G21K2201/065 - CPC Classification Index

#1

20240242852

2024-07-18

SOLID TARGET IRRADIATOR SYSTEM FOR RADIOISOTOPES PRODUCTION

#2

20210162083

2021-06-03

Apparatus and method for irradiation

#3

20200312479

2020-10-01

Extreme ultraviolet chamber apparatus, extreme ultraviolet light generation system, and method for manufacturing electronic device

#4

20200096874

2020-03-26

Method for producing a reflective optical element, reflective optical element, and use of a reflective optical element

#5

20200073248

2020-03-05

Semiconductor apparatus and method of operating the same

#6

20200069825

2020-03-05

Apparatus and method for irradiation

#7

20190148028

2019-05-16

REFLECTOR

#8

20190066859

2019-02-28

Radioisotope production

#9

20190046675

2019-02-14

Apparatus and method for irradiation

#10

20190046674

2019-02-14

Apparatus and method for irradiation

#11

20180307142

2018-10-25

Reflective optical element

#12

20180074410

2018-03-15

Illumination optic for EUV projection lithography

#13

20170315453

2017-11-02

Method for producing a reflective optical element, reflective optical element, and use of a reflective optical element

#14

20160278195

2016-09-22

Apparatus for generating extreme ultraviolet light

#15

20150028229

2015-01-29

Dual elliptical reflector with a co-located foci for curing optical fibers

#16

20130335816

2013-12-19

Method for producing a reflective optical component for an EUV projection exposure apparatus and component of this type

#17

20130068969

2013-03-21

Dual elliptical reflector with a co-located foci for curing optical fibers

#18

20130020511

2013-01-24

MIRROR, MIRROR DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS

#19

20130003167

2013-01-03

Optical collector for collecting extreme ultraviolet radiation, method for operating such an optical collector, and EUV source with such a collector

#20

20120099088

2012-04-26

High heat load optics with a liquid metal interface for use in an extreme ultraviolet lithography system

#21

20120050704

2012-03-01

Source-collector module with GIC mirror and xenon liquid EUV LPP target system

#22

20120050703

2012-03-01

EUV collector with cooling device

#23

20110248183

2011-10-13

Ultraviolet reflector with coolant gas holes and method

#24

20110211180

2011-09-01

OPTICAL COMPONENT HAVING AN IMPROVED TRANSIENT THERMAL BEHAVIOR AND METHOD FOR IMPROVING THE TRANSIENT THERMAL BEHAVIOR OF AN OPTICAL COMPONENT

#25

20110181860

2011-07-28

Cooled spider and method for grazing-incidence collectors

#26

20110128513

2011-06-02

Cooling systems and methods for grazing incidence EUV lightography collectors

#27

20110001948

2011-01-06

ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS

#28

20100303199

2010-12-02

Grazing incidence collector for laser produced plasma sources

#29

20100110397

2010-05-06

High heat load optics with a liquid metal interface for use in an extreme ultraviolet lithography system

#30

20100096564

2010-04-22

Ultraviolet reflector with coolant gas holes and method

#31

20090103063

2009-04-23

COOLING APPARATUS FOR OPTICAL MEMBER, BARREL, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

#32

20090021950

2009-01-22

Optical component having an improved transient thermal behavior and method for improving the transient thermal behavior of an optical component

#33

20080017801

2008-01-24

EUV light source

#34

20080013680

2008-01-17

Collector configured of mirror shells

#35

20070158597

2007-07-12

EUV light source

#36

20070158596

2007-07-12

EUV light source

#37

20070158594

2007-07-12

Extreme UV radiation source device

#38

20070125970

2007-06-07

EUV light source

#39

20070091485

2007-04-26

Liquid cooled mirror for use in extreme ultraviolet lithography

#40

20070035814

2007-02-15

Projection objective

#41

20060227826

2006-10-12

Collector mirror for plasma-based, short-wavelength radiation sources

#42

20060221474

2006-10-05

Optical thin film and mirror using the same

#43

20060097202

2006-05-11

Collector having unused region for illumination systems using a wavelength ≦193 nm

#44

20060093253

2006-05-04

Optical component having an improved transient thermal behavior and method for improving the transient thermal behavior of an optical component

#45

20050199829

2005-09-15

EUV light source

#46

20050185307

2005-08-25

Optical component, comprising a material with a predetermined homogeneity of thermal expansion

#47

20050105066

2005-05-19

Lithographic apparatus and device manufacturing method

#48

20050073663

2005-04-07

Reflection mirror apparatus, exposure apparatus and device manufacturing method