-05

Illumination system particularly for microlithography

 #137
20080104828
2008-05-08

Collector mirror exchanging apparatus and method for extreme ultraviolet light source apparatus

 #138
20080099935
2008-05-01

High-Precision Optical Surface Prepared by Sagging from a Masterpiece

 #139
20080043922
2008-02-21

X-ray generator and exposure apparatus

 #140
20080042079
2008-02-21

Collector with fastening devices for fastening mirror shells

 #141
20080023657
2008-01-31

Extreme ultraviolet light source

 #142
20080017801
2008-01-24

EUV light source

 #143
20080013680
2008-01-17

Collector configured of mirror shells

 #144
20070296943
2007-12-27

Optical apparatus

 #145
20070187627
2007-08-16

Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source

 #146
20070177274
2007-08-02

OPTICAL ELEMENT, AND LIGHT SOURCE UNIT AND EXPOSURE APPARATUS HAVING THE SAME

 #147
20070170378
2007-07-26

EUV light source optical elements

 #148
20070158597
2007-07-12

EUV light source

 #149
20070158596
2007-07-12

EUV light source

 #150
20070125970
2007-06-07

EUV light source

 #151
20070125964
2007-06-07

Lithographic apparatus including a cleaning device and method for cleaning an optical element

 #152
20070120072
2007-05-31

Illumination system particularly for microlithography

 #153
20070114470
2007-05-24

Collector for EUV light source

 #154
20070114469
2007-05-24

Collector for EUV light source

 #155
20070114468
2007-05-24

Collector for EUV light source

 #156
20070114466
2007-05-24

Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element

 #157
20070085043
2007-04-19

Lithographic apparatus, device manufacturing method, and use of a radiation collector

 #158
20070084461
2007-04-19

Lithographic apparatus, device manufacturing method and radiation collector

 #159
20070069162
2007-03-29

Ex-situ removal of deposition on an optical element

 #160
20070069160
2007-03-29

Ex-situ removal of deposition on an optical element

 #161
20070058244
2007-03-15

Oblique mirror-type normal-incidence collector system for light sources, particularly EUV plasma discharge sources

 #162
20070041004
2007-02-22

Optical systems that correct optical irregularities, and projection-exposure systems and methods comprising same

 #163
20070023711
2007-02-01

Discharge produced plasma EUV light source

 #164
20060291062
2006-12-28

Collector with fastening devices for fastening mirror shells

 #165
20060289810
2006-12-28

Adjustment of distance between source plasma and mirrors to change partial coherence

 #166
20060289808
2006-12-28

EUV light source collector erosion mitigation

 #167
20060250599
2006-11-09

Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method

 #168
20060245045
2006-11-02

Condenser optic with sacrificial reflective surface

 #169
20060237668
2006-10-26

Dual hemispherical collectors

 #170
20060227826
2006-10-12

Collector mirror for plasma-based, short-wavelength radiation sources

 #171
20060176547
2006-08-10

Efficient EUV collector designs

 #172
20060175558
2006-08-10

Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby

 #173
20060132046
2006-06-22

Device for generating and/or influencing electromagnetic radiation from a plasma

 #174
20060131515
2006-06-22

Collector for EUV light source

 #175
20060120429
2006-06-08

Collector optical system, light source unit, illumination optical apparatus, and exposure apparatus

 #176
20060119824
2006-06-08

Lithographic apparatus and device manufacturing method

 #177
20060097202
2006-05-11

Collector having unused region for illumination systems using a wavelength ≦193 nm

 #178
20060093253
2006-05-04

Optical component having an improved transient thermal behavior and method for improving the transient thermal behavior of an optical component

 #179
20060078089
2006-04-13

X-ray generator and exposure apparatus

 #180
20060002113
2006-01-05

Adjustable illumination source

 #181
20060000985
2006-01-05

Optics for extreme ultraviolet lithography

 #182
20050269529
2005-12-08

Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source

 #183
20050244572
2005-11-03

Technique to prevent tin contamination of mirrors and electrodes in an EUV lithography system

 #184
20050230645
2005-10-20

Extreme ultraviolet light source

 #185
20050225739
2005-10-13

Exposure apparatus and device fabrication method using the same

 #186
20050199830
2005-09-15

EUV light source optical elements

 #187
20050199829
2005-09-15

EUV light source

 #188
20050157383
2005-07-21

Condenser optic with sacrificial reflective surface

 #189
20050157284
2005-07-21

Lithographic apparatus, device manufacturing method, and device manufactured thereby

 #190
20050148210
2005-07-07

Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method

 #191
20050088760
2005-04-28

Illumination system particularly for microlithography

 #192
20050073663
2005-04-07

Reflection mirror apparatus, exposure apparatus and device manufacturing method

 #193
20050030653
2005-02-10

Facet mirror having a number of mirror facets

 #194
15284513
2017-04-04

EUV light source with spectral purity filter and power recycling