200565 ⎘
Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
Interferometer for x-ray phase contrast imaging
#2Microscopic system for testing structures and defects on EUV lithography photomasks
#3Method for producing a multilayer Laue lens
#4Nanopatterned electron beams for temporal coherence and deterministic phase control of x-ray free-electron lasers
#5Electron diffraction intensity from single crystal silicon in a photoinjector
#6Metal X-ray grid, X-ray imaging device, and production method for metal X-ray grid
#7Semiconductor apparatus and method of operating the same
#8System and method for x-ray fluorescence with filtering
#9X-ray apparatus including x-ray reflector and method for operating the x-ray apparatus
#10EUV exposure apparatus with reflective elements having reduced influence of temperature variation
#11X-ray generator and x-ray analysis device
#12Multilayer mirror for reflecting EUV radiation and method for producing the same
#13Reticles for lithography
#14EUV exposure apparatus with reflective elements having reduced influence of temperature variation
#15Graphene spectral purity filter
#16Reflective mirror, projection optical system, exposure apparatus, and device manufacturing method
#17Methods for manufacturing doubly bent X-ray focusing device, doubly bent X-ray focusing device assembly, doubly bent X-ray spectroscopic device and doubly bent X-ray spectroscopic device assembly
#18EUV exposure apparatus with reflective elements having reduced influence of temperature variation
#19Reflective mirror, projection optical system, exposure apparatus, and device manufacturing method
#20X-ray optics assembly with switching system for three beam paths, and associated X-ray diffractometer
#21Pellicle for reticle and multilayer mirror
#22Multilayer mirror
#23EUV exposure apparatus with reflective elements having reduced influence of temperature variation
#24Structure, method for manufacturing the same, and talbot interferometer
#25High brightness X-ray absorption spectroscopy system
#26X-ray surface analysis and measurement apparatus
#27Reflective mirror, projection optical system, exposure apparatus, and device manufacturing method
#28Color x-ray histology for multi-stained biologic sample
#29Multilayer mirror, method of producing a multilayer mirror and lithographic apparatus
#30Collector
#31Pellicle for reticle and multilayer mirror
#32Lithographic apparatus, spectral purity filter and device manufacturing method
#33Grazing incidence reflectors, lithographic apparatus, methods for manufacturing a grazing incidence reflector and methods for manufacturing a device
#34Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirror
#35Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objective
#36Method for manufacturing X-ray/γ-ray focusing optical system using atomic layer deposition
#37X-RAY WAVEGUIDE AND X-RAY WAVEGUIDE SYSTEM
#38X-RAY WAVEGUIDE
#39X-ray waveguide
#40EUV exposure apparatus with reflective elements having reduced influence of temperature variation
#41Lithographic apparatus and method
#42APPARATUS FOR ALIGNMENT OF MULTILAYER FILM MIRRORS FOR MONOCHROMATIC X-RAY GENERATOR AND X-RAY IMAGE DETECTING METHOD USING THE SAME
#43LITHOGRAPHIC APPARATUS AND SPECTRAL PURITY FILTER
#44Optical collector for collecting extreme ultraviolet radiation, method for operating such an optical collector, and EUV source with such a collector
#45X-RAY MIRROR, METHOD OF PRODUCING THE MIRROR, AND X-RAY APPARATUS
#46Multilayer mirror and lithographic apparatus
#47MULTILAYER METALLIC ELECTRODES FOR OPTOELECTRONICS
#48Semiconductor exposure device using extreme ultra violet radiation
#49REFLECTIVE OPTICAL ELEMENT AND METHOD FOR OPERATING AN EUV LITHOGRAPHY APPARATUS
#50Nanotube based device for guiding X-ray photons and neutrons
#51Optical member for EUV lithography, and process for production of reflective layer-equipped substrate
#52Compact mammograph and associated mammography process
#53Projection objective and projection exposure apparatus with negative back focus of the entry pupil
#54Source-collector module with GIC mirror and xenon ice EUV LPP target system
#55Method of measuring aerial image of EUV mask
#56X-ray waveguide
#57X-ray radiator to generate quasi-monochromatic x-ray radiation, and radiography x-ray acquisition system employing same
#58X-ray dark-field imaging system and method
#59X-RAY GENERATOR WITH POLYCAPILLARY OPTIC
#60LOW-EMISSIVITY STRUCTURES
#61Device for providing a high energy X-ray beam
#62Method and lithography device with a mask reflecting light
#63High flux photon beams using optic devices
#64EUV light source components and methods for producing, using and refurbishing same
#65Multi-beam X-ray system
#66Source-collector module with GIC mirror and LPP EUV light source
#67Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
#68Extreme UV radiation reflecting element comprising a sputter-resistant material
#69Multiconfiguration X-ray optical system
#70Radiation Collector
#71Projection objective and projection exposure apparatus with negative back focus of the entry pupil
#72Short working distance spectrometer and associated devices, systems, and methods
#73Apparatus for measuring aerial image of EUV mask
#74RADIATION SYSTEM AND METHOD, AND A SPECTRAL PURITY FILTER
#75Grazing incidence collector for laser produced plasma sources
#76LITHOGRAPHIC RADIATION SOURCE, COLLECTOR, APPARATUS AND METHOD
#77X-ray diffraction method and X-ray diffraction apparatus
#78APERIODIC MULTILAYER STRUCTURES
#79METHOD FOR PRODUCING AN OPTICAL ELEMENT THROUGH A MOLDING PROCESS, OPTICAL ELEMENT PRODUCED ACCORDING TO THE METHOD, COLLECTOR, AND LIGHTING SYSTEM
#80Procedure of Manufacturing a Neutron-Guiding Flat Surface
#81Ultra-high density diffraction grating
#82High intensity x-ray beam system
#83X-ray generator with polycapillary optic
#84Masks, lithography device and semiconductor component
#85Semiconductor exposure device using extreme ultra violet radiation
#86Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination
#87Highly aligned x-ray optic and source assembly for precision x-ray analysis applications
#88X-ray imaging systems employing point-focusing, curved monochromating optics
#89Illumination system for a microlithography projection exposure apparatus
#90Method of manufacturing photomask
#91Monochromatic x-ray micro beam for trace element mapping
#92EUV light source components and methods for producing, using and refurbishing same
#93Multi-energy imaging system and method using optic devices
#94X-ray imaging system and methods of using and forming an array of optic devices therein
#95Thermally stable multilayer mirror for the EUV spectral range
#96Method and apparatus for X-ray fluorescence analysis and detection
#97EUV illumination system having a folding geometry
#98Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element
#99Method of making and structure of multilayer laue lens for focusing hard x-rays
#100Illumination system particularly for microlithography
#101Laser scanning apparatus and method using diffractive optical elements
#102METHOD AND APPARATUS FOR INCREASING X-RAY FLUX AND BRIGHTNESS OF A ROTATING ANODE X-RAY SOURCE
#103Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors
#104EUV light source
#105Ultra-small angle x-ray scattering measuring apparatus
#106NARROW BAND X-RAY SYSTEM AND FABRICATION METHOD THEREOF
#107Reflective photomask, method of fabricating the same, and reflective blank photomask
#108X-ray generating method and x-ray generating apparatus
#109Projection objective and projection exposure apparatus with negative back focus of the entry pupil
#110EUV light source
#111EUV light source
#112EUV light source
#113X-ray optical element
#114Illumination system particularly for microlithography
#115Masks, lithography device and semiconductor component
#116Polarized neutron guide
#117Electrostatic chuck with temperature sensing unit, exposure equipment having the same, and method of detecting temperature from photomask
#118Photomask providing uniform critical dimension on semiconductor device and method of manufacturing the same
#119Device for producing extreme UV radiation
#120Radiation image detection method and system
#121Systems and methods for EUV light source metrology
#122Apparatus for evaluating EUV light source, and evaluation method using the same
#123Alternative fuels for EUV light source
#124Beam conditioning system with sequential optic
#125Radiation image information detecting panel
#126Systems and methods for cleaning a chamber window of an EUV light source
#127Optical device for X-ray applications
#128Two-dimensional diffraction grating with alternate multilayered stacks and its process of manufacture, and spectroscopic devices including these gratings
#129Devices and methods for targeting interior cancers with ionizing radiation
#130EUV light source
#131Broadband telescope
#132Optical unit and associated method
#133Illumination system particularly for microlithography
#134Beam conditioning system
#135EUV illumination system having a folding geometry
#136Speckle-based imaging diffuser and method for controllably fabricating same