METHOD FOR DESIGNING MIRROR AND ASTIGMATISM CONTROL MIRROR HAVING REFLECTING SURFACE SATISFYING DESIGN FORMULA IN SAID DESIGNING METHOD

System and method for bending crystal wafers for use in high resolution analyzers

OPTICAL ELEMENT FOR A EUV PROJECTION EXPOSURE SYSTEM

STABILIZED GRATING STRUCTURES

X-ray spectrometer and methods for use

Reflector and method of manufacturing a reflector

Light generator including debris shielding assembly, photolithographic apparatus including the light generator

Off-axis capillary x-ray optics

X-ray fluorescence analyzer and a method for performing an x-ray fluorescence analysis

X-RAY REFLECTIVE LENS ARRANGEMENT

Grid-mounting device for slit-scan differential phase contrast imaging

Metal X-ray grid, X-ray imaging device, and production method for metal X-ray grid

Stress patterning systems and methods for manufacturing free-form deformations in thin substrates

Hard X-ray photoelectron spectroscopy system

Constructions of x-ray lenses for converging x-rays

Extreme ultraviolet chamber apparatus, extreme ultraviolet light generation system, and method for manufacturing electronic device

Testing of curved X-ray gratings

Metal X-ray grid, X-ray imaging device, and production method for metal X-ray grid

Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method

Radiation system

Reflector and method of manufacturing a reflector

Light generator including debris shielding assembly, photolithographic apparatus including the light generator, and method of manufacturing integrated circuit device using the photolithographic apparatus

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

X-ray spectrometer and methods for use

X-ray detection apparatus and x-ray detection method

X-ray spectrometer system

EUV Collector

X-ray illumination system with multiple target microstructures

Optical systems, metrology apparatus and associated method

Methods for aligning a spectrometer

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

X-ray microscope

X-ray optical device

Imaging with enhanced x-ray radiation

X-ray illumination system with multiple target microstructures

Radiation system

Methods for manufacturing doubly bent X-ray focusing device, doubly bent X-ray focusing device assembly, doubly bent X-ray spectroscopic device and doubly bent X-ray spectroscopic device assembly

X-ray transmission spectrometer system

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

Mirror, in particular collector mirror for microlithography

APPARATUS INCLUDING A BENT INTERFERENCE GRATING AND METHOD FOR BENDING AN INTERFERENCE GRATING FOR INTERFEROMETRIC X-RAY IMAGING

Charged particle beam device, optical device, irradiation method, diffraction grating system, and diffraction grating

Support structure and highly aligned monochromatic X-ray optics for X-ray analysis engines and analyzers

Extreme ultraviolet light generation apparatus

Extreme ultraviolet light generation apparatus

Method for producing a mirror element

Mobile transport and shielding apparatus for removable x-ray analyzer

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

Collector

Optical design method for X-ray focusing system using rotating mirror, and X-ray focusing system

X-ray source

Method and apparatus for measuring scattering intensity distribution

High brightness X-ray absorption spectroscopy system

Spectroscopic element and charged particle beam device using the same

X-ray shield grating and X-ray talbot interferometer including X-ray shield grating

XRF system having multiple excitation energy bands in highly aligned package

X-ray reflective lens arrangement

X-ray surface analysis and measurement apparatus

X-ray topography apparatus

Methods and systems for fabricating platelets of a monochromator for X-ray photoelectron spectroscopy

Dual elliptical reflector with a co-located foci for curing optical fibers

Extreme ultraviolet light generation apparatus

Source-collector device, lithographic apparatus, and device manufacturing method

Imaging-guided delivery of X-ray radiation

Mobile transport and shielding apparatus for removable x-ray analyzer

Color x-ray histology for multi-stained biologic sample

SUPPORT STRUCTURE AND HIGHLY ALIGNED MONOCHROMATING X-RAY OPTICS FOR X-RAY ANALYSIS ENGINES AND ANALYZERS

Collector

Source-collector module with GIC mirror and LPP EUV light source

XRF system having multiple excitation energy bands in highly aligned package

Method for producing a reflective optical component for an EUV projection exposure apparatus and component of this type

X-ray beam system offering 1D and 2D beams

X-ray optical apparatus and adjusting method thereof

X-ray apparatus and its adjusting method

Radiation imaging apparatus

X-ray optical apparatus

X-RAY CONTROL UNIT USING MONOCRYSTALLINE MATERIAL

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

Silicon focusing mirror system

Method for characterization of a spherically bent crystal for Kα X-ray imaging of laser plasmas using a focusing monochromator geometry

System and method for characterizing a film by X-ray photoelectron and low-energy X-ray fluorescence spectroscopy

Dual elliptical reflector with a co-located foci for curing optical fibers

Reflective surface shape controllable mirror device, and method for manufacturing reflective surface shape controllable mirror

Collector mirror assembly and extreme ultraviolet light source device using said collector mirror assembly

Confocal double crystal monochromator

Semiconductor exposure device using extreme ultra violet radiation

Mirror for extreme ultra violet, manufacturing method for mirror for extreme ultra violet, and far ultraviolet light source device

Extreme ultraviolet light generation apparatus

MIRROR FOR THE EUV WAVELENGTH RANGE, PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY CROMPRISING SUCH A MIRROR, AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING SUCH A PROJECTION OBJECTIVE

Method for assembling a mirror plate stack

Mirror, method of manufacturing the same, exposure apparatus, and device manufacturing method

Illumination optical unit for microlithography

EUV radiation source and method of generating EUV radiation

Point-line converter

Compact mammograph and associated mammography process

Adjustable electromagnetic energy collimator

Two-axis sagittal focusing monochromator

Fan-shaped X-ray beam imaging systems employing graded multilayer optic devices

Source-collector module with GIC mirror and xenon ice EUV LPP target system

Source-collector module with GIC mirror and xenon liquid EUV LPP target system

X-ray optical systems with adjustable convergence and focal spot size

X-ray apparatus, method of using the same and X-ray irradiation method

Device for providing a high energy X-ray beam

Ultraviolet reflector with coolant gas holes and method

Reflective optical element, projection system, and projection exposure apparatus

Extreme ultraviolet light generation system

High flux photon beams using optic devices

Multi-beam X-ray system

Cooled spider and method for grazing-incidence collectors

XRF system having multiple excitation energy bands in highly aligned package

X-ray optical configuration with two focusing elements

Cooling systems and methods for grazing incidence EUV lightography collectors

X-ray reflecting device

Medical X-ray examination apparatus and method for k-edge imaging

Multiconfiguration X-ray optical system

Radiation Collector

Short working distance spectrometer and associated devices, systems, and methods

Grazing incidence collector optical systems for EUV and X-ray applications

ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS

Grazing incidence collector for laser produced plasma sources

Optimizing total internal reflection multilayer optics through material selection

Wavelength-dispersive X-ray spectrometer

LITHOGRAPHIC RADIATION SOURCE, COLLECTOR, APPARATUS AND METHOD

Bundle-guiding optical collector for collecting the emission of a radiation source

X-ray convergence element and X-ray irradiation device

Electron-beam-assisted EEM method

Curvature distribution crystal lens and X-ray reflectometer

METHOD FOR PRODUCING AN OPTICAL ELEMENT THROUGH A MOLDING PROCESS, OPTICAL ELEMENT PRODUCED ACCORDING TO THE METHOD, COLLECTOR, AND LIGHTING SYSTEM

Device for the X-ray analysis of a specimen, comprising an energy/angle-filtering diffraction analyser system

EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE

Ultraviolet reflector with coolant gas holes and method

Collector optical system

MULTI-REFLECTION OPTICAL SYSTEMS AND THEIR FABRICATION

Radiation phase image radiographing apparatus

RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Radiation sources and methods of generating radiation

High-resolution, active-optic X-ray fluorescence analyzer

High-resolution X-ray optic and method for constructing an X-ray optic

High intensity x-ray beam system

Mirror for extreme ultra violet, manufacturing method for mirror for extreme ultra violet, and far ultraviolet light source device

Radiation source and lithographic apparatus including a contamination trap

Semiconductor exposure device using extreme ultra violet radiation

Highly aligned x-ray optic and source assembly for precision x-ray analysis applications

X-ray imaging systems employing point-focusing, curved monochromating optics

Sample module with sample stream spaced from window, for x-ray analysis system

Monochromatic x-ray micro beam for trace element mapping

Multi-energy imaging system and method using optic devices

X-ray imaging system and methods of using and forming an array of optic devices therein

Thermally stable multilayer mirror for the EUV spectral range

Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror

Sagittal focusing Laue monochromator

Device for improving the resolution capability of an x-ray optical apparatus

X-ray focusing optic having multiple layers with respective crystal orientations

EUV light source, EUV exposure equipment, and semiconductor device manufacturing method

Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors

Photolithography Apparatus Having Mirror for Correcting Aberrations in Optical Illumination System and Mirror Having Aberration Correcting Part

Method of providing a shaped body made of glass or glass ceramics

X-ray optical element

Curved X-ray reflector

Discharge produced plasma EUV light source

Device for producing extreme UV radiation

Beam conditioning system with sequential optic

Method and apparatus for implement XANES analysis

Systems and methods for cleaning a chamber window of an EUV light source

Optical device for X-ray applications

High Spatial Resolution X-ray and Gamma Ray Imaging System Using Crystal Diffraction Lenses

Portable and on-line arsenic analyzer for drinking water

Device and method for producing a spatially uniformly intense source of x-rays

Optical unit and associated method

Collector unit with a reflective element for illumination systems with a wavelength of smaller than 193 nm

Beam conditioning system