206307 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Charge control of objects or beams; Neutralising arrangements Deflection of neutralising particles
Apparatus and techniques for decelerated ion beam with no energy contamination
#2Method and apparatus for neutral beam processing based on gas cluster ion beam technology
#3Chicane blanker assemblies for charged particle beam systems and methods of using the same
#4Dual beam system
#5Dual beam system
#6Imprint method, chip production process, and imprint apparatus
#7Techniques for commensurate cusp-field for effective ion beam neutralization
#8Beam processing apparatus
#9Dual beam system
#10Electromagnet with active field containment
#11Electron microscope application apparatus and sample inspection method
#12Beam neutralization in low-energy high-current ribbon-beam implanters
#13Electron confinement inside magnet of ion implanter
#14Substrate processing apparatus using neutralized beam and method thereof
#15Dual beam system