206309 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Charge control of objects or beams; Neutralising arrangements of objects being observed or treated using secondary electrons
Methods and systems including pulsed dual-beam charge neutralization
#2System and method for reducing the charging effect in a transmission electron microscope system
#3PLASMA BRIDGE NEUTRALIZER FOR ION BEAM ETCHING
#4Method for inspecting EUV reticle and apparatus thereof
#5Method for inspecting EUV reticle and apparatus thereof
#6Method for controlling charging of sample and scanning electron microscope
#7Transmission electron microscope
#8Scanning electron microscope
#9Apparatus for producing secondary electrons, a secondary electrode, and an acceleration electrode
#10Technique for confining secondary electrons in plasma-based ion implantation
#11Method for charging substrate to a potential
#12Pattern defect inspection method and apparatus thereof
#13Scanning electron microscope
#14Method for charging substrate to a potential
#15Charged particle beam system
#16Controlled charge neutralization of ion-implanted articles